PL3546748T3 - Podzespół i komora pokryte nieodparowującym getterem, sposób ich wytwarzania i urządzenie do ich wytwarzania - Google Patents

Podzespół i komora pokryte nieodparowującym getterem, sposób ich wytwarzania i urządzenie do ich wytwarzania

Info

Publication number
PL3546748T3
PL3546748T3 PL17873075T PL17873075T PL3546748T3 PL 3546748 T3 PL3546748 T3 PL 3546748T3 PL 17873075 T PL17873075 T PL 17873075T PL 17873075 T PL17873075 T PL 17873075T PL 3546748 T3 PL3546748 T3 PL 3546748T3
Authority
PL
Poland
Prior art keywords
manufacturing
chamber
coated component
manufacturing apparatus
evaporative getter
Prior art date
Application number
PL17873075T
Other languages
English (en)
Inventor
Kazuhiko Mase
Takashi Kikuchi
Original Assignee
Inter-University Research Institute Corporation High Energy Accelerator Research Organization
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inter-University Research Institute Corporation High Energy Accelerator Research Organization filed Critical Inter-University Research Institute Corporation High Energy Accelerator Research Organization
Publication of PL3546748T3 publication Critical patent/PL3546748T3/pl

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B23/00—Pumping installations or systems
    • F04B23/04—Combinations of two or more pumps
    • F04B23/08—Combinations of two or more pumps the pumps being of different types
    • F04B23/14—Combinations of two or more pumps the pumps being of different types at least one pump being of the non-positive-displacement type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/02—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by absorption or adsorption
    • F04B37/04—Selection of specific absorption or adsorption materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/02—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by absorption or adsorption
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Separation Of Gases By Adsorption (AREA)
PL17873075T 2016-11-28 2017-11-28 Podzespół i komora pokryte nieodparowującym getterem, sposób ich wytwarzania i urządzenie do ich wytwarzania PL3546748T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016230510 2016-11-28
EP17873075.0A EP3546748B1 (en) 2016-11-28 2017-11-28 Non-evaporative getter-coated component, chamber, manufacturing method, and manufacturing apparatus
PCT/JP2017/042682 WO2018097325A1 (ja) 2016-11-28 2017-11-28 非蒸発型ゲッタコーティング部品、容器、製法、装置

Publications (1)

Publication Number Publication Date
PL3546748T3 true PL3546748T3 (pl) 2021-12-27

Family

ID=62195046

Family Applications (1)

Application Number Title Priority Date Filing Date
PL17873075T PL3546748T3 (pl) 2016-11-28 2017-11-28 Podzespół i komora pokryte nieodparowującym getterem, sposób ich wytwarzania i urządzenie do ich wytwarzania

Country Status (7)

Country Link
US (1) US20200149519A1 (pl)
EP (1) EP3546748B1 (pl)
JP (1) JP6916537B2 (pl)
KR (1) KR102279327B1 (pl)
CN (1) CN110023623B (pl)
PL (1) PL3546748T3 (pl)
WO (1) WO2018097325A1 (pl)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7445408B2 (ja) * 2019-11-01 2024-03-07 東京エレクトロン株式会社 基板処理装置及び基板処理装置の立ち上げまたはメンテナンス方法
CN110863174A (zh) * 2019-11-20 2020-03-06 有研工程技术研究院有限公司 一种无需激活的钛基吸氢材料及其制备方法
GB2591814A (en) * 2020-02-10 2021-08-11 Edwards Vacuum Llc Housing for a vacuum pump
EP3945210B1 (en) 2020-07-31 2023-09-06 Japan Atomic Energy Agency Vacuum component and evacuation method using the same
CN220977121U (zh) * 2022-12-13 2024-05-17 费勉仪器科技（上海）有限公司 Si热束源及分子束外延系统
JP2026073662A (ja) * 2024-10-18 2026-05-01 大学共同利用機関法人 高エネルギー加速器研究機構 非蒸発型ゲッタコーティング部品、非蒸発型ゲッタコーティング容器、その製造方法および製造装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2514465Y2 (ja) * 1991-10-19 1996-10-16 助川電気工業株式会社 ゲッタポンプ
FR2750248B1 (fr) * 1996-06-19 1998-08-28 Org Europeene De Rech Dispositif de pompage par getter non evaporable et procede de mise en oeuvre de ce getter
FR2760089B1 (fr) * 1997-02-26 1999-04-30 Org Europeene De Rech Agencement et procede pour ameliorer le vide dans un systeme a vide tres pousse
US6110808A (en) * 1998-12-04 2000-08-29 Trw Inc. Hydrogen getter for integrated microelectronic assembly
JP4662666B2 (ja) * 1999-06-02 2011-03-30 サエス ゲッターズ ソチエタ ペル アツィオニ 複合材料及びその調製方法
WO2001073159A1 (en) * 2000-03-27 2001-10-04 Mitsubishi Heavy Industries, Ltd. Method for forming metallic film and apparatus for forming the same
US20030062610A1 (en) * 2001-09-28 2003-04-03 Kovacs Alan L. Multilayer thin film hydrogen getter
FR2883099B1 (fr) * 2005-03-14 2007-04-13 Commissariat Energie Atomique Protection d'un getter en couche mince
US9200359B2 (en) * 2008-03-12 2015-12-01 Acktar Ltd. Thin-layered structure
CN201210480Y (zh) * 2008-06-13 2009-03-18 北京有色金属研究总院 一种热子型吸气元件
KR101030338B1 (ko) * 2008-10-08 2011-04-19 한국진공주식회사 진공 증착 장치
ITMI20111987A1 (it) * 2011-11-03 2013-05-04 Getters Spa Getters compositi perfezionati
FR3023974B1 (fr) * 2014-07-18 2016-07-22 Ulis Procede de fabrication d'un dispositif comprenant un boitier hermetique sous vide et un getter
US10354830B2 (en) * 2016-04-06 2019-07-16 Carl Zeiss Microscopy, Llc Charged particle beam system

Also Published As

Publication number Publication date
CN110023623B (zh) 2021-05-18
KR102279327B1 (ko) 2021-07-20
WO2018097325A1 (ja) 2018-05-31
EP3546748A4 (en) 2020-06-17
EP3546748A1 (en) 2019-10-02
US20200149519A1 (en) 2020-05-14
KR20190089882A (ko) 2019-07-31
JPWO2018097325A1 (ja) 2019-10-17
JP6916537B2 (ja) 2021-08-11
CN110023623A (zh) 2019-07-16
EP3546748B1 (en) 2021-06-30

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