SG136092A1 - Displacement measurement systems lithographic apparatus and device manufacturing method - Google Patents

Displacement measurement systems lithographic apparatus and device manufacturing method

Info

Publication number
SG136092A1
SG136092A1 SG200702071-2A SG2007020712A SG136092A1 SG 136092 A1 SG136092 A1 SG 136092A1 SG 2007020712 A SG2007020712 A SG 2007020712A SG 136092 A1 SG136092 A1 SG 136092A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
displacement measurement
measurement systems
systems
Prior art date
Application number
SG200702071-2A
Other languages
English (en)
Inventor
Renatus Gerardus Klaver
Erik Roelof Loopstra
Der Pasch Engelbertus Anto Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG136092A1 publication Critical patent/SG136092A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70653—Metrology techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0606—Position monitoring, e.g. misposition detection or presence detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
SG200702071-2A 2006-03-21 2007-03-21 Displacement measurement systems lithographic apparatus and device manufacturing method SG136092A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/384,834 US7636165B2 (en) 2006-03-21 2006-03-21 Displacement measurement systems lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG136092A1 true SG136092A1 (en) 2007-10-29

Family

ID=38109629

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200702071-2A SG136092A1 (en) 2006-03-21 2007-03-21 Displacement measurement systems lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (2) US7636165B2 (de)
EP (2) EP1865291B1 (de)
JP (1) JP4948213B2 (de)
KR (3) KR20070095805A (de)
CN (1) CN101042542B (de)
DE (1) DE602007000251D1 (de)
SG (1) SG136092A1 (de)
TW (1) TWI344060B (de)

Families Citing this family (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1853608B1 (de) * 2005-02-16 2008-07-09 Basf Se 5-alkoxyalkyl-6-alkyl-7-amino-azolopyrimidine, verfahren zu ihrer herstellung und ihre verwendung zur bekämpfung von schadpilzen sowie sie enthaltende mittel
SG10201510758QA (en) * 2006-01-19 2016-01-28 Nikon Corp Movable Body Drive Method, Movable Body Drive System, Pattern Formation Method, Pattern Forming Apparatus, Exposure Method, Exposure Apparatus, and Device Manufacturing Method
CN101385122B (zh) 2006-02-21 2010-12-08 株式会社尼康 图案形成装置、标记检测装置、曝光装置、图案形成方法、曝光方法及组件制造方法
EP2003681B1 (de) 2006-02-21 2014-11-12 Nikon Corporation Messeinrichtung und verfahren, strukturbildungseinrichtung und verfahren, und bauelementeherstellungsverfahren
KR101333872B1 (ko) 2006-02-21 2013-11-27 가부시키가이샤 니콘 패턴 형성 장치 및 패턴 형성 방법, 이동체 구동 시스템 및 이동체 구동 방법, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
US7636165B2 (en) * 2006-03-21 2009-12-22 Asml Netherlands B.V. Displacement measurement systems lithographic apparatus and device manufacturing method
KR100737177B1 (ko) * 2006-05-15 2007-07-10 경북대학교 산학협력단 수직 공진 표면광 레이저를 이용한 간섭계
SG172681A1 (en) * 2006-06-09 2011-07-28 Nikon Corp Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method
JPWO2008026732A1 (ja) 2006-08-31 2010-01-21 株式会社ニコン 移動体駆動システム及び移動体駆動方法、パターン形成装置及び方法、露光装置及び方法、デバイス製造方法、並びに決定方法
KR101565275B1 (ko) 2006-08-31 2015-11-02 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101763546B1 (ko) 2006-08-31 2017-07-31 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
WO2008029757A1 (fr) 2006-09-01 2008-03-13 Nikon Corporation Procédé de commande d'objet mobile, système de commande d'objet mobile, procédé et appareil de formation de motif, procédé et appareil d'exposition, procédé de fabrication de dispositif et procédé d'étalonnage
SG174740A1 (en) 2006-09-01 2011-10-28 Nikon Corp Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
EP2068112A4 (de) * 2006-09-29 2017-11-15 Nikon Corporation Mobileinheitssystem, strukturbildungseinrichtung, belichtungseinrichtung, belichtungsverfahren und bauelementherstellungsverfahren
DE102007023300A1 (de) * 2007-05-16 2008-11-20 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung und Anordnung derselben
US7787107B2 (en) * 2007-05-18 2010-08-31 Allview Research Llc Motion measurement and synchronization using a scanning interferometer with gratings
US8687166B2 (en) * 2007-05-24 2014-04-01 Asml Netherlands B.V. Lithographic apparatus having an encoder position sensor system
US8760615B2 (en) * 2007-05-24 2014-06-24 Asml Netherlands B.V. Lithographic apparatus having encoder type position sensor system
JP5066401B2 (ja) * 2007-07-24 2012-11-07 株式会社森精機製作所 定点検出装置及び変位測定装置
US8237919B2 (en) * 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
CN101680746B (zh) * 2007-12-11 2013-11-20 株式会社尼康 移动体装置、曝光装置及图案形成装置、以及器件制造方法
US8111377B2 (en) * 2008-01-10 2012-02-07 Asml Netherlands B.V. Lithographic apparatus with an encoder arranged for defining a zero level
DE102008007319A1 (de) * 2008-02-02 2009-08-06 Dr. Johannes Heidenhain Gmbh Optische Positionsmesseinrichtung
DE102008010284A1 (de) * 2008-02-21 2009-08-27 Dr. Johannes Heidenhain Gmbh XY-Tisch mit einer Messanordnung zur Positionsbestimmung
KR101670624B1 (ko) * 2008-04-30 2016-11-09 가부시키가이샤 니콘 스테이지 장치, 패턴 형성 장치, 노광 장치, 스테이지 구동 방법, 노광 방법, 그리고 디바이스 제조 방법
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8228482B2 (en) * 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8817236B2 (en) * 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
NL2003638A (en) * 2008-12-03 2010-06-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8760629B2 (en) 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8334983B2 (en) * 2009-05-22 2012-12-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2264528A1 (de) * 2009-06-19 2010-12-22 ASML Netherlands B.V. Sensor und Lithografievorrichtung
US8514395B2 (en) 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110096318A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096312A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110102761A1 (en) * 2009-09-28 2011-05-05 Nikon Corporation Stage apparatus, exposure apparatus, and device fabricating method
US20110096306A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
NL2005259A (en) * 2009-09-29 2011-03-30 Asml Netherlands Bv Imprint lithography.
NL2005545A (en) * 2009-11-17 2011-05-18 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US20110123913A1 (en) * 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US20110128523A1 (en) * 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
JP5602420B2 (ja) * 2009-12-10 2014-10-08 キヤノン株式会社 変位測定装置、露光装置、及び精密加工機器
US8488106B2 (en) * 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
EP3006902B1 (de) 2010-03-30 2018-04-11 Zygo Corporation Lithografieverfahren und lithografiesystem
NL2006743A (en) * 2010-06-09 2011-12-12 Asml Netherlands Bv Position sensor and lithographic apparatus.
JP5566203B2 (ja) * 2010-06-21 2014-08-06 Ｄｍｇ森精機株式会社 変位検出装置
CN102375343A (zh) * 2010-08-18 2012-03-14 上海微电子装备有限公司 一种工作台位置测量系统
WO2012106246A2 (en) 2011-02-01 2012-08-09 Zygo Corporation Interferometric heterodyne optical encoder system
NL2009197A (en) * 2011-08-25 2013-02-27 Asml Netherlands Bv System for detection motion, lithographic apparatus and device manufacturing method.
WO2013070957A1 (en) * 2011-11-09 2013-05-16 Zygo Corporation Compact encoder head for interferometric encoder system
TWI476376B (zh) 2011-11-09 2015-03-11 Zygo Corp 雙程干涉式編碼器系統
WO2013073538A1 (ja) 2011-11-17 2013-05-23 株式会社ニコン エンコーダ装置、移動量計測方法、光学装置、並びに露光方法及び装置
NL2009870A (en) * 2011-12-23 2013-06-26 Asml Netherlands Bv Lithographic apparatus and method.
US9207549B2 (en) 2011-12-29 2015-12-08 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
TWI516746B (zh) 2012-04-20 2016-01-11 賽格股份有限公司 在干涉編碼系統中執行非諧循環錯誤補償的方法、裝置及計算機程式產品，以及微影系統
DE112014004817A5 (de) * 2013-10-21 2016-07-07 Yxlon International Gmbh Röntgenprüfsystem sowie Verfahren zum Rotieren eines Prüfobjekts mittels eines solchen Röntgenprüfsystems
CN107250717B (zh) 2015-02-23 2020-09-29 株式会社尼康 测量装置、光刻系统及曝光装置、以及组件制造方法
CN107278279B (zh) 2015-02-23 2020-07-03 株式会社尼康 基板处理系统及基板处理方法、以及组件制造方法
WO2016136690A1 (ja) 2015-02-23 2016-09-01 株式会社ニコン 計測装置、リソグラフィシステム及び露光装置、並びに管理方法、重ね合わせ計測方法及びデバイス製造方法
CN105045042B (zh) * 2015-04-23 2017-06-16 清华大学 一种硅片台曝光区域六自由度位移测量方法
US20180364595A1 (en) * 2015-09-30 2018-12-20 Nikon Corporation Exposure apparatus, flat panel display manufacturing method, and device manufacturing method
US10254136B1 (en) * 2016-04-18 2019-04-09 Rockwell Collins, Inc. Prismatic relative positioning system
TWI629475B (zh) 2017-04-18 2018-07-11 財團法人工業技術研究院 非接觸式雙平面定位方法與裝置
US10551575B2 (en) * 2017-08-24 2020-02-04 Juniper Networks, Inc. Optical coupler including a faraday rotator layer and at least one grating coupler
WO2019204928A1 (en) * 2018-04-25 2019-10-31 National Research Council Of Canada High resolution and high throughput spectrometer
EP3629086A1 (de) * 2018-09-25 2020-04-01 ASML Netherlands B.V. Verfahren und vorrichtung zum bestimmen eines strahlungsintensitätsprofils
CN111536883B (zh) * 2020-06-10 2021-07-23 中北大学 一种基于复合式光栅的微位移传感器
CN112113507B (zh) * 2020-09-23 2021-10-22 中国科学院长春光学精密机械与物理研究所 一种基于光栅投影识别的二维平面位移测量装置
CN112762836B (zh) * 2020-12-23 2023-02-28 长春汇通光电技术有限公司 光栅尺、光栅尺读数方法、装置和计算机存储介质
JP7625444B2 (ja) * 2021-03-05 2025-02-03 キヤノン株式会社 ステージ装置、リソグラフィー装置および物品製造方法
TWI878865B (zh) 2022-05-10 2025-04-01 美商賽格股份有限公司 資料延遲時間之減縮方法及裝置

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2521618B1 (de) * 1975-05-15 1976-03-11 Zeiss Carl Fa Vorrichtung zum Messen oder Einstellen von zweidimensionalen Lagekoordinaten
EP0045321B1 (de) 1980-07-31 1986-12-10 International Business Machines Corporation Verfahren und Einrichtung zur optischen Distanzmessung
JPS59163517A (ja) * 1983-03-09 1984-09-14 Yokogawa Hokushin Electric Corp 光学式スケ−ル読取装置
JPS61130816A (ja) * 1984-11-30 1986-06-18 Canon Inc リニアエンコ−ダ−
JPS61130861A (ja) 1984-11-30 1986-06-18 Les-The- Syst Kk プラスチツク袋の封止部検査装置
GB2185314B (en) 1986-01-14 1990-09-26 Canon Kk Encoder
EP0243520B1 (de) 1986-04-29 1991-11-27 Ibm Deutschland Gmbh Interferometrische Maskensubstratausrichtung
JPS63115011A (ja) * 1986-10-31 1988-05-19 Canon Inc 変位測定装置
JPS63231217A (ja) * 1987-03-19 1988-09-27 Omron Tateisi Electronics Co 移動量測定装置
JPH0293307A (ja) * 1988-09-30 1990-04-04 Toshiba Corp 間隙設定方法および装置、位置合せ方法および装置、相対位置合せ方法および装置
US4985624A (en) 1988-05-11 1991-01-15 Simmonds Precision Products, Inc. Optical grating sensor and method of monitoring with a multi-period grating
DE3905730C2 (de) 1989-02-24 1995-06-14 Heidenhain Gmbh Dr Johannes Positionsmeßeinrichtung
DE4033013C2 (de) * 1990-10-18 1994-11-17 Heidenhain Gmbh Dr Johannes Polarisationsoptische Anordnung
DE4033556A1 (de) * 1990-10-22 1992-04-23 Suess Kg Karl Messanordnung fuer x,y,(phi)-koordinatentische
JPH06307811A (ja) * 1993-04-28 1994-11-04 Soltec:Kk 位置ずれ及びギャップ検出方法
JP3247791B2 (ja) * 1993-04-19 2002-01-21 株式会社リコー エンコーダ装置
US5652426A (en) * 1993-04-19 1997-07-29 Ricoh Company, Ltd. Optical encoder having high resolution
US5537210A (en) 1993-06-10 1996-07-16 Canon Kabushiki Kaisha Rotation detecting apparatus and scale having a multi helix diffraction grating for the same
JP3196459B2 (ja) 1993-10-29 2001-08-06 キヤノン株式会社 ロータリーエンコーダ
JPH07270122A (ja) * 1994-03-30 1995-10-20 Canon Inc 変位検出装置、該変位検出装置を備えた露光装置およびデバイスの製造方法
WO1999017073A1 (de) 1997-09-29 1999-04-08 Dr. Johannes Heidenhain Gmbh Vorrichtung zur erfassung der position von zwei körpern
US6351313B1 (en) 1997-09-29 2002-02-26 Dr. Johannes Heidenhain Gmbh Device for detecting the position of two bodies
CN1144063C (zh) 1998-03-09 2004-03-31 葛莱特有限公司 光学平移测量
DE50015787D1 (de) * 1999-09-16 2009-12-24 Heidenhain Gmbh Dr Johannes Vorrichtung zur Positionsbestimmung und Ermittlung von Führungsfehlern
JP4846909B2 (ja) 2000-02-15 2011-12-28 キヤノン株式会社 光学式エンコーダ及び回折格子の変位測定方法
CN1248058C (zh) 2000-09-14 2006-03-29 约翰尼斯海登海恩博士股份有限公司 位置测量装置
FR2825150B1 (fr) 2001-05-28 2003-09-26 Univ Jean Monnet Dispositif de caracterisation de reseaux optiques et procede de fabrication de reseaux optiques avec une frequence spatiale predefinie
DE10333772A1 (de) 2002-08-07 2004-02-26 Dr. Johannes Heidenhain Gmbh Interferenzielle Positionsmesseinrichtung
JP2004212243A (ja) * 2003-01-06 2004-07-29 Canon Inc 格子干渉型光学式エンコーダ
WO2007034379A2 (en) * 2005-09-21 2007-03-29 Koninklijke Philips Electronics, N.V. System for detecting motion of a body
SG10201510758QA (en) * 2006-01-19 2016-01-28 Nikon Corp Movable Body Drive Method, Movable Body Drive System, Pattern Formation Method, Pattern Forming Apparatus, Exposure Method, Exposure Apparatus, and Device Manufacturing Method
US7636165B2 (en) 2006-03-21 2009-12-22 Asml Netherlands B.V. Displacement measurement systems lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
KR20090081351A (ko) 2009-07-28
KR20080089548A (ko) 2008-10-07
TW200739242A (en) 2007-10-16
EP1865291A2 (de) 2007-12-12
JP4948213B2 (ja) 2012-06-06
US7636165B2 (en) 2009-12-22
KR100983909B1 (ko) 2010-09-28
CN101042542B (zh) 2011-05-11
EP1837630A1 (de) 2007-09-26
KR20070095805A (ko) 2007-10-01
EP1837630B1 (de) 2008-11-19
TWI344060B (en) 2011-06-21
KR100950068B1 (ko) 2010-03-26
EP1865291B1 (de) 2015-08-19
DE602007000251D1 (de) 2009-01-02
EP1865291A3 (de) 2009-07-15
US20100053586A1 (en) 2010-03-04
US8390820B2 (en) 2013-03-05
JP2007292735A (ja) 2007-11-08
US20070223007A1 (en) 2007-09-27
CN101042542A (zh) 2007-09-26

Similar Documents

Publication Publication Date Title
TWI350429B (en) Lithographic apparatus and device manufacturing method
TWI372317B (en) Lithographic apparatus and device manufacturing method
SG136116A1 (en) Lithographic apparatus and device manufacturing method
TWI365359B (en) Lithographic apparatus and device manufacturing method
TWI372315B (en) Lithographic apparatus and device manufacturing method
TWI341444B (en) Lithographic apparatus and device manufacturing method
TWI365360B (en) Lithographic apparatus and device manufacturing method
TWI369589B (en) Lithographic apparatus and device manufacturing method
IL194580A0 (en) Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method
SG136117A1 (en) Lithographic apparatus and device manufacturing method
EP2187430A4 (de) Positionsmesssystem, belichtungseinrichtung, positionsmessverfahren, belichtungsverfahren, bauelementeherstellungsverfahren, werkzeug und messverfahren
IL207506A0 (en) Metrology method and apparatus, lithographic apparatus, and device manufacturing method
SG124359A1 (en) Lithographic apparatus and device manufacturing method
SG133580A1 (en) Lithographic apparatus and device manufacturing method
SG128601A1 (en) Lithographic apparatus and device manufacturing method
SG126135A1 (en) Lithographic apparatus and device manufacturing method
IL210126A0 (en) Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus
IL187797A (en) Method of measurement, an inspection apparatus and a lithographic apparatus
EP2023237A4 (de) Positionsangabeverfahren und positionsangabevorrichtung
GB2440825B (en) Device for neural placement and reference system measurement
GB2438298B (en) Method and apparatus for the use of a breathalyser device
TWI373065B (en) Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method
FR2897434B1 (fr) Procede et dispositif de mesure de permeation
SG136068A1 (en) Lithographic apparatus, control system and device manufacturing method
TWI340298B (en) Lithographic apparatus and device manufacturing method