PL3152345T3 - Nanoszona bezprądowo wysokofosforowa powłoka niklowa - Google Patents

Nanoszona bezprądowo wysokofosforowa powłoka niklowa

Info

Publication number
PL3152345T3
PL3152345T3 PL15803204.5T PL15803204T PL3152345T3 PL 3152345 T3 PL3152345 T3 PL 3152345T3 PL 15803204 T PL15803204 T PL 15803204T PL 3152345 T3 PL3152345 T3 PL 3152345T3
Authority
PL
Poland
Prior art keywords
electroless nickel
high phosphorus
phosphorus electroless
nickel
phosphorus
Prior art date
Application number
PL15803204.5T
Other languages
English (en)
Inventor
Robert Janik
Nicole J. Micyus
Original Assignee
Macdermid Acumen, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Macdermid Acumen, Inc. filed Critical Macdermid Acumen, Inc.
Publication of PL3152345T3 publication Critical patent/PL3152345T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemically Coating (AREA)
PL15803204.5T 2014-06-03 2015-05-26 Nanoszona bezprądowo wysokofosforowa powłoka niklowa PL3152345T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/294,437 US9708693B2 (en) 2014-06-03 2014-06-03 High phosphorus electroless nickel
PCT/US2015/032390 WO2015187403A1 (en) 2014-06-03 2015-05-26 High phosphorus electroless nickel

Publications (1)

Publication Number Publication Date
PL3152345T3 true PL3152345T3 (pl) 2026-03-09

Family

ID=54701071

Family Applications (1)

Application Number Title Priority Date Filing Date
PL15803204.5T PL3152345T3 (pl) 2014-06-03 2015-05-26 Nanoszona bezprądowo wysokofosforowa powłoka niklowa

Country Status (9)

Country Link
US (1) US9708693B2 (pl)
EP (1) EP3152345B1 (pl)
JP (1) JP6426203B2 (pl)
KR (1) KR101848227B1 (pl)
CN (1) CN106460180B (pl)
ES (1) ES3062801T3 (pl)
MY (1) MY193246A (pl)
PL (1) PL3152345T3 (pl)
WO (1) WO2015187403A1 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108277512A (zh) * 2018-03-15 2018-07-13 新乡学院 一种镁合金表面活化工艺
CN117684229B (zh) * 2023-11-14 2025-06-06 九江德福科技股份有限公司 一种埋阻铜箔的制备及其电阻测试方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887732A (en) 1970-10-01 1975-06-03 Gen Am Transport Stress controlled electroless nickel deposits
JPH0633255A (ja) * 1992-07-14 1994-02-08 Toyota Central Res & Dev Lab Inc 無電解めっき浴
US5258061A (en) 1992-11-20 1993-11-02 Monsanto Company Electroless nickel plating baths
JP2901523B2 (ja) 1995-08-09 1999-06-07 日本カニゼン株式会社 無電解黒色めっき浴組成と皮膜の形成方法
EP0894156A4 (en) 1996-11-14 2002-06-26 Atotech Deutschland Gmbh REMOVAL OF ORTHOPHOSPHITIONS FROM ELECTRICIZED NICKEL PLATING BATHS
US6020021A (en) 1998-08-28 2000-02-01 Mallory, Jr.; Glenn O. Method for depositing electroless nickel phosphorus alloys
JP4027642B2 (ja) 2001-11-08 2007-12-26 日本パーカライジング株式会社 樹脂との耐熱接着性に優れたニッケル系表面処理皮膜
US6800121B2 (en) 2002-06-18 2004-10-05 Atotech Deutschland Gmbh Electroless nickel plating solutions
DE10246453A1 (de) * 2002-10-04 2004-04-15 Enthone Inc., West Haven Verfahren zur stromlosen Abscheidung von Nickel
JP4417259B2 (ja) * 2002-12-20 2010-02-17 日本カニゼン株式会社 異方成長バンプ形成用無電解ニッケルめっき浴及び異方成長バンプの形成方法
JP4705776B2 (ja) 2004-12-17 2011-06-22 日本カニゼン株式会社 リン酸塩被膜を有する無電解ニッケルめっき膜の形成方法およびその形成膜
EP1816237A1 (de) * 2006-02-02 2007-08-08 Enthone, Inc. Verfahren und Vorrichtung zur Beschichtung von Substratoberflächen
JP5263932B2 (ja) 2008-02-28 2013-08-14 学校法人神奈川大学 めっき液及び該めっき液を用いての切削ブレードの製造方法
EP2347413B1 (en) * 2008-10-16 2016-06-22 ATOTECH Deutschland GmbH Metal plating additive, and method for plating substrates and products therefrom
PL2449148T3 (pl) 2009-07-03 2019-06-28 Macdermid Enthone Inc. Elektrolit zawierający beta-aminokwas i sposób osadzania warstwy metalu
US20110192316A1 (en) * 2010-02-05 2011-08-11 E-Chem Enterprise Corp. Electroless plating solution for providing solar cell electrode
US20110195542A1 (en) * 2010-02-05 2011-08-11 E-Chem Enterprise Corp. Method of providing solar cell electrode by electroless plating and an activator used therein
SG188351A1 (en) 2010-09-03 2013-04-30 Omg Electronic Chemicals Llc Electroless nickel alloy plating bath and process for depositing thereof
KR101218062B1 (ko) 2011-04-28 2013-01-03 씨큐브 주식회사 은 코팅 안료 및 그 제조 방법
KR101365661B1 (ko) * 2011-10-24 2014-02-24 (주)지오데코 무전해 니켈-인 도금액 및 이를 이용한 도금방법
EP2671969A1 (en) 2012-06-04 2013-12-11 ATOTECH Deutschland GmbH Plating bath for electroless deposition of nickel layers
BR112015001113B1 (pt) 2012-07-17 2021-05-18 Coventya, Inc método de formação de um revestimento de níquel autocatalítico preto de um substrato
US11685999B2 (en) * 2014-06-02 2023-06-27 Macdermid Acumen, Inc. Aqueous electroless nickel plating bath and method of using the same

Also Published As

Publication number Publication date
WO2015187403A1 (en) 2015-12-10
US20150345026A1 (en) 2015-12-03
EP3152345B1 (en) 2025-12-24
CN106460180B (zh) 2019-08-23
EP3152345A1 (en) 2017-04-12
KR20170012546A (ko) 2017-02-02
JP2017527688A (ja) 2017-09-21
CN106460180A (zh) 2017-02-22
EP3152345A4 (en) 2018-01-31
KR101848227B1 (ko) 2018-04-12
MY193246A (en) 2022-09-28
US9708693B2 (en) 2017-07-18
JP6426203B2 (ja) 2018-11-21
ES3062801T3 (en) 2026-04-14

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