SE437585B - Elektronstraleapparat med en elektronkella som innefattar en katod med en metalltrad - Google Patents

Elektronstraleapparat med en elektronkella som innefattar en katod med en metalltrad

Info

Publication number
SE437585B
SE437585B SE8006463A SE8006463A SE437585B SE 437585 B SE437585 B SE 437585B SE 8006463 A SE8006463 A SE 8006463A SE 8006463 A SE8006463 A SE 8006463A SE 437585 B SE437585 B SE 437585B
Authority
SE
Sweden
Prior art keywords
wire
electron beam
electron
metal wire
beam apparatus
Prior art date
Application number
SE8006463A
Other languages
English (en)
Swedish (sv)
Other versions
SE8006463L (sv
Inventor
H J Frima
Poole J B Le
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of SE8006463L publication Critical patent/SE8006463L/
Publication of SE437585B publication Critical patent/SE437585B/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Lasers (AREA)
SE8006463A 1979-09-19 1980-09-16 Elektronstraleapparat med en elektronkella som innefattar en katod med en metalltrad SE437585B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7906958A NL7906958A (nl) 1979-09-19 1979-09-19 Metaaldraadkathode voor elektronenstraalapparaat.

Publications (2)

Publication Number Publication Date
SE8006463L SE8006463L (sv) 1981-03-20
SE437585B true SE437585B (sv) 1985-03-04

Family

ID=19833868

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8006463A SE437585B (sv) 1979-09-19 1980-09-16 Elektronstraleapparat med en elektronkella som innefattar en katod med en metalltrad

Country Status (11)

Country Link
US (1) US4419561A (it)
JP (1) JPS5652856A (it)
BR (1) BR8008838A (it)
CA (1) CA1151320A (it)
DE (1) DE3034598C2 (it)
FR (1) FR2466096A1 (it)
GB (1) GB2059149B (it)
IT (1) IT1141056B (it)
NL (1) NL7906958A (it)
SE (1) SE437585B (it)
WO (1) WO1981000929A1 (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8302275A (nl) * 1983-06-28 1985-01-16 Philips Nv Electronenstraalapparaat met metaaldraadbron.
CN86105432A (zh) * 1985-09-27 1987-05-27 美国电话电报公司 带电粒子束曝光

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL74193C (it) * 1948-05-10
US3466487A (en) * 1967-06-16 1969-09-09 United Aircraft Corp Device for moving a beam of charged particles
NL7018701A (it) * 1970-12-23 1972-06-27
JPS4929969A (it) * 1972-07-20 1974-03-16
JPS5357760A (en) * 1976-11-04 1978-05-25 Fujitsu Ltd Electron beam exposure apparatus
JPS5412675A (en) * 1977-06-30 1979-01-30 Jeol Ltd Electon beam exposure method

Also Published As

Publication number Publication date
WO1981000929A1 (en) 1981-04-02
SE8006463L (sv) 1981-03-20
GB2059149B (en) 1984-01-18
JPS6329782B2 (it) 1988-06-15
GB2059149A (en) 1981-04-15
DE3034598C2 (de) 1985-05-15
FR2466096B1 (it) 1984-12-14
JPS5652856A (en) 1981-05-12
NL7906958A (nl) 1981-03-23
FR2466096A1 (fr) 1981-03-27
DE3034598A1 (de) 1981-04-09
CA1151320A (en) 1983-08-02
US4419561A (en) 1983-12-06
IT8024696A0 (it) 1980-09-16
BR8008838A (pt) 1981-06-30
IT1141056B (it) 1986-10-01

Similar Documents

Publication Publication Date Title
JP3730666B2 (ja) 大電流リボンビーム注入装置
JP2878112B2 (ja) 小型の高電流幅広ビームのイオン注入装置
EP1618587B1 (en) Beam uniformity and angular distribution measurement system
WO1998002900A9 (en) High current ribbon beam ion implanter
US8455848B2 (en) Ion beam incident angle detection assembly and method
US5193105A (en) Ion controlling electrode assembly for a scanning electron beam computed tomography scanner
GB2339493A (en) Blanking aperture array (BAA) for electron beam lithography comprising second mask with a similar aperture pattern to BAA
KR101636647B1 (ko) Rfq 가속기의 주파수 튜닝 방법
JPH0568058B2 (it)
US3450824A (en) Method and apparatus for producing and directing an electron beam
JP5415083B2 (ja) イオン注入システムのための多様な角度のスロットアレーを用いたイオンビームの角度測定システムおよび方法
CN101322216B (zh) 在离子植入机中提供成段的静电透镜的技术
JP2009516335A (ja) イオン注入装置のセグメント化された電界レンズを提供する技術
TWI490909B (zh) 離子植入系統中所使用的電極用終端
JP2665819B2 (ja) イオン注入装置
KR20010080286A (ko) 열전계 방출 정렬 방법 및 장치
Keller Beam scanning-electrostatic
US10102999B2 (en) Asymmetric core quadrupole with concave pole tips
US4419561A (en) Metal wire cathode for electron beam apparatus
TW202201458A (zh) 聚焦離子束加工裝置
US8558198B2 (en) Beam line system of ion implanter
JPS5856947B2 (ja) 電子ビ−ムの軸合せ装置
JPH02144835A (ja) Ｘ線管の陰極構体
JPS62272434A (ja) イオン注入装置用質量分析装置
KR20060066792A (ko) 이온주입기에 있어서 이온빔 균일성 조절장치 및 방법

Legal Events

Date Code Title Description
NUG Patent has lapsed

Ref document number: 8006463-7

Effective date: 19891006

Format of ref document f/p: F