PL1996744T3 - Metody tworzenia powłok przeciwmikrobowych - Google Patents

Metody tworzenia powłok przeciwmikrobowych

Info

Publication number
PL1996744T3
PL1996744T3 PL07762413T PL07762413T PL1996744T3 PL 1996744 T3 PL1996744 T3 PL 1996744T3 PL 07762413 T PL07762413 T PL 07762413T PL 07762413 T PL07762413 T PL 07762413T PL 1996744 T3 PL1996744 T3 PL 1996744T3
Authority
PL
Poland
Prior art keywords
microbial
coating methods
antimicrobial coating
microbial materials
onto
Prior art date
Application number
PL07762413T
Other languages
English (en)
Inventor
Daniel M Storey
Deidre Sewell
John H Peterson
Terrence S Mcgrath
Original Assignee
Metascape Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metascape Llc filed Critical Metascape Llc
Priority claimed from PCT/US2007/001695 external-priority patent/WO2007087269A2/en
Publication of PL1996744T3 publication Critical patent/PL1996744T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Medical Uses (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Physical Vapour Deposition (AREA)
PL07762413T 2006-01-27 2007-01-19 Metody tworzenia powłok przeciwmikrobowych PL1996744T3 (pl)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US76276906P 2006-01-27 2006-01-27
US76326206P 2006-01-30 2006-01-30
US77653706P 2006-02-25 2006-02-25
US77991706P 2006-03-06 2006-03-06
PCT/US2007/001695 WO2007087269A2 (en) 2002-12-18 2007-01-19 Antimicrobial coating methods
EP07762413A EP1996744B1 (en) 2006-01-27 2007-01-19 Antimicrobial coating methods

Publications (1)

Publication Number Publication Date
PL1996744T3 true PL1996744T3 (pl) 2011-09-30

Family

ID=39731306

Family Applications (1)

Application Number Title Priority Date Filing Date
PL07762413T PL1996744T3 (pl) 2006-01-27 2007-01-19 Metody tworzenia powłok przeciwmikrobowych

Country Status (8)

Country Link
EP (1) EP1996744B1 (pl)
JP (1) JP2009524479A (pl)
AT (1) ATE499457T1 (pl)
DE (1) DE602007012667D1 (pl)
IL (1) IL192889A0 (pl)
MX (1) MX2008009511A (pl)
PL (1) PL1996744T3 (pl)
PT (1) PT1996744E (pl)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5200304B2 (ja) * 2008-04-22 2013-06-05 国立大学法人群馬大学 プラスチックへの銀担持方法及びプラスチックの銀担体、銀イオン水の製造方法
DE102009023459B4 (de) * 2009-06-02 2017-08-31 Aap Implantate Ag Osteosynthese mit Nanosilber
EP2382960A1 (de) * 2010-04-19 2011-11-02 DERU GmbH Entwicklung von medizinischen Produkten Implantat mit antimikrobieller Beschichtung
US20120183674A1 (en) * 2011-01-18 2012-07-19 Bonn-Savage Nathan G Method of Selectively Applying an Antimicrobial Coating to a Medical Device or Device Material
CN102181859B (zh) * 2011-03-29 2012-08-29 桂林电子科技大学 一种轻金属基载银复合抗菌层及其制备方法
CN102977746B (zh) * 2012-12-25 2015-04-15 广州慧谷工程材料有限公司 一种纳米抗油污抗菌自清洁涂料及其制备方法与应用
KR102117080B1 (ko) * 2018-12-21 2020-06-01 원광대학교 산학협력단 근적외선 레이저로 원격 제어가 가능한 항균성 임플란트 및 이의 제조방법
JP2020131149A (ja) * 2019-02-22 2020-08-31 株式会社ワク・コーポレーション 抗菌化処理装置及び抗菌化処理方法
WO2021071793A1 (en) 2019-10-07 2021-04-15 Particle Measuring Systems, Inc. Antimicrobial particle detectors
US11470892B1 (en) 2021-11-18 2022-10-18 King Abdulaziz University Antimicrobial metal nanoparticle mesh air filter
CN116837343A (zh) * 2023-08-29 2023-10-03 北京市春立正达医疗器械股份有限公司 一种通过化学气相沉积制备镀铜的医用钽金属材料的方法
WO2025263511A1 (ja) * 2024-06-20 2025-12-26 京セラ株式会社 生体インプラント、及び、その製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4886505A (en) * 1985-06-07 1989-12-12 Becton, Dickinson And Company Antimicrobial surfaces and inhibition of microorganism growth thereby
CA2136455C (en) * 1993-11-18 1999-06-29 Robert Edward Burrell Process for producing anti-microbial effect with complex silver ions
US5744017A (en) * 1993-12-17 1998-04-28 Kabushiki Kaisha Kobe Seiko Sho Vacuum arc deposition apparatus
WO2003044240A1 (en) * 2001-11-15 2003-05-30 Ionic Fusion Corporation Ionic plasma deposition apparatus
KR20050123089A (ko) * 2002-12-18 2005-12-29 이오닉 퓨즌 코포레이션 항미생물성 표면의 이온 플라스마 침적 및 이로부터 수득한항미생물성 표면

Also Published As

Publication number Publication date
EP1996744A4 (en) 2009-03-11
IL192889A0 (en) 2009-08-03
EP1996744A2 (en) 2008-12-03
MX2008009511A (es) 2008-09-26
EP1996744B1 (en) 2011-02-23
ATE499457T1 (de) 2011-03-15
DE602007012667D1 (de) 2011-04-07
PT1996744E (pt) 2011-03-03
JP2009524479A (ja) 2009-07-02

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