SG54576A1 - Improved inductively coupled plasma source - Google Patents

Improved inductively coupled plasma source

Info

Publication number
SG54576A1
SG54576A1 SG1997003672A SG1997003672A SG54576A1 SG 54576 A1 SG54576 A1 SG 54576A1 SG 1997003672 A SG1997003672 A SG 1997003672A SG 1997003672 A SG1997003672 A SG 1997003672A SG 54576 A1 SG54576 A1 SG 54576A1
Authority
SG
Singapore
Prior art keywords
inductively coupled
coupled plasma
plasma source
improved inductively
improved
Prior art date
Application number
SG1997003672A
Other languages
English (en)
Inventor
Gongda Yao
Ralf Hofmann
Avi Tepman
Praburam Gopalraja
Sergio Edelstein
Mani Subramani
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/730,722 external-priority patent/US6254737B1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG54576A1 publication Critical patent/SG54576A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3441—Dark space shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3322—Problems associated with coating
    • H01J2237/3327—Coating high aspect ratio workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
SG1997003672A 1996-10-08 1997-10-06 Improved inductively coupled plasma source SG54576A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/730,722 US6254737B1 (en) 1996-10-08 1996-10-08 Active shield for generating a plasma for sputtering
US79127897A 1997-01-30 1997-01-30

Publications (1)

Publication Number Publication Date
SG54576A1 true SG54576A1 (en) 1998-11-16

Family

ID=27112097

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1997003672A SG54576A1 (en) 1996-10-08 1997-10-06 Improved inductively coupled plasma source

Country Status (5)

Country Link
EP (1) EP0836219A3 (fr)
JP (1) JPH10214799A (fr)
KR (1) KR19980032633A (fr)
SG (1) SG54576A1 (fr)
TW (1) TW408358B (fr)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW358964B (en) 1996-11-21 1999-05-21 Applied Materials Inc Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma
US6451179B1 (en) 1997-01-30 2002-09-17 Applied Materials, Inc. Method and apparatus for enhancing sidewall coverage during sputtering in a chamber having an inductively coupled plasma
US6579426B1 (en) 1997-05-16 2003-06-17 Applied Materials, Inc. Use of variable impedance to control coil sputter distribution
US6589407B1 (en) * 1997-05-23 2003-07-08 Applied Materials, Inc. Aluminum deposition shield
US6375810B2 (en) * 1997-08-07 2002-04-23 Applied Materials, Inc. Plasma vapor deposition with coil sputtering
US6235169B1 (en) 1997-08-07 2001-05-22 Applied Materials, Inc. Modulated power for ionized metal plasma deposition
US6345588B1 (en) 1997-08-07 2002-02-12 Applied Materials, Inc. Use of variable RF generator to control coil voltage distribution
US6042700A (en) * 1997-09-15 2000-03-28 Applied Materials, Inc. Adjustment of deposition uniformity in an inductively coupled plasma source
US6023038A (en) * 1997-09-16 2000-02-08 Applied Materials, Inc. Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system
USD440582S1 (en) 1998-03-16 2001-04-17 Applied Materials, Inc. Sputtering chamber coil
US6506287B1 (en) * 1998-03-16 2003-01-14 Applied Materials, Inc. Overlap design of one-turn coil
US6660134B1 (en) 1998-07-10 2003-12-09 Applied Materials, Inc. Feedthrough overlap coil
USD450070S1 (en) 1998-07-13 2001-11-06 Applied Materials, Inc. Sputtering chamber coil
GB2342927B (en) * 1998-10-23 2003-05-07 Trikon Holdings Ltd Apparatus and methods for sputtering
USD442853S1 (en) 1999-08-24 2001-05-29 Applied Materials, Inc. Rounded overlap coil
USD442852S1 (en) 1999-08-24 2001-05-29 Applied Materials, Inc. Squared overlap coil
US6461483B1 (en) * 2000-03-10 2002-10-08 Applied Materials, Inc. Method and apparatus for performing high pressure physical vapor deposition
US6730174B2 (en) * 2002-03-06 2004-05-04 Applied Materials, Inc. Unitary removable shield assembly
JP4827639B2 (ja) * 2006-07-12 2011-11-30 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
CN112877655A (zh) * 2021-03-08 2021-06-01 泰杋科技股份有限公司 一种溅镀沉积的反应腔体

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5122251A (en) * 1989-06-13 1992-06-16 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
DE4235064A1 (de) * 1992-10-17 1994-04-21 Leybold Ag Vorrichtung zum Erzeugen eines Plasmas mittels Kathodenzerstäubung

Also Published As

Publication number Publication date
TW408358B (en) 2000-10-11
JPH10214799A (ja) 1998-08-11
KR19980032633A (ko) 1998-07-25
EP0836219A2 (fr) 1998-04-15
EP0836219A3 (fr) 1998-09-16

Similar Documents

Publication Publication Date Title
EP0880873A4 (fr) Dispositif d'eclairage alimente par induction
SG71083A1 (en) Plasma source for hdp-cvd chamber
GB2304986B (en) Electron source
SG63778A1 (en) Plasma processing apparatus
IL122471A0 (en) Electron source
GB9620151D0 (en) Plasma processing apparatus
IL129294A (en) Lamp
EP0880388A4 (fr) Procede d'etherification-hydrogenation
GB2319941B (en) Plasma gas processing
SG66424A1 (en) Plasma processing apparatus
EP0818801A3 (fr) Appareil de traitement par plasma
TW399773U (en) Plasma processing device
PT785569E (pt) Reactor de plasma
GB9708738D0 (en) Plasma injection apparatus
EP0810053A4 (fr) Torche a plasma
GB2315918B (en) Plasma treatment system
GB9817653D0 (en) Hydrocyclone
GB9714341D0 (en) Plasma processing apparatus
TW458486U (en) Plasma processing device
GB2304984B (en) Electron source
GB9602046D0 (en) Process
GB2342724B (en) Programming frequency source
GB2319771B (en) Process
GB2316403B (en) Process
GB2324196B (en) Plasma processing