PL3068197T3 - Urządzenie do detekcji stanu braku zapłonu plazmy i sposób wykrywania stanu braku zapłonu plazmy - Google Patents

Urządzenie do detekcji stanu braku zapłonu plazmy i sposób wykrywania stanu braku zapłonu plazmy

Info

Publication number
PL3068197T3
PL3068197T3 PL13898096T PL13898096T PL3068197T3 PL 3068197 T3 PL3068197 T3 PL 3068197T3 PL 13898096 T PL13898096 T PL 13898096T PL 13898096 T PL13898096 T PL 13898096T PL 3068197 T3 PL3068197 T3 PL 3068197T3
Authority
PL
Poland
Prior art keywords
state detection
plasma state
unignited plasma
unignited
detection device
Prior art date
Application number
PL13898096T
Other languages
English (en)
Inventor
Itsuo Yuzurihara
Satoshi Aikawa
Ryosuke OHMA
Original Assignee
Kyosan Electric Mfg. Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyosan Electric Mfg. Co., Ltd. filed Critical Kyosan Electric Mfg. Co., Ltd.
Publication of PL3068197T3 publication Critical patent/PL3068197T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/26—Matching networks

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma Technology (AREA)
PL13898096T 2013-11-29 2013-12-26 Urządzenie do detekcji stanu braku zapłonu plazmy i sposób wykrywania stanu braku zapłonu plazmy PL3068197T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013247660A JP5850581B2 (ja) 2013-11-29 2013-11-29 プラズマ未着火状態判別装置およびプラズマ未着火判別方法
PCT/JP2013/084820 WO2015079595A1 (ja) 2013-11-29 2013-12-26 プラズマ未着火状態検出装置およびプラズマ未着火状態検出方法
EP13898096.6A EP3068197B1 (en) 2013-11-29 2013-12-26 Unignited plasma state detection device and unignited plasma state detection method

Publications (1)

Publication Number Publication Date
PL3068197T3 true PL3068197T3 (pl) 2018-10-31

Family

ID=53198578

Family Applications (1)

Application Number Title Priority Date Filing Date
PL13898096T PL3068197T3 (pl) 2013-11-29 2013-12-26 Urządzenie do detekcji stanu braku zapłonu plazmy i sposób wykrywania stanu braku zapłonu plazmy

Country Status (8)

Country Link
US (1) US9699878B2 (pl)
EP (1) EP3068197B1 (pl)
JP (1) JP5850581B2 (pl)
KR (1) KR101689509B1 (pl)
CN (1) CN105723813B (pl)
PL (1) PL3068197T3 (pl)
TW (1) TWI549569B (pl)
WO (1) WO2015079595A1 (pl)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109563799B (zh) * 2016-08-17 2021-06-08 三菱电机株式会社 阻挡放电型点火装置
US10283320B2 (en) * 2016-11-11 2019-05-07 Applied Materials, Inc. Processing chamber hardware fault detection using spectral radio frequency analysis
JP6814693B2 (ja) * 2017-05-10 2021-01-20 東京エレクトロン株式会社 マイクロ波出力装置及びプラズマ処理装置
US10505348B2 (en) * 2017-09-15 2019-12-10 Mks Instruments, Inc. Apparatus and method for ignition of a plasma system and for monitoring health of the plasma system
CN107681984B (zh) * 2017-10-24 2024-04-05 合肥雷科电子科技有限公司 一种毫米波快脉冲反射过大实时保护电路及其保护方法
EP3908087B1 (en) * 2019-05-09 2024-11-27 SPP Technologies Co., Ltd. Plasma ignition method and plasma generation device
EP4046283A1 (en) * 2019-10-18 2022-08-24 Nokia Technologies Oy Massive mimo antenna array
KR102223876B1 (ko) * 2019-10-28 2021-03-05 주식회사 뉴파워 프라즈마 불안정 매칭 현상을 해소하기 위한 다중 전압 제어 방법 및 다중 전압 제어 방식의 고주파 전원 장치
EP4177928B1 (en) * 2021-11-09 2024-01-03 Impedans Ltd Two stage ion current measuring method in a device for analysis of plasma processes
DE102022108642A1 (de) * 2022-04-08 2023-10-12 TRUMPF Hüttinger GmbH + Co. KG Plasmazünderkennungsvorrichtung zum Anschluss an eine Impedanzanpassungsschaltung für ein Plasmaerzeugungssystem
CN120637190A (zh) * 2024-03-11 2025-09-12 北京北方华创微电子装备有限公司 应用于半导体工艺设备的起辉控制方法及半导体工艺设备

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5556549A (en) * 1994-05-02 1996-09-17 Lsi Logic Corporation Power control and delivery in plasma processing equipment
JPH09260096A (ja) * 1996-03-15 1997-10-03 Hitachi Ltd インピーダンス整合方法および装置ならびに半導体製造装置
CN100573827C (zh) 2001-09-27 2009-12-23 东京毅力科创株式会社 电磁场供给装置及等离子体处理装置
JP4332322B2 (ja) 2002-06-05 2009-09-16 パール工業株式会社 排ガス分解処理用プラズマ発生装置
JP4127488B2 (ja) 2002-07-03 2008-07-30 東京エレクトロン株式会社 プラズマ処理装置
KR100877304B1 (ko) 2003-11-27 2009-01-09 가부시키가이샤 다이헨 고주파 전력 공급 시스템
CN101854754B (zh) * 2005-12-26 2013-02-27 松下电器产业株式会社 高频加热设备及检测其操作状态的状态检测装置和方法
PL2259662T3 (pl) 2008-03-26 2019-10-31 Kyosan Electric Mfg Urządzenie wygaszające nietypowe wyładowanie do przyrządu próżniowego
WO2010070985A1 (ja) * 2008-12-15 2010-06-24 日本電気株式会社 電力検出回路、送信装置および電力検出方法
US8440061B2 (en) * 2009-07-20 2013-05-14 Lam Research Corporation System and method for plasma arc detection, isolation and prevention
SG175695A1 (en) 2009-08-07 2011-12-29 Kyosan Electric Mfg Pulse-modulated high-frequency power control method and pulse-modulated high-frequency power source device
JP2011052279A (ja) * 2009-09-02 2011-03-17 Mitsubishi Electric Corp 放電状態検知装置および放電状態検知方法
JP4891384B2 (ja) * 2009-12-10 2012-03-07 株式会社新川 プラズマ発生装置
JP5847496B2 (ja) * 2011-09-01 2016-01-20 株式会社日立国際電気 プラズマ生成用電源装置及びプラズマ生成パラメータ設定方法

Also Published As

Publication number Publication date
EP3068197B1 (en) 2018-05-16
EP3068197A4 (en) 2017-06-07
JP2015106484A (ja) 2015-06-08
US20160295675A1 (en) 2016-10-06
WO2015079595A1 (ja) 2015-06-04
TW201521522A (zh) 2015-06-01
EP3068197A1 (en) 2016-09-14
KR20160056958A (ko) 2016-05-20
JP5850581B2 (ja) 2016-02-03
TWI549569B (zh) 2016-09-11
KR101689509B1 (ko) 2016-12-23
CN105723813B (zh) 2017-02-22
CN105723813A (zh) 2016-06-29
US9699878B2 (en) 2017-07-04

Similar Documents

Publication Publication Date Title
EP3023864A4 (en) Detection device and method
EP3067823A4 (en) Detection method and device
GB2511754B (en) Radiation Detection Device and Method
GB2517087B (en) Electronic device and coordinate detecting method
EP3057063A4 (en) Object detection device and vehicle using same
EP3018482A4 (en) Detection device and biological-sample analysis device
EP3081930A4 (en) Gas detection device and method thereof
PL3040991T3 (pl) Sposób i urządzenie do wykrywania aktywacji głosowej
PL3068197T3 (pl) Urządzenie do detekcji stanu braku zapłonu plazmy i sposób wykrywania stanu braku zapłonu plazmy
GB201319105D0 (en) Detection apparatus and method
EP3032925A4 (en) Plasma processing device and plasma processing method
HUE043037T2 (hu) Aktív mikrohullámú készülék és detektálási eljárás
EP2993460A4 (en) Target-substance detection apparatus and method
ZA201601263B (en) Proximity detection systems and methods
GB201315185D0 (en) Location detection system and method
IL245696A (en) Install micro active waves and detection method
GB2535409B (en) Flame detection system and method
EP3054383A4 (en) PROCESS AND SYSTEM FOR QUICK ERROR DETECTION
GB201513968D0 (en) Partial discharge detection method and partial discharge detection device for electrical appliance
GB201604534D0 (en) Nucleic-acid-sequence determination device and nucleic-acid-sequence determination method
EP2869063A4 (en) DETECTION DEVICE AND METHOD
EP3037029A4 (en) Location detection device and location detection system
EP3018469A4 (en) State determination method and state determination device
EP3063520B8 (en) Detection apparatus and method
EP2998839A4 (en) INDICATOR DETECTION DEVICE AND INDICATOR DETECTION METHOD