SG72912A1 - Apparatus for treatment of exhaust gases containing hydrogen - Google Patents

Apparatus for treatment of exhaust gases containing hydrogen

Info

Publication number
SG72912A1
SG72912A1 SG1998005980A SG1998005980A SG72912A1 SG 72912 A1 SG72912 A1 SG 72912A1 SG 1998005980 A SG1998005980 A SG 1998005980A SG 1998005980 A SG1998005980 A SG 1998005980A SG 72912 A1 SG72912 A1 SG 72912A1
Authority
SG
Singapore
Prior art keywords
treatment
exhaust gases
containing hydrogen
gases containing
hydrogen
Prior art date
Application number
SG1998005980A
Other languages
English (en)
Inventor
Yoshikazu Tanabe
Yukio Minami
Koji Kawada
Nobukazu Ikeda
Akihiro Morimoto
Keiji Hirao
Original Assignee
Fujikin Kk
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikin Kk, Hitachi Ltd filed Critical Fujikin Kk
Publication of SG72912A1 publication Critical patent/SG72912A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/72—Organic compounds not provided for in groups B01D53/48 - B01D53/70, e.g. hydrocarbons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8671—Removing components of defined structure not provided for in B01D53/8603 - B01D53/8668

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Treating Waste Gases (AREA)
  • Catalysts (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SG1998005980A 1998-01-06 1998-12-30 Apparatus for treatment of exhaust gases containing hydrogen SG72912A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00088498A JP3563950B2 (ja) 1998-01-06 1998-01-06 水素含有排ガス処理装置

Publications (1)

Publication Number Publication Date
SG72912A1 true SG72912A1 (en) 2000-05-23

Family

ID=11486109

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1998005980A SG72912A1 (en) 1998-01-06 1998-12-30 Apparatus for treatment of exhaust gases containing hydrogen

Country Status (9)

Country Link
US (1) US6274098B1 (fr)
EP (1) EP0928631B1 (fr)
JP (1) JP3563950B2 (fr)
KR (1) KR100289986B1 (fr)
CA (1) CA2258632C (fr)
DE (1) DE69925648T2 (fr)
IL (1) IL127760A (fr)
SG (1) SG72912A1 (fr)
TW (1) TW457119B (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW462093B (en) * 1997-03-05 2001-11-01 Hitachi Ltd Method for manufacturing semiconductor integrated circuit device having a thin insulative film
CN1279582C (zh) * 1999-08-06 2006-10-11 株式会社富士金 水分发生用反应炉
IL144024A0 (en) * 2000-06-05 2002-04-21 Fujikin Kk Reactor for generating moisture
KR100777672B1 (ko) * 2005-12-20 2007-11-28 코아텍주식회사 수소가스 처리용 스크러버 시스템
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
KR101670461B1 (ko) * 2015-06-11 2016-11-01 주식회사 테라세미콘 수소 포함 배기가스 처리장치
WO2017032404A1 (fr) * 2015-08-24 2017-03-02 Applied Materials, Inc. Appareil de dépôt par pulvérisation sous vide et son procédé
CN105999997B (zh) * 2016-06-29 2018-09-25 上海立得催化剂有限公司 间断、小流量、低轻烃组分浓度的含轻烃尾气的处理方法
US10983537B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
KR102450632B1 (ko) * 2022-03-17 2022-10-06 (주)진솔루션 반도체 제조 수소 공정의 배기 수소 처리장치

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1692916A (en) * 1927-01-04 1928-11-27 Woodruff Asa Allen Ejector
US4008050A (en) * 1975-06-11 1977-02-15 Betz Erwin C Apparatus for combining oxygen and hydrogen
US4119706A (en) * 1976-10-12 1978-10-10 Engelhard Minerals & Chemicals Corporation Method of catalytically recombining radiolytic hydrogen and radiolytic oxygen
US4178760A (en) * 1976-12-02 1979-12-18 Filterwerk Mann & Hummel Gmbh Filter dust ejector and check valve arrangement in exhaust system of internal combustion engine
JPS5749895A (en) 1980-09-10 1982-03-24 Hitachi Ltd Catalyst structure of recombiner
DE4319973A1 (de) * 1993-06-17 1995-02-16 Forschungszentrum Juelich Gmbh Katalysatoren zur Beseitigung von Wasserstoff aus einer Wasserstoff, Luft und Dampf enthaltenden Atmosphäre
DE19548235C2 (de) * 1995-12-22 1999-02-25 Forschungszentrum Juelich Gmbh Vorrichtung zur Entfernung von Wasserstoff aus einem Gasgemisch und Anwendung der Vorrichtung
JP3110465B2 (ja) * 1996-01-29 2000-11-20 株式会社 フジキン 水分発生用反応炉と水分発生用反応炉の温度制御方法及び白金コーティング触媒層の形成方法
US5907076A (en) * 1996-12-31 1999-05-25 Exxon Chemical Patents Inc. Process for selectively separating hydrogen, or both hydrogen and carbon monoxide from olefinic hydrocarbons
JP3808975B2 (ja) * 1997-06-17 2006-08-16 忠弘 大見 半導体製造用水分の発生方法

Also Published As

Publication number Publication date
DE69925648T2 (de) 2006-03-16
TW457119B (en) 2001-10-01
KR19990067729A (ko) 1999-08-25
EP0928631A3 (fr) 1999-09-29
EP0928631A2 (fr) 1999-07-14
CA2258632A1 (fr) 1999-07-06
DE69925648D1 (de) 2005-07-14
IL127760A0 (en) 1999-10-28
IL127760A (en) 2003-06-24
KR100289986B1 (ko) 2001-05-15
JP3563950B2 (ja) 2004-09-08
EP0928631B1 (fr) 2005-06-08
JPH11192429A (ja) 1999-07-21
US6274098B1 (en) 2001-08-14
CA2258632C (fr) 2002-07-16

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