SE386210B - Medtod att markera ett substrat - Google Patents

Medtod att markera ett substrat

Info

Publication number
SE386210B
SE386210B SE7300820A SE7300820A SE386210B SE 386210 B SE386210 B SE 386210B SE 7300820 A SE7300820 A SE 7300820A SE 7300820 A SE7300820 A SE 7300820A SE 386210 B SE386210 B SE 386210B
Authority
SE
Sweden
Prior art keywords
substrate
marking
included marking
Prior art date
Application number
SE7300820A
Other languages
English (en)
Swedish (sv)
Inventor
L C Scala
D F Ciliberti
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of SE386210B publication Critical patent/SE386210B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
SE7300820A 1972-01-21 1973-01-19 Medtod att markera ett substrat SE386210B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21988172A 1972-01-21 1972-01-21

Publications (1)

Publication Number Publication Date
SE386210B true SE386210B (sv) 1976-08-02

Family

ID=22821140

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7300820A SE386210B (sv) 1972-01-21 1973-01-19 Medtod att markera ett substrat

Country Status (8)

Country Link
US (1) US3794510A (it)
JP (1) JPS5129017B2 (it)
BE (1) BE794343A (it)
DE (1) DE2302667C3 (it)
FR (1) FR2168593A1 (it)
GB (1) GB1417726A (it)
IT (1) IT978291B (it)
SE (1) SE386210B (it)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3950569A (en) * 1972-05-05 1976-04-13 W. R. Grace & Co. Method for preparing coatings with solid curable compositions containing styrene-allyl alcohol copolymer based polythiols
US4012536A (en) * 1972-12-14 1977-03-15 Rca Corporation Electron beam recording medium comprising 1-methylvinyl methyl ketone
US4018937A (en) * 1972-12-14 1977-04-19 Rca Corporation Electron beam recording comprising polymer of 1-methylvinyl methyl ketone
US4061799A (en) * 1973-11-05 1977-12-06 Texas Instruments Incorporated Method of patterning styrene diene block copolymer electron beam resists
US3916035A (en) * 1973-11-05 1975-10-28 Texas Instruments Inc Epoxy-polymer electron beam resists
DE2545047C3 (de) * 1975-10-08 1978-09-21 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur Herstellung eines Halbleiterfestwertspeichers
JPS5315153A (en) * 1976-07-27 1978-02-10 Canon Inc Hologram
CS193322B1 (en) * 1977-11-07 1979-10-31 Jaroslav Kalal Electron resisit
JPS5511217A (en) * 1978-07-10 1980-01-26 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method using radiation sensitive high polymer
EP0048291B1 (de) * 1980-09-19 1985-07-03 Ibm Deutschland Gmbh Struktur mit einem eine durchgehende Öffnung aufweisenden Siliciumkörper und Verfahren zu ihrer Herstellung
US4892617A (en) * 1984-08-22 1990-01-09 American Telephone & Telegraph Company, At&T Bell Laboratories Processes involving lithographic materials
JPH0234984A (ja) * 1988-04-13 1990-02-05 Mitsubishi Electric Corp プリント回路基板の製造方法

Also Published As

Publication number Publication date
DE2302667C3 (de) 1982-01-07
FR2168593A1 (it) 1973-08-31
DE2302667B2 (de) 1981-01-22
JPS4883828A (it) 1973-11-08
IT978291B (it) 1974-09-20
GB1417726A (en) 1975-12-17
JPS5129017B2 (it) 1976-08-23
BE794343A (fr) 1973-07-19
DE2302667A1 (de) 1973-07-26
US3794510A (en) 1974-02-26

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