PL3924793T3 - System sterowania, system optyczny i sposób - Google Patents

System sterowania, system optyczny i sposób

Info

Publication number
PL3924793T3
PL3924793T3 PL20705024.6T PL20705024T PL3924793T3 PL 3924793 T3 PL3924793 T3 PL 3924793T3 PL 20705024 T PL20705024 T PL 20705024T PL 3924793 T3 PL3924793 T3 PL 3924793T3
Authority
PL
Poland
Prior art keywords
open
loop control
control system
optical system
optical
Prior art date
Application number
PL20705024.6T
Other languages
English (en)
Inventor
Malte Hoffmann
Gunther Schulz
Original Assignee
Carl Zeiss Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Gmbh filed Critical Carl Zeiss Smt Gmbh
Publication of PL3924793T3 publication Critical patent/PL3924793T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0208—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the configuration of the monitoring system
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2223/00—Indexing scheme associated with group G05B23/00
    • G05B2223/06—Remote monitoring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Communication System (AREA)
  • Selective Calling Equipment (AREA)
  • Steering Control In Accordance With Driving Conditions (AREA)
  • Testing And Monitoring For Control Systems (AREA)
PL20705024.6T 2019-02-12 2020-02-10 System sterowania, system optyczny i sposób PL3924793T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102019201810.6A DE102019201810A1 (de) 2019-02-12 2019-02-12 Steuerungssystem, optisches system und verfahren
PCT/EP2020/053324 WO2020165091A1 (de) 2019-02-12 2020-02-10 Steuerungssystem, optisches system und verfahren

Publications (1)

Publication Number Publication Date
PL3924793T3 true PL3924793T3 (pl) 2023-05-22

Family

ID=69571977

Family Applications (1)

Application Number Title Priority Date Filing Date
PL20705024.6T PL3924793T3 (pl) 2019-02-12 2020-02-10 System sterowania, system optyczny i sposób

Country Status (8)

Country Link
US (1) US11630395B2 (pl)
EP (1) EP3924793B1 (pl)
KR (1) KR102877967B1 (pl)
CN (1) CN113474738A (pl)
DE (1) DE102019201810A1 (pl)
ES (1) ES2940510T3 (pl)
PL (1) PL3924793T3 (pl)
WO (1) WO2020165091A1 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021213612A1 (de) * 2021-12-01 2023-06-01 Carl Zeiss Smt Gmbh Optisches system, testgerät, lithographieanlage, anordnung und verfahren
DE102021213610A1 (de) * 2021-12-01 2023-06-01 Carl Zeiss Smt Gmbh Verfahren, optisches system, testgerät und anordnung

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6019945B2 (ja) * 1982-12-25 1985-05-18 大倉工業株式会社 二液型接着剤組成物
JP4006251B2 (ja) * 2002-03-20 2007-11-14 キヤノン株式会社 ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法
DE102004011457B4 (de) * 2004-03-09 2020-03-05 Siemens Aktiengesellschaft Aktor und Verfahren zum Betreiben eines Aktors
JP2007034742A (ja) * 2005-07-27 2007-02-08 Sumitomo Heavy Ind Ltd 故障低減装置、故障低減方法、及び故障低減プログラム
DE102006011807A1 (de) * 2006-03-15 2007-09-20 Zf Friedrichshafen Ag Verfahren zur Fehlererkennung an einem Aktuator
US7576832B2 (en) * 2006-05-04 2009-08-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5194030B2 (ja) * 2007-02-06 2013-05-08 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
US7782446B2 (en) * 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
US8332071B2 (en) * 2007-08-20 2012-12-11 David Zeltzer System and method enabling sensorless actuator
JP4528338B2 (ja) * 2008-03-04 2010-08-18 キヤノン株式会社 制振装置、露光装置及びデバイス製造方法
DE102008049616B4 (de) * 2008-09-30 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen
EP2202426A3 (en) * 2008-12-23 2017-05-03 ASML Netherlands B.V. A method for damping an object, an active damping system, and a lithographic apparatus
US8345150B2 (en) * 2009-07-27 2013-01-01 Panasonic Corporation Imaging apparatus
WO2012081197A1 (ja) * 2010-12-17 2012-06-21 パナソニック株式会社 弾性体アクチュエータ駆動機構の制御装置及び制御方法、並びに、制御プログラム
JP6019945B2 (ja) * 2012-08-31 2016-11-02 ブラザー工業株式会社 制御装置及び画像形成システム
CN102880063B (zh) * 2012-09-13 2016-01-20 中国人民解放军63921部队 同步控制遥操作系统及方法
DE102013018923B4 (de) * 2013-11-13 2017-05-11 Audi Ag Verfahren zum Kontrollieren eines Aktors
CN103868859B (zh) * 2014-03-04 2015-12-30 中国空间技术研究院 一种基于ccd成像的电弧金属蒸汽浓度测量系统
DE102015205370B4 (de) * 2015-03-25 2026-04-16 Robert Bosch Gmbh Verfahren und Vorrichtung zur Bereitstellung von Daten für eine Zustandsüberwachung einer Maschine
JP6679218B2 (ja) * 2015-05-08 2020-04-15 キヤノン株式会社 光学機器およびアクチュエータ処理プログラム
DE102015008754B4 (de) * 2015-07-06 2018-07-05 Liebherr-Aerospace Lindenberg Gmbh Zustandsüberwachung eines Stellantriebs in einem Fluggerät
JP2017027118A (ja) * 2015-07-16 2017-02-02 東レエンジニアリング株式会社 製造設備管理システム
FR3051263B1 (fr) * 2016-05-10 2018-04-20 Safran Aircraft Engines Procede de commande d'un actionneur et dispositif de commande associe
DE102016213025A1 (de) * 2016-07-18 2016-09-08 Carl Zeiss Smt Gmbh Steuerung für Mikrospiegelanordnungen in Lithographiesystemen
KR102408426B1 (ko) * 2016-10-12 2022-06-10 삼성에스디에스 주식회사 설비 노화 지수를 이용한 이상 감지 방법 및 장치
WO2018225117A1 (ja) * 2017-06-05 2018-12-13 ギガフォトン株式会社 レーザ装置、及びｅｕｖ光生成システム
JP7222344B2 (ja) * 2019-12-06 2023-02-15 横河電機株式会社 判定装置、判定方法、判定プログラム、学習装置、学習方法、および、学習プログラム
JP7367622B2 (ja) * 2020-06-17 2023-10-24 横河電機株式会社 データ管理システム、データ管理方法、および、データ管理プログラム

Also Published As

Publication number Publication date
CN113474738A (zh) 2021-10-01
KR102877967B1 (ko) 2025-10-30
WO2020165091A1 (de) 2020-08-20
US11630395B2 (en) 2023-04-18
ES2940510T3 (es) 2023-05-08
EP3924793A1 (de) 2021-12-22
EP3924793B1 (de) 2023-01-25
DE102019201810A1 (de) 2020-08-13
US20210364926A1 (en) 2021-11-25
KR20210125518A (ko) 2021-10-18

Similar Documents

Publication Publication Date Title
ZA202109247B (en) Smart irrigation control system, and control method therefor
EP3748881A4 (en) OPTICAL TRANSMISSION DEVICE, TRANSMISSION SYSTEM, AND TRANSMISSION SYSTEM CONTROL PROCEDURE
EP3919832A4 (en) ENVIRONMENT CONTROL SYSTEM AND ENVIRONMENT CONTROL METHOD
EP3767458A4 (en) CONTROL SYSTEM, CONTROL ORGAN AND CONTROL METHOD
EP3897076A4 (en) ENVIRONMENT CONTROL SYSTEM AND PROCEDURES
GB2587878B (en) Method and system for aftertreatment control
GB201909028D0 (en) Structural arrangement, climate control system and method
EP3992734A4 (en) CONTROL SYSTEM, CONTROL DEVICE AND MANAGEMENT PROCEDURES
EP3860279A4 (en) COMMUNICATION DEVICE, CONTROL DEVICE AND COMMUNICATION SYSTEM
EP4003673A4 (en) SYSTEMS AND PROCEDURES FOR SAFETY-READY CONTROL
EP4002053A4 (en) CONTROL SYSTEM, CONTROL DEVICE AND CONTROL METHOD
EP3889930A4 (en) CONTROL SYSTEM, PROGRAM AND CONTROL METHOD
EP3929860A4 (en) LIGHTING CONTROL DEVICE, METHOD AND SYSTEM, AND COMPUTER READABLE MEDIA
GB202208397D0 (en) Irrigation controller, system and method
GB2586803B (en) Control system and method
EP4024385A4 (en) PROJECTION SYSTEM, PROJECTION SYSTEM CONTROL DEVICE, PROJECTION METHOD AND PROGRAM
GB202207377D0 (en) Access control system and method
GB201917328D0 (en) Access control system and method
EP3579359A4 (en) FIBER LASER PROCESS AND SYSTEM AND ITS CONTROL PROCESS
EP3816792A4 (en) CONTROL SYSTEM, METHOD OF CONTROLLING A CONTROL SYSTEM AND PROGRAM FOR CONTROL SYSTEM
GB2584315B (en) Control system and method
GB201907293D0 (en) Control system and method
EP3691057A4 (en) FIBER LASER SYSTEM AND CONTROL PROCEDURE FOR IT
EP3843330A4 (en) PROCESS FOR ADJUSTING A CONTROL FUNCTION, CONTROL DEVICE AND CONTROL SYSTEM
EP4075081A4 (en) CONTROL METHOD AND CONTROL SYSTEM