SG61093G - Method for aligning photomasks - Google Patents

Method for aligning photomasks

Info

Publication number
SG61093G
SG61093G SG610/93A SG61093A SG61093G SG 61093 G SG61093 G SG 61093G SG 610/93 A SG610/93 A SG 610/93A SG 61093 A SG61093 A SG 61093A SG 61093 G SG61093 G SG 61093G
Authority
SG
Singapore
Prior art keywords
photomasks
aligning
aligning photomasks
Prior art date
Application number
SG610/93A
Other languages
English (en)
Original Assignee
American Telephone & Telegraph
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone & Telegraph filed Critical American Telephone & Telegraph
Publication of SG61093G publication Critical patent/SG61093G/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/57—Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
SG610/93A 1987-07-06 1993-05-07 Method for aligning photomasks SG61093G (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/069,901 US4835078A (en) 1987-07-06 1987-07-06 Method for aligning photomasks

Publications (1)

Publication Number Publication Date
SG61093G true SG61093G (en) 1993-07-09

Family

ID=22091910

Family Applications (1)

Application Number Title Priority Date Filing Date
SG610/93A SG61093G (en) 1987-07-06 1993-05-07 Method for aligning photomasks

Country Status (9)

Country Link
US (1) US4835078A (ja)
EP (1) EP0298642B1 (ja)
JP (1) JPH0766904B2 (ja)
KR (1) KR970004887B1 (ja)
CA (1) CA1296180C (ja)
DE (1) DE3874028T2 (ja)
DK (1) DK373188A (ja)
ES (1) ES2034237T3 (ja)
SG (1) SG61093G (ja)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5325176A (en) * 1988-02-16 1994-06-28 Canon Kabushiki Kaisha Position detecting method and apparatus including Fraunhofer diffraction detector
US5319444A (en) * 1988-02-16 1994-06-07 Canon Kabushiki Kaisha Position detecting method and apparatus
US5262257A (en) * 1989-07-13 1993-11-16 Canon Kabushiki Kaisha Mask for lithography
US5288729A (en) * 1989-10-07 1994-02-22 Kabushiki Kaisha Toshiba Exposing method and apparatus
US5135590A (en) * 1991-05-24 1992-08-04 At&T Bell Laboratories Optical fiber alignment method
US5170058A (en) * 1991-10-30 1992-12-08 International Business Machines Corporation Apparatus and a method for alignment verification having an opaque work piece between two artwork masters
JPH05216209A (ja) * 1992-02-03 1993-08-27 Nikon Corp フォトマスク
US5504596A (en) * 1992-12-21 1996-04-02 Nikon Corporation Exposure method and apparatus using holographic techniques
FR2704660B1 (fr) * 1993-04-27 1995-07-13 Sgs Thomson Microelectronics Masques pour une machine d'insolation double face.
US5346583A (en) * 1993-09-02 1994-09-13 At&T Bell Laboratories Optical fiber alignment techniques
EP0752600B1 (en) 1995-07-06 2003-12-17 Dai Nippon Printing Co., Ltd. Hologram color filter, and its fabrication method
JPH0961111A (ja) * 1995-08-28 1997-03-07 Nikon Corp パターン座標測定方法および装置
KR0172790B1 (ko) * 1995-09-18 1999-03-20 김영환 위상반전 마스크 및 그 제조방법
JPH09166416A (ja) * 1995-12-13 1997-06-24 Mitsubishi Electric Corp レチクルパターンの相対的位置ずれ量計測方法およびレチクルパターンの相対的位置ずれ量計測装置
US5627378A (en) * 1996-02-28 1997-05-06 Orc Electronic Products, A Divison Of Benson Eyecare Corporation Die set for automatic UV exposure system
US6156220A (en) * 1997-03-10 2000-12-05 Ohlig; Albert H. System and method for optically aligning films and substrates used in printed circuit boards
US6324010B1 (en) 1999-07-19 2001-11-27 Eastman Kodak Company Optical assembly and a method for manufacturing lens systems
US6737223B2 (en) * 2000-08-07 2004-05-18 Shipley Company, L.L.C. Fiber optic chip with lenslet array and method of fabrication
US7086134B2 (en) * 2000-08-07 2006-08-08 Shipley Company, L.L.C. Alignment apparatus and method for aligning stacked devices
US6587618B2 (en) * 2001-03-16 2003-07-01 Corning Incorporated Collimator array and method and system for aligning optical fibers to a lens array
US6621553B2 (en) 2001-03-30 2003-09-16 Perkinelmer, Inc. Apparatus and method for exposing substrates
JP2004253741A (ja) * 2003-02-21 2004-09-09 Sumitomo Eaton Noba Kk 移動装置及び半導体製造装置
CN101452228B (zh) * 2007-11-29 2010-11-17 富葵精密组件(深圳)有限公司 自动对位装置
TWI506313B (zh) * 2011-12-27 2015-11-01 Hon Hai Prec Ind Co Ltd 光纖耦合連接裝置
CN102608877B (zh) * 2012-03-30 2013-09-04 上海华力微电子有限公司 光刻套刻方法以及光刻方法
CN102759865B (zh) * 2012-07-26 2016-02-03 四川聚能核技术工程有限公司 曝光对位系统
GB2563435A (en) * 2017-06-16 2018-12-19 The Univ Court Of The Univ Of St Andrews Three-photon light sheet imaging
KR102721980B1 (ko) 2022-02-24 2024-10-25 삼성전자주식회사 기판 정렬 장치 및 이를 이용한 기판 정렬 방법
CN116430579B (zh) * 2022-12-21 2026-02-24 西安应用光学研究所 一种基于振荡狭缝的光电瞄准方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3264105A (en) * 1962-05-31 1966-08-02 Western Electric Co Method of using a master art drawing to produce a two-sided printed circuit board
US3759767A (en) * 1971-10-08 1973-09-18 Western Electric Co Mask alignment methods
US3963489A (en) * 1975-04-30 1976-06-15 Western Electric Company, Inc. Method of precisely aligning pattern-defining masks
US4109158A (en) * 1976-05-27 1978-08-22 Western Electric Company, Inc. Apparatus for positioning a pair of elements into aligned intimate contact
JPS5533146A (en) * 1978-08-30 1980-03-08 Dainippon Screen Mfg Co Ltd Photoelectric element for detecting and positioning register mark for engraving
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
DE3121666A1 (de) * 1981-05-30 1982-12-16 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren und einrichtung zur gegenseitigen ausrichtung von objekten bei roentgenstrahl- und korpuskularstrahl-belichtungsvorgaengen
US4545683A (en) * 1983-02-28 1985-10-08 The Perkin-Elmer Corporation Wafer alignment device
DE3443178A1 (de) * 1984-11-27 1986-05-28 Hoechst Ag, 6230 Frankfurt Verfahren zum positionieren von druckformen vor dem stanzen von registerlochungen sowie anordnung zum durchfuehren des verfahrens

Also Published As

Publication number Publication date
KR890002971A (ko) 1989-04-12
DE3874028T2 (de) 1993-01-07
JPS6424420A (en) 1989-01-26
ES2034237T3 (es) 1993-04-01
CA1296180C (en) 1992-02-25
KR970004887B1 (ko) 1997-04-08
EP0298642A3 (en) 1989-04-26
JPH0766904B2 (ja) 1995-07-19
DE3874028D1 (de) 1992-10-01
EP0298642B1 (en) 1992-08-26
DK373188D0 (da) 1988-07-05
EP0298642A2 (en) 1989-01-11
DK373188A (da) 1989-01-07
US4835078A (en) 1989-05-30

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