SU411323A1 - - Google Patents

Info

Publication number: SU411323A1
Authority: SU; USSR - Soviet Union
Prior art keywords: protective; electrical; vessels; film layers; electrical circuit
Prior art date: 1971-07-19

Application number

SU1683628A

Other languages

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1971-07-19

Filing date

1971-07-19

Publication date

1974-01-15

1971-07-19 Application filed filed Critical

1971-07-19 Priority to SU1683628A priority Critical patent/SU411323A1/ru

1974-01-15 Application granted granted Critical

1974-01-15 Publication of SU411323A1 publication Critical patent/SU411323A1/ru

Links

239000011253 protective coating Substances 0.000 description 11
229910052751 metal Inorganic materials 0.000 description 7
239000002184 metal Substances 0.000 description 7
239000010409 thin film Substances 0.000 description 7
239000000463 material Substances 0.000 description 5
230000001681 protective effect Effects 0.000 description 5
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
239000007788 liquid Substances 0.000 description 4
239000010936 titanium Substances 0.000 description 4
229910052719 titanium Inorganic materials 0.000 description 4
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
229910052804 chromium Inorganic materials 0.000 description 3
239000011651 chromium Substances 0.000 description 3
229910001338 liquidmetal Inorganic materials 0.000 description 3
238000005259 measurement Methods 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
229910045601 alloy Inorganic materials 0.000 description 2
239000000956 alloy Substances 0.000 description 2
229910052782 aluminium Inorganic materials 0.000 description 2
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
238000007743 anodising Methods 0.000 description 2
239000011248 coating agent Substances 0.000 description 2
238000000576 coating method Methods 0.000 description 2
239000004020 conductor Substances 0.000 description 2
230000005684 electric field Effects 0.000 description 2
239000010408 film Substances 0.000 description 2
239000000155 melt Substances 0.000 description 2
LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
229910000831 Steel Inorganic materials 0.000 description 1
NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
229910052614 beryl Inorganic materials 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
UHPOHYZTPBGPKO-UHFFFAOYSA-N bis(boranylidyne)chromium Chemical compound B#[Cr]#B UHPOHYZTPBGPKO-UHFFFAOYSA-N 0.000 description 1
239000003990 capacitor Substances 0.000 description 1
238000009749 continuous casting Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
230000006378 damage Effects 0.000 description 1
239000003989 dielectric material Substances 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000012212 insulator Substances 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
238000000034 method Methods 0.000 description 1
238000012544 monitoring process Methods 0.000 description 1
229910001120 nichrome Inorganic materials 0.000 description 1
150000004767 nitrides Chemical class 0.000 description 1
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
230000000704 physical effect Effects 0.000 description 1
238000007750 plasma spraying Methods 0.000 description 1
239000003870 refractory metal Substances 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
239000010959 steel Substances 0.000 description 1
239000000126 substance Substances 0.000 description 1
229910052715 tantalum Inorganic materials 0.000 description 1
GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1

Landscapes

Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)

SU1683628A 1971-07-19 1971-07-19 SU411323A1 (fr)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
SU1683628A SU411323A1 (fr)	1971-07-19	1971-07-19

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
SU1683628A SU411323A1 (fr)	1971-07-19	1971-07-19

Publications (1)

Publication Number	Publication Date
SU411323A1 true SU411323A1 (fr)	1974-01-15

Family

ID=20483650

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SU1683628A SU411323A1 (fr)	1971-07-19	1971-07-19

Country Status (1)

Country	Link
SU (1)	SU411323A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN108375424A (zh) *	2018-01-18	2018-08-07	深圳市志凌伟业技术股份有限公司	一种电容传感器

1971
- 1971-07-19 SU SU1683628A patent/SU411323A1/ru active

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN108375424A (zh) *	2018-01-18	2018-08-07	深圳市志凌伟业技术股份有限公司	一种电容传感器

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