SG136065A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG136065A1
SG136065A1 SG200701781-7A SG2007017817A SG136065A1 SG 136065 A1 SG136065 A1 SG 136065A1 SG 2007017817 A SG2007017817 A SG 2007017817A SG 136065 A1 SG136065 A1 SG 136065A1
Authority
SG
Singapore
Prior art keywords
liquid
substrate
final element
lithographic apparatus
confined
Prior art date
Application number
SG200701781-7A
Other languages
English (en)
Inventor
Erik Roelof Loopstra
Der Pasch Engelbertus Anto Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG136065A1 publication Critical patent/SG136065A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0606—Position monitoring, e.g. misposition detection or presence detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200701781-7A 2006-03-13 2007-03-09 Lithographic apparatus and device manufacturing method SG136065A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/373,529 US7230676B1 (en) 2006-03-13 2006-03-13 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG136065A1 true SG136065A1 (en) 2007-10-29

Family

ID=38120536

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200701781-7A SG136065A1 (en) 2006-03-13 2007-03-09 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US7230676B1 (de)
EP (1) EP1835348A2 (de)
JP (1) JP2007251160A (de)
KR (1) KR100849982B1 (de)
CN (1) CN101038442B (de)
SG (1) SG136065A1 (de)
TW (1) TWI329243B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8625070B2 (en) * 2007-11-15 2014-01-07 Asml Holding N.V. Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing method
US8228482B2 (en) * 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
TWI471891B (zh) * 2009-02-22 2015-02-01 Mapper Lithography Ip Bv 帶電粒子微影機器及基板處理系統
CN102661709B (zh) * 2012-04-23 2014-08-13 清华大学 一种大行程运动台位移测量方法
JP6614880B2 (ja) * 2015-09-10 2019-12-04 キヤノン株式会社 リソグラフィ装置および物品の製造方法
JP6722048B2 (ja) * 2016-06-09 2020-07-15 キヤノン株式会社 ステージ装置およびリニアアクチュエータ
EP3614194A1 (de) * 2018-08-24 2020-02-26 ASML Netherlands B.V. Bestimmung einer pupillenanpassung
US11275312B1 (en) 2020-11-30 2022-03-15 Waymo Llc Systems and methods for verifying photomask cleanliness

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231622A (ja) * 2000-11-29 2002-08-16 Nikon Corp ステージ装置及び露光装置
JP2002280283A (ja) * 2001-03-16 2002-09-27 Canon Inc 基板処理装置
US6785005B2 (en) 2001-09-21 2004-08-31 Nikon Corporation Switching type dual wafer stage
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1510870A1 (de) 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
JP4479911B2 (ja) * 2004-02-18 2010-06-09 株式会社ニコン 駆動方法、露光方法及び露光装置、並びにデバイス製造方法

Also Published As

Publication number Publication date
KR100849982B1 (ko) 2008-08-01
CN101038442B (zh) 2012-09-26
TWI329243B (en) 2010-08-21
JP2007251160A (ja) 2007-09-27
US7230676B1 (en) 2007-06-12
TW200739287A (en) 2007-10-16
KR20070093355A (ko) 2007-09-18
EP1835348A2 (de) 2007-09-19
CN101038442A (zh) 2007-09-19

Similar Documents

Publication Publication Date Title
SG126866A1 (en) Dual stage lithographic apparatus and device manufacturing method
SG136065A1 (en) Lithographic apparatus and device manufacturing method
TW200705136A (en) Lithographic apparatus and lithographic product produced thereby
SG151198A1 (en) Methods relating to immersion lithography and an immersion lithographic apparatus
NL2002883A1 (nl) Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus.
TW200732857A (en) Lithographic apparatus, device manufacturing method and exchangeable optical element
NO20080246L (no) Anti-IGF1R-antistofformuleringer
WO2011085019A3 (en) Site based quantification of substrate topography and its relation to lithography defocus and overlay
BR112015025407A2 (pt) método e dispositivo para testar um transformador
WO2009152276A3 (en) Photoacid generators and lithographic resists comprising the same
TW200739242A (en) Displacement measurement system, lithographic apparatus and device manufacturing method
SG142289A1 (en) Lithographic apparatus and method
DK2106530T3 (da) Fremgangsmåde og indretning til registrering af den tredimensionale overflade af et objekt, navnlig et køretøjsdæk
PH12013501013A1 (en) Coding the position of a last significant coefficient within a video block based on a scanning order for the block in video coding
TW200942977A (en) Exposure apparatus, exposure method, and device manufacturing method
EP1924827A4 (de) System und verfahren zur messung des flüssigkeitsstands durch bild
UA106162C2 (uk) Кодування позиції останнього значущого коефіцієнта у відеоблоці на основі порядку сканування для блока при кодуванні відео
WO2007131545A3 (en) A method and apparatus for automatic comparison of data sequences
MX2009006226A (es) Metodos y sistema para medir un objeto.
DE102006032810A8 (de) Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, Mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
TW200741367A (en) Lithographic apparatus, control system and device manufacturing method
IL210390A (en) Method and spectrometric measurement system for lithography
EP2037258A4 (de) Vorrichtung für zellelektrophysiologiesensor, zellelektrophysiologiesensor unter verwendung der vorrichtung sowie verfahren zur herstellung der zellelektrophysiologiesensorvorrichtung
AR059361A1 (es) Dispositivo y metodos para detectar y cuantificar uno o mas agentes objetivos
ATE554536T1 (de) Verfahren und vorrichtung zur elektronischen kommunikation zwischen wenigstens zwei kommunikationsgeräten