PL1870236T3 - Arkusz dekoracyjny o wysokim połysku - Google Patents

Arkusz dekoracyjny o wysokim połysku

Info

Publication number
PL1870236T3
PL1870236T3 PL06714916T PL06714916T PL1870236T3 PL 1870236 T3 PL1870236 T3 PL 1870236T3 PL 06714916 T PL06714916 T PL 06714916T PL 06714916 T PL06714916 T PL 06714916T PL 1870236 T3 PL1870236 T3 PL 1870236T3
Authority
PL
Poland
Prior art keywords
decorative sheet
gloss decorative
gloss
sheet
decorative
Prior art date
Application number
PL06714916T
Other languages
English (en)
Inventor
Eiichiro Yokochi
Original Assignee
Dainippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Printing Co Ltd filed Critical Dainippon Printing Co Ltd
Publication of PL1870236T3 publication Critical patent/PL1870236T3/pl

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B44DECORATIVE ARTS
    • B44CPRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/16Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like
    • B44C1/165Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like for decalcomanias; sheet material therefor
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/1006Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/1006Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/1006Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106Esters of polycondensation macromers
    • C08F222/1065Esters of polycondensation macromers of alcohol terminated (poly)urethanes, e.g. urethane(meth)acrylates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851Intermediate layer is discontinuous or differential
    • Y10T428/24868Translucent outer layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851Intermediate layer is discontinuous or differential
    • Y10T428/24868Translucent outer layer
    • Y10T428/24876Intermediate layer contains particulate material [e.g., pigment, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31551Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31652Of asbestos
    • Y10T428/31663As siloxane, silicone or silane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31855Of addition polymer from unsaturated monomers
    • Y10T428/31938Polymer of monoethylenically unsaturated hydrocarbon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Laminated Bodies (AREA)
PL06714916T 2005-03-01 2006-02-28 Arkusz dekoracyjny o wysokim połysku PL1870236T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005056416A JP4867179B2 (ja) 2005-03-01 2005-03-01 高光沢化粧シート
PCT/JP2006/303790 WO2006093165A1 (ja) 2005-03-01 2006-02-28 高光沢化粧シート
EP20060714916 EP1870236B1 (en) 2005-03-01 2006-02-28 High-gloss decorative sheet

Publications (1)

Publication Number Publication Date
PL1870236T3 true PL1870236T3 (pl) 2014-07-31

Family

ID=36941194

Family Applications (1)

Application Number Title Priority Date Filing Date
PL06714916T PL1870236T3 (pl) 2005-03-01 2006-02-28 Arkusz dekoracyjny o wysokim połysku

Country Status (5)

Country Link
US (1) US8053061B2 (pl)
EP (1) EP1870236B1 (pl)
JP (1) JP4867179B2 (pl)
PL (1) PL1870236T3 (pl)
WO (1) WO2006093165A1 (pl)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5035038B2 (ja) * 2007-03-29 2012-09-26 大日本印刷株式会社 化粧シート
JP4900000B2 (ja) * 2007-03-30 2012-03-21 大日本印刷株式会社 鏡面化粧シート及びこれを用いた化粧板
JP2009048184A (ja) * 2007-07-23 2009-03-05 Hitachi Chem Co Ltd 積層型光学部材用光硬化型樹脂組成物、及びこれを用いてなる積層型光学部材と視野角拡大フィルム
JP5287077B2 (ja) * 2007-09-28 2013-09-11 大日本印刷株式会社 鋼板用化粧シート及びこれを用いた化粧鋼板
JP5454053B2 (ja) * 2008-09-29 2014-03-26 大日本印刷株式会社 化粧シート
JP5454054B2 (ja) * 2008-09-29 2014-03-26 大日本印刷株式会社 化粧シート
JP5454057B2 (ja) * 2008-09-29 2014-03-26 大日本印刷株式会社 化粧シート
US9365980B2 (en) 2010-11-05 2016-06-14 International Paper Company Packaging material having moisture barrier and methods for preparing same
US9358576B2 (en) 2010-11-05 2016-06-07 International Paper Company Packaging material having moisture barrier and methods for preparing same
TWI583553B (zh) 2011-08-31 2017-05-21 3M新設資產公司 具有抗磨損的氣味吸收膜
US10894904B2 (en) 2013-04-15 2021-01-19 Nitto Denko Corporation Pressure-sensitive adhesive sheet and pressure sensitive adhesive composition
JP6223836B2 (ja) * 2013-04-15 2017-11-01 日東電工株式会社 粘着剤組成物および粘着シート
JP6459340B2 (ja) * 2013-09-30 2019-01-30 大日本印刷株式会社 鏡面化粧シート、及びこれを用いた鏡面化粧板
JP5831593B2 (ja) * 2014-05-26 2015-12-09 大日本印刷株式会社 加飾シートの製造方法、加飾シート及びそれを用いてなる加飾樹脂成形品
CN104499628B (zh) * 2014-12-31 2016-09-28 东莞市亚欧装饰设计工程有限公司 一种防潮防脱落天花板结构
JP2018079603A (ja) * 2016-11-15 2018-05-24 凸版印刷株式会社 化粧シート及び化粧板

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2856862B2 (ja) 1990-08-03 1999-02-10 大日本印刷株式会社 塗料組成物およびこれを用いた化粧材
DE4025811C1 (pl) * 1990-08-16 1992-01-02 Uvex Winter Optik Gmbh, 8510 Fuerth, De
JP3088511B2 (ja) * 1991-09-27 2000-09-18 三菱レイヨン株式会社 被覆用組成物及び表面被覆物品
JP4046253B2 (ja) * 1998-05-20 2008-02-13 大日本印刷株式会社 同調エンボス化粧シート及びその製造方法
JP2000141551A (ja) * 1998-11-10 2000-05-23 Dainippon Printing Co Ltd プレコート化粧紙
JP3388437B2 (ja) 2000-02-18 2003-03-24 大日本印刷株式会社 化粧シート
JP3453679B2 (ja) * 2000-04-27 2003-10-06 大日本印刷株式会社 化粧材
US6841221B2 (en) * 2002-02-20 2005-01-11 Congoleum Corporation Heat activated coating texture

Also Published As

Publication number Publication date
JP2006239954A (ja) 2006-09-14
WO2006093165A1 (ja) 2006-09-08
EP1870236A4 (en) 2009-11-11
US20090220800A1 (en) 2009-09-03
JP4867179B2 (ja) 2012-02-01
US8053061B2 (en) 2011-11-08
EP1870236A1 (en) 2007-12-26
EP1870236B1 (en) 2013-12-04

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