PL3095890T3 - Sposób nakładania powłok cienkowarstwowych i linia produkcyjna do przeprowadzania sposobu - Google Patents

Sposób nakładania powłok cienkowarstwowych i linia produkcyjna do przeprowadzania sposobu

Info

Publication number
PL3095890T3
PL3095890T3 PL14878801T PL14878801T PL3095890T3 PL 3095890 T3 PL3095890 T3 PL 3095890T3 PL 14878801 T PL14878801 T PL 14878801T PL 14878801 T PL14878801 T PL 14878801T PL 3095890 T3 PL3095890 T3 PL 3095890T3
Authority
PL
Poland
Prior art keywords
manufacturing line
film coatings
implementing same
applying thin
thin
Prior art date
Application number
PL14878801T
Other languages
English (en)
Inventor
Ayrat Khamitovich Khisamov
Original Assignee
The Batteries Spółka z ograniczoną odpowiedzialnością
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The Batteries Spółka z ograniczoną odpowiedzialnością filed Critical The Batteries Spółka z ograniczoną odpowiedzialnością
Publication of PL3095890T3 publication Critical patent/PL3095890T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
PL14878801T 2014-01-14 2014-01-14 Sposób nakładania powłok cienkowarstwowych i linia produkcyjna do przeprowadzania sposobu PL3095890T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14878801.1A EP3095890B1 (de) 2014-01-14 2014-01-14 Verfahren zum aufbringen von dünnfilmbeschichtungen und produktionslinie zur durchführung des verfahrens
PCT/RU2014/000010 WO2015108432A1 (ru) 2014-01-14 2014-01-14 Способ нанесения тонкопленочных покрытий и технологическая линия для его осуществления

Publications (1)

Publication Number Publication Date
PL3095890T3 true PL3095890T3 (pl) 2019-02-28

Family

ID=53543223

Family Applications (1)

Application Number Title Priority Date Filing Date
PL14878801T PL3095890T3 (pl) 2014-01-14 2014-01-14 Sposób nakładania powłok cienkowarstwowych i linia produkcyjna do przeprowadzania sposobu

Country Status (18)

Country Link
US (1) US10385446B2 (pl)
EP (1) EP3095890B1 (pl)
JP (1) JP6534390B2 (pl)
KR (1) KR102092815B1 (pl)
CN (1) CN105980594B (pl)
CY (1) CY1121199T1 (pl)
DK (1) DK3095890T3 (pl)
ES (1) ES2699888T3 (pl)
HR (1) HRP20181983T1 (pl)
HU (1) HUE040753T2 (pl)
IL (1) IL246666B (pl)
LT (1) LT3095890T (pl)
PL (1) PL3095890T3 (pl)
PT (1) PT3095890T (pl)
RS (1) RS58180B1 (pl)
SI (1) SI3095890T1 (pl)
SM (1) SMT201800661T1 (pl)
WO (1) WO2015108432A1 (pl)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106893993B (zh) * 2017-03-08 2019-01-25 深圳先进技术研究院 溅射镀膜设备及其镀膜腔室
CN107794508A (zh) * 2017-11-15 2018-03-13 中山市创科科研技术服务有限公司 一种光学镀膜装置基板承载机构
DE102018115404A1 (de) 2018-06-27 2020-01-02 Schaeffler Technologies AG & Co. KG Verfahren und Vorrichtung zur Beschichtung eines Bauteils mittels physikalischer Gasphasenabscheidung
CN108677160B (zh) * 2018-08-13 2020-12-29 武汉科瑞达真空科技有限公司 一种基于公自转装载托盘的连续镀膜生产线
US20220145450A1 (en) * 2019-03-01 2022-05-12 The Batteries spólka z ograniczona odpowiedzialnoscia Processing line for depositing thin-film coatings
CN111545749B (zh) * 2020-04-24 2022-06-21 江苏大学 一种超高速激光熔覆复杂曲面回转体的方法
JP2024542372A (ja) * 2021-10-26 2024-11-15 アプライド マテリアルズ インコーポレイテッド 薄膜基板を搬送するための真空処理システム、装置および方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4851095A (en) 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US6485616B1 (en) * 1999-12-29 2002-11-26 Deposition Sciences, Inc. System and method for coating substrates with improved capacity and uniformity
US6571434B2 (en) * 2000-09-14 2003-06-03 Kim A. Ortiz Connector device for releasably securing a strap member and a fastening mechanism together
US20030003767A1 (en) 2001-06-29 2003-01-02 Plasmion Corporation High throughput hybrid deposition system and method using the same
CN1274874C (zh) * 2001-08-14 2006-09-13 三星康宁株式会社 在玻璃衬底上淀积薄膜的设备和方法
DE102004008598B4 (de) * 2004-02-21 2006-12-28 Applied Films Gmbh & Co. Kg Verfahren für den Betrieb einer Inline-Beschichtungsanlage
JP2007077478A (ja) * 2005-09-16 2007-03-29 Sony Corp 成膜方法及び成膜装置
US8398770B2 (en) 2007-09-26 2013-03-19 Eastman Kodak Company Deposition system for thin film formation
RU78785U1 (ru) 2008-06-02 2008-12-10 ООО НПО "КвинтТех" Автоматизированная установка для формирования тонкопленочных покрытий наноразмерной толщины методом молекулярного наслаивания
JP2014532813A (ja) * 2011-11-04 2014-12-08 インテヴァック インコーポレイテッド 線走査スパッタリングシステムおよび線走査スパッタリング方法
CN102560408A (zh) * 2012-01-20 2012-07-11 纳峰真空镀膜（上海）有限公司 连续真空镀膜装置
TWI518832B (zh) * 2012-04-26 2016-01-21 因特瓦克公司 真空處理系統架構

Also Published As

Publication number Publication date
CN105980594B (zh) 2019-06-18
SI3095890T1 (sl) 2019-01-31
SMT201800661T1 (it) 2019-01-11
JP6534390B2 (ja) 2019-06-26
PT3095890T (pt) 2018-12-05
WO2015108432A1 (ru) 2015-07-23
EP3095890A1 (de) 2016-11-23
LT3095890T (lt) 2018-12-10
CY1121199T1 (el) 2020-05-29
ES2699888T3 (es) 2019-02-13
IL246666B (en) 2020-08-31
EP3095890A4 (de) 2016-11-23
IL246666A0 (en) 2016-08-31
KR102092815B1 (ko) 2020-04-24
HRP20181983T1 (hr) 2019-01-25
KR20160106748A (ko) 2016-09-12
RS58180B1 (sr) 2019-03-29
US20160333467A1 (en) 2016-11-17
US10385446B2 (en) 2019-08-20
EP3095890B1 (de) 2018-08-29
HUE040753T2 (hu) 2019-03-28
DK3095890T3 (da) 2019-01-02
JP2017506289A (ja) 2017-03-02
CN105980594A (zh) 2016-09-28

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