PL358687A1 - Pasty trawiące do powierzchni nieorganicznych - Google Patents
Pasty trawiące do powierzchni nieorganicznychInfo
- Publication number
- PL358687A1 PL358687A1 PL01358687A PL35868701A PL358687A1 PL 358687 A1 PL358687 A1 PL 358687A1 PL 01358687 A PL01358687 A PL 01358687A PL 35868701 A PL35868701 A PL 35868701A PL 358687 A1 PL358687 A1 PL 358687A1
- Authority
- PL
- Poland
- Prior art keywords
- etching
- inorganic surfaces
- etching pastes
- nitride based
- pastes
- Prior art date
Links
- 238000005530 etching Methods 0.000 title abstract 5
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 2
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 2
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Weting (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10020817 | 2000-04-28 | ||
| DE10101926A DE10101926A1 (de) | 2000-04-28 | 2001-01-16 | Ätzpasten für anorganische Oberflächen |
| PCT/EP2001/003317 WO2001083391A1 (de) | 2000-04-28 | 2001-03-23 | Ätzpasten für anorganische oberflächen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| PL358687A1 true PL358687A1 (pl) | 2004-08-09 |
| PL207872B1 PL207872B1 (pl) | 2011-02-28 |
Family
ID=26005499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL358687A PL207872B1 (pl) | 2000-04-28 | 2001-03-23 | Drukowalne homogeniczne, nie-ziarniste medium trawiące do trawienia powierzchni szkieł, jego zastosowania oraz sposób trawienia nieorganicznych, szkło-podobnych powierzchni krystalicznych |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US20030160026A1 (pl) |
| EP (1) | EP1276701B1 (pl) |
| JP (1) | JP2003531807A (pl) |
| KR (1) | KR100812891B1 (pl) |
| CN (1) | CN100343189C (pl) |
| AU (2) | AU2001242510B2 (pl) |
| CA (1) | CA2407530C (pl) |
| IL (1) | IL152497A0 (pl) |
| MX (1) | MXPA02010634A (pl) |
| PL (1) | PL207872B1 (pl) |
| RU (1) | RU2274615C2 (pl) |
| TW (1) | TWI243801B (pl) |
| WO (1) | WO2001083391A1 (pl) |
Families Citing this family (82)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10150040A1 (de) | 2001-10-10 | 2003-04-17 | Merck Patent Gmbh | Kombinierte Ätz- und Dotiermedien |
| WO2003047005A2 (en) | 2001-11-26 | 2003-06-05 | Shell Solar Gmbh | Manufacturing a solar cell with backside contacts |
| EP1378947A1 (en) * | 2002-07-01 | 2004-01-07 | Interuniversitair Microelektronica Centrum Vzw | Semiconductor etching paste and the use thereof for localised etching of semiconductor substrates |
| DE10239656A1 (de) * | 2002-08-26 | 2004-03-11 | Merck Patent Gmbh | Ätzpasten für Titanoxid-Oberflächen |
| DE10241300A1 (de) * | 2002-09-04 | 2004-03-18 | Merck Patent Gmbh | Ätzpasten für Siliziumoberflächen und -schichten |
| TWI282814B (en) * | 2002-09-13 | 2007-06-21 | Daikin Ind Ltd | Etchant and etching method |
| KR20040042243A (ko) * | 2002-11-13 | 2004-05-20 | 박진국 | 유리표면의 반투명 처리용 부식액조성물과 이를 이용한저반사처리방법 |
| RU2238919C2 (ru) * | 2002-12-30 | 2004-10-27 | Сидельников Анатолий Анатольевич | Паста для матирования |
| US7339110B1 (en) | 2003-04-10 | 2008-03-04 | Sunpower Corporation | Solar cell and method of manufacture |
| US7388147B2 (en) * | 2003-04-10 | 2008-06-17 | Sunpower Corporation | Metal contact structure for solar cell and method of manufacture |
| JP4549655B2 (ja) * | 2003-11-18 | 2010-09-22 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 機能性塗料 |
| KR100619449B1 (ko) * | 2004-07-10 | 2006-09-13 | 테크노세미켐 주식회사 | 박막트랜지스터 형성용 모든 전극을 위한 통합 식각액조성물 |
| MXGT04000020A (es) * | 2004-12-10 | 2005-06-07 | Luis Rendon Granados Juan | Proceso quimico para satinado - mateado total o parcial de vidrio por inmersion en solucion acida para produccion simultanea y continua de una o varias piezas y/o laminas de vidrio de dimensiones estandares y variables. |
| US20060151434A1 (en) * | 2005-01-07 | 2006-07-13 | The Boc Group, Inc. | Selective surface texturing through the use of random application of thixotropic etching agents |
| DE102005007743A1 (de) * | 2005-01-11 | 2006-07-20 | Merck Patent Gmbh | Druckfähiges Medium zur Ätzung von Siliziumdioxid- und Siliziumnitridschichten |
| DE102005031469A1 (de) * | 2005-07-04 | 2007-01-11 | Merck Patent Gmbh | Medium zur Ätzung von oxidischen, transparenten, leitfähigen Schichten |
| DE102005032807A1 (de) * | 2005-07-12 | 2007-01-18 | Merck Patent Gmbh | Kombinierte Ätz- und Dotiermedien für Siliziumdioxidschichten und darunter liegendes Silizium |
| DE102005033724A1 (de) * | 2005-07-15 | 2007-01-18 | Merck Patent Gmbh | Druckfähige Ätzmedien für Siliziumdioxid-und Siliziumnitridschichten |
| DE102005035255A1 (de) * | 2005-07-25 | 2007-02-01 | Merck Patent Gmbh | Ätzmedien für oxidische, transparente, leitfähige Schichten |
| DE102005037335B4 (de) * | 2005-08-04 | 2008-12-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Rückstandsfrei abnehmbares Beizmittel |
| KR101188425B1 (ko) * | 2005-08-24 | 2012-10-05 | 엘지디스플레이 주식회사 | 식각 테이프 및 이를 이용한 액정 표시 장치용 어레이기판의 제조 방법 |
| JP4657068B2 (ja) * | 2005-09-22 | 2011-03-23 | シャープ株式会社 | 裏面接合型太陽電池の製造方法 |
| RU2301204C1 (ru) * | 2006-03-02 | 2007-06-20 | Юлия Алексеевна Щепочкина | Полировальный раствор |
| DE102006047579A1 (de) * | 2006-10-05 | 2008-04-17 | Institut Für Solarenergieforschung Gmbh | Verfahren zur Herstellung von Solarzellen mit durch eine Ätzlösung lokal strukturierten Oberflächen |
| DE102006051735A1 (de) | 2006-10-30 | 2008-05-08 | Merck Patent Gmbh | Druckfähiges Medium zur Ätzung von oxidischen, transparenten, leitfähigen Schichten |
| DE102006051952A1 (de) * | 2006-11-01 | 2008-05-08 | Merck Patent Gmbh | Partikelhaltige Ätzpasten für Siliziumoberflächen und -schichten |
| US8608972B2 (en) * | 2006-12-05 | 2013-12-17 | Nano Terra Inc. | Method for patterning a surface |
| EP2095187A2 (en) * | 2006-12-05 | 2009-09-02 | Nano Terra Inc. | Method for patterning a surface |
| JP2008186927A (ja) * | 2007-01-29 | 2008-08-14 | Sharp Corp | 裏面接合型太陽電池とその製造方法 |
| JP5226255B2 (ja) * | 2007-07-13 | 2013-07-03 | シャープ株式会社 | 太陽電池の製造方法 |
| EP2207756B1 (en) * | 2007-09-24 | 2017-12-06 | Dip Tech. Ltd. | Liquid etching composition and etching method for drop on demand inkjet printing |
| JP4947654B2 (ja) * | 2007-09-28 | 2012-06-06 | シャープ株式会社 | 誘電体膜のパターニング方法 |
| US20090092745A1 (en) * | 2007-10-05 | 2009-04-09 | Luca Pavani | Dopant material for manufacturing solar cells |
| TW200939509A (en) * | 2007-11-19 | 2009-09-16 | Applied Materials Inc | Crystalline solar cell metallization methods |
| TW200939510A (en) * | 2007-11-19 | 2009-09-16 | Applied Materials Inc | Solar cell contact formation process using a patterned etchant material |
| EP2224471A4 (en) * | 2007-12-20 | 2013-01-09 | Teoss Co Ltd | A THICKNESSED COATED COATING LIQUID AND METHOD FOR SELECTIVELY HEATING A SUNLIGHT POWER GENERATION ELEMENT SUBSTRATE FOR A SOLAR CELL USING THE THICKNESSED COATING LIQUID |
| CN101990705A (zh) * | 2008-02-01 | 2011-03-23 | 新南部创新有限公司 | 用于对选定材料进行图案蚀刻的方法 |
| EP2291549A2 (en) | 2008-03-26 | 2011-03-09 | Merck Patent GmbH | Composition for manufacturing sio2 resist layers and method of its use |
| WO2010022849A2 (de) * | 2008-09-01 | 2010-03-04 | Merck Patent Gmbh | Randentschichtung von dünnschicht-solar-modulen mittels ätzen |
| GB0820126D0 (en) * | 2008-11-04 | 2008-12-10 | Conductive Inkjet Technology Ltd | Inkjet ink |
| KR101000556B1 (ko) | 2008-12-23 | 2010-12-14 | 주식회사 효성 | 태양전지 및 그 제조방법 |
| KR20120036939A (ko) * | 2009-06-04 | 2012-04-18 | 메르크 파텐트 게엠베하 | 2성분 에칭 |
| WO2011050889A2 (de) * | 2009-10-30 | 2011-05-05 | Merck Patent Gmbh | Verfahren zur herstellung von solarzellen mit selektivem emitter |
| CN102088042A (zh) * | 2009-12-02 | 2011-06-08 | 上海交大泰阳绿色能源有限公司 | 一种高效率晶体硅太阳能电池用浆料的制备方法和浆料 |
| US8524524B2 (en) * | 2010-04-22 | 2013-09-03 | General Electric Company | Methods for forming back contact electrodes for cadmium telluride photovoltaic cells |
| JP2013534944A (ja) * | 2010-06-14 | 2013-09-09 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 高分解能な特徴のパターン形成のための架橋および多相エッチングペースト |
| KR101729065B1 (ko) * | 2010-08-06 | 2017-04-21 | 스미토모 베이클리트 컴퍼니 리미티드 | 입체특이적 폴리시클릭 2,3-디올 단량체로부터 유래된 반복단위를 갖는 폴리카보네이트를 포함하는 희생 중합체 조성물 |
| US8393707B2 (en) | 2010-08-24 | 2013-03-12 | Sunpower Corporation | Apparatuses and methods for removal of ink buildup |
| WO2012077568A1 (ja) | 2010-12-06 | 2012-06-14 | 信越化学工業株式会社 | 太陽電池及び太陽電池モジュール |
| RU2571444C2 (ru) | 2010-12-06 | 2015-12-20 | Син-Эцу Кемикал Ко., Лтд. | Солнечный элемент и модуль солнечного элемента |
| WO2012083082A1 (en) | 2010-12-15 | 2012-06-21 | Sun Chemical Corporation | Printable etchant compositions for etching silver nanoware-based transparent, conductive film |
| KR20120067198A (ko) * | 2010-12-15 | 2012-06-25 | 제일모직주식회사 | 에칭 페이스트, 그 제조방법 및 이를 이용한 패턴 형성방법 |
| JP2011124603A (ja) * | 2011-02-09 | 2011-06-23 | Sharp Corp | 裏面接合型太陽電池の製造方法 |
| CN102775071A (zh) * | 2011-05-09 | 2012-11-14 | 代芳 | 一种表面粗化的玻璃纤维制造技术 |
| EP2735216A1 (de) * | 2011-07-18 | 2014-05-28 | Merck Patent GmbH | Strukturierung von antistatischen und antireflektionsbeschichtungen und von entsprechenden stapelschichten |
| CN102955596B (zh) * | 2011-08-20 | 2016-04-06 | 宸鸿科技(厦门)有限公司 | 保护层处理方法及其装置 |
| WO2013169884A1 (en) | 2012-05-10 | 2013-11-14 | Corning Incorporated | Glass etching media and methods |
| CN102800380A (zh) * | 2012-08-21 | 2012-11-28 | 海南汉能光伏有限公司 | 浆料及其制备方法、太阳能电池边缘膜层的去除方法 |
| JP5888202B2 (ja) * | 2012-10-16 | 2016-03-16 | 日立化成株式会社 | 液状組成物 |
| US9550940B2 (en) * | 2012-10-16 | 2017-01-24 | Hitachi Chemical Company, Ltd. | Etching material |
| US10040718B2 (en) * | 2012-11-02 | 2018-08-07 | Corning Incorporated | Methods to texture opaque, colored and translucent materials |
| KR20140086669A (ko) * | 2012-12-28 | 2014-07-08 | 동우 화인켐 주식회사 | 금속 산화물막의 식각액 조성물 |
| KR101536001B1 (ko) * | 2014-04-30 | 2015-07-13 | 주식회사 지앤티 | 반투명 또는 불투명 유리 제조방법 |
| CN104150782A (zh) * | 2014-07-18 | 2014-11-19 | 张家港市德力特新材料有限公司 | 一种显示屏用玻璃的制备方法 |
| TWI546371B (zh) * | 2014-11-10 | 2016-08-21 | 盟智科技股份有限公司 | 研磨組成物 |
| JP2016086187A (ja) * | 2016-02-01 | 2016-05-19 | 日立化成株式会社 | SiN膜の除去方法 |
| CN106242307A (zh) | 2016-08-11 | 2016-12-21 | 京东方科技集团股份有限公司 | 用于强化制品的边缘的方法、玻璃及显示装置 |
| CN106630658B (zh) * | 2016-12-31 | 2018-11-20 | 江苏来德福汽车部件有限公司 | 液晶显示屏玻璃基板薄化工艺预处理组合物 |
| CN106587649B (zh) * | 2016-12-31 | 2019-03-22 | 深圳迈辽技术转移中心有限公司 | Tft玻璃基板薄化工艺预处理剂 |
| US10632783B1 (en) | 2017-04-25 | 2020-04-28 | Ysidro C. Chacon | Method for adhering embellishments to a glass substrate |
| US11186771B2 (en) * | 2017-06-05 | 2021-11-30 | Versum Materials Us, Llc | Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device |
| US10870799B2 (en) * | 2017-08-25 | 2020-12-22 | Versum Materials Us, Llc | Etching solution for selectively removing tantalum nitride over titanium nitride during manufacture of a semiconductor device |
| US11142830B2 (en) * | 2019-02-08 | 2021-10-12 | The Boeing Company | Method of surface micro-texturing with a subtractive agent |
| US11136673B2 (en) | 2019-02-08 | 2021-10-05 | The Boeing Company | Method of surface micro-texturing with a subtractive agent |
| CN114620939B (zh) * | 2020-12-09 | 2023-03-14 | Oppo广东移动通信有限公司 | 壳体组件及其制备方法和电子设备 |
| CN116040949B (zh) * | 2021-10-28 | 2024-06-18 | 比亚迪股份有限公司 | 一种玻璃刻蚀液、具有螺母图案的玻璃及其生产方法 |
| CN116040952B (zh) * | 2021-10-28 | 2024-06-18 | 比亚迪股份有限公司 | 玻璃刻蚀液、具有晶耀图案的玻璃及其生产方法 |
| CN115124249B (zh) * | 2022-01-20 | 2024-01-23 | 佛山犀马精细化工有限公司 | 一种玻璃基材萤石状抗指纹印及闪光效果蚀刻成型工艺 |
| KR20250120983A (ko) * | 2022-12-13 | 2025-08-11 | 주식회사 다이셀 | 표면 처리제, 및 에칭된 실리콘 기판의 제조 방법 |
| CN115881969B (zh) * | 2023-02-07 | 2023-05-16 | 四川大学 | 一种硼氮掺杂多孔碳基负极活性材料及其制备方法与应用 |
| CN116948648A (zh) * | 2023-06-30 | 2023-10-27 | 浙江奥首材料科技有限公司 | 一种半导体芯片二氧化硅蚀刻液、制备方法及其应用 |
| CN119708974B (zh) * | 2024-10-21 | 2025-10-31 | 清远市美佳乐环保新材股份有限公司 | 一种皮革用水性处理剂、制备方法及应用 |
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2001
- 2001-03-23 US US10/258,747 patent/US20030160026A1/en not_active Abandoned
- 2001-03-23 JP JP2001580827A patent/JP2003531807A/ja active Pending
- 2001-03-23 RU RU2002130248/03A patent/RU2274615C2/ru not_active IP Right Cessation
- 2001-03-23 CN CNB018087086A patent/CN100343189C/zh not_active Expired - Fee Related
- 2001-03-23 AU AU2001242510A patent/AU2001242510B2/en not_active Ceased
- 2001-03-23 MX MXPA02010634A patent/MXPA02010634A/es active IP Right Grant
- 2001-03-23 EP EP01915409A patent/EP1276701B1/de not_active Expired - Lifetime
- 2001-03-23 PL PL358687A patent/PL207872B1/pl unknown
- 2001-03-23 KR KR1020027014508A patent/KR100812891B1/ko not_active Expired - Fee Related
- 2001-03-23 WO PCT/EP2001/003317 patent/WO2001083391A1/de not_active Ceased
- 2001-03-23 IL IL15249701A patent/IL152497A0/xx unknown
- 2001-03-23 CA CA2407530A patent/CA2407530C/en not_active Expired - Fee Related
- 2001-03-23 AU AU4251001A patent/AU4251001A/xx active Pending
- 2001-04-20 TW TW090109529A patent/TWI243801B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003531807A (ja) | 2003-10-28 |
| US20030160026A1 (en) | 2003-08-28 |
| CN100343189C (zh) | 2007-10-17 |
| AU4251001A (en) | 2001-11-12 |
| TWI243801B (en) | 2005-11-21 |
| WO2001083391A1 (de) | 2001-11-08 |
| AU2001242510B2 (en) | 2006-02-23 |
| HK1053295A1 (en) | 2003-10-17 |
| CA2407530A1 (en) | 2002-10-25 |
| RU2002130248A (ru) | 2004-03-20 |
| PL207872B1 (pl) | 2011-02-28 |
| KR20030004377A (ko) | 2003-01-14 |
| RU2274615C2 (ru) | 2006-04-20 |
| CA2407530C (en) | 2010-05-11 |
| IL152497A0 (en) | 2003-05-29 |
| CN1426381A (zh) | 2003-06-25 |
| EP1276701A1 (de) | 2003-01-22 |
| MXPA02010634A (es) | 2003-03-10 |
| EP1276701B1 (de) | 2012-12-05 |
| KR100812891B1 (ko) | 2008-03-11 |
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