PL2948574T3 - Sposób wytwarzania powłoki z metalu szlachetnego na podłożu metalicznym - Google Patents

Sposób wytwarzania powłoki z metalu szlachetnego na podłożu metalicznym

Info

Publication number
PL2948574T3
PL2948574T3 PL15709091T PL15709091T PL2948574T3 PL 2948574 T3 PL2948574 T3 PL 2948574T3 PL 15709091 T PL15709091 T PL 15709091T PL 15709091 T PL15709091 T PL 15709091T PL 2948574 T3 PL2948574 T3 PL 2948574T3
Authority
PL
Poland
Prior art keywords
producing
precious metal
metal coating
metallic substrate
metallic
Prior art date
Application number
PL15709091T
Other languages
English (en)
Inventor
Horst Neddermann
Original Assignee
Aumann Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aumann Gmbh filed Critical Aumann Gmbh
Publication of PL2948574T3 publication Critical patent/PL2948574T3/pl

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/011Apparatus therefor
    • H10W72/0115Apparatus for manufacturing bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/015Manufacture or treatment of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/555Materials of bond wires of outermost layers of multilayered bond wires, e.g. material of a coating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Catalysts (AREA)
  • Chemically Coating (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
PL15709091T 2014-02-28 2015-02-27 Sposób wytwarzania powłoki z metalu szlachetnego na podłożu metalicznym PL2948574T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP14000722.0A EP2913424A1 (de) 2014-02-28 2014-02-28 Verfahren zum Ausbilden einer Edellmetallbeschichtung auf einem metallischen Substrat sowie Beschichtungsanordnung

Publications (1)

Publication Number Publication Date
PL2948574T3 true PL2948574T3 (pl) 2017-03-31

Family

ID=50230842

Family Applications (1)

Application Number Title Priority Date Filing Date
PL15709091T PL2948574T3 (pl) 2014-02-28 2015-02-27 Sposób wytwarzania powłoki z metalu szlachetnego na podłożu metalicznym

Country Status (10)

Country Link
EP (2) EP2913424A1 (pl)
ES (1) ES2607139T3 (pl)
HR (1) HRP20161761T1 (pl)
HU (1) HUE032381T2 (pl)
LT (1) LT2948574T (pl)
PL (1) PL2948574T3 (pl)
PT (1) PT2948574T (pl)
RS (1) RS55473B1 (pl)
SI (1) SI2948574T1 (pl)
WO (1) WO2015128093A1 (pl)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017219435A1 (de) * 2017-10-30 2019-05-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Beschichtung einer metallischen Oberfläche mit einem metallischen Material

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3741328A1 (de) * 1987-12-03 1989-06-15 Lackdraht Union Gmbh Verfahren zur herstellung eines lackdrahtes und vorrichtung zur durchfuehrung des verfahrens
JP4918994B2 (ja) * 2005-05-30 2012-04-18 住友電気工業株式会社 金属被膜の形成方法および金属配線
EP2461358B1 (en) * 2009-07-30 2017-10-18 Nippon Steel & Sumikin Materials Co., Ltd. Bonding wire for semiconductor
DE102011052520A1 (de) * 2011-08-09 2013-02-14 Aumann Gmbh Vorrichtung zur Beschichtung von elektrisch leitenden Drähten
US20150322586A1 (en) 2011-11-26 2015-11-12 Microbonds Inc. Bonding wire and process for manufacturing a bonding wire
TWI592234B (zh) * 2012-08-07 2017-07-21 Daicel Corp Method for producing silver nano-particles, silver nano-particles and silver paint composition
CN103219247B (zh) * 2013-03-01 2015-11-25 溧阳市虹翔机械制造有限公司 一种镀银键合铜丝的制造方法

Also Published As

Publication number Publication date
RS55473B1 (sr) 2017-04-28
LT2948574T (lt) 2016-12-27
EP2948574A1 (de) 2015-12-02
ES2607139T3 (es) 2017-03-29
WO2015128093A1 (de) 2015-09-03
PT2948574T (pt) 2016-12-22
EP2948574B1 (de) 2016-09-21
HRP20161761T1 (hr) 2017-02-24
EP2913424A1 (de) 2015-09-02
SI2948574T1 (sl) 2017-01-31
HUE032381T2 (hu) 2017-09-28

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