SE7810324L - I alkalilosning framkallbart negativ litografisk tryckplat - Google Patents
I alkalilosning framkallbart negativ litografisk tryckplatInfo
- Publication number
- SE7810324L SE7810324L SE7810324A SE7810324A SE7810324L SE 7810324 L SE7810324 L SE 7810324L SE 7810324 A SE7810324 A SE 7810324A SE 7810324 A SE7810324 A SE 7810324A SE 7810324 L SE7810324 L SE 7810324L
- Authority
- SE
- Sweden
- Prior art keywords
- lithographic printing
- printing plate
- alkali solution
- negative lithographic
- developable negative
- Prior art date
Links
- 238000007639 printing Methods 0.000 title abstract 2
- 239000003513 alkali Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000003822 epoxy resin Substances 0.000 abstract 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 1
- 229920000647 polyepoxide Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/878,110 US4171974A (en) | 1978-02-15 | 1978-02-15 | Aqueous alkali developable negative working lithographic printing plates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SE7810324L true SE7810324L (sv) | 1979-08-16 |
Family
ID=25371404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE7810324A SE7810324L (sv) | 1978-02-15 | 1978-10-02 | I alkalilosning framkallbart negativ litografisk tryckplat |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4171974A (sv) |
| JP (1) | JPS54117202A (sv) |
| AU (1) | AU521646B2 (sv) |
| DE (1) | DE2903270A1 (sv) |
| FR (1) | FR2417794A1 (sv) |
| GB (1) | GB2006453B (sv) |
| NL (1) | NL7810155A (sv) |
| SE (1) | SE7810324L (sv) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4390615A (en) * | 1979-11-05 | 1983-06-28 | Courtney Robert W | Coating compositions |
| US4447512A (en) * | 1982-01-25 | 1984-05-08 | Polychrome Corporation | Method for making a negative working lithographic printing plate |
| US4483758A (en) * | 1982-01-25 | 1984-11-20 | Polychrome Corporation | Method for making a negative working lithographic printing plate |
| GB8307220D0 (en) * | 1983-03-16 | 1983-04-20 | Ciba Geigy Ag | Production of images |
| IE55632B1 (en) * | 1983-05-09 | 1990-12-05 | Vickers Plc | Improvements in or relating to radiation sensitive plates |
| US4795693A (en) * | 1983-07-13 | 1989-01-03 | American Telephone And Telegraph Company, At&T Technologies, Inc. | Multilayer circuit board fabrication process |
| US4628022A (en) * | 1983-07-13 | 1986-12-09 | At&T Technologies, Inc. | Multilayer circuit board fabrication process and polymer insulator used therein |
| US4511757A (en) * | 1983-07-13 | 1985-04-16 | At&T Technologies, Inc. | Circuit board fabrication leading to increased capacity |
| DE3425328A1 (de) * | 1984-07-10 | 1986-01-16 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| DE3567294D1 (en) * | 1984-12-06 | 1989-02-09 | Hoechst Celanese Corp | Light-sensitive composition |
| DE3528309A1 (de) * | 1985-08-07 | 1987-02-12 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
| DE3644160A1 (de) * | 1986-12-23 | 1988-07-14 | Hoechst Ag | Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht |
| US5070002A (en) * | 1988-09-13 | 1991-12-03 | Amp-Akzo Corporation | Photoimageable permanent resist |
| US5178988A (en) * | 1988-09-13 | 1993-01-12 | Amp-Akzo Corporation | Photoimageable permanent resist |
| DE3903001A1 (de) * | 1989-02-02 | 1990-08-16 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| US5035982A (en) * | 1989-07-14 | 1991-07-30 | Eastman Kodak Company | Aqueous developer composition for developing negative working lithographic printing plate |
| US5820932A (en) | 1995-11-30 | 1998-10-13 | Sun Chemical Corporation | Process for the production of lithographic printing plates |
| JP4585299B2 (ja) * | 2004-12-09 | 2010-11-24 | 東京応化工業株式会社 | リソグラフィー用リンス液及びそれを用いたレジストパターン形成方法 |
| EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| EP2196851A1 (en) | 2008-12-12 | 2010-06-16 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties |
| ATE555904T1 (de) | 2009-08-10 | 2012-05-15 | Eastman Kodak Co | Lithografische druckplattenvorläufer mit betahydroxy-alkylamid-vernetzern |
| EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3230087A (en) * | 1959-02-26 | 1966-01-18 | Azoplate Corp | Light-sensitive polymeric diazonium and azidoacrylamido reproduction materials and process for making plates therefrom |
| US3387976A (en) * | 1964-07-22 | 1968-06-11 | Harris Intertype Corp | Photopolymer and lithographic plates |
| US3679419A (en) * | 1969-05-20 | 1972-07-25 | Azoplate Corp | Light-sensitive diazo condensate containing reproduction material |
| US3652272A (en) * | 1969-10-31 | 1972-03-28 | Lithoplate Inc | Phenoxy photopolymer having no epoxy groups, and article made therefrom |
| US3600290A (en) * | 1970-01-15 | 1971-08-17 | Continental Can Co | Furan-stabilized beta-hydroxy ester coating compositions |
| US3661576A (en) * | 1970-02-09 | 1972-05-09 | Brady Co W H | Photopolymerizable compositions and articles |
| NL7109179A (sv) * | 1970-07-13 | 1972-01-17 | ||
| US3861917A (en) * | 1972-02-22 | 1975-01-21 | Grace W R & Co | Continuous tone lithographic plate and method of making |
| US3876432A (en) * | 1972-09-11 | 1975-04-08 | Sun Chemical Corp | Fatty ester modified epoxy resin photopolymerizable compositions |
| US3997344A (en) * | 1974-07-05 | 1976-12-14 | American Can Company | Dry positive photopolymer imaging process involving heating and application of toner |
| JPS51116893A (en) * | 1975-04-08 | 1976-10-14 | Ube Ind Ltd | Photo-setting compositions |
| GB1512814A (en) * | 1975-08-13 | 1978-06-01 | Ciba Geigy Ag | Epoxide resins |
-
1978
- 1978-02-15 US US05/878,110 patent/US4171974A/en not_active Expired - Lifetime
- 1978-10-02 SE SE7810324A patent/SE7810324L/sv not_active Application Discontinuation
- 1978-10-05 GB GB7839395A patent/GB2006453B/en not_active Expired
- 1978-10-09 NL NL7810155A patent/NL7810155A/xx not_active Application Discontinuation
- 1978-11-22 AU AU41790/78A patent/AU521646B2/en not_active Expired
-
1979
- 1979-01-25 FR FR7901953A patent/FR2417794A1/fr active Granted
- 1979-01-29 DE DE19792903270 patent/DE2903270A1/de not_active Withdrawn
- 1979-02-14 JP JP1595379A patent/JPS54117202A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2417794A1 (fr) | 1979-09-14 |
| FR2417794B1 (sv) | 1983-06-03 |
| US4171974A (en) | 1979-10-23 |
| GB2006453A (en) | 1979-05-02 |
| JPS54117202A (en) | 1979-09-12 |
| AU4179078A (en) | 1979-08-23 |
| GB2006453B (en) | 1982-06-16 |
| AU521646B2 (en) | 1982-04-22 |
| NL7810155A (nl) | 1979-08-17 |
| DE2903270A1 (de) | 1979-08-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| NAV | Patent application has lapsed |
Ref document number: 7810324-9 |