SG149765A1 - Catadioptric optical system for scatterometry - Google Patents

Catadioptric optical system for scatterometry

Info

Publication number
SG149765A1
SG149765A1 SG200805249-0A SG2008052490A SG149765A1 SG 149765 A1 SG149765 A1 SG 149765A1 SG 2008052490 A SG2008052490 A SG 2008052490A SG 149765 A1 SG149765 A1 SG 149765A1
Authority
SG
Singapore
Prior art keywords
reflective surface
optical system
catadioptric optical
electromagnetic radiation
scatterometry
Prior art date
Application number
SG200805249-0A
Other languages
English (en)
Inventor
Yevgeniy Konstantinovich Shmarev
Stanislav Y Smirnov
Irina I Pozhinskaya
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG149765A1 publication Critical patent/SG149765A1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4711—Multiangle measurement
    • G01N2021/4714—Continuous plural angles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives
    • G02B21/04—Objectives involving mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200805249-0A 2007-07-18 2008-07-11 Catadioptric optical system for scatterometry SG149765A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/779,691 US7633689B2 (en) 2007-07-18 2007-07-18 Catadioptric optical system for scatterometry

Publications (1)

Publication Number Publication Date
SG149765A1 true SG149765A1 (en) 2009-02-27

Family

ID=39864794

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200805249-0A SG149765A1 (en) 2007-07-18 2008-07-11 Catadioptric optical system for scatterometry

Country Status (8)

Country Link
US (2) US7633689B2 (de)
EP (1) EP2017662B1 (de)
JP (1) JP4914408B2 (de)
KR (1) KR100982136B1 (de)
CN (1) CN101349804B (de)
IL (1) IL192667A (de)
SG (1) SG149765A1 (de)
TW (1) TWI382202B (de)

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US7633689B2 (en) * 2007-07-18 2009-12-15 Asml Holding N.V. Catadioptric optical system for scatterometry
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EP2400345B1 (de) 2010-06-22 2016-05-11 ASML Holding N.V. Katadioptrisches Beleuchtungssystem für Metrologie
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EP2579100A3 (de) * 2011-10-03 2017-12-06 ASML Holding N.V. Inspektionsgerät, lithografisches Gerät und Verfahren zur Herstellung von Bauelementen
US8982481B2 (en) 2011-12-30 2015-03-17 Asml Holding N.V. Catadioptric objective for scatterometry
CN103529643B (zh) * 2012-07-05 2017-01-18 中国科学院物理研究所 一种纳米图形化系统及其光响应特性检测装置
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US9846128B2 (en) * 2016-01-19 2017-12-19 Applied Materials Israel Ltd. Inspection system and a method for evaluating an exit pupil of an inspection system
CN106295497B (zh) * 2016-07-19 2019-09-27 西安理工大学 一种三维表面光场编码信号生成及识别的装置与方法
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CN109724901B (zh) * 2018-12-29 2020-10-13 中国科学院长春光学精密机械与物理研究所 一种微米粒子光学检测装置
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US12352952B2 (en) 2019-08-08 2025-07-08 Arizona Board Of Regents On Behalf Of The University Of Arizona Space, time and angular multiplexed dynamic image transfer for augmented reality display
WO2022240632A1 (en) * 2021-05-10 2022-11-17 Applied Materials, Inc. Method and apparatus for greyscale lithography

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Also Published As

Publication number Publication date
CN101349804A (zh) 2009-01-21
KR100982136B1 (ko) 2010-09-14
IL192667A (en) 2014-09-30
JP4914408B2 (ja) 2012-04-11
US20100046092A1 (en) 2010-02-25
TW200912384A (en) 2009-03-16
TWI382202B (zh) 2013-01-11
EP2017662A2 (de) 2009-01-21
IL192667A0 (en) 2009-02-11
EP2017662A3 (de) 2009-04-22
JP2009044143A (ja) 2009-02-26
KR20090009159A (ko) 2009-01-22
US20090021845A1 (en) 2009-01-22
EP2017662B1 (de) 2021-06-23
US8107173B2 (en) 2012-01-31
CN101349804B (zh) 2013-04-17
US7633689B2 (en) 2009-12-15

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