SE522722C2 - Skärverktyg belagt med titandiborid - Google Patents

Skärverktyg belagt med titandiborid

Info

Publication number: SE522722C2
Authority: SE; Sweden
Prior art keywords: tib2; layer; hkl; layers; substrate
Prior art date: 2001-03-28

Application number

SE0101111A

Other languages

English (en)

Swedish (sv)

Other versions

SE0101111D0 (sv

SE0101111L (sv

Inventor

Mattias Berger

Lennart Karlsson

Original Assignee

Seco Tools Ab

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-03-28

Filing date

2001-03-28

Publication date

2004-03-02

2001-03-28 Application filed by Seco Tools Ab filed Critical Seco Tools Ab

2001-03-28 Priority to SE0101111A priority Critical patent/SE522722C2/sv

2001-03-28 Publication of SE0101111D0 publication Critical patent/SE0101111D0/xx

2002-03-26 Priority to AT02445042T priority patent/ATE486153T1/de

2002-03-26 Priority to DE60238092T priority patent/DE60238092D1/de

2002-03-26 Priority to EP02445042A priority patent/EP1245693B1/de

2002-03-27 Priority to US10/106,116 priority patent/US6770358B2/en

2002-03-28 Priority to JP2002092667A priority patent/JP4184691B2/ja

2002-09-29 Publication of SE0101111L publication Critical patent/SE0101111L/

2004-03-02 Publication of SE522722C2 publication Critical patent/SE522722C2/sv

2004-05-19 Priority to US10/848,012 priority patent/US6939445B2/en

Links

QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 title claims abstract description 45
229910033181 TiB2 Inorganic materials 0.000 title claims abstract description 45
238000005520 cutting process Methods 0.000 title claims abstract description 14
239000000758 substrate Substances 0.000 claims abstract description 45
238000000576 coating method Methods 0.000 claims abstract description 31
239000011248 coating agent Substances 0.000 claims abstract description 24
238000000034 method Methods 0.000 claims description 13
238000001755 magnetron sputter deposition Methods 0.000 claims description 6
239000000463 material Substances 0.000 claims description 6
239000000919 ceramic Substances 0.000 claims description 4
230000011514 reflex Effects 0.000 claims description 4
229910000997 High-speed steel Inorganic materials 0.000 claims description 3
CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 2
238000004364 calculation method Methods 0.000 claims description 2
150000001875 compounds Chemical class 0.000 claims description 2
238000002447 crystallographic data Methods 0.000 claims description 2
239000000843 powder Substances 0.000 claims description 2
230000035882 stress Effects 0.000 description 26
239000010936 titanium Substances 0.000 description 6
230000015572 biosynthetic process Effects 0.000 description 5
229910052719 titanium Inorganic materials 0.000 description 5
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
229910052751 metal Inorganic materials 0.000 description 4
239000002184 metal Substances 0.000 description 4
229910052726 zirconium Inorganic materials 0.000 description 4
229910052796 boron Inorganic materials 0.000 description 3
229910052804 chromium Inorganic materials 0.000 description 3
239000011651 chromium Substances 0.000 description 3
238000009792 diffusion process Methods 0.000 description 3
229910052735 hafnium Inorganic materials 0.000 description 3
238000010849 ion bombardment Methods 0.000 description 3
238000003754 machining Methods 0.000 description 3
238000003801 milling Methods 0.000 description 3
229910052750 molybdenum Inorganic materials 0.000 description 3
229910052758 niobium Inorganic materials 0.000 description 3
239000010955 niobium Substances 0.000 description 3
230000006911 nucleation Effects 0.000 description 3
238000010899 nucleation Methods 0.000 description 3
229910052715 tantalum Inorganic materials 0.000 description 3
229910052721 tungsten Inorganic materials 0.000 description 3
229910052720 vanadium Inorganic materials 0.000 description 3
229910000838 Al alloy Inorganic materials 0.000 description 2
241000375392 Tana Species 0.000 description 2
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
229910052782 aluminium Inorganic materials 0.000 description 2
229910052786 argon Inorganic materials 0.000 description 2
230000015556 catabolic process Effects 0.000 description 2
239000011195 cermet Substances 0.000 description 2
238000009837 dry grinding Methods 0.000 description 2
230000000694 effects Effects 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
150000001247 metal acetylides Chemical class 0.000 description 2
239000000203 mixture Substances 0.000 description 2
150000004767 nitrides Chemical class 0.000 description 2
238000005240 physical vapour deposition Methods 0.000 description 2
238000004544 sputter deposition Methods 0.000 description 2
230000008646 thermal stress Effects 0.000 description 2
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
241000283707 Capra Species 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
229910009043 WC-Co Inorganic materials 0.000 description 1
238000002441 X-ray diffraction Methods 0.000 description 1
LRTTZMZPZHBOPO-UHFFFAOYSA-N [B].[B].[Hf] Chemical compound [B].[B].[Hf] LRTTZMZPZHBOPO-UHFFFAOYSA-N 0.000 description 1
WRSVIZQEENMKOC-UHFFFAOYSA-N [B].[Co].[Co].[Co] Chemical compound [B].[Co].[Co].[Co] WRSVIZQEENMKOC-UHFFFAOYSA-N 0.000 description 1
239000003513 alkali Substances 0.000 description 1
229910045601 alloy Inorganic materials 0.000 description 1
239000000956 alloy Substances 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
238000004458 analytical method Methods 0.000 description 1
XTDAIYZKROTZLD-UHFFFAOYSA-N boranylidynetantalum Chemical compound [Ta]#B XTDAIYZKROTZLD-UHFFFAOYSA-N 0.000 description 1
239000013078 crystal Substances 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
238000003795 desorption Methods 0.000 description 1
230000001627 detrimental effect Effects 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
239000000835 fiber Substances 0.000 description 1
239000010408 film Substances 0.000 description 1
238000009501 film coating Methods 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
239000010439 graphite Substances 0.000 description 1
VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
239000012535 impurity Substances 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
239000007769 metal material Substances 0.000 description 1
238000005555 metalworking Methods 0.000 description 1
239000011733 molybdenum Substances 0.000 description 1
GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
239000002244 precipitate Substances 0.000 description 1
230000000717 retained effect Effects 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
239000010703 silicon Substances 0.000 description 1
230000003746 surface roughness Effects 0.000 description 1
GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
239000010409 thin film Substances 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/067—Borides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
- Y10T428/24372—Particulate matter
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/252—Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Cutting Tools, Boring Holders, And Turrets (AREA)
Polishing Bodies And Polishing Tools (AREA)

SE0101111A 2001-03-28 2001-03-28 Skärverktyg belagt med titandiborid SE522722C2 (sv)

Priority Applications (7)

Application Number	Priority Date	Filing Date	Title
SE0101111A SE522722C2 (sv)	2001-03-28	2001-03-28	Skärverktyg belagt med titandiborid
AT02445042T ATE486153T1 (de)	2001-03-28	2002-03-26	Beschichteter schneideinsatz
DE60238092T DE60238092D1 (de)	2001-03-28	2002-03-26	Beschichteter Schneideinsatz
EP02445042A EP1245693B1 (de)	2001-03-28	2002-03-26	Beschichteter Schneideinsatz
US10/106,116 US6770358B2 (en)	2001-03-28	2002-03-27	Coated cutting tool
JP2002092667A JP4184691B2 (ja)	2001-03-28	2002-03-28	切削工具インサート
US10/848,012 US6939445B2 (en)	2001-03-28	2004-05-19	Coated cutting tool

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
SE0101111A SE522722C2 (sv)	2001-03-28	2001-03-28	Skärverktyg belagt med titandiborid

Publications (3)

Publication Number	Publication Date
SE0101111D0 SE0101111D0 (sv)	2001-03-28
SE0101111L SE0101111L (sv)	2002-09-29
SE522722C2 true SE522722C2 (sv)	2004-03-02

Family

ID=20283582

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SE0101111A SE522722C2 (sv)	2001-03-28	2001-03-28	Skärverktyg belagt med titandiborid

Country Status (6)

Country	Link
US (2)	US6770358B2 (de)
EP (1)	EP1245693B1 (de)
JP (1)	JP4184691B2 (de)
AT (1)	ATE486153T1 (de)
DE (1)	DE60238092D1 (de)
SE (1)	SE522722C2 (de)

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EP1587676A4 (de) *	2002-11-15	2010-07-21	Univ Utah Res Found	Titanboridintegralbeschichtungen auf titanoberflächen und entsprechende verfahren
US7580813B2 (en) *	2003-06-17	2009-08-25	Microsoft Corporation	Systems and methods for new time series model probabilistic ARMA
JP2006022368A (ja) *	2004-07-07	2006-01-26	Shinko Seiki Co Ltd	表面処理装置および表面処理方法
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US7421380B2 (en) *	2004-12-14	2008-09-02	Microsoft Corporation	Gradient learning for probabilistic ARMA time-series models
US7459105B2 (en) *	2005-05-10	2008-12-02	University Of Utah Research Foundation	Nanostructured titanium monoboride monolithic material and associated methods
US7617010B2 (en) *	2005-12-28	2009-11-10	Microsoft Corporation	Detecting instabilities in time series forecasting
JP2008238281A (ja) *	2007-03-26	2008-10-09	Hitachi Tool Engineering Ltd	被覆工具
EP2209929B1 (de) *	2007-12-06	2013-08-21	Ceratizit Austria GmbH	Beschichtetes werkzeug
US8845867B2 (en) *	2008-12-09	2014-09-30	Tdk Corporation	Method for manufacturing magnetoresistance effect element using simultaneous sputtering of Zn and ZnO
US20100176339A1 (en) *	2009-01-12	2010-07-15	Chandran K S Ravi	Jewelry having titanium boride compounds and methods of making the same
JP5402516B2 (ja) *	2009-10-19	2014-01-29	三菱マテリアル株式会社	硬質被覆層がすぐれた耐チッピング性を発揮する表面被覆切削工具
EP2369031B1 (de) *	2010-03-18	2016-05-04	Oerlikon Trading AG, Trübbach	Beschichtung auf nial2o4 basis in spinellstruktur
JP5488824B2 (ja) *	2010-08-12	2014-05-14	三菱マテリアル株式会社	硬質難削材の高速切削加工で硬質被覆層がすぐれた耐剥離性とすぐれた耐摩耗性を発揮する表面被覆切削工具
JP5553013B2 (ja) *	2010-11-25	2014-07-16	三菱マテリアル株式会社	硬質難削材の高速高送り切削加工で硬質被覆層がすぐれた耐剥離性とすぐれた耐チッピング性を発揮する表面被覆切削工具
CN103339283B (zh) *	2011-02-01	2015-09-09	Osg株式会社	硬质层叠被膜
JP5734318B2 (ja) *	2011-02-01	2015-06-17	オーエスジー株式会社	硬質積層被膜
DE112011104813B4 (de) *	2011-02-01	2017-02-23	Osg Corporation	Hartlaminarbeschichtung
WO2013089254A1 (ja)	2011-12-15	2013-06-20	株式会社神戸製鋼所	多層硬質皮膜およびその製造方法
EP2823919B1 (de) *	2012-02-27	2020-12-09	Sumitomo Electric Hardmetal Corp.	Herstellungsverfahren eines werkzeugs zum schneiden beschichteter oberflächen
JP6213867B2 (ja) *	2013-02-21	2017-10-18	住友電工ハードメタル株式会社	表面被覆切削工具およびその製造方法
DE102013011075A1 (de) *	2013-07-03	2015-01-08	Oerlikon Trading Ag	TiB2 Schichten und ihre Herstellung
WO2016015771A1 (en) *	2014-07-31	2016-02-04	Bic-Violex Sa	Razor blade coating
AT15677U1 (de)	2017-01-31	2018-04-15	Ceratizit Austria Gmbh	Beschichtetes Werkzeug
RU2685820C1 (ru) *	2018-04-18	2019-04-23	Общество с ограниченной ответственностью "Сборные конструкции инструмента, фрезы Москвитина"	Режущий инструмент с износостойким покрытием
CN112805109A (zh) *	2018-10-10	2021-05-14	住友电工硬质合金株式会社	切削工具及其制造方法
EP3865233A4 (de) *	2018-10-10	2022-03-23	Sumitomo Electric Hardmetal Corp.	Schneidwerkzeug und herstellungsverfahren dafür
CN112063983B (zh) *	2020-07-31	2021-11-05	广东工业大学	一种带HfB2涂层的刀具及其制备方法
AT17511U1 (de) *	2020-12-15	2022-06-15	Plansee Se	Titandiborid beschichtetes bauteil aus refraktärmetall
CN115612984B (zh) *	2022-09-09	2024-09-20	中国科学院金属研究所	一种应力和结构梯度的二硼化钛涂层及其制备方法
CN117921043B (zh) *	2024-03-22	2024-06-11	赣州澳克泰工具技术有限公司	一种cvd涂层刀具及其制备方法

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2001
- 2001-03-28 SE SE0101111A patent/SE522722C2/sv not_active IP Right Cessation
2002
- 2002-03-26 EP EP02445042A patent/EP1245693B1/de not_active Expired - Lifetime
- 2002-03-26 AT AT02445042T patent/ATE486153T1/de active
- 2002-03-26 DE DE60238092T patent/DE60238092D1/de not_active Expired - Lifetime
- 2002-03-27 US US10/106,116 patent/US6770358B2/en not_active Expired - Fee Related
- 2002-03-28 JP JP2002092667A patent/JP4184691B2/ja not_active Expired - Fee Related
2004
- 2004-05-19 US US10/848,012 patent/US6939445B2/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
US20040214033A1 (en)	2004-10-28
EP1245693B1 (de)	2010-10-27
JP4184691B2 (ja)	2008-11-19
US20030039867A1 (en)	2003-02-27
ATE486153T1 (de)	2010-11-15
EP1245693A1 (de)	2002-10-02
US6939445B2 (en)	2005-09-06
SE0101111D0 (sv)	2001-03-28
JP2002355704A (ja)	2002-12-10
SE0101111L (sv)	2002-09-29
US6770358B2 (en)	2004-08-03
DE60238092D1 (de)	2010-12-09

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2013-10-29	NUG	Patent has lapsed

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