PL2936539T3 - Sposób zapłonu i urządzenie do parowania elektrod DBD - Google Patents

Sposób zapłonu i urządzenie do parowania elektrod DBD

Info

Publication number
PL2936539T3
PL2936539T3 PL13818465T PL13818465T PL2936539T3 PL 2936539 T3 PL2936539 T3 PL 2936539T3 PL 13818465 T PL13818465 T PL 13818465T PL 13818465 T PL13818465 T PL 13818465T PL 2936539 T3 PL2936539 T3 PL 2936539T3
Authority
PL
Poland
Prior art keywords
pairs
ignition process
dbd electrodes
dbd
electrodes
Prior art date
Application number
PL13818465T
Other languages
English (en)
Inventor
M. Eric Tixhon
M. Eric Michel
M. Joseph Leclercq
Original Assignee
Asahi Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Company, Limited filed Critical Asahi Glass Company, Limited
Publication of PL2936539T3 publication Critical patent/PL2936539T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
PL13818465T 2012-12-21 2013-12-18 Sposób zapłonu i urządzenie do parowania elektrod DBD PL2936539T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP12199066 2012-12-21
EP13818465.0A EP2936539B1 (en) 2012-12-21 2013-12-18 Ignition process and device for pairs of dbd electrodes

Publications (1)

Publication Number Publication Date
PL2936539T3 true PL2936539T3 (pl) 2017-08-31

Family

ID=47709769

Family Applications (1)

Application Number Title Priority Date Filing Date
PL13818465T PL2936539T3 (pl) 2012-12-21 2013-12-18 Sposób zapłonu i urządzenie do parowania elektrod DBD

Country Status (8)

Country Link
US (1) US20150332897A1 (pl)
EP (1) EP2936539B1 (pl)
JP (1) JP2016507853A (pl)
EA (1) EA027687B1 (pl)
HU (1) HUE032619T2 (pl)
PL (1) PL2936539T3 (pl)
SI (1) SI2936539T1 (pl)
WO (1) WO2014097620A1 (pl)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0822898A (ja) * 1994-07-05 1996-01-23 Mitsubishi Electric Corp プラズマ処理装置及び放電装置
US6083355A (en) * 1997-07-14 2000-07-04 The University Of Tennessee Research Corporation Electrodes for plasma treater systems
CA2295729A1 (en) * 1997-07-14 1999-01-28 John Lynch Plasma treater systems and treatment methods
US6480086B1 (en) * 1999-12-20 2002-11-12 Advanced Micro Devices, Inc. Inductor and transformer formed with multi-layer coil turns fabricated on an integrated circuit substrate
JP4579522B2 (ja) * 2003-09-29 2010-11-10 株式会社イー・スクエア プラズマ表面処理装置
JP2005200710A (ja) * 2004-01-16 2005-07-28 Konica Minolta Holdings Inc 薄膜の形成方法とそれにより造られた薄膜および透明プラスチックフィルム
US7886688B2 (en) * 2004-09-29 2011-02-15 Sekisui Chemical Co., Ltd. Plasma processing apparatus
DE102005029360B4 (de) * 2005-06-24 2011-11-10 Softal Corona & Plasma Gmbh Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen
EP2145979A1 (fr) * 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur les deux faces d'un substrat de façon simultanée
EP2145978A1 (fr) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur un substrat
JP5262501B2 (ja) * 2008-09-19 2013-08-14 富士電機株式会社 基板処理装置及び基板処理方法
KR20120106737A (ko) * 2009-11-27 2012-09-26 엔지케이 인슐레이터 엘티디 플라즈마 처리 장치

Also Published As

Publication number Publication date
EA201590775A1 (ru) 2015-10-30
HUE032619T2 (en) 2017-10-30
EA027687B1 (ru) 2017-08-31
EP2936539A1 (en) 2015-10-28
EP2936539B1 (en) 2017-02-22
JP2016507853A (ja) 2016-03-10
SI2936539T1 (sl) 2017-09-29
WO2014097620A1 (en) 2014-06-26
US20150332897A1 (en) 2015-11-19

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