PL2920341T3 - Electrolytic generation of manganese (iii) ions in strong sulfuric acid - Google Patents

Electrolytic generation of manganese (iii) ions in strong sulfuric acid

Info

Publication number
PL2920341T3
PL2920341T3 PL13854930T PL13854930T PL2920341T3 PL 2920341 T3 PL2920341 T3 PL 2920341T3 PL 13854930 T PL13854930 T PL 13854930T PL 13854930 T PL13854930 T PL 13854930T PL 2920341 T3 PL2920341 T3 PL 2920341T3
Authority
PL
Poland
Prior art keywords
manganese
ions
iii
sulfuric acid
strong sulfuric
Prior art date
Application number
PL13854930T
Other languages
Polish (pl)
Inventor
Trevor Pearson
Terence Clarke
Roshan V. Chapaneri
Original Assignee
Macdermid Acumen Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/677,798 external-priority patent/US9752241B2/en
Application filed by Macdermid Acumen Inc filed Critical Macdermid Acumen Inc
Publication of PL2920341T3 publication Critical patent/PL2920341T3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/042—Electrodes formed of a single material
    • C25B11/043—Carbon, e.g. diamond or graphene
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22—Roughening, e.g. by etching
    • C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/21—Manganese oxides
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1646—Characteristics of the product obtained
    • C23C18/165—Multilayered product
    • C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
PL13854930T 2012-11-15 2013-09-26 Electrolytic generation of manganese (iii) ions in strong sulfuric acid PL2920341T3 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/677,798 US9752241B2 (en) 2012-01-23 2012-11-15 Electrolytic generation of manganese (III) ions in strong sulfuric acid using an improved anode
EP13854930.8A EP2920341B1 (en) 2012-11-15 2013-09-26 Electrolytic generation of manganese (iii) ions in strong sulfuric acid
PCT/US2013/061860 WO2014077957A1 (en) 2012-11-15 2013-09-26 Electrolytic generation of manganese (iii) ions in strong sulfuric acid

Publications (1)

Publication Number Publication Date
PL2920341T3 true PL2920341T3 (en) 2019-05-31

Family

ID=50731593

Family Applications (1)

Application Number Title Priority Date Filing Date
PL13854930T PL2920341T3 (en) 2012-11-15 2013-09-26 Electrolytic generation of manganese (iii) ions in strong sulfuric acid

Country Status (12)

Country Link
EP (1) EP2920341B1 (en)
JP (1) JP6060270B2 (en)
KR (2) KR101950169B1 (en)
CN (1) CN104838044B (en)
BR (1) BR112015011123B1 (en)
CA (2) CA3056665A1 (en)
ES (1) ES2704672T3 (en)
MX (1) MX2015006178A (en)
PL (1) PL2920341T3 (en)
TR (1) TR201900116T4 (en)
TW (1) TWI500582B (en)
WO (1) WO2014077957A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
HUE045344T2 (en) * 2013-03-12 2019-12-30 Macdermid Acumen Inc Production of manganese (III) ions by electrolysis in strong sulfuric acid
US11047052B2 (en) 2014-07-10 2021-06-29 Okuno Chemical Industries Co., Ltd. Resin plating method
CN107078291A (en) * 2014-08-28 2017-08-18 英克罗恩有限公司 Crystalline transition oxide particles and continuous process for preparing the same
US10889905B2 (en) * 2018-12-11 2021-01-12 Rohm And Haas Electronic Materials Llc Methods of generating manganese (III) ions in mixed aqueous acid solutions using ozone

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3065155A (en) * 1960-09-02 1962-11-20 Manganese Chemicals Corp Electrolytic manganese dioxide process
AT310285B (en) 1966-02-22 1973-09-25 Photocircuits Corp Process for the production of a laminated body for printed circuits
US4042729A (en) 1972-12-13 1977-08-16 Kollmorgen Technologies Corporation Process for the activation of resinous bodies for adherent metallization
IT1159931B (en) * 1978-10-13 1987-03-04 Oronzio De Nora Impianti INDUSTRIAL PROCEDURE FOR THE PRODUCTION OF TITANIUM DIOXIDE FROM ILMENITE
US4279705A (en) * 1980-02-19 1981-07-21 Kerr-Mcgee Corporation Process for oxidizing a metal of variable valence by constant current electrolysis
IT1132194B (en) * 1980-07-15 1986-06-25 Anic Spa ELECTROCHEMICAL PROCESS FOR THE SYNTHESIS OF ORGANIC COMPOUNDS
JPS58502027A (en) * 1981-11-23 1983-11-24 バロ−ス・コ−ポレ−ション Peripherals adapted to monitor low data rate serial input/output interfaces
US4610895A (en) 1984-02-01 1986-09-09 Shipley Company Inc. Process for metallizing plastics
US4948630A (en) 1984-06-07 1990-08-14 Enthone, Inc. Three step process for treating plastics with alkaline permanganate solutions
JPS6447890A (en) * 1987-08-13 1989-02-22 Kenzo Yamaguchi Electrolytic synthesis method
US5213665A (en) * 1988-02-29 1993-05-25 Nippon Shokubai Kagaku Kogyo, Co., Ltd. Process for producing 1-aminoanthraquinones
US4936970A (en) * 1988-11-14 1990-06-26 Ebonex Technologies, Inc. Redox reactions in an electrochemical cell including an electrode comprising Magneli phase titanium oxide
US5160600A (en) * 1990-03-05 1992-11-03 Patel Gordhanbai N Chromic acid free etching of polymers for electroless plating
US5648125A (en) 1995-11-16 1997-07-15 Cane; Frank N. Electroless plating process for the manufacture of printed circuit boards
GB9714275D0 (en) * 1997-07-08 1997-09-10 Ciba Geigy Ag Oxidation process
JP2004511803A (en) 2000-10-16 2004-04-15 オーソ−マクニール・フアーマシユーチカル・インコーポレーテツド Improved ligand binding assay for vanilloid receptor
CA2408951C (en) * 2002-10-18 2008-12-16 Kvaerner Canada Inc. Mediated hydrohalic acid electrolysis
US8394289B2 (en) 2006-04-18 2013-03-12 Okuno Chemicals Industries Co., Ltd. Composition for etching treatment of resin molded article
US8734992B2 (en) * 2007-02-14 2014-05-27 Tosoh Corporation Electrolytic manganese dioxide, and method for its production and its application
DE502007001745D1 (en) 2007-08-10 2009-11-26 Enthone Chrome-free stain for plastic surfaces
JP2010121143A (en) * 2008-11-17 2010-06-03 Okuno Chem Ind Co Ltd Post-processing agent of etching for resin-formed body, post-processing method using the same, and plating method for resin-formed body
JP5738898B2 (en) * 2010-01-29 2015-06-24 エバレデイ バツテリ カンパニー インコーポレーテツド Method for producing an electrochemical cell having a catalyst electrode comprising manganese dioxide
US10260000B2 (en) * 2012-01-23 2019-04-16 Macdermid Acumen, Inc. Etching of plastic using acidic solutions containing trivalent manganese

Also Published As

Publication number Publication date
CA3056665A1 (en) 2014-05-22
CN104838044A (en) 2015-08-12
CA2889342A1 (en) 2014-05-22
JP6060270B2 (en) 2017-01-11
CN104838044B (en) 2017-12-05
BR112015011123A2 (en) 2017-07-11
CA2889342C (en) 2019-11-12
TWI500582B (en) 2015-09-21
JP2016504492A (en) 2016-02-12
ES2704672T3 (en) 2019-03-19
MX2015006178A (en) 2015-11-06
KR20170039315A (en) 2017-04-10
EP2920341A4 (en) 2016-04-27
KR20150082636A (en) 2015-07-15
EP2920341B1 (en) 2018-11-14
TW201431793A (en) 2014-08-16
KR101950169B1 (en) 2019-02-20
WO2014077957A1 (en) 2014-05-22
BR112015011123B1 (en) 2021-08-03
TR201900116T4 (en) 2019-01-21
EP2920341A1 (en) 2015-09-23

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