SG155111A1 - Surface treatment material for semiconductor manufacturing system and method for producing same - Google Patents

Surface treatment material for semiconductor manufacturing system and method for producing same

Info

Publication number
SG155111A1
SG155111A1 SG200808957-5A SG2008089575A SG155111A1 SG 155111 A1 SG155111 A1 SG 155111A1 SG 2008089575 A SG2008089575 A SG 2008089575A SG 155111 A1 SG155111 A1 SG 155111A1
Authority
SG
Singapore
Prior art keywords
fluorine
anodic oxidation
oxidation coating
treatment material
semiconductor manufacturing
Prior art date
Application number
SG200808957-5A
Inventor
Takayuki Tsubota
Jun Hisamoto
Koji Wada
Mamoru Hosokawa
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Publication of SG155111A1 publication Critical patent/SG155111A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • C25D11/246—Chemical after-treatment for sealing layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

Disclosed are a surface-treatment material of a semiconductor manufacturing system and a method thereof. The surface-treatment material includes a substrate made of aluminum, or aluminum alloy, an anodic oxidation coating formed over the surface of the substrate, with sealing applied thereto, and a fluorine-enriched layer formed over the surface of the anodic oxidation coating, wherein fluorine concentration in the fluorine-enriched layer is not less than 1 mass. The method includes an anodic oxidation coating forming step for forming an anodic oxidation coating over the surface of a substrate made of aluminum, or aluminum alloy, a sealing step for applying sealing to the anodic oxidation coating, and a fluorine-enriched layer forming step for forming a fluorine-enriched layer with fluorine enriched to a fluorine concentration not less than 1 mass% over the surface of the anodic oxidation coating with the sealing applied thereto.
SG200808957-5A 2008-02-26 2008-12-03 Surface treatment material for semiconductor manufacturing system and method for producing same SG155111A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008044144 2008-02-26

Publications (1)

Publication Number Publication Date
SG155111A1 true SG155111A1 (en) 2009-09-30

Family

ID=40911493

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200808957-5A SG155111A1 (en) 2008-02-26 2008-12-03 Surface treatment material for semiconductor manufacturing system and method for producing same

Country Status (6)

Country Link
JP (1) JP5452034B2 (en)
KR (1) KR20090092228A (en)
CN (1) CN101521145A (en)
DE (1) DE102009004402A1 (en)
SG (1) SG155111A1 (en)
TW (1) TW200942643A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI741320B (en) * 2018-07-18 2021-10-01 日商日本發條股份有限公司 Components for plasma processing equipment
JP6585863B1 (en) 2019-01-23 2019-10-02 株式会社Uacj Aluminum member and manufacturing method thereof
CN115449777A (en) * 2022-09-28 2022-12-09 上海积塔半导体有限公司 Semiconductor reaction member and method for producing same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5069938A (en) 1990-06-07 1991-12-03 Applied Materials, Inc. Method of forming a corrosion-resistant protective coating on aluminum substrate
US5192610A (en) 1990-06-07 1993-03-09 Applied Materials, Inc. Corrosion-resistant protective coating on aluminum substrate and method of forming same
JPH07273053A (en) 1994-03-31 1995-10-20 Tokyo Electron Ltd Processing apparatus and aluminum-based member coating method
US5756222A (en) 1994-08-15 1998-05-26 Applied Materials, Inc. Corrosion-resistant aluminum article for semiconductor processing equipment
JP3608707B2 (en) 1997-06-09 2005-01-12 株式会社神戸製鋼所 Vacuum chamber member and manufacturing method thereof
ZA986096B (en) * 1997-07-11 1999-01-28 Magnesium Technology Ltd Sealing procedures for metal and/or anodised metal substrates
JP3094000B2 (en) 1997-09-12 2000-10-03 昭和電工株式会社 Metal material or metal film having fluorinated surface layer and fluoridation method
JPH11229185A (en) * 1998-02-13 1999-08-24 Kobe Steel Ltd Aluminum material excellent in resistance to heat cracking and corrosion
JP3891815B2 (en) 2001-10-12 2007-03-14 昭和電工株式会社 Aluminum alloy for film formation treatment, aluminum alloy material excellent in corrosion resistance and method for producing the same
JP3871544B2 (en) 2001-10-12 2007-01-24 昭和電工株式会社 Aluminum alloy for film formation treatment, aluminum alloy material excellent in corrosion resistance and method for producing the same
JP4744099B2 (en) * 2004-06-15 2011-08-10 株式会社アルバック Surface treatment method of aluminum material for inner wall of vacuum vessel

Also Published As

Publication number Publication date
DE102009004402A1 (en) 2009-09-03
TW200942643A (en) 2009-10-16
CN101521145A (en) 2009-09-02
JP5452034B2 (en) 2014-03-26
JP2009228132A (en) 2009-10-08
KR20090092228A (en) 2009-08-31

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