SG86376A1 - Refractory coated induction coil for use in thin film deposition and method for making - Google Patents

Refractory coated induction coil for use in thin film deposition and method for making

Info

Publication number
SG86376A1
SG86376A1 SG200001117A SG200001117A SG86376A1 SG 86376 A1 SG86376 A1 SG 86376A1 SG 200001117 A SG200001117 A SG 200001117A SG 200001117 A SG200001117 A SG 200001117A SG 86376 A1 SG86376 A1 SG 86376A1
Authority
SG
Singapore
Prior art keywords
making
thin film
induction coil
film deposition
refractory coated
Prior art date
Application number
SG200001117A
Other languages
English (en)
Inventor
K F Lam Raymond
Chi-Fung Lo
S Gilman Paul
Original Assignee
Praxair Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Praxair Technology Inc filed Critical Praxair Technology Inc
Publication of SG86376A1 publication Critical patent/SG86376A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Electrodes Of Semiconductors (AREA)
SG200001117A 1999-03-02 2000-03-01 Refractory coated induction coil for use in thin film deposition and method for making SG86376A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26030099A 1999-03-02 1999-03-02

Publications (1)

Publication Number Publication Date
SG86376A1 true SG86376A1 (en) 2002-02-19

Family

ID=22988611

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200001117A SG86376A1 (en) 1999-03-02 2000-03-01 Refractory coated induction coil for use in thin film deposition and method for making

Country Status (4)

Country Link
EP (1) EP1035561A2 (fr)
JP (1) JP2000273612A (fr)
KR (1) KR20000062666A (fr)
SG (1) SG86376A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2333086C2 (ru) * 2002-01-24 2008-09-10 Х.Ц. Щтарк, Инк. Очищенный лазерной обработкой и плавлением тугоплавкий металл и его сплав
US20060022411A1 (en) * 2004-07-15 2006-02-02 Beardsley M B Sealing system
EP2316252B1 (fr) 2008-08-04 2018-10-31 AGC Flat Glass North America, Inc. Source de plasma et procédé pour déposer des revêtements de film mince en utilisant un dépôt chimique en phase vapeur renforcé par plasma
JP2010100913A (ja) * 2008-10-24 2010-05-06 Citizen Tohoku Kk 薄膜形成装置および薄膜形成方法
EA201791234A1 (ru) 2014-12-05 2017-11-30 Эй-Джи-Си Гласс Юроуп, С.А. Плазменный источник с полым катодом
BR112017011770A2 (pt) * 2014-12-05 2017-12-26 Agc Flat Glass Na Inc fonte de plasma que utiliza um revestimento de redução de macro partícula e método de usar a fonte de plasma que utiliza um revestimento de redução de macro partícula para a deposição de revestimentos de filme fino e modificação de superfícies
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4054500A (en) * 1975-04-28 1977-10-18 Gte Sylvania Incorporated Method of making refractory metal-ceramic crucible
US5382339A (en) * 1993-09-17 1995-01-17 Applied Materials, Inc. Shield and collimator pasting deposition chamber with a side pocket for pasting the bottom of the collimator
JPH10316490A (ja) * 1997-05-19 1998-12-02 Kokusai Electric Co Ltd 高周波誘導加熱コイル及び半導体製造装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4054500A (en) * 1975-04-28 1977-10-18 Gte Sylvania Incorporated Method of making refractory metal-ceramic crucible
US5382339A (en) * 1993-09-17 1995-01-17 Applied Materials, Inc. Shield and collimator pasting deposition chamber with a side pocket for pasting the bottom of the collimator
JPH10316490A (ja) * 1997-05-19 1998-12-02 Kokusai Electric Co Ltd 高周波誘導加熱コイル及び半導体製造装置

Also Published As

Publication number Publication date
JP2000273612A (ja) 2000-10-03
KR20000062666A (ko) 2000-10-25
EP1035561A2 (fr) 2000-09-13

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