SG159455A1 - Phenyl isocyanate-based urethane acrylates, processes for producing and methods of using the same - Google Patents
Phenyl isocyanate-based urethane acrylates, processes for producing and methods of using the sameInfo
- Publication number
- SG159455A1 SG159455A1 SG200905215-0A SG2009052150A SG159455A1 SG 159455 A1 SG159455 A1 SG 159455A1 SG 2009052150 A SG2009052150 A SG 2009052150A SG 159455 A1 SG159455 A1 SG 159455A1
- Authority
- SG
- Singapore
- Prior art keywords
- processes
- producing
- methods
- same
- urethane acrylates
- Prior art date
Links
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 title abstract 2
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 title 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 3
- 150000003839 salts Chemical class 0.000 abstract 2
- 239000012453 solvate Substances 0.000 abstract 2
- 125000001424 substituent group Chemical group 0.000 abstract 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 1
- 125000006700 (C1-C6) alkylthio group Chemical group 0.000 abstract 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 abstract 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical group CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical group 0.000 abstract 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 abstract 1
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
- C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
- C07C323/33—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to a carbon atom of the same non-condensed six-membered aromatic ring
- C07C323/35—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to a carbon atom of the same non-condensed six-membered aromatic ring the thio group being a sulfide group
- C07C323/36—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to a carbon atom of the same non-condensed six-membered aromatic ring the thio group being a sulfide group the sulfur atom of the sulfide group being further bound to an acyclic carbon atom
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Holo Graphy (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08014170A EP2154128B1 (fr) | 2008-08-08 | 2008-08-08 | Uréthane acrylates à base de phénylisocyanate ayant un index de rupture élevé |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG159455A1 true SG159455A1 (en) | 2010-03-30 |
Family
ID=40263539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG200905215-0A SG159455A1 (en) | 2008-08-08 | 2009-08-05 | Phenyl isocyanate-based urethane acrylates, processes for producing and methods of using the same |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US8222314B2 (fr) |
| EP (2) | EP2154128B1 (fr) |
| JP (1) | JP5523008B2 (fr) |
| KR (1) | KR101633513B1 (fr) |
| CN (1) | CN101704773B (fr) |
| AT (1) | ATE493383T1 (fr) |
| BR (1) | BRPI0902816A2 (fr) |
| CA (1) | CA2674826A1 (fr) |
| DE (1) | DE502008002161D1 (fr) |
| IL (1) | IL200025A0 (fr) |
| RU (1) | RU2515896C2 (fr) |
| SG (1) | SG159455A1 (fr) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9976192B2 (en) | 2006-03-10 | 2018-05-22 | Ldip, Llc | Waveguide-based detection system with scanning light source |
| US9423397B2 (en) | 2006-03-10 | 2016-08-23 | Indx Lifecare, Inc. | Waveguide-based detection system with scanning light source |
| US9528939B2 (en) | 2006-03-10 | 2016-12-27 | Indx Lifecare, Inc. | Waveguide-based optical scanning systems |
| US8288157B2 (en) | 2007-09-12 | 2012-10-16 | Plc Diagnostics, Inc. | Waveguide-based optical scanning systems |
| US8675199B2 (en) | 2006-03-10 | 2014-03-18 | Plc Diagnostics, Inc. | Waveguide-based detection system with scanning light source |
| RU2009141369A (ru) * | 2007-04-11 | 2011-05-20 | Байер МатириальСайенс АГ (DE) | Радиационно-сшиваемые и термически-сшиваемые полиуретановые системы, содержащие иминооксадиазиндион |
| CN102667936B (zh) | 2009-11-03 | 2016-03-30 | 拜尔材料科学股份公司 | 生产全息介质的方法 |
| EP2496549B1 (fr) * | 2009-11-03 | 2014-10-08 | Bayer Intellectual Property GmbH | Méthacrylates nouveaux non cristallisants, leur fabrication et leur utilisation |
| CN102667935B (zh) | 2009-11-03 | 2016-01-20 | 拜尔材料科学股份公司 | 具有不同书写共聚单体的光聚合物制剂 |
| PL2317511T3 (pl) | 2009-11-03 | 2012-08-31 | Bayer Materialscience Ag | Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv |
| IN2012DN03900A (fr) | 2009-11-03 | 2015-09-04 | Bayer Materialscience Ag | |
| EP2497080B1 (fr) | 2009-11-03 | 2013-12-25 | Bayer Intellectual Property GmbH | Procédé de fabrication d'un film holographique |
| KR101804591B1 (ko) * | 2010-02-02 | 2017-12-04 | 바이엘 인텔렉쳐 프로퍼티 게엠베하 | 에스테르-기재 기록 단량체를 갖는 광중합체 배합물 |
| US9057946B2 (en) | 2010-08-11 | 2015-06-16 | Bayer Intellectual Property Gmbh | Difunctional (meth)acrylate writing monomers |
| WO2012103338A1 (fr) * | 2011-01-26 | 2012-08-02 | M-I L.L.C. | Composition de renforcement de puits de forage |
| EP2613319A1 (fr) | 2012-01-05 | 2013-07-10 | Bayer MaterialScience AG | Composite en couche à partir d'une pellicule photopolymère et d'une couche d'adhésif |
| US10018566B2 (en) | 2014-02-28 | 2018-07-10 | Ldip, Llc | Partially encapsulated waveguide based sensing chips, systems and methods of use |
| KR102382218B1 (ko) | 2014-04-25 | 2022-04-05 | 코베스트로 도이칠란트 아게 | 홀로그래픽 광중합체 배합물에서의 기록 단량체로서의 방향족 글리콜 에테르 |
| US10241402B2 (en) | 2014-12-12 | 2019-03-26 | Covestro Deutschland Ag | Naphthyl acrylates as writing monomers for photopolymers |
| CN107223121B (zh) * | 2014-12-19 | 2020-10-27 | 科思创德国股份有限公司 | 湿稳定的全息介质 |
| WO2016138427A1 (fr) | 2015-02-27 | 2016-09-01 | Indx Lifecare, Inc. | Système de détection à guide d'ondes à source de lumière à balayage |
| EP3166109A1 (fr) | 2015-11-09 | 2017-05-10 | Covestro Deutschland AG | Ensemble de pieces comprenant une couche couvre-n uds et photo-polymere |
| US11680039B2 (en) * | 2016-08-10 | 2023-06-20 | Arkema France | Compounds containing cyclic structural elements, urethane/ureido linkages and a free radical-polymerizable functional group |
| EP3495886A1 (fr) | 2017-12-06 | 2019-06-12 | Covestro Deutschland AG | Structure en couches en photopolymère sans adhésif |
| US11406964B2 (en) * | 2018-03-28 | 2022-08-09 | Covestro Intellectual Property Gmbh & Co. Kg | Heterogeneous catalysts for the synthesis of carbamates |
| CN113304683B (zh) * | 2021-06-17 | 2022-12-13 | 江南大学 | 葡糖酰胺封端聚醚型表面活性剂、其制备方法及应用 |
| WO2024005140A1 (fr) * | 2022-06-30 | 2024-01-04 | 三菱ケミカル株式会社 | Composé, composition polymérisable, polymère, support d'enregistrement holographique, matériau optique et composant optique |
| WO2024052256A1 (fr) | 2022-09-07 | 2024-03-14 | Covestro Deutschland Ag | Sels de benzopyrylium spécifiques en tant que colorants pour compositions photopolymères |
| JPWO2024085208A1 (fr) * | 2022-10-19 | 2024-04-25 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2217744A1 (de) * | 1972-04-13 | 1973-10-18 | Agfa Gevaert Ag | Lichtempfindliche polymere |
| GB1429649A (en) * | 1972-06-22 | 1976-03-24 | Agfagevaert | Unsaturated carboxylic esters of hydroxyalkyl carbamates addition polymers derived thereform and photographic silver halide materials containing said polymers |
| US4227980A (en) * | 1978-09-13 | 1980-10-14 | Whittaker Corporation | Photoreactive coating compositions based on urethane modified acrylates |
| US5342891A (en) * | 1987-06-30 | 1994-08-30 | Union Carbide Chemicals & Plastics Technology Corporation | (N-substituted carbamoyloxy) alkanoyloxyalkyl acrylate polymers and compositions made therefrom |
| US4968837A (en) | 1989-07-28 | 1990-11-06 | Ethyl Corporation | Resolution of racemic mixtures |
| DE3935138A1 (de) * | 1989-10-21 | 1991-04-25 | Hoechst Ag | Ethylenisch ungesaettigte, grenzflaechenaktive urethanderivate und verfahren zu ihrer herstellung |
| RU2002637C1 (ru) * | 1992-07-14 | 1993-11-15 | Московское научно-производственное объединение "НИОПИК" | Способ получени декорированного материала |
| GB9410578D0 (en) * | 1994-05-26 | 1994-07-13 | London Hospital Med Coll | Novel (meth)acrylate monomers and denture base compositions prepared therefrom |
| US5916987A (en) * | 1996-05-29 | 1999-06-29 | Mitsui Chemicals, Inc. | Thiol and Sulfur-containing O-(meth) acrylate compounds and use thereof |
| JP3778620B2 (ja) * | 1996-07-15 | 2006-05-24 | 岡本化学工業株式会社 | 感光性組成物 |
| JP3672059B2 (ja) * | 1996-10-11 | 2005-07-13 | 日本化薬株式会社 | 樹脂組成物、レンズ用樹脂組成物及びその硬化物 |
| RU2167150C2 (ru) * | 1998-03-25 | 2001-05-20 | Фокин Александр Васильевич | Полифторалкил-n-арилкарбаматы, обладающие антимикробной активностью |
| JP3068562B2 (ja) | 1998-06-12 | 2000-07-24 | ホーヤ株式会社 | 光学部材用コーティング組成物、それを用いて得られる薄膜層及びそれを有する光学部材 |
| US7566412B2 (en) * | 1999-11-10 | 2009-07-28 | Dentsply International Inc. | Dental method and device |
| KR100453344B1 (ko) | 2000-09-22 | 2004-10-20 | 미쯔이카가쿠 가부시기가이샤 | 아크릴산 에스테르화합물 및 그 용도 |
| JP4008203B2 (ja) | 2001-03-28 | 2007-11-14 | リンテック株式会社 | 光学用フィルム |
| US6780546B2 (en) | 2001-08-30 | 2004-08-24 | Inphase Technologies, Inc. | Blue-sensitized holographic media |
| KR100638123B1 (ko) | 2002-07-22 | 2006-10-24 | 미쓰이 가가쿠 가부시키가이샤 | 무기 초미립자를 함유하는 수지 조성물 |
| US7498394B2 (en) * | 2003-02-24 | 2009-03-03 | The Regents Of The University Of Colorado | (Meth)acrylic and (meth)acrylamide monomers, polymerizable compositions, and polymers obtained |
| EP2137220B1 (fr) * | 2007-04-11 | 2017-10-18 | Covestro Deutschland AG | Acrylates d'uréthane aromatiques à indice de réfraction élevé |
-
2008
- 2008-08-08 AT AT08014170T patent/ATE493383T1/de active
- 2008-08-08 EP EP08014170A patent/EP2154128B1/fr active Active
- 2008-08-08 DE DE502008002161T patent/DE502008002161D1/de active Active
-
2009
- 2009-07-23 IL IL200025A patent/IL200025A0/en unknown
- 2009-07-25 EP EP09009651A patent/EP2154129A1/fr not_active Withdrawn
- 2009-08-05 CA CA2674826A patent/CA2674826A1/fr not_active Abandoned
- 2009-08-05 SG SG200905215-0A patent/SG159455A1/en unknown
- 2009-08-05 BR BRPI0902816-1A patent/BRPI0902816A2/pt not_active IP Right Cessation
- 2009-08-07 US US12/537,371 patent/US8222314B2/en active Active
- 2009-08-07 KR KR1020090072845A patent/KR101633513B1/ko active Active
- 2009-08-07 RU RU2009130286/04A patent/RU2515896C2/ru active
- 2009-08-07 JP JP2009184274A patent/JP5523008B2/ja active Active
- 2009-08-10 CN CN200910165740.XA patent/CN101704773B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR101633513B1 (ko) | 2016-06-24 |
| US8222314B2 (en) | 2012-07-17 |
| EP2154128A1 (fr) | 2010-02-17 |
| US20100036013A1 (en) | 2010-02-11 |
| BRPI0902816A2 (pt) | 2010-05-25 |
| JP5523008B2 (ja) | 2014-06-18 |
| CA2674826A1 (fr) | 2010-02-08 |
| KR20100019388A (ko) | 2010-02-18 |
| ATE493383T1 (de) | 2011-01-15 |
| RU2515896C2 (ru) | 2014-05-20 |
| DE502008002161D1 (de) | 2011-02-10 |
| EP2154129A1 (fr) | 2010-02-17 |
| IL200025A0 (en) | 2010-05-17 |
| CN101704773B (zh) | 2014-03-05 |
| EP2154128B1 (fr) | 2010-12-29 |
| CN101704773A (zh) | 2010-05-12 |
| RU2009130286A (ru) | 2011-02-20 |
| JP2010043079A (ja) | 2010-02-25 |
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