Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/50—Substrate holders
  • C23C14/505—Substrate holders for rotation of the substrates
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
  • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
  • B23Q1/25—Movable or adjustable work or tool supports
  • B23Q1/64—Movable or adjustable work or tool supports characterised by the purpose of the movement
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
  • F16H—GEARING
  • F16H21/00—Gearings comprising primarily only links or levers, with or without slides
  • F16H21/10—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane
  • F16H21/12—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion
  • F16H21/14—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion by means of cranks, eccentrics, or like members fixed to one rotary member and guided along tracks on the other
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
  • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
  • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
  • H10P72/3212—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips or lead frames

Landscapes

• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Mechanical Engineering (AREA)
• General Engineering & Computer Science (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Metallurgy (AREA)
• Organic Chemistry (AREA)
• Materials Engineering (AREA)
• General Chemical & Material Sciences (AREA)
• Retarders (AREA)
• Gear Transmission (AREA)
• Grinding Of Cylindrical And Plane Surfaces (AREA)
• Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
• Physical Vapour Deposition (AREA)
• Specific Conveyance Elements (AREA)
• Mechanical Treatment Of Semiconductor (AREA)
• Agricultural Machines (AREA)
• Soil Working Implements (AREA)
• Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=38982780

Family Applications (2)

Family Applications Before (1)

Country Status (14)

Families Citing this family (13)

Family Cites Families (11)

• 2007
  • 2007-10-08 PL PL11405237T patent/PL2336387T3/pl unknown
  • 2007-10-08 DE DE502007006849T patent/DE502007006849D1/de active Active
  • 2007-10-08 PL PL07405302T patent/PL2048263T3/pl unknown
  • 2007-10-08 EP EP11405237.6A patent/EP2336387B1/de active Active
  • 2007-10-08 EP EP07405302A patent/EP2048263B1/de not_active Not-in-force
  • 2007-10-08 AT AT07405302T patent/ATE503858T1/de active
  • 2007-10-08 ES ES07405302T patent/ES2362016T3/es active Active
• 2008
  • 2008-10-02 JP JP2010528299A patent/JP5497647B2/ja active Active
  • 2008-10-02 KR KR1020107007588A patent/KR20100071057A/ko not_active Ceased
  • 2008-10-02 CN CN2008801106260A patent/CN101827955B/zh active Active
  • 2008-10-02 MX MX2010003727A patent/MX2010003727A/es active IP Right Grant
  • 2008-10-02 RU RU2010113596/02A patent/RU2485211C2/ru not_active IP Right Cessation
  • 2008-10-02 US US12/681,833 patent/US8596626B2/en active Active
  • 2008-10-02 WO PCT/EP2008/008349 patent/WO2009046928A1/en not_active Ceased
  • 2008-10-02 BR BRPI0818592A patent/BRPI0818592A2/pt not_active IP Right Cessation
  • 2008-10-06 TW TW097138355A patent/TWI481448B/zh not_active IP Right Cessation
• 2013
  • 2013-09-04 US US14/018,118 patent/US8783673B2/en active Active

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