SG86372A1 - Water-distribution piping of gas-dissolved cleaning water - Google Patents

Water-distribution piping of gas-dissolved cleaning water

Info

Publication number
SG86372A1
SG86372A1 SG200000584A SG200000584A SG86372A1 SG 86372 A1 SG86372 A1 SG 86372A1 SG 200000584 A SG200000584 A SG 200000584A SG 200000584 A SG200000584 A SG 200000584A SG 86372 A1 SG86372 A1 SG 86372A1
Authority
SG
Singapore
Prior art keywords
gas
water
cleaning water
dissolved
distribution piping
Prior art date
Application number
SG200000584A
Other languages
English (en)
Inventor
Hiroshi Morita
Original Assignee
Kurita Water Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP32562798A priority Critical patent/JP3381250B2/ja
Priority to TW088118565A priority patent/TW418302B/zh
Priority to KR1019990050526A priority patent/KR100647447B1/ko
Priority to US09/440,571 priority patent/US6343779B1/en
Priority to EP99309073A priority patent/EP1001208A3/fr
Application filed by Kurita Water Ind Ltd filed Critical Kurita Water Ind Ltd
Priority to SG200000584A priority patent/SG86372A1/en
Priority to CNB001008927A priority patent/CN1209180C/zh
Publication of SG86372A1 publication Critical patent/SG86372A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/006—Water distributors either inside a treatment tank or directing the water to several treatment tanks; Water treatment plants incorporating these distributors, with or without chemical or biological tanks
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/727—Treatment of water, waste water, or sewage by oxidation using pure oxygen or oxygen rich gas
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/42—Ozonizers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Cleaning In General (AREA)
  • Pipeline Systems (AREA)
SG200000584A 1998-11-16 2000-02-02 Water-distribution piping of gas-dissolved cleaning water SG86372A1 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP32562798A JP3381250B2 (ja) 1998-11-16 1998-11-16 ガス溶解洗浄水の通水配管
TW088118565A TW418302B (en) 1998-11-16 1999-10-27 A water piping for gas dissolved cleaning water
KR1019990050526A KR100647447B1 (ko) 1998-11-16 1999-11-15 가스 용해 세정수의 수로 배관
US09/440,571 US6343779B1 (en) 1998-11-16 1999-11-15 Water distribution piping of gas-dissolved cleaning water
EP99309073A EP1001208A3 (fr) 1998-11-16 1999-11-15 Tuyauterie de distribution d'eau pour de l'eau de nettoyage contenant un gaz dissous
SG200000584A SG86372A1 (en) 1998-11-16 2000-02-02 Water-distribution piping of gas-dissolved cleaning water
CNB001008927A CN1209180C (zh) 1998-11-16 2000-02-14 溶解有气体的清洗水用配水管路

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP32562798A JP3381250B2 (ja) 1998-11-16 1998-11-16 ガス溶解洗浄水の通水配管
SG200000584A SG86372A1 (en) 1998-11-16 2000-02-02 Water-distribution piping of gas-dissolved cleaning water
CNB001008927A CN1209180C (zh) 1998-11-16 2000-02-14 溶解有气体的清洗水用配水管路

Publications (1)

Publication Number Publication Date
SG86372A1 true SG86372A1 (en) 2002-02-19

Family

ID=27178724

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200000584A SG86372A1 (en) 1998-11-16 2000-02-02 Water-distribution piping of gas-dissolved cleaning water

Country Status (7)

Country Link
US (1) US6343779B1 (fr)
EP (1) EP1001208A3 (fr)
JP (1) JP3381250B2 (fr)
KR (1) KR100647447B1 (fr)
CN (1) CN1209180C (fr)
SG (1) SG86372A1 (fr)
TW (1) TW418302B (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002018432A (ja) * 2000-07-07 2002-01-22 Shibaura Mechatronics Corp オゾン水処理装置及び洗浄処理装置
JP4469078B2 (ja) * 2000-11-13 2010-05-26 コフロック株式会社 高濃度オゾン水製造装置及びこの装置を用いた高濃度オゾン水の製造方法
US7244354B2 (en) * 2001-01-12 2007-07-17 Alab, Llc Ozone irrigator
DE10295630T5 (de) * 2001-01-12 2004-04-22 Alab, Llc Ozonspülvorrichtung
JP2002316027A (ja) * 2001-04-19 2002-10-29 Ebara Corp ガス溶解水製造装置、およびその方法、超音波洗浄装置、およびその方法
JP4942125B2 (ja) * 2001-07-26 2012-05-30 住友精密工業株式会社 オゾン処理システム
US8420699B1 (en) 2002-06-19 2013-04-16 Irvine L. Dubow Composition and methods of treatment using deionized and ozonated solution
US7897642B1 (en) * 2002-06-19 2011-03-01 Dr. Irvine Dubow Compositions and methods for dry eye syndrome
US7736494B2 (en) * 2003-07-31 2010-06-15 Acquisci, Inc. Ozone delivery system including a variable pitch gas-fluid contact device
JP5087839B2 (ja) * 2005-12-19 2012-12-05 栗田工業株式会社 水質評価方法、該方法を用いる超純水評価装置及び超純水製造システム
JP5327364B2 (ja) * 2006-02-10 2013-10-30 新日鐵住金株式会社 酸洗鋼板のリンス設備及びそのリンス方法
WO2009149990A1 (fr) * 2008-06-09 2009-12-17 Siemens Aktiengesellschaft Procédé de rinçage d'un système d'alimentation en combustible d'une turbine à gaz et système d'alimentation en combustible associé
MY202017A (en) * 2018-10-11 2024-03-28 Medklinn Tech Pte Ltd Distributed sterilizer system
SE542591C2 (en) * 2018-10-24 2020-06-09 Nanosized Sweden Ab Method and arrangement for semiconductor manufacturing
JP7412200B2 (ja) * 2020-02-06 2024-01-12 株式会社荏原製作所 ガス溶解液製造装置
IT202000009565A1 (it) * 2020-04-30 2021-10-30 Antonio Olivieri Impianto di ozonizzazione dell'aria, dell'acqua e/o di altro fluido

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5106503A (en) * 1988-03-11 1992-04-21 Tadahiro Ohmi Ultra-pure water supply piping system

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1810131A (en) * 1929-05-25 1931-06-16 American Ozone Company Device for mixing gases and liquids
US3670759A (en) * 1970-08-03 1972-06-20 Nippon Petroleum Refining Co Method and multi-branched network system for uniformly distributing the flow of mixed phase fluids
US4544207A (en) * 1982-07-14 1985-10-01 Union Carbide Corporation Process for the uniform distribution of a two phase mixture
US4800921A (en) * 1986-06-20 1989-01-31 Exxon Production Research Company Method and apparatus for dividing a single stream of liquid and vapor into multiple streams having similar vapor to liquid rations
US4824614A (en) * 1987-04-09 1989-04-25 Santa Fe Energy Company Device for uniformly distributing a two-phase fluid
US5492655A (en) * 1994-05-31 1996-02-20 Schuller International, Inc. Air/liquid static foam generator
US5670093A (en) * 1996-02-14 1997-09-23 Atlantic Richfield Company Fluid distribution system and method utilizing a radial splitter
US5904851A (en) * 1998-01-19 1999-05-18 Life International Products, Inc. Oxygenating apparatus, method for oxygenating liquid therewith, and applications thereof
SE514879C2 (sv) * 1998-03-09 2001-05-07 Otre Ab Framställning av vatten med förbestämd ozonkoncentration och användning av lösningen
US6074564A (en) * 1998-04-09 2000-06-13 Black & Veatch, L.L.P. Ozone injection system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5106503A (en) * 1988-03-11 1992-04-21 Tadahiro Ohmi Ultra-pure water supply piping system

Also Published As

Publication number Publication date
JP2000150450A (ja) 2000-05-30
US6343779B1 (en) 2002-02-05
EP1001208A2 (fr) 2000-05-17
KR100647447B1 (ko) 2006-11-23
KR20000035472A (ko) 2000-06-26
JP3381250B2 (ja) 2003-02-24
EP1001208A3 (fr) 2001-12-12
TW418302B (en) 2001-01-11
CN1209180C (zh) 2005-07-06
CN1309095A (zh) 2001-08-22

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