PL3102717T3 - Warstwa ochronna do grafitowych łodzi PECVD - Google Patents

Warstwa ochronna do grafitowych łodzi PECVD

Info

Publication number
PL3102717T3
PL3102717T3 PL15704736T PL15704736T PL3102717T3 PL 3102717 T3 PL3102717 T3 PL 3102717T3 PL 15704736 T PL15704736 T PL 15704736T PL 15704736 T PL15704736 T PL 15704736T PL 3102717 T3 PL3102717 T3 PL 3102717T3
Authority
PL
Poland
Prior art keywords
protective layer
graphite boats
pecvd graphite
pecvd
boats
Prior art date
Application number
PL15704736T
Other languages
English (en)
Inventor
Torsten Kornmeyer
Original Assignee
Kgt Graphit Technologie Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kgt Graphit Technologie Gmbh filed Critical Kgt Graphit Technologie Gmbh
Publication of PL3102717T3 publication Critical patent/PL3102717T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/12—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H10P72/123—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterised by a material, a roughness, a coating or the like

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
PL15704736T 2014-02-06 2015-02-04 Warstwa ochronna do grafitowych łodzi PECVD PL3102717T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014101497 2014-02-06
EP15704736.6A EP3102717B1 (de) 2014-02-06 2015-02-04 Schutzschicht für pecvd-boote aus graphit
PCT/EP2015/052255 WO2015117991A1 (de) 2014-02-06 2015-02-04 Schutzschicht für pecvd-boote aus graphit

Publications (1)

Publication Number Publication Date
PL3102717T3 true PL3102717T3 (pl) 2020-07-27

Family

ID=52473882

Family Applications (1)

Application Number Title Priority Date Filing Date
PL15704736T PL3102717T3 (pl) 2014-02-06 2015-02-04 Warstwa ochronna do grafitowych łodzi PECVD

Country Status (6)

Country Link
US (1) US10151030B2 (pl)
EP (1) EP3102717B1 (pl)
CN (1) CN106460172B (pl)
DK (1) DK3102717T3 (pl)
PL (1) PL3102717T3 (pl)
WO (1) WO2015117991A1 (pl)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105457942B (zh) * 2015-09-28 2018-02-13 阳光中科（福建）能源股份有限公司 一种延长pecvd炉用石墨舟使用寿命的方法
CN105470344B (zh) * 2015-09-28 2017-04-26 阳光中科（福建）能源股份有限公司 一种延长石墨舟使用寿命的方法
CN106024681B (zh) * 2016-07-27 2018-12-28 苏州阿特斯阳光电力科技有限公司 叠层膜、包含其的石墨舟及其制备方法、及石墨舟清洗方法
CN109207960B (zh) * 2017-07-04 2021-02-02 宁波晨鑫维克工业科技有限公司 一种复合于m42钢表面的碳化钛纳米晶体涂层及其制备方法和应用
CN107742603A (zh) * 2017-10-19 2018-02-27 西安黄河光伏科技股份有限公司 一种晶硅太阳电池石墨舟及其饱和处理方法
CN110819968B (zh) * 2018-08-08 2022-06-28 上海理想万里晖薄膜设备有限公司 一种用于pecvd反应腔的复合载板
TWI879113B (zh) * 2023-09-25 2025-04-01 財團法人金屬工業研究發展中心 晶舟裝置及電漿輔助化學氣相沉積設備

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8303602A (nl) * 1983-10-19 1985-05-17 Johannes Hendrikus Leonardus H Plasma-gestimuleerde chemische opdampinrichting en in het bijzonder een substratenondersteunings- en elektrodeopstelling daarvoor en de betreffende onderdelen.
JPS62176981A (ja) * 1986-01-29 1987-08-03 Kyocera Corp 窒化ホウ素被覆ルツボ
US5536574A (en) * 1993-08-02 1996-07-16 Loral Vought Systems Corporation Oxidation protection for carbon/carbon composites
US6120640A (en) * 1996-12-19 2000-09-19 Applied Materials, Inc. Boron carbide parts and coatings in a plasma reactor
JPH11279761A (ja) * 1998-03-31 1999-10-12 Kyocera Corp 耐食性部材
JP4166350B2 (ja) * 1998-06-26 2008-10-15 東洋炭素株式会社 耐酸化性の炭化ホウ素−炭化ケイ素複合炭素材料及びそれを用いた焼結用ルツボ、真空蒸着用ルツボ及び高温焼成用治具
WO2002020871A1 (de) 2000-09-08 2002-03-14 Centrotherm Elektrische Anlagen Gmbh + Co. Plasmaboot
DE10142267A1 (de) 2001-08-29 2003-03-27 Infineon Technologies Ag Verfahren zum Abscheiden von Siliziumnitrid
US20070221132A1 (en) * 2006-03-24 2007-09-27 General Electric Company Composition, coating, coated article, and method
US20080050522A1 (en) 2006-08-23 2008-02-28 Atomic Energy Council-Institute Of Nuclear Energy Research Preparative method for protective layer of susceptor
US20080141938A1 (en) * 2006-12-13 2008-06-19 General Electric Company Processing apparatus, coated article and method
EP2148939B1 (de) * 2007-05-25 2017-06-14 Oerlikon Surface Solutions AG, Pfäffikon Vakuumbehandlungsanlage und vakuumbehandlungsverfahren
DE102008019023B4 (de) 2007-10-22 2009-09-24 Centrotherm Photovoltaics Ag Vakuum-Durchlaufanlage zur Prozessierung von Substraten
US8021487B2 (en) 2007-12-12 2011-09-20 Veeco Instruments Inc. Wafer carrier with hub
US9228256B2 (en) 2009-12-11 2016-01-05 Kgt Graphit Technologie Gmbh Substrate support
US20120278443A1 (en) 2011-04-26 2012-11-01 Kenichi Taniuchi Server, display device, and control method
DE102012101456A1 (de) 2012-02-23 2013-08-29 Schott Solar Ag Verfahren zum Herstellen einer Solarzelle
JP2013234369A (ja) 2012-05-10 2013-11-21 Shin-Etsu Chemical Co Ltd グラファイト材に熱分解窒化ほう素をコーティングする方法及びその方法によって得られた被覆物

Also Published As

Publication number Publication date
US20170211182A1 (en) 2017-07-27
DK3102717T3 (da) 2020-04-20
US10151030B2 (en) 2018-12-11
EP3102717B1 (de) 2020-01-15
EP3102717A1 (de) 2016-12-14
WO2015117991A1 (de) 2015-08-13
CN106460172B (zh) 2019-01-15
CN106460172A (zh) 2017-02-22

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