SG67441A1 - Processing system - Google Patents

Processing system

Info

Publication number: SG67441A1
Authority: SG; Singapore
Prior art keywords: processing system; processing
Prior art date: 1996-11-19

Application number

SG1997004074A

Other languages

English (en)

Inventor

Masami Akimoto

Issei Ueda

Original Assignee

Tokyo Electron Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1996-11-19

Filing date

1997-11-17

Publication date

1999-09-21

1997-11-17 Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd

1999-09-21 Publication of SG67441A1 publication Critical patent/SG67441A1/en

Links

Classifications

- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H10P72/3411—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means

SG1997004074A 1996-11-19 1997-11-17 Processing system SG67441A1 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP32340396A JP3774283B2 (ja)	1996-11-19	1996-11-19	処理システム

Publications (1)

Publication Number	Publication Date
SG67441A1 true SG67441A1 (en)	1999-09-21

Family

ID=18154334

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SG1997004074A SG67441A1 (en)	1996-11-19	1997-11-17	Processing system

Country Status (6)

Country	Link
US (2)	US6126703A (fr)
EP (1)	EP0843343B1 (fr)
JP (1)	JP3774283B2 (fr)
DE (1)	DE69719151T2 (fr)
SG (1)	SG67441A1 (fr)
TW (1)	TW354406B (fr)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3926890B2 (ja) *	1997-06-11	2007-06-06	東京エレクトロン株式会社	処理システム
US6533531B1 (en) *	1998-12-29	2003-03-18	Asml Us, Inc.	Device for handling wafers in microelectronic manufacturing
US6293713B1 (en) *	1999-07-02	2001-09-25	Tokyo Electron Limited	Substrate processing apparatus
JP3635214B2 (ja) *	1999-07-05	2005-04-06	東京エレクトロン株式会社	基板処理装置
SG185822A1 (en)	2000-02-01	2012-12-28	Tokyo Electron Ltd	Substrate processing apparatus and substrate processing method
US6395648B1 (en)	2000-02-25	2002-05-28	Wafermasters, Inc.	Wafer processing system
JP3943828B2 (ja) *	2000-12-08	2007-07-11	東京エレクトロン株式会社	塗布、現像装置及びパターン形成方法
JP3916473B2 (ja) *	2002-01-31	2007-05-16	東京エレクトロン株式会社	基板処理装置および基板処理方法
US20030168175A1 (en) *	2002-03-08	2003-09-11	Kim Kyung-Tae	Substrate alignment apparatus
DE10217028C1 (de) *	2002-04-11	2003-11-20	Nanophotonics Ag	Meßmodul für Waferfertigungsanlagen
WO2006124472A2 (fr) *	2005-05-12	2006-11-23	Applied Materials, Inc.	Procede et appareil permettant le transport vertical de substrats semi-conducteurs dans un module de nettoyage
JP5132920B2 (ja) *	2006-11-22	2013-01-30	東京エレクトロン株式会社	塗布・現像装置および基板搬送方法、ならびにコンピュータプログラム
JP4853374B2 (ja) *	2007-04-27	2012-01-11	東京エレクトロン株式会社	塗布、現像装置及びその方法並びに記憶媒体
JP4464993B2 (ja) *	2007-06-29	2010-05-19	東京エレクトロン株式会社	基板の処理システム
JP4684268B2 (ja) *	2007-08-30	2011-05-18	株式会社アルバック	真空処理装置、基板搬送方法
KR101681185B1 (ko) *	2014-11-04	2016-12-02	세메스 주식회사	인터페이스 모듈 및 이를 포함하는 기판 처리 장치 및 방법
CN110817391B (zh) *	2019-11-24	2021-09-07	湖南凯通电子有限公司	基板装卸机

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4584045A (en) *	1984-02-21	1986-04-22	Plasma-Therm, Inc.	Apparatus for conveying a semiconductor wafer
JPS61123150A (ja) *	1985-10-23	1986-06-11	Hitachi Ltd	製造装置
JPS62213259A (ja) *	1986-03-14	1987-09-19	Shinkawa Ltd	バツフア装置
US4917556A (en) *	1986-04-28	1990-04-17	Varian Associates, Inc.	Modular wafer transport and processing system
US5030057A (en) *	1987-11-06	1991-07-09	Tel Sagami Limited	Semiconductor wafer transferring method and apparatus and boat for thermal treatment of a semiconductor wafer
JPH0617295Y2 (ja) *	1987-11-27	1994-05-02	大日本スクリーン製造株式会社	基板受け渡し装置
KR970003907B1 (ko) *	1988-02-12	1997-03-22	도오교오 에레구토론 가부시끼 가이샤	기판처리 장치 및 기판처리 방법
US5202716A (en) *	1988-02-12	1993-04-13	Tokyo Electron Limited	Resist process system
US5024570A (en) *	1988-09-14	1991-06-18	Fujitsu Limited	Continuous semiconductor substrate processing system
US5061144A (en) *	1988-11-30	1991-10-29	Tokyo Electron Limited	Resist process apparatus
JPH04209110A (ja) *	1990-11-30	1992-07-30	Matsushita Electric Ind Co Ltd	バッファー装置
KR970011065B1 (ko) *	1992-12-21	1997-07-05	다이닛뽕 스크린 세이조오 가부시키가이샤	기판처리장치와 기판처리장치에 있어서 기판교환장치 및 기판교환방법
JPH07164273A (ja) *	1993-12-16	1995-06-27	Deisuko Eng Service:Kk	２層テーブルを有する搬出入装置
JPH07297258A (ja) *	1994-04-26	1995-11-10	Tokyo Electron Ltd	板状体の搬送装置
US5826129A (en) *	1994-06-30	1998-10-20	Tokyo Electron Limited	Substrate processing system
TW297910B (fr) *	1995-02-02	1997-02-11	Tokyo Electron Co Ltd
JP3734295B2 (ja) *	1995-09-04	2006-01-11	大日本スクリーン製造株式会社	基板搬送装置
US5788868A (en) *	1995-09-04	1998-08-04	Dainippon Screen Mfg. Co., Ltd.	Substrate transfer method and interface apparatus

1996
- 1996-11-19 JP JP32340396A patent/JP3774283B2/ja not_active Expired - Fee Related
1997
- 1997-11-11 TW TW086116851A patent/TW354406B/zh not_active IP Right Cessation
- 1997-11-17 SG SG1997004074A patent/SG67441A1/en unknown
- 1997-11-17 US US08/972,150 patent/US6126703A/en not_active Expired - Fee Related
- 1997-11-18 DE DE69719151T patent/DE69719151T2/de not_active Expired - Lifetime
- 1997-11-18 EP EP97120153A patent/EP0843343B1/fr not_active Expired - Lifetime
1999
- 1999-12-27 US US09/472,199 patent/US6264705B1/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
JPH10150089A (ja)	1998-06-02
DE69719151T2 (de)	2003-12-04
EP0843343B1 (fr)	2003-02-19
EP0843343A2 (fr)	1998-05-20
US6126703A (en)	2000-10-03
DE69719151D1 (de)	2003-03-27
TW354406B (en)	1999-03-11
US6264705B1 (en)	2001-07-24
JP3774283B2 (ja)	2006-05-10
EP0843343A3 (fr)	2000-01-12

Publication	Publication Date	Title
GB9600823D0 (en)	1996-03-20	Distributed processing
GB2294789B (en)	1999-06-16	Distributed processing system
EP0717355A3 (fr)	1996-10-16	Système de traitement parallèle
SG64441A1 (en)	1999-04-27	Resist processing system
PL334610A1 (en)	2000-03-13	Car-park mangaging system
GB9706558D0 (en)	1997-05-21	Data processing system
GB9608664D0 (en)	1996-07-03	Voice processing system
GB9623892D0 (en)	1997-01-08	Speech processing system
SG72758A1 (en)	2000-05-23	Substrate processing system
GB9626669D0 (en)	1997-02-12	Distributed voice processing system
SG70641A1 (en)	2000-02-22	Processing system
DE69719151D1 (de)	2003-03-27	Verarbeitungssystem
GB9600854D0 (en)	1996-03-20	Distributed processing
GB2291740B (en)	1998-08-19	Wet processing system
GB9620196D0 (en)	1996-11-13	Distributed processing
EP0759595A3 (fr)	1997-07-30	Système de traitement de documents
GB2309132B (en)	2000-09-20	Object location system
GB9517048D0 (en)	1995-10-25	Processing system
GB9825009D0 (en)	1999-01-06	Processing system
GB9622343D0 (en)	1997-01-08	Processing system
GB2332305B (en)	2002-08-07	Signal processing system
ZA962679B (en)	1996-12-31	Data processing system
TW316494U (en)	1997-09-21	Exhaust processing system
GB9724182D0 (en)	1998-01-14	Processing system
TW303874U (en)	1997-04-21	Conveying system