PL2057300T3 - Źródło jonów z wnęką w elektrodzie - Google Patents

Źródło jonów z wnęką w elektrodzie

Info

Publication number
PL2057300T3
PL2057300T3 PL07835800T PL07835800T PL2057300T3 PL 2057300 T3 PL2057300 T3 PL 2057300T3 PL 07835800 T PL07835800 T PL 07835800T PL 07835800 T PL07835800 T PL 07835800T PL 2057300 T3 PL2057300 T3 PL 2057300T3
Authority
PL
Poland
Prior art keywords
recess
electrode
ion source
ion
source
Prior art date
Application number
PL07835800T
Other languages
English (en)
Inventor
Nestor P Murphy
David Rock
Original Assignee
Guardian Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guardian Industries filed Critical Guardian Industries
Publication of PL2057300T3 publication Critical patent/PL2057300T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H01J27/024—Extraction optics, e.g. grids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H01J27/143—Hall-effect ion sources with closed electron drift
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
PL07835800T 2006-07-18 2007-06-12 Źródło jonów z wnęką w elektrodzie PL2057300T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/488,189 US7872422B2 (en) 2006-07-18 2006-07-18 Ion source with recess in electrode
PCT/US2007/013717 WO2008010882A2 (en) 2006-07-18 2007-06-12 Ion source with recess in electrode
EP07835800.9A EP2057300B1 (en) 2006-07-18 2007-06-12 Ion source with recess in electrode

Publications (1)

Publication Number Publication Date
PL2057300T3 true PL2057300T3 (pl) 2013-10-31

Family

ID=38957252

Family Applications (1)

Application Number Title Priority Date Filing Date
PL07835800T PL2057300T3 (pl) 2006-07-18 2007-06-12 Źródło jonów z wnęką w elektrodzie

Country Status (6)

Country Link
US (1) US7872422B2 (pl)
EP (1) EP2057300B1 (pl)
BR (1) BRPI0714331A2 (pl)
ES (1) ES2424764T3 (pl)
PL (1) PL2057300T3 (pl)
WO (1) WO2008010882A2 (pl)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120015196A1 (en) 2007-01-29 2012-01-19 Guardian Industries Corp. Method of making heat treated coated article using diamond-like carbon (dlc) coating and protective film on acid-etched surface
US20120015195A1 (en) 2007-01-29 2012-01-19 Guardian Industries Corp. and C.R.V.C. Method of making heat treated and ion-beam etched/milled coated article using diamond-like carbon (dlc) coating and protective film
US20120040160A1 (en) 2007-01-29 2012-02-16 Guardian Industries Corp. Method of making heat treated and ion-beam etched/milled coated article using diamond-like carbon (dlc) protective film
EP2368257A4 (en) * 2008-12-08 2016-03-09 Gen Plasma Inc MAGNETIC FIELD ION SOURCE DEVICE WITH CLOSED DRIFT AND SELF-CLEANING ANODE AND METHOD OF SUBSTRATE MODIFICATION THEREWITH
US10586689B2 (en) * 2009-07-31 2020-03-10 Guardian Europe S.A.R.L. Sputtering apparatus including cathode with rotatable targets, and related methods
WO2011017314A2 (en) * 2009-08-03 2011-02-10 General Plasma, Inc. Closed drift ion source with symmetric magnetic field
US20110186120A1 (en) * 2009-11-05 2011-08-04 Guardian Industries Corp. Textured coating with various feature sizes made by using multiple-agent etchant for thin-film solar cells and/or methods of making the same
US8502066B2 (en) * 2009-11-05 2013-08-06 Guardian Industries Corp. High haze transparent contact including insertion layer for solar cells, and/or method of making the same
US20110100446A1 (en) 2009-11-05 2011-05-05 Guardian Industries Corp. High haze transparent contact including ion-beam treated layer for solar cells, and/or method of making the same
US20110168252A1 (en) * 2009-11-05 2011-07-14 Guardian Industries Corp. Textured coating with etching-blocking layer for thin-film solar cells and/or methods of making the same
US20120167971A1 (en) 2010-12-30 2012-07-05 Alexey Krasnov Textured coating for thin-film solar cells and/or methods of making the same
US8575565B2 (en) 2011-10-10 2013-11-05 Guardian Industries Corp. Ion source apparatus and methods of using the same
US8497155B1 (en) 2012-06-05 2013-07-30 Guardian Industries Corp. Planarized TCO-based anode for OLED devices, and/or methods of making the same
US9593019B2 (en) 2013-03-15 2017-03-14 Guardian Industries Corp. Methods for low-temperature graphene precipitation onto glass, and associated articles/devices
US10580610B2 (en) * 2013-03-15 2020-03-03 General Electric Company Cold cathode switching device and converter
KR101491255B1 (ko) 2013-05-28 2015-02-06 한국기계연구원 이온 빔 소스의 양극 지지부 및 이를 갖는 이온 빔 소스
KR101495424B1 (ko) * 2013-06-04 2015-02-23 한국기계연구원 이온 빔 소스
US20160133426A1 (en) * 2013-06-12 2016-05-12 General Plasma, Inc. Linear duoplasmatron
CN104822219B (zh) * 2015-05-18 2017-09-19 京东方科技集团股份有限公司 等离子发生器、退火设备、镀膜结晶化设备及退火工艺
CN109559962A (zh) * 2017-09-26 2019-04-02 深圳市鼎力真空科技有限公司 一种窄束型线性离子源
CN110767522B (zh) * 2019-11-04 2022-03-18 无锡诚承电子科技有限公司 一种聚焦型线性阳极层离子源
CN111192803B (zh) * 2020-02-28 2025-03-28 成都国泰真空设备有限公司 一种防离子轰击的离子源装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6813748A (pl) 1968-09-26 1970-04-01
US4058748A (en) * 1976-05-13 1977-11-15 Hitachi, Ltd. Microwave discharge ion source
RU2030807C1 (ru) * 1992-02-20 1995-03-10 Парфененок Михаил Антонович Источник ионов с замкнутым дрейфом электронов
US5576600A (en) * 1994-12-23 1996-11-19 Dynatenn, Inc. Broad high current ion source
FR2743191B1 (fr) 1995-12-29 1998-03-27 Europ Propulsion Source d'ions a derive fermee d'electrons
US6002208A (en) 1998-07-02 1999-12-14 Advanced Ion Technology, Inc. Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ion-emitting slit
US6037717A (en) 1999-01-04 2000-03-14 Advanced Ion Technology, Inc. Cold-cathode ion source with a controlled position of ion beam
US6238526B1 (en) 1999-02-14 2001-05-29 Advanced Ion Technology, Inc. Ion-beam source with channeling sputterable targets and a method for channeled sputtering
US6525480B1 (en) * 1999-06-29 2003-02-25 The Board Of Trustees Of The Leland Stanford Junior University Low power, linear geometry hall plasma source with an open electron drift
US6501078B1 (en) * 2000-03-16 2002-12-31 Applied Materials, Inc. Ion extraction assembly
US6359388B1 (en) 2000-08-28 2002-03-19 Guardian Industries Corp. Cold cathode ion beam deposition apparatus with segregated gas flow
US6750600B2 (en) 2001-05-03 2004-06-15 Kaufman & Robinson, Inc. Hall-current ion source
US6815690B2 (en) 2002-07-23 2004-11-09 Guardian Industries Corp. Ion beam source with coated electrode(s)
US6988463B2 (en) 2002-10-18 2006-01-24 Guardian Industries Corp. Ion beam source with gas introduced directly into deposition/vacuum chamber
US6812648B2 (en) * 2002-10-21 2004-11-02 Guardian Industries Corp. Method of cleaning ion source, and corresponding apparatus/system
US7259378B2 (en) 2003-04-10 2007-08-21 Applied Process Technologies, Inc. Closed drift ion source
JP4286864B2 (ja) * 2003-08-21 2009-07-01 インターナシヨナル・エンバイロンメンタル・ソリユーシヨンズ・コーポレイシヨン 熱分解廃棄物処理システムのための室支持体
US6987364B2 (en) 2003-09-03 2006-01-17 Guardian Industries Corp. Floating mode ion source
US7030390B2 (en) 2003-09-09 2006-04-18 Guardian Industries Corp. Ion source with electrode kept at potential(s) other than ground by zener diode(s), thyristor(s) and/or the like
US7183559B2 (en) 2004-11-12 2007-02-27 Guardian Industries Corp. Ion source with substantially planar design
US7312579B2 (en) * 2006-04-18 2007-12-25 Colorado Advanced Technology Llc Hall-current ion source for ion beams of low and high energy for technological applications

Also Published As

Publication number Publication date
US20080017112A1 (en) 2008-01-24
US7872422B2 (en) 2011-01-18
EP2057300A2 (en) 2009-05-13
BRPI0714331A2 (pt) 2012-12-25
WO2008010882A3 (en) 2008-10-30
ES2424764T3 (es) 2013-10-08
EP2057300A4 (en) 2010-10-27
WO2008010882A2 (en) 2008-01-24
EP2057300B1 (en) 2013-05-08

Similar Documents

Publication Publication Date Title
EP2057300A4 (en) IONIC SOURCE WITH REPEAT IN ELECTRODE
GB2412488B (en) Ion sources
GB2455153B (en) Excitation of ions in an ICR-cell with structured trapping electrodes
GB0622482D0 (en) Diamond electrode
EP2097354A4 (en) INCREASE IN IONS
AP2011005611A0 (en) Amide compounds useful in therapy.
EP1982345A4 (en) ION SOURCE WITH REMOVABLE ANODE
GB0600575D0 (en) Electrode
EP2377142A4 (en) FLAT FAAMS WITH LATERAL ION FOCUSING
EP2320529A4 (en) ION GENERATION UNIT AND LIGHTING DEVICE
PL1894221T3 (pl) Źródło jonów z wieloelementową zewnętrzną katodą
TWI319962B (en) Ionizer with parts-extension unit
TWI372862B (en) Reference electrode
GB0815340D0 (en) Improvements in MBMS
GB0505856D0 (en) Cathode and counter-cathode arrangement in an ion source
EP2044607A4 (en) IONIC ELECTROPULVERIZATION SOURCE
EP2224234A4 (en) ION-ELECTRODE ELECTRODE
EP2023695A4 (en) ION GENERATOR
GB0610596D0 (en) Electrode
GB0500073D0 (en) Electrochemical electrode
GB0500289D0 (en) Electrodes
GB0521451D0 (en) Ion pump
GB0614498D0 (en) Improvements in Hydrogen Trapping
GB0623490D0 (en) Electrode
GB0604596D0 (en) An electrode