PL2144711T3 - Sposób przenoszenia nanowarstwy - Google Patents
Sposób przenoszenia nanowarstwyInfo
- Publication number
- PL2144711T3 PL2144711T3 PL08735184T PL08735184T PL2144711T3 PL 2144711 T3 PL2144711 T3 PL 2144711T3 PL 08735184 T PL08735184 T PL 08735184T PL 08735184 T PL08735184 T PL 08735184T PL 2144711 T3 PL2144711 T3 PL 2144711T3
- Authority
- PL
- Poland
- Prior art keywords
- nanolayer
- transferring
- Prior art date
Links
- 239000002052 molecular layer Substances 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
- B05D1/283—Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00349—Creating layers of material on a substrate
- B81C1/0038—Processes for creating layers of materials not provided for in groups B81C1/00357 - B81C1/00373
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
- B81C2201/0191—Transfer of a layer from a carrier wafer to a device wafer
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Micromachines (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007016995A DE102007016995A1 (de) | 2007-04-11 | 2007-04-11 | Verfahren zum Übertragen einer Nanoschicht |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL2144711T3 true PL2144711T3 (pl) | 2017-09-29 |
Family
ID=39744147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL08735184T PL2144711T3 (pl) | 2007-04-11 | 2008-04-11 | Sposób przenoszenia nanowarstwy |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8377243B2 (pl) |
| EP (1) | EP2144711B1 (pl) |
| DE (1) | DE102007016995A1 (pl) |
| ES (1) | ES2629782T3 (pl) |
| PL (1) | PL2144711T3 (pl) |
| WO (1) | WO2008125302A2 (pl) |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9195004B2 (en) | 2008-01-04 | 2015-11-24 | Massachusetts Institute Of Technology | Method and apparatus for forming structures of polymer nanobeads |
| US8409450B2 (en) * | 2008-03-24 | 2013-04-02 | The Regents Of The University Of California | Graphene-based structure, method of suspending graphene membrane, and method of depositing material onto graphene membrane |
| WO2010017441A2 (en) | 2008-08-07 | 2010-02-11 | Massachusetts Institute Of Technology | Method and apparatus for simultaneous lateral and vertical patterning of molecular organic films |
| US8748219B2 (en) | 2008-09-08 | 2014-06-10 | Massachusetts Institute Of Technology | Method and apparatus for super radiant laser action in half wavelength thick organic semiconductor microcavities |
| US9388048B1 (en) * | 2008-10-08 | 2016-07-12 | University Of Southern California | Synthesis of graphene by chemical vapor deposition |
| US8057863B2 (en) * | 2008-12-05 | 2011-11-15 | The Regents Of The University Of California | Electrostatic force assisted deposition of graphene |
| US8739390B2 (en) | 2008-12-16 | 2014-06-03 | Massachusetts Institute Of Technology | Method for microcontact printing of MEMS |
| US8963262B2 (en) | 2009-08-07 | 2015-02-24 | Massachusettes Institute Of Technology | Method and apparatus for forming MEMS device |
| DE102009034575A1 (de) * | 2009-07-24 | 2011-01-27 | Universität Bielefeld | Perforierte Membranen |
| KR101652787B1 (ko) * | 2009-11-12 | 2016-09-01 | 삼성전자주식회사 | 대면적 그라핀의 제조방법 및 전사방법 |
| DE102009056052B4 (de) * | 2009-11-26 | 2014-07-10 | Humboldt-Universität Zu Berlin | Anordnung mit einem Träger und einer Schicht |
| FI125151B (fi) * | 2010-03-05 | 2015-06-15 | Canatu Oy | Menetelmä konformisen elementin valmistamiseksi |
| TW201203041A (en) | 2010-03-05 | 2012-01-16 | Canatu Oy | A touch sensitive film and a touch sensing device |
| KR101767921B1 (ko) | 2010-08-11 | 2017-08-14 | 한화테크윈 주식회사 | 그래핀의 후처리 방법 및 이를 이용한 그래핀 제조 방법 |
| DE102010056572B4 (de) * | 2010-12-30 | 2018-12-27 | Snaptrack, Inc. | Elektronisches Bauelement und Verfahren zur Herstellung des elektronischen Bauelements |
| DE102010056562B4 (de) | 2010-12-30 | 2018-10-11 | Snaptrack, Inc. | Elektroakustisches Bauelement und Verfahren zur Herstellung des elektroakustischen Bauelements |
| CN103460364B (zh) * | 2011-04-13 | 2016-08-17 | 英派尔科技开发有限公司 | 使石墨烯顺应目标基板 |
| CN102249175B (zh) * | 2011-04-13 | 2014-08-13 | 中国航天科技集团公司第五研究院第五一0研究所 | 基于电子束激励脱附的纳电子器件和/或电路的制作方法 |
| KR101878737B1 (ko) * | 2011-08-19 | 2018-07-17 | 삼성전자주식회사 | 트렌치를 이용한 그래핀 전사방법 및 그래핀 전사 대상 기판 |
| KR101822500B1 (ko) * | 2011-09-06 | 2018-01-29 | 삼성전자주식회사 | 양자점층 제조 방법 및 양자점층을 포함한 양자점 광전자소자 |
| KR101878739B1 (ko) | 2011-10-24 | 2018-07-17 | 삼성전자주식회사 | 그래핀 전사부재, 그래핀 전사방법 및 이를 이용한 그래핀 소자 제조방법 |
| WO2013096841A1 (en) * | 2011-12-22 | 2013-06-27 | The Trustees Of Columbia University In The City Of New York | Assisted transfer of graphene |
| DE102012100476A1 (de) * | 2012-01-20 | 2013-07-25 | Gsi Helmholtzzentrum Für Schwerionenforschung Gmbh | Verfahren zur Herstellung ultradünner Polymerfolien |
| US9431487B2 (en) | 2013-01-11 | 2016-08-30 | International Business Machines Corporation | Graphene layer transfer |
| US8916451B2 (en) | 2013-02-05 | 2014-12-23 | International Business Machines Corporation | Thin film wafer transfer and structure for electronic devices |
| US10957816B2 (en) | 2013-02-05 | 2021-03-23 | International Business Machines Corporation | Thin film wafer transfer and structure for electronic devices |
| US9059013B2 (en) | 2013-03-21 | 2015-06-16 | International Business Machines Corporation | Self-formation of high-density arrays of nanostructures |
| US9096050B2 (en) | 2013-04-02 | 2015-08-04 | International Business Machines Corporation | Wafer scale epitaxial graphene transfer |
| US9337274B2 (en) | 2013-05-15 | 2016-05-10 | Globalfoundries Inc. | Formation of large scale single crystalline graphene |
| ES2536491B2 (es) * | 2013-11-21 | 2015-11-18 | Universidad Politecnica De Madrid | Procedimiento de transferencia de nanocapas y aparato de realización del mismo. |
| US10586651B2 (en) | 2014-06-26 | 2020-03-10 | Cnm Technologies Gmbh | Method of manufacture of a multilayer structure |
| WO2016085086A1 (ko) * | 2014-11-28 | 2016-06-02 | 서울대학교산학협력단 | 양자점 전자 장치 및 양자점 전사 인쇄 방법 |
| GB2534404A (en) | 2015-01-23 | 2016-07-27 | Cnm Tech Gmbh | Pellicle |
| EP3050620A1 (en) | 2015-01-29 | 2016-08-03 | Johann Wolfgang Goethe-Universität, Frankfurt am Main | Functionalized nanomembrane, a method for preparation thereof and their use |
| JP6271454B2 (ja) * | 2015-02-16 | 2018-01-31 | 日本電信電話株式会社 | 機能性材料の転写方法 |
| US10450650B2 (en) * | 2015-09-24 | 2019-10-22 | The United States of America as represented by the Admininstrator of the National Aeronautics and Space Administration | Method of manufacturing large area graphene and graphene-based photonics devices |
| CN105304832B (zh) * | 2015-11-02 | 2017-07-25 | 深圳市华星光电技术有限公司 | 电致发光器件的制备方法 |
| KR101787435B1 (ko) * | 2016-02-29 | 2017-10-19 | 피에스아이 주식회사 | 나노 로드 제조방법 |
| EP3217423A1 (en) | 2016-03-07 | 2017-09-13 | Fritz Haber Institut der Max Planck Gesellschaft Department of Inorganic Chemistry | Transferable silica bilayer film |
| US10986435B2 (en) | 2017-04-18 | 2021-04-20 | Massachusetts Institute Of Technology | Electrostatic acoustic transducer utilized in a hearing aid or audio processing system |
| LU100276B1 (en) | 2017-06-02 | 2018-12-03 | Cnm Tech Gmbh | Immobilisation of nucleic acids on surfaces |
| CN109809358B (zh) * | 2017-11-21 | 2021-03-26 | 中国科学院金属研究所 | 采用液相界面层洁净、无损转移大面积二维材料的方法 |
| CN110098099B (zh) * | 2018-01-27 | 2020-09-29 | 清华大学 | 透射电镜微栅及透射电镜微栅的制备方法 |
| EP3797089A4 (en) * | 2018-05-22 | 2022-03-09 | ETX Corporation | METHOD AND DEVICE FOR THE TRANSFER OF TWO-DIMENSIONAL MATERIALS |
| LU100812B1 (en) | 2018-05-29 | 2019-11-29 | Cnm Tech Gmbh | Carbon nanomembranes on porous materials |
| US10841709B2 (en) | 2018-12-06 | 2020-11-17 | Waves Audio Ltd. | Nanocomposite graphene polymer membrane assembly, and manufacturing method thereof |
| EP4315445A1 (en) | 2021-03-22 | 2024-02-07 | Friedrich-Schiller-Universität Jena | Method of transfer of organic semiconductor films to a substrate and electronic devices made therefrom |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5391257A (en) * | 1993-12-10 | 1995-02-21 | Rockwell International Corporation | Method of transferring a thin film to an alternate substrate |
| DE19945935B4 (de) | 1999-09-24 | 2008-01-03 | Universität Heidelberg | Verfahren zur Herstellung eines oberflächenmodifizierten Schichtsystems |
| CN1304207C (zh) * | 2001-10-01 | 2007-03-14 | 派拉迪格玛有限公司 | 制造片形介质的方法及其所得的片形介质和使所述片形介质着墨的方法 |
| AU2003217184A1 (en) * | 2002-01-11 | 2003-09-02 | Massachusetts Institute Of Technology | Microcontact printing |
| WO2004111185A2 (en) * | 2002-10-30 | 2004-12-23 | The Regents Of The University Of California | Direct micro-patterning of lipid bilayers using uv light and selected uses thereof |
| US7150801B2 (en) * | 2003-02-26 | 2006-12-19 | Mitsubishi Gas Chemical Company, Inc. | Process for producing cold field-emission cathodes |
| WO2005015792A2 (en) * | 2003-08-06 | 2005-02-17 | Purdue Research Foundation | Fabrication of nanoparticle arrays |
| GB0323295D0 (en) * | 2003-10-04 | 2003-11-05 | Dow Corning | Deposition of thin films |
| US7227034B2 (en) * | 2004-11-22 | 2007-06-05 | Xerox Corporation | Process for arylamine production |
| US7238456B2 (en) * | 2004-11-30 | 2007-07-03 | Xerox Corporation | Silicon-containing layers for electrophotographic photoreceptors and methods for making the same |
| US7541483B2 (en) * | 2005-03-31 | 2009-06-02 | Xerox Corporation | Process for arylamine production |
| US7510810B2 (en) * | 2005-06-29 | 2009-03-31 | Xerox Corporation | Cyanoresin polymers and electrophotographic imaging members containing cyanoresin polymers |
| US7998651B2 (en) * | 2006-05-15 | 2011-08-16 | Asml Netherlands B.V. | Imprint lithography |
| US7524596B2 (en) * | 2006-11-01 | 2009-04-28 | Xerox Corporation | Electrophotographic photoreceptors having reduced torque and improved mechanical robustness |
| JP2008155578A (ja) * | 2006-12-26 | 2008-07-10 | Fuji Xerox Co Ltd | 記録装置 |
| WO2010003132A1 (en) * | 2008-07-02 | 2010-01-07 | Illumina Cambridge Ltd. | Using populations of beads for the fabrication of arrays on surfaces |
| JP2012128355A (ja) * | 2010-12-17 | 2012-07-05 | Sharp Corp | 電子写真感光体およびそれを用いた画像形成装置 |
-
2007
- 2007-04-11 DE DE102007016995A patent/DE102007016995A1/de not_active Ceased
-
2008
- 2008-04-11 US US12/595,314 patent/US8377243B2/en active Active
- 2008-04-11 PL PL08735184T patent/PL2144711T3/pl unknown
- 2008-04-11 ES ES08735184.7T patent/ES2629782T3/es active Active
- 2008-04-11 EP EP08735184.7A patent/EP2144711B1/de active Active
- 2008-04-11 WO PCT/EP2008/002891 patent/WO2008125302A2/de not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2008125302A3 (de) | 2009-02-26 |
| ES2629782T3 (es) | 2017-08-14 |
| US8377243B2 (en) | 2013-02-19 |
| DE102007016995A1 (de) | 2008-10-16 |
| EP2144711B1 (de) | 2017-05-31 |
| US20100143726A1 (en) | 2010-06-10 |
| WO2008125302A2 (de) | 2008-10-23 |
| EP2144711A2 (de) | 2010-01-20 |
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