PL3818414T3 - Podparcie jednostki optycznej - Google Patents

Podparcie jednostki optycznej

Info

Publication number
PL3818414T3
PL3818414T3 PL19734740.4T PL19734740T PL3818414T3 PL 3818414 T3 PL3818414 T3 PL 3818414T3 PL 19734740 T PL19734740 T PL 19734740T PL 3818414 T3 PL3818414 T3 PL 3818414T3
Authority
PL
Poland
Prior art keywords
support
optical unit
optical
unit
Prior art date
Application number
PL19734740.4T
Other languages
English (en)
Inventor
Martin Vogt
Joachim Hartjes
Original Assignee
Carl Zeiss Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Gmbh filed Critical Carl Zeiss Smt Gmbh
Publication of PL3818414T3 publication Critical patent/PL3818414T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/183—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors specially adapted for very large mirrors, e.g. for astronomy, or solar concentrators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Astronomy & Astrophysics (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
PL19734740.4T 2018-07-04 2019-06-25 Podparcie jednostki optycznej PL3818414T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102018210996.6A DE102018210996A1 (de) 2018-07-04 2018-07-04 Abstützung einer optischen einheit
PCT/EP2019/066818 WO2020007649A1 (de) 2018-07-04 2019-06-25 Abstützung einer optischen einheit

Publications (1)

Publication Number Publication Date
PL3818414T3 true PL3818414T3 (pl) 2022-12-19

Family

ID=67137924

Family Applications (1)

Application Number Title Priority Date Filing Date
PL19734740.4T PL3818414T3 (pl) 2018-07-04 2019-06-25 Podparcie jednostki optycznej

Country Status (8)

Country Link
US (1) US11307503B2 (pl)
EP (1) EP3818414B1 (pl)
KR (1) KR102839387B1 (pl)
CN (1) CN112384862B (pl)
DE (1) DE102018210996A1 (pl)
ES (1) ES2927815T3 (pl)
PL (1) PL3818414T3 (pl)
WO (1) WO2020007649A1 (pl)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5815246A (en) * 1996-12-24 1998-09-29 U.S. Philips Corporation Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device
DE69817750T2 (de) * 1997-07-22 2004-07-01 Asml Netherlands B.V. Stützvorrichtung mit gaslager
EP1143492A4 (en) * 1998-09-03 2004-06-02 Nikon Corp EXPOSURE APPARATUS AND METHOD, DEVICE AND METHOD FOR PRODUCING SAID APPARATUS
WO2006038952A2 (en) * 2004-09-30 2006-04-13 Nikon Corporation Projection optical device and exposure apparatus
US7936443B2 (en) * 2006-05-09 2011-05-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20080038050A (ko) * 2006-10-27 2008-05-02 캐논 가부시끼가이샤 광학 요소 유지장치 및 노광 장치
WO2008122313A1 (en) * 2007-04-05 2008-10-16 Carl Zeiss Smt Ag Optical element module with imaging error and position correction
US20090033895A1 (en) * 2007-07-30 2009-02-05 Nikon Corporation Lithography apparatus with flexibly supported optical system
JP5188135B2 (ja) * 2007-10-05 2013-04-24 キヤノン株式会社 露光装置及びデバイス製造方法
US7927976B2 (en) * 2008-07-23 2011-04-19 Semprius, Inc. Reinforced composite stamp for dry transfer printing of semiconductor elements
EP2739935B1 (de) 2011-08-03 2015-10-21 Carl Zeiss Industrielle Messtechnik GmbH Koordinatenmessgerät zur vermessung eines werkstückes
WO2013178277A1 (en) * 2012-05-31 2013-12-05 Carl Zeiss Smt Gmbh Optical imaging arrangement with multiple metrology support units
DE102013211310A1 (de) * 2013-06-17 2014-12-18 Carl Zeiss Smt Gmbh EUV-Abbildungsvorrichtung
DE102014103299B4 (de) * 2014-03-12 2021-07-22 Spektra Schwingungstechnik Und Akustik Gmbh Dresden Schwingungserreger mit Lastkompensation
DE102015220817A1 (de) * 2015-10-26 2015-12-24 Carl Zeiss Smt Gmbh Messvorrichtung mit Luftlager

Also Published As

Publication number Publication date
KR20210027430A (ko) 2021-03-10
US11307503B2 (en) 2022-04-19
CN112384862B (zh) 2024-08-20
US20210116823A1 (en) 2021-04-22
DE102018210996A1 (de) 2020-01-09
CN112384862A (zh) 2021-02-19
EP3818414B1 (de) 2022-08-31
WO2020007649A1 (de) 2020-01-09
KR102839387B1 (ko) 2025-07-29
ES2927815T3 (es) 2022-11-11
EP3818414A1 (de) 2021-05-12

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