TW200401707A - Laminated film - Google Patents
Laminated film Download PDFInfo
- Publication number
- TW200401707A TW200401707A TW092117155A TW92117155A TW200401707A TW 200401707 A TW200401707 A TW 200401707A TW 092117155 A TW092117155 A TW 092117155A TW 92117155 A TW92117155 A TW 92117155A TW 200401707 A TW200401707 A TW 200401707A
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- laminated film
- patent application
- scope
- layer
- Prior art date
Links
- 239000010410 layer Substances 0.000 claims abstract description 84
- 239000011247 coating layer Substances 0.000 claims abstract description 54
- -1 polyethylene naphthalene dicarboxylate Polymers 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 230000005540 biological transmission Effects 0.000 claims abstract description 7
- 238000000691 measurement method Methods 0.000 claims abstract description 6
- 239000010408 film Substances 0.000 claims description 239
- 239000007789 gas Substances 0.000 claims description 34
- 230000004888 barrier function Effects 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 30
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 25
- 238000005809 transesterification reaction Methods 0.000 claims description 22
- 238000006116 polymerization reaction Methods 0.000 claims description 20
- 229920005989 resin Polymers 0.000 claims description 20
- 239000011347 resin Substances 0.000 claims description 20
- 239000010409 thin film Substances 0.000 claims description 20
- 238000010438 heat treatment Methods 0.000 claims description 18
- 229920000728 polyester Polymers 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 239000002346 layers by function Substances 0.000 claims description 12
- 239000004925 Acrylic resin Substances 0.000 claims description 10
- 229920000178 Acrylic resin Polymers 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims description 9
- 150000004706 metal oxides Chemical class 0.000 claims description 9
- 229920001225 polyester resin Polymers 0.000 claims description 9
- 239000004645 polyester resin Substances 0.000 claims description 9
- 230000008859 change Effects 0.000 claims description 8
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 claims description 8
- 239000011112 polyethylene naphthalate Substances 0.000 claims description 8
- 239000007790 solid phase Substances 0.000 claims description 8
- 229910017052 cobalt Inorganic materials 0.000 claims description 7
- 239000010941 cobalt Substances 0.000 claims description 7
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 6
- 150000002148 esters Chemical class 0.000 claims description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 239000004698 Polyethylene Substances 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000003475 lamination Methods 0.000 claims description 4
- 229920000573 polyethylene Polymers 0.000 claims description 4
- 238000009877 rendering Methods 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 229910001887 tin oxide Inorganic materials 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 3
- 239000000155 melt Substances 0.000 claims description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 3
- 229920002554 vinyl polymer Polymers 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 239000002952 polymeric resin Substances 0.000 claims description 2
- 229920003002 synthetic resin Polymers 0.000 claims description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 238000013467 fragmentation Methods 0.000 claims 1
- 238000006062 fragmentation reaction Methods 0.000 claims 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 1
- 230000002829 reductive effect Effects 0.000 abstract description 14
- 238000012545 processing Methods 0.000 abstract description 2
- 238000001556 precipitation Methods 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 description 31
- 238000000576 coating method Methods 0.000 description 27
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical group OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 24
- 239000003054 catalyst Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- 239000002253 acid Substances 0.000 description 12
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- 239000000178 monomer Substances 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 8
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 238000007792 addition Methods 0.000 description 6
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 6
- 150000002009 diols Chemical class 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 229920005862 polyol Polymers 0.000 description 6
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 6
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 6
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 5
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
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- 239000000203 mixture Substances 0.000 description 5
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 150000007942 carboxylates Chemical class 0.000 description 4
- 150000001869 cobalt compounds Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 4
- 238000002955 isolation Methods 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical group C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 4
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 229920006267 polyester film Polymers 0.000 description 4
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
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- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000001361 adipic acid Substances 0.000 description 3
- 235000011037 adipic acid Nutrition 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
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- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
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- 239000011777 magnesium Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
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- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- WPUMVKJOWWJPRK-UHFFFAOYSA-N naphthalene-2,7-dicarboxylic acid Chemical compound C1=CC(C(O)=O)=CC2=CC(C(=O)O)=CC=C21 WPUMVKJOWWJPRK-UHFFFAOYSA-N 0.000 description 3
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- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 2
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- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
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- 239000000654 additive Substances 0.000 description 2
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- 229910052787 antimony Inorganic materials 0.000 description 2
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- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 2
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- 239000011734 sodium Substances 0.000 description 2
- YXTFRJVQOWZDPP-UHFFFAOYSA-M sodium;3,5-dicarboxybenzenesulfonate Chemical compound [Na+].OC(=O)C1=CC(C(O)=O)=CC(S([O-])(=O)=O)=C1 YXTFRJVQOWZDPP-UHFFFAOYSA-M 0.000 description 2
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- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
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- ZAOCWQZQPKGTRN-UHFFFAOYSA-N nitrous acid;sodium Chemical compound [Na].ON=O ZAOCWQZQPKGTRN-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 239000012785 packaging film Substances 0.000 description 1
- 229920006280 packaging film Polymers 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- RYYWUUFWQRZTIU-UHFFFAOYSA-K thiophosphate Chemical compound [O-]P([O-])([O-])=S RYYWUUFWQRZTIU-UHFFFAOYSA-K 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229940098465 tincture Drugs 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium(IV) ethoxide Substances [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
- C08J7/0423—Coating with two or more layers, where at least one layer of a composition contains a polymer binder with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/048—Forming gas barrier coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
Abstract
Description
200401707 (1) 玖、發明說明 【發明所屬之技術領域】 本發明係有關由聚乙烯萘二羧酸酯所成之層合薄膜者 。更詳細者係有關具良好透明性、色相,且,加熱時極少 產生低聚物之聚乙烯萘二羧酸酯所成之層合薄膜者。 【先前技術】 先行聚酯薄膜,特別是聚乙烯對苯二甲酸酯、聚乙烯 萘二羧酸酯之雙軸延伸薄膜爲具有良好機械性質、耐熱性 、耐藥性,因此,被提議做爲磁帶、強磁性薄膜膠帶、照 相薄膜、包裝用薄膜、電子零件用薄膜、電氣絕緣用薄膜 、金屬層壓塑料用薄膜,貼於玻璃顯示器等表面之薄膜, 各種部材之保護用薄膜等基材者(專利文獻1)。 又,被提議將聚酯薄膜適用於液晶顯示器所代表之影 像顯示裝置者。亦即,影像顯示裝置中,先行係以玻璃基 板被使用者。惟,近年來,影像顯示裝置被要求薄型、輕 量化、大畫面化、形狀自由度、曲面顯示,因此,以聚酯 薄膜等透明高分子薄膜基板取代厚重易裂之玻璃基板使用 者被硏討之(專利文獻2及3)。 特別是近年來,有機EL所代表之自體激光元件被積極 開發之,對於非得採用如液晶顯示器之背光、務必使用極多 部材之影像顯示裝置極欲改變之,此用途中玻璃之易裂、 厚重之缺點亦被極力要求改良之。 惟,截至目前,欲提供一種充份改良玻璃缺點之理想撞 -5- r;'e A 疒〜 (2) (2)200401707 擊性,且,具有接近玻璃之透明性、色相的高分子薄膜者仍 極爲困難。 又,被利用於上記所代表顯示器用途之高分子薄膜依其 用途,其氣體隔離層、導體層、半導體層,若光體層等被層 合,而,此等層之層合中以蒸鍍、離子噴鍍、濺射、電漿 CDV等方法被利用之。適用該方法時,依不同方法有高低不 同溫度,惟,溫度太高易曝露,析出存在於薄膜之低分子物 的低聚物、損及透明性,爲去除所產生之低聚物將出現極複 雜步驟之問題點。 (特許文獻1)特開2002-27 3 844號公報 (特許文獻2)特開200卜1 38465號公報 (特許文獻3)特開2002-8062 1號公報 【發明內容】 本發明係以提供一種解決該先行技術之課題,具良好耐 撞擊性、透明性、色相,且,步驟過程中極少產生低聚物之 薄膜爲目的者。 亦即’本發明係由基材層及其至少單面被設置塗佈層所 成層合薄膜者, 該基材層由聚乙烯萘二羧酸酯所成,固有黏度爲 0.45〜0.70dl/g之定向薄膜者, 該層合薄膜之濁度當ΙΟΟμιη薄膜厚度時爲0.5 %以下、 L*a*b*顯色系中a*値與b*値於透射測定法下,薄膜厚度 100 μπι時均爲- 2.0〜+ 2.0,面定向係數爲0.15〜0.30者爲其特徵 (3) 200401707 之層合薄膜者。 本發明包含設置機能層於該層合薄膜之層合薄膜者、 機能層之特徵係至少1種選自棒塗佈層、氣體隔離層及導電 層所成群中者之層合薄膜。 又’本發明包含由該該層合薄膜所成之EL顯示器用基 板、電泳紙用基板、太陽電池用基板。200401707 (1) 发明 Description of the invention [Technical field to which the invention belongs] The present invention relates to a laminated film made of polyethylene naphthalate. More specifically, it relates to a laminated film made of polyvinyl naphthalate, which has good transparency and hue and rarely generates oligomers when heated. [Previous technology] Advance polyester films, especially biaxially stretched films of polyethylene terephthalate and polyethylene naphthalate, have good mechanical properties, heat resistance, and chemical resistance. Therefore, it is proposed to Tapes, ferromagnetic film tapes, photographic films, packaging films, films for electronic parts, films for electrical insulation, films for metal laminated plastics, films affixed to surfaces such as glass displays, films for protection of various materials, etc. (Patent Document 1). Furthermore, it has been proposed to apply a polyester film to an image display device represented by a liquid crystal display. That is, in the image display device, a user first uses a glass substrate. However, in recent years, image display devices have been required to be thin, lightweight, large screens, shape freedom, and curved display. Therefore, users who use transparent polymer film substrates such as polyester films instead of thick and fragile glass substrates have been criticized. (Patent Documents 2 and 3). Especially in recent years, the self-laser element represented by the organic EL has been actively developed. For image display devices that must use a backlight such as a liquid crystal display and must use a large number of materials, it is extremely desirable to change the glass. The heavy shortcomings have also been strongly requested to be improved. However, as of now, I want to provide an ideal bumper which can improve the shortcomings of glass sufficiently. -5-e; 'e A 疒 ~ (2) (2) 200401707, and a polymer film with transparency and hue close to glass This is still extremely difficult. In addition, the polymer film used for the display application represented by the above note is based on its application. If the gas barrier layer, conductor layer, semiconductor layer, and photobody layer are laminated, the lamination of these layers is performed by evaporation, Ion plating, sputtering, plasma CDV and other methods are used. When this method is applied, there are different temperatures according to different methods. However, if the temperature is too high, it is easy to be exposed, and the oligomers of the low-molecular substances existing in the film are precipitated and the transparency is impaired. Problems with complex steps. (Patent Document 1) JP 2002-27 3 844 (Patent Document 2) JP 200 1 38465 (Patent Document 3) JP 2002-8062 1 [Summary of the Invention] The present invention is to provide a The purpose of solving the problems of this prior art is to have a good impact resistance, transparency, hue, and rarely produce oligomer films during the steps. That is, the present invention is a laminate film formed of a base material layer and a coating layer provided on at least one side thereof. The base material layer is made of polyethylene naphthalate and has an inherent viscosity of 0.45 to 0.70 dl / g. For oriented films, the turbidity of the laminated film is 0.5% or less when the thickness of the film is 100 μm, and a * 値 and b * L in the L * a * b * color system are measured by the transmission method and the film thickness is 100 μm Both are -2.0 ~ + 2.0, and those with a plane orientation coefficient of 0.15 ~ 0.30 are the features of (3) 200401707 laminated films. The present invention includes a laminated film provided with a functional layer on the laminated film. The feature of the functional layer is at least one laminated film selected from the group consisting of a rod coating layer, a gas barrier layer, and a conductive layer. The present invention also includes a substrate for EL displays, a substrate for electrophoretic paper, and a substrate for solar cells formed from the laminated film.
本發明更包含對於EL顯示器用基板、電泳紙用基板或 太陽電池用基板之該層合薄膜之使用。 另外,本發明該層合薄膜之製造方法係由 (1) 於鈷元素之存在下,利用酯交換反應製造聚乙烯萘 二羧酸酯之步驟, (2) 將該聚乙烯基二羧酸酯於旋轉冷卻滾筒進行擠壓後 ,取得未延伸薄膜之步驟,The present invention further includes the use of the laminated film for a substrate for an EL display, a substrate for an electrophoretic paper, or a substrate for a solar cell. In addition, the manufacturing method of the laminated film of the present invention is (1) a step of manufacturing polyethylene naphthalene dicarboxylate by transesterification reaction in the presence of cobalt element, (2) the polyvinyl dicarboxylic acid ester The step of obtaining an unstretched film after pressing on a rotating cooling drum,
(3) 設置塗佈層於該未延伸薄膜後,往連續製膜方向(MD 方向)進行延伸,或使該未延伸薄膜往MD方向進行延伸後設 置塗佈層之後,取得層合單軸延伸薄膜之步驟, (4) 該層合單軸延伸薄膜針對連續製膜方向往垂直方向 (TD方向)延伸後,取得雙軸延伸薄膜之步驟,以及 (5) 將取得雙軸延伸薄膜進行熱固定之步驟,所成之該 層合薄膜之製造方法者。 【實施方式】 [發明實施之最佳形態] (聚乙烯萘二羧酸酯) -7- (4) (4)200401707 本發明中構成層合薄膜之聚乙烯萘二羧酸酯其主要二 羧酸成份爲萘二羧酸者,主要二醇成份爲乙二醇者。 做爲萘二羧酸例者如:2,6 -萘二羧酸、2,7 -萘二羧酸、 1,5 -萘二羧酸例者’其中又以2,6 -萘二羧酸爲較佳者。其 中「主要」係指本發明薄膜成份之聚合物構成成份中總重覆 單位至少爲90mol%,較佳者爲至少95mol%之意者。 共聚物時,做爲構成共聚物之共聚成份者可於分子內使 用具有2個酯形成性官能基之化合物者,該化合物例如:草酸 、己二酸、酞酸、癸二酸、十二烷二羧酸、異酞酸、對苯二 甲酸、1,4 -環己二羧酸、4,4、二苯二羧酸、苯基茚滿二羧 酸、2,7-萘二羧酸、萘滿二羧酸、萘烷二羧酸、二苯醚二 羧酸等類之二羧酸、對-氧基苯甲酸、對-氧基乙氧基苯甲酸 類之氧基羧酸、或丙二醇、三亞甲基二醇 '四亞甲基二醇、 六亞甲基二醇 '環己亞甲基二醇、新戊二醇、雙酚碾之環氧 乙烷附加物、雙酚A之環氧乙烷附加物、二乙二醇、聚環氧 乙烷二醇類之2價醇爲理想使用者。 此等化合物可以1種使用,亦可使用2種以上者。又,其 中理想之酸成份爲異酞酸、對苯二甲酸、4,4f -二苯基二羧 酸、2,7-萘二羧酸、對-氧基苯甲酸者,做爲二醇成份之例 者如:三亞甲基二醇、六亞甲基二醇、新戊二醇、雙酚碾之 環氧乙烷附加物者。 又’聚乙烯萘二羧酸酯可藉由苯甲酸、甲氧基聚亞烷基, 二醇等單官能性化合物使末端之氫氧基及/或羧基之一部份 或全部進行封鏈者,亦可以極少量之甘油、季戊四醇等類之 (5) (5)200401707 三宫能以上酯形成性化合物取得實質上爲線狀聚合物範圍內 所共聚者。 本發明聚酯可於二羧酸與二醇之反應下取得直接低聚合 物聚酯之方法,利用酯交換觸媒反應二羧酸之低級烷酯與二 醇後,於聚合觸媒之存在下進行熔融聚合反應之方法下取得 之。 做爲酯交換反應所使用之觸媒例者如含鈉、鉀、鎂、鈣 、鋅、緦、鈦、鉻、錳、鈷等化合物例者,其中又以使用含 鈷之1種或2種以上元素之化合物者做爲薄膜時較可取得理想 色相者。 做爲鈷化合物例者如:氧化物、氯化物、碳酸鹽、羧酸 鹽等例,又以羧酸鹽,特別以醋酸鹽爲較理想者。理想之鈷 化合物添加量以針對鈷元素之聚乙烯萘二羧酸酯、重量分率 下爲2〜80ppm者宜’較佳者爲4〜60ppm’特別以8〜40ppm爲最 佳。當鈷量不足2ppm時,則色相易帶黃色,反之,超出 8 0 p p m則易降低透明性。 又,做爲理想組合鈷化合物進行使用之化合物例者如: 鎂、鈣、錳等化合物例者,其中又以錳較可保持良好化合物 色相,且可促進酯交換反應做爲觸媒爲理想例者。 做爲錳化合物例者如:氧化物、氯化物、碳酸鹽、羧酸 鹽等例,又以羧酸鹽,特別以醋酸鹽爲最佳者。理想之添加 錳化合物量針對錳元素之薄膜、重量分率下,以20〜120ppm 爲宜,較佳者爲30〜lOOppm、特別以40〜80ppm爲最佳者、錳 化合物之添加量當針對錳元素薄膜其重量分率不足20ppm時 (6) (6)200401707 ,則易使酯交換反應不足,反之,超出120ppm則損及透明 性均不理想。 經由酯交換反應進行聚合時,於聚合反應前爲使酯交換 觸媒失活爲目的下,通常添加三甲基磷酸酯、三乙基磷酸酯 、三·正-丁基磷酸酯、正磷酸等磷化合物,而,做爲磷元素 之聚乙烯萘二羧酸酯中之含量爲20〜lOOppm者其聚酯熱安定 性良好爲理想者。更理想之添加量爲30〜90ppm、40〜80ppm 爲最佳者。又,磷化合物之添加量針對所添加之酯交換反應 觸媒總量,莫耳比以0.7〜2.0者宜。當此莫耳比不足0.7時, 則易造成酯交換觸媒之失活效果不足,反之,超出2.0時, 則易使熱安定性惡化。理想添加量莫耳比爲0.8〜1.9、更佳 者爲0.9〜1.8,特別以1.0〜1.7爲最佳。 做爲聚合觸媒例者如:三氧化銻、五氧化銻類之銻化合 物、二氧化鍺所代表之鍺化合物、四乙基鈦酸酯、四丙基酞 酸酯、四苯基酞酸酯、或此等一部份水解物、草酸二氧化酞 基銨、草酸鈦氧基鉀、鈦三乙醯醋酸酯類之鈦化合物例,爲 取得良好色相者以銻化合物爲宜,特別以三氧化銻爲最佳。 銻化合物之理想添加量以針對銻元素之薄膜,重量分率 下,以50〜400ppm爲宜,更佳者爲60〜300ppm,特別以 70〜200ppm爲最佳,當銻添加量不足5〇ppm時,則聚合速度 將極度延遲,反之,超出400ppm則降低透明性。 針對前述觸媒、安定劑之添加時間,其酯交換觸媒於酯 交換反應開始時,安定劑爲其酯交換反應實質結束時,聚合 觸媒於添加女疋劑之1 0分鐘以則進行添加者宜。 - 10- (7) (7)200401707 又,聚酯於熔融聚合後進行碎化後,於加熱減壓下,或 氮等不活性氣流中更進行固相聚合後,藉由聚合時之熱劣化 可防止著色爲理想者。特別是固有粘度爲0.40〜0.60dl/g之熔 融聚合聚合物更進行碎化後,固有粘度爲0.46〜0.75dl/g其固 相聚合可保持良好色相,且,溫度於該加工步驟中可抑制低 聚物產生之面觀之爲理想者。 本發明聚乙烯萘二羧酸酯亦可含有著色劑、靜電防止劑 、氧化防止劑、有機潤滑劑等者。 本發明層合薄膜係使該聚合物藉由熱觸解後,由接頭 進行旋轉之金屬滾筒等進行擠壓後,進行急冷之後,使取得 之未延伸薄膜往如:後述之連續製膜方向(MD方向)及針對連 續製膜方向往垂直方向(TD方向)進行延伸,藉由熱固定處理 後可製造之。 (固有粘度) 構成基材層之定向薄膜固有粘度爲0.45〜0.70dl/g者。當 薄膜固有粘度爲不足0.45 dl/g之薄膜於製膜步驟中易結晶化 ,因此,易於薄膜中生成微結晶,此使光散射,造成色相惡 化。又,固有粘度不足0.45dl/g之薄膜於製膜步驟中易產生 斷裂、降低耐撞擊性,做成薄膜時易龜裂。反之,固有粘度 超出0.70dl/g之薄膜於製造時,其聚合物之熔融粘度高,造 成熔融擠壓:不易,降低生產力,使得成本提高。 1 定向薄膜之固有粘度由層合薄膜去除塗佈層等之後, 使0.3g基材層溶於25ml之鄰-氯苯酚溶液後,於35 °C之溫度 -11 - (8) (8)2〇〇4〇17〇7 下進行測定。塗佈層等者可以刮鬍子、銼刀、等去除之。 (濁度) 本發明層合薄膜針對ΙΟΟμπι厚度之薄膜時其濁度爲0.5% 以下。超出0.5 %時,透明性變差,做爲顯示器時之視認性不 良,做爲太陽電池時降低光電轉換效率。每ΙΟΟμπι之濁度以 〇· 45 %以下者爲更佳,特別以0.4%以下爲最佳。 (L*a*b*顯色系之a*値與b*値) 本發明層合薄膜針對ΙΟΟμπι厚度之薄膜,其L*a*b*顯色 系之a*値與b*値以透射測定法進行測定時,均爲-2〜+ 2。當 此値不足-2,或超出+2時,則其薄膜色調將由無色彩至極大 不同調者,做爲顯示器時之色再顯性變差。此値以-1.8〜+1.8 爲更佳,特別以-1.6〜+1.6爲最佳。 又,本發明層合薄膜針對ΙΟΟμπι厚度之薄膜時,其a*値 與b*値以反射測定法爲-0.5〜+ 0.5時,其外光照射時色再顯 性較良好,因此爲理想者。此値以-0.4〜+ 0.4爲較佳,更以-0.3〜+ 0.3爲更佳,最佳者爲-0.2〜+ 0.2。 此等透明性控制色相相關之參數後,取得良好品質之薄 膜中,可藉由如前述聚酯聚合時所使用之觸媒、安定劑之種 類、添加量之最適化及聚合度之最適化而達成。 (面配向係數) 本發明層合薄膜其面定向係數爲0.15〜0.30。當面定向 ?-*.* rv r r' ih〇 -12- 200401707 Ο) 係數不足〇· 15時,則無法取得足夠之耐撞擊性,反之,大於 0.30時’則於製造薄膜時,易斷裂,而無法取得品質安定之 薄膜。較理想之面定向係數爲0.18〜0.29,更佳者爲0.21〜0.28 ,特別以0.24〜0.27爲最佳。 (尺寸變換率)(3) After the coating layer is set on the unstretched film, it is stretched in the continuous film-forming direction (MD direction), or after the unstretched film is stretched in the MD direction, after the coating layer is set, the laminated uniaxial extension is obtained. The step of film, (4) the step of obtaining the biaxially stretched film after the laminated uniaxially stretched film is extended in the vertical direction (TD direction) for the continuous film making direction, and (5) the biaxially stretched film is obtained for thermal fixation Step, the method of manufacturing the laminated film. [Embodiment] [The best form of implementation of the invention] (Polyvinylnaphthalene dicarboxylate) -7- (4) (4) 200401707 The polyethylene naphthalate dicarboxylate constituting the laminated film in the present invention is mainly dicarboxylic Those whose acid component is naphthalenedicarboxylic acid and whose main diol component is ethylene glycol. Examples of naphthalenedicarboxylic acids are: 2,6-naphthalenedicarboxylic acid, 2,7-naphthalenedicarboxylic acid, and 1,5-naphthalenedicarboxylic acid. For the better. The "mainly" means that the total repeating unit in the polymer constituents of the film component of the present invention is at least 90 mol%, preferably at least 95 mol%. In the case of a copolymer, as a copolymer component constituting the copolymer, a compound having two ester-forming functional groups can be used in the molecule, such as oxalic acid, adipic acid, phthalic acid, sebacic acid, and dodecane. Dicarboxylic acid, isophthalic acid, terephthalic acid, 1,4-cyclohexanedicarboxylic acid, 4,4, diphenyl dicarboxylic acid, phenylindane dicarboxylic acid, 2,7-naphthalenedicarboxylic acid, Dicarboxylic acids such as naphthalene dicarboxylic acid, decalin dicarboxylic acid, diphenyl ether dicarboxylic acid, p-oxybenzoic acid, p-oxyethoxybenzoic acid, or propylene glycol , Trimethylene glycol 'tetramethylene glycol, hexamethylene glycol' cyclohexylene glycol, neopentyl glycol, bisphenol milled ethylene oxide addition, bisphenol A ring Ethylene oxide additives, diethylene glycol, polyethylene oxide glycol divalent alcohols are ideal users. These compounds may be used singly or in combination of two or more kinds. In addition, the ideal acid component is isophthalic acid, terephthalic acid, 4,4f-diphenyldicarboxylic acid, 2,7-naphthalenedicarboxylic acid, and p-oxybenzoic acid as the diol component. Examples include: trimethylene glycol, hexamethylene glycol, neopentyl glycol, and bisphenol milled ethylene oxide additives. Polyethylene naphthalene dicarboxylic acid esters can be partially or fully blocked by monofunctional compounds such as benzoic acid, methoxy polyalkylene, and diols at the terminal. It is also possible to obtain a copolymer of substantially linear polymers in a small amount of (5) (5) 200401707 triglyceride-like ester-forming compounds such as glycerol and pentaerythritol. The polyester of the present invention can obtain a direct low-polymer polyester under the reaction of a dicarboxylic acid and a diol. After the lower alkyl ester of the dicarboxylic acid and the diol are reacted by using a transesterification catalyst, it is in the presence of a polymerization catalyst. Obtained by a method of performing melt polymerization. Examples of catalysts used in the transesterification reaction include compounds containing sodium, potassium, magnesium, calcium, zinc, hafnium, titanium, chromium, manganese, and cobalt, among which one or two types of cobalt are used. Compounds of the above elements are more likely to achieve ideal hue when used as a thin film. Examples of cobalt compounds are oxides, chlorides, carbonates, carboxylates, and the like, and carboxylates, especially acetates are more preferred. The amount of the cobalt compound to be added is preferably polyethylene naphthalene dicarboxylate with respect to the cobalt element, and 2 to 80 ppm at the weight fraction is preferable, more preferably 4 to 60 ppm, and particularly 8 to 40 ppm. When the amount of cobalt is less than 2 ppm, the hue tends to be yellowish; conversely, when it exceeds 80 p p m, the transparency is liable to decrease. Examples of compounds that are ideally used in combination with cobalt compounds are: Examples of compounds such as magnesium, calcium, and manganese. Among them, manganese can maintain a good compound hue and promote transesterification as an ideal catalyst. By. Examples of manganese compounds are oxides, chlorides, carbonates, carboxylates, and the like, and carboxylates, especially acetates are the most preferable. The ideal amount of added manganese compound is 20 ~ 120ppm, preferably 30 ~ 100ppm, especially 40 ~ 80ppm. When the elemental film has a weight fraction of less than 20 ppm (6) (6) 200401707, the transesterification reaction tends to be insufficient. On the other hand, if it exceeds 120 ppm, the transparency is not compromised. When polymerization is carried out through a transesterification reaction, trimethyl phosphate, triethyl phosphate, tri-n-butyl phosphate, orthophosphoric acid, etc. are usually added for the purpose of deactivating the transesterification catalyst before the polymerization reaction. Phosphorus compounds. Polyethylene naphthalene dicarboxylate as the phosphorus element has an ideal polyester having good thermal stability if the content is 20 to 100 ppm. More preferable addition amounts are 30 to 90 ppm, and 40 to 80 ppm are the best. In addition, the amount of phosphorus compound is preferably 0.7 to 2.0 based on the total amount of the transesterification catalyst added. When the molar ratio is less than 0.7, the inactivation effect of the transesterification catalyst is likely to be insufficient. On the other hand, when it exceeds 2.0, the thermal stability is easily deteriorated. The molar ratio is preferably 0.8 to 1.9, more preferably 0.9 to 1.8, and most preferably 1.0 to 1.7. Examples of polymerization catalysts include antimony trioxide, antimony pentoxide antimony compounds, germanium compounds represented by germanium dioxide, tetraethyl titanate, tetrapropyl phthalate, and tetraphenyl phthalate. Or some of these hydrolysates, titanium oxalate oxalate phthalate, potassium titanyl oxalate, titanium triacetamyl acetate, etc. Examples of titanium compounds are suitable for obtaining a good hue, especially trioxide Antimony is the best. The ideal amount of antimony compound is for the thin film of antimony element. In the weight fraction, it is preferably 50 ~ 400ppm, more preferably 60 ~ 300ppm, especially 70 ~ 200ppm. When the amount of antimony is less than 50ppm When it is too high, the polymerization rate will be extremely delayed, while if it exceeds 400 ppm, the transparency will be reduced. Regarding the adding time of the aforementioned catalyst and stabilizer, the transesterification catalyst was added at the beginning of the transesterification reaction, and the stabilizer was essentially terminated at the transesterification reaction. The polymerization catalyst was added in 10 minutes after adding the female tincture. Anyone should. -10- (7) (7) 200401707 In addition, after the polyester is melt-polymerized, it is crushed, and then solid-phase polymerization is performed under heating or reduced pressure, or in an inert gas stream such as nitrogen, and then thermally deteriorates during polymerization. Prevents coloring from being ideal. In particular, after the melt-polymerized polymer having an intrinsic viscosity of 0.40 to 0.60 dl / g is further reduced, its solid state polymerization can maintain a good hue when the intrinsic viscosity is 0.46 to 0.75 dl / g, and the temperature can be suppressed in this processing step. The appearance of oligomers is ideal. The polyethylene naphthalene dicarboxylate of the present invention may also contain a colorant, an antistatic agent, an oxidation inhibitor, an organic lubricant, and the like. The laminated film of the present invention is obtained by extruding the polymer through thermal dissolution, pressing a metal drum rotated by a joint, etc., and then quenching the obtained unstretched film such as: a continuous film forming direction described later ( MD direction) and the continuous film forming direction is extended to the vertical direction (TD direction), which can be manufactured after heat fixing treatment. (Intrinsic viscosity) The intrinsic viscosity of the oriented film constituting the base material layer is 0.45 to 0.70 dl / g. When the intrinsic viscosity of the thin film is less than 0.45 dl / g, it is easy to crystallize during the film formation step. Therefore, microcrystals are easily formed in the thin film, which scatters light and causes hue deterioration. In addition, a thin film having an intrinsic viscosity of less than 0.45 dl / g is prone to breakage during the film forming step, lowering the impact resistance, and is liable to crack when made into a thin film. Conversely, when a film with an inherent viscosity exceeding 0.70 dl / g is produced, its polymer has a high melt viscosity, resulting in melt extrusion: it is not easy, reduces productivity, and increases costs. 1 Intrinsic viscosity of the oriented film After removing the coating layer and the like from the laminated film, 0.3 g of the substrate layer was dissolved in 25 ml of o-chlorophenol solution, and the temperature was at 35 ° C -11-(8) (8) 2 The measurement was performed at 407,007,7. The coating layer, etc. can be removed by shaving, filing, etc. (Haze) The turbidity of the laminated film of the present invention at a thickness of 100 μm is 0.5% or less. When it exceeds 0.5%, the transparency becomes poor, the visibility is poor when used as a display, and the photoelectric conversion efficiency is reduced when used as a solar cell. The turbidity per 100 μm is more preferably 0.45% or less, particularly 0.4% or less. (L * a * b * a * 値 and b * 値 of the color rendering system) The laminated film of the present invention is directed to a film having a thickness of 100 μm, and the a * 値 and b * 显 of the L * a * b * color rendering system are transmitted When measured by the measurement method, all were -2 to +2. When this value is less than -2, or exceeds +2, the color tone of the film will change from no color to a greatly different tone, and the color will be worse when used as a display. In this case, -1.8 to +1.8 is more preferable, and -1.6 to +1.6 is particularly preferable. In addition, when the laminated film of the present invention is directed to a film having a thickness of 100 μm, when a * 値 and b * 値 are -0.5 to +0.5 by reflection measurement method, the color reappearance is better when exposed to external light, so it is ideal. . In this case, -0.4 ~ + 0.4 is preferable, -0.3 ~ + 0.3 is more preferable, and the most preferable is -0.2 ~ + 0.2. After these transparency-controlled hue-related parameters are obtained, a film of good quality can be obtained by optimizing the types of catalysts, stabilizers, addition amounts, and polymerization degrees as used in the aforementioned polyester polymerization. Reached. (Face Alignment Coefficient) The laminated film of the present invention has a surface orientation coefficient of 0.15 to 0.30. When the surface orientation?-*. * Rv rr 'ih〇-12- 200401707 〇) When the coefficient is less than 0.15, sufficient impact resistance cannot be obtained. Conversely, when it is greater than 0.30, it is easy to break when manufacturing thin films, and Unable to obtain a stable film. The more ideal surface orientation coefficient is 0.18 ~ 0.29, the more preferred is 0.21 ~ 0.28, and the most preferred is 0.24 ~ 0.27. (Size conversion rate)
本發明層合薄膜其薄膜連續製膜方向(MD方向)之尺寸 變換率係於200°C之溫度中、i40g/mm2載重下爲-2〜+ 2%者宜 。藉由此,於薄膜設置棒塗佈層、氣體隔離層、透明導電層 、半導體層、發光體層、金屬電極層等機能層之過程中薄膜 尺寸變換減少,於機能層不易產生龜裂。較理想之尺寸變換 率以-1 · 5〜+ 1 · 5 %,更理想者爲-1 · 〇〜+ 1 · 〇 %,特別以_ 〇. 5〜+ 〇. 5 % 爲最理想。 面配向係數及尺寸變換率係使聚合物之聚合度如上述, 且,藉由調整薄膜之延伸溫度、延伸倍率、熱固定溫度後可 做成所定範圍。In the laminated film of the present invention, the size conversion rate of the continuous film forming direction (MD direction) of the film is preferably at a temperature of 200 ° C and a load of i40g / mm2 of -2 to + 2%. Therefore, in the process of providing a functional layer such as a rod coating layer, a gas barrier layer, a transparent conductive layer, a semiconductor layer, a light emitting layer, and a metal electrode layer in the thin film, the size change of the thin film is reduced, and cracks are unlikely to occur in the functional layer. The more ideal size conversion rate is -1 · 5 ~ + 1.5%, the more ideal is -1 · 〇 ~ + 1 · 〇%, and especially _ 〇0.5 ~ + 0.5% is the most ideal. The surface alignment coefficient and size conversion rate are such that the polymerization degree of the polymer is as described above, and the predetermined range can be made by adjusting the stretching temperature, stretching ratio, and heat-fixing temperature of the film.
(低聚物數) 本發明層合薄膜於200°C下進行加熱30分鐘後之表面爲 0.24mm2之面積內低聚物數以2,000個以下者宜,更佳者爲 100個以下者。 低聚物數係將薄膜於200艺之烤箱中進行3〇分鐘加熱後 取出、表面蒸鍍鋁後,以微分干擾顯微鏡、640倍下進行觀 察0 · 2 4 m m2之面積後,計算所析出低聚物之數。 -13- (10) (10)200401707 (塗佈層) 本發明層合薄膜係以如後述之提高與機能層易於黏著 性,提昇薄膜自體之易滑性者爲目的,至少其單面具有塗佈 層者。 塗佈層係以由至少1種選自聚酯樹脂、胺基甲酸乙酯樹 脂、丙烯樹脂、乙烯系樹脂所成群之水溶性或水分散性高分 子樹脂所成者宜,特別以含有聚酯樹脂與丙烯樹脂兩者爲更 佳。 塗佈層之聚酯樹脂其玻璃轉移點(Tg)爲0〜100 °c者宜, 更佳者爲10〜90°C。該聚酯樹脂以可溶於水之水可溶性或分 散性之聚酯者宜,亦可含些許有機溶劑者。 做爲該聚酯樹脂例者如由以下之多鹽基酸或其酯形成衍 生物與聚醇或其酯形成衍生物所成者。 亦即,做爲多鹽基酸成份例者如:對苯二甲酸、異酞酸 、酞酸、酞酸酐、2,6 -萘二羧酸、1,4 -環己二羧酸、己二 酸、癸二酸、偏苯三酸、焦燐酸、二聚物酸、5-磺基異酞酸 鈉等例。使用2種以上此等酸後,進行合成共聚聚酯樹脂。 又,可使用少量之不飽和多鹽基酸成份馬來酸、衣康酸等及 對-羥基苯甲酸等類之羥基羧酸者。 另外,做爲聚醇成份例者如:乙二醇、1,心丁二醇、二 乙二醇、二丙二醇、1,6-己二醇、1,4-環己二甲醇、二甲 苯二醇、二羥甲基丙烷、聚(環氧乙烷)二醇、聚(四烯化毒) 二醇、雙酚A、雙酚A之環氧乙烯或環氧丙烷附加物等例。 另外,此等單體例並未限定於此等中。 -14- (11) (11)200401707 本發明所使用塗佈層之丙烯樹脂其玻璃轉移點(Tg)爲-50〜50°C者宜,更佳者爲-50〜。該丙烯樹脂以於水可溶 性或分散性之丙烯者宜,亦可含些許有機溶劑。 做爲該丙烯樹脂者可由如下之丙烯單體共聚之。做爲此 丙烯單體例者如:丙烯酸烷酯、甲基丙烯酸烷酯(做爲烷基者 如··甲基、乙基、正-丙基、異丙基、正-丁基、異丁基、第 三-丁基、2-乙基己基、環己基等);2-羥乙基丙烯酸酯、2-羥 乙基甲基丙烯酸酯、2 -羥丙基丙烯酸酯、2·羥丙基甲基丙烯 酸酯等含有羥基之單體;縮水甘油基丙烯酸酯、縮水甘油 基甲基丙烯酸酯、烯丙基縮水甘油醚等含環氧基之單體; 丙烯酸、甲基丙烯酸、衣康酸、馬來酸、延胡索酸、巴豆酸 、苯乙烯磺酸及其鹽(鈉鹽、鉀鹽、銨鹽、叔胺鹽等)等之羧 基或含其鹽之單體;丙烯醯胺、甲基丙烯醯胺、N-烷基丙 烯醯胺、N-烷基甲基丙烯醯胺、N,N-二烷基丙烯醯胺、N ,N-二烷基甲基丙烯酸酯(做爲烷基者爲甲基、乙基、正-丙 基、異丙基、正-丁基、異丁基、第三·丁基、2-乙基己基、 環己基等)、N-烷氧基丙烯醯胺、N·烷氧基甲基丙烯醯胺、N ,N-二烷氧基丙烯醯胺、N,N-二烷氧基甲基丙烯醯胺(做爲 烷氧基者如:甲氧基、乙氧基、丁氧基、異丁氧基等)、丙烯 醯基嗎啉、N-羥甲基丙烯醯胺、N-羥甲基甲基丙烯醯胺、N-苯基丙烯醯胺、N-苯基甲基丙烯醯胺等含醯胺基之單體; 馬來酸酐、衣康酸酐等酸’無水物之單體;乙烯異氰酸酯、 烯丙基異氰酸酯、苯乙烯、α -甲基苯乙烯、乙烯甲基醚、 乙烯乙基醚、乙烯三烷氧基矽烷、烷基馬來酸單酯、烷基延 (12) (12)200401707 胡索酸單酯、烷基衣康酸單酯、丙烯腈、甲基丙烯腈、氯化 亞乙烯、乙烯、丙烯、氯化乙烯、醋酸乙烯酯、丁二烯等單 體例者。又,此等單體例並未受限此等者。 本發明所使用該組成物爲形成塗佈,以水溶液、水分散 液、或乳化液等水性溶液之形態進行使用者宜。爲形成塗時 ,於必要時,除該組成物之外,可添加其他樹脂,如:具有 噁唑啉基之聚合物、蜜胺、環氧基、氮雜環丙烷等之交聯劑 、靜帶防止劑、著色劑、界面活性劑、紫外線吸收劑、潤滑 劑(塡料、蠟)、界面活性劑等者。特別是,添加潤滑劑後, 更可改善潤滑性、耐連粘性。 水性塗液之固形份濃度通常爲20重量%以下者宜,更以 1〜10重量%爲更佳,當此比例不足1重量%時,則對於聚酯薄 膜之塗敷性將不足,反之,超出20重量%則塗劑之安定性、 塗佈外觀將不良。 塗佈層之厚度以〇.〇1〜〇.2μιτι者宜。更理想之塗佈層厚度 爲 0.01 〜Ο.ίμιη,最佳者爲 0.02 〜Ο.ΐμπι。 (層合薄膜之厚度) 層合薄膜之厚度於做爲液晶顯示用擴散板用薄膜,防 止反射薄膜、觸碰配電盤、電漿顯示器、配電盤(PDP)用電 磁波保護膜、有機EL、電泳紙、太陽電池等之支撑體使用 時,爲取得必要之強度、與某種程度之自由折射性以 12〜500μηι者宜。較理想之層合薄膜厚度爲16〜400μηι、更佳 者爲25〜350μιη、特別以50〜250μηι爲最佳。 -16- (13) (13)200401707 (層合薄膜之製造方法) 本發明理想之層合薄膜係可藉由 (1) 於銘元素之存在下,利用酯交換反應,製造聚乙烯 萘二羧酸酯之步驟, (2) 於旋轉冷卻滾筒上進行該聚乙烯萘二羧酸酯之擠壓 後,取得未延伸薄膜之步驟, (3) 於該未延伸薄膜設置塗佈層後,往連續製膜方向(Md 方向)進行延伸,或使該未延伸薄膜往MD方向進行延伸後, 設置塗佈層,取得層合單軸延伸薄膜之步驟, (4) 針對連續製膜方向往垂直方向(TD方向)進行延伸 層合單軸延伸薄膜,取得雙軸延伸薄膜之步驟,以及, (5 )將取得之雙軸延伸薄膜進行熱固定之步驟, 可製造之 酯交換反應針對聚乙烯萘二羧酸酯、重量分率下以 2〜80ppm、更佳者4〜60ppm、特別以8〜40ppm之銘元素存在下 進行者爲最理想者。 製造聚乙烯萘二羧酸酯之步驟中,酯交換反應後,其固 有粘度呈0.40〜0.60dl/g爲止進行熔融聚合反應,之後碎化後 使固有粘度呈0.46〜0.75dl/g爲止進行固相聚合反應者宜。固 有粘度之調整係使熔融聚合取得之小片進行真空乾燥後,真 空下或不活性氣體之存在下,可於200〜250 °C之溫度進行加 熱至呈目的之,固有粘度者。該小片進行熔融製膜做成薄膜後 ,些許降低固有粘度。 理想之薄膜延伸溫度係使聚合物之玻璃轉移溫度做成(Number of oligomers) The number of oligomers in the area of the surface of the laminated film of the present invention after being heated at 200 ° C for 30 minutes is preferably 0.24 mm2 or less, and more preferably 100 or less. The oligomer number is obtained by heating the film in a 200-art oven for 30 minutes, removing the surface, and vapor-depositing aluminum, and then observing the area of 0 · 2 4 m 2 with a differential interference microscope at 640 times. Number of oligomers. -13- (10) (10) 200401707 (coating layer) The laminated film of the present invention is for the purpose of improving the easy adhesion of the functional layer as described later, and improving the sliding property of the film itself, at least on one side of the film. Coating layer. The coating layer is preferably made of at least one kind of water-soluble or water-dispersible polymer resin selected from the group consisting of polyester resins, urethane resins, acrylic resins, and ethylene-based resins. In particular, the coating layer contains a polymer Both ester resins and acrylic resins are more preferred. The polyester resin of the coating layer preferably has a glass transition point (Tg) of 0 to 100 ° C, and more preferably 10 to 90 ° C. The polyester resin is preferably a water-soluble or dispersible polyester which is soluble in water, and may also contain some organic solvents. Examples of the polyester resin include those formed from the following polybasic acid or its ester-forming derivative and a polyalcohol or its ester-forming derivative. That is, examples of the polybasic acid component include terephthalic acid, isophthalic acid, phthalic acid, phthalic anhydride, 2,6-naphthalenedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, and adipic acid. Examples include acids, sebacic acid, trimellitic acid, pyroic acid, dimer acid, and sodium 5-sulfoisophthalate. After using two or more of these acids, a synthetic copolymer polyester resin is carried out. Also, a small amount of an unsaturated polybasic acid component, such as maleic acid, itaconic acid, and the like, and hydroxycarboxylic acids such as p-hydroxybenzoic acid, can be used. In addition, as examples of the polyol component, ethylene glycol, 1, butanediol, diethylene glycol, dipropylene glycol, 1,6-hexanediol, 1,4-cyclohexanedimethanol, and xylene Examples of alcohols, dimethylolpropane, poly (ethylene oxide) glycol, poly (tetraalkylene poison) glycol, bisphenol A, bisphenol A, ethylene oxide, or propylene oxide additions. In addition, these monomer examples are not limited to these. -14- (11) (11) 200401707 The acrylic resin of the coating layer used in the present invention preferably has a glass transition point (Tg) of -50 to 50 ° C, more preferably -50 to. The propylene resin is preferably water-soluble or dispersible propylene, and may contain some organic solvents. As the propylene resin, the following propylene monomers can be copolymerized. Examples of such propylene monomers are: alkyl acrylates and alkyl methacrylates (as alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl Group, tert-butyl, 2-ethylhexyl, cyclohexyl, etc.); 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2.hydroxypropyl Hydroxyl-containing monomers such as methacrylate; epoxy-containing monomers such as glycidyl acrylate, glycidyl methacrylate, allyl glycidyl ether; acrylic acid, methacrylic acid, itaconic acid, Maleic acid, fumaric acid, crotonic acid, styrene sulfonic acid and its salts (sodium salt, potassium salt, ammonium salt, tertiary amine salt, etc.) and other carboxyl groups or monomers containing the salts; acrylamide, methacrylic acid Amine, N-alkyl propylene amide, N-alkyl methacrylamide, N, N-dialkyl propylene amide, N, N-dialkyl methacrylate (for alkyl Group, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, 2-ethylhexyl, cyclohexyl, etc.), N-alkoxyacrylamide, N ·alkyl Methyl methacrylamide, N, N-dialkoxyacrylamide, N, N-dialkoxymethacrylamide (as alkoxy groups such as: methoxy, ethoxy, butane (Oxy, isobutoxy, etc.), acrylamidomorpholine, N-methylol acrylamide, N-methylol acrylamide, N-phenylacrylamide, N-phenylmethyl Acrylamidine-containing monomers such as fluorenamine; monomers of anhydrides such as maleic anhydride and itaconic anhydride; ethylene isocyanate, allyl isocyanate, styrene, α-methylstyrene, and vinyl methyl ether , Ethylene ethyl ether, ethylene trialkoxy silane, alkyl maleic acid monoester, alkyl extended (12) (12) 200401707 humic acid monoester, alkyl itaconic acid monoester, acrylonitrile, methyl Examples of monomers are acrylonitrile, vinylidene chloride, ethylene, propylene, vinyl chloride, vinyl acetate, and butadiene. Moreover, these individual examples are not limited to these. The composition used in the present invention is suitable for users to form a coating, and to perform it in the form of an aqueous solution such as an aqueous solution, an aqueous dispersion, or an emulsion. In order to form the coating, if necessary, in addition to the composition, other resins can be added, such as: polymers with oxazoline groups, melamine, epoxy groups, azacyclopropane, etc. With preventive agents, colorants, surfactants, UV absorbers, lubricants (economy, wax), surfactants, etc. In particular, by adding a lubricant, the lubricity and the adhesion resistance can be improved. The solid content concentration of the aqueous coating liquid is usually less than 20% by weight, and more preferably 1 to 10% by weight. When the ratio is less than 1% by weight, the coating property to the polyester film will be insufficient, otherwise, If it exceeds 20% by weight, the stability and coating appearance of the coating agent will be poor. The thickness of the coating layer is preferably from 0.01 to 0.2 μm. A more desirable thickness of the coating layer is 0.01 to 0. Ιμιη, and the best is 0.02 to 〇. Ϊ́μπι. (Thickness of laminated film) The thickness of laminated film is used as a thin film for liquid crystal display, anti-reflection film, touch panel, plasma display, electromagnetic wave protective film for distribution panel (PDP), organic EL, electrophoretic paper, When a support such as a solar cell is used, it is preferably 12 to 500 μm in order to obtain necessary strength and a certain degree of free refraction. More preferably, the thickness of the laminated film is 16 to 400 μm, more preferably 25 to 350 μm, and most preferably 50 to 250 μm. -16- (13) (13) 200401707 (Manufacturing method of laminated film) The ideal laminated film of the present invention can be used to produce polyethylene naphthalene dicarboxylate by (1) using transesterification reaction in the presence of element Ming. (2) the step of obtaining the unstretched film after extruding the polyethylene naphthalene dicarboxylate on a rotary cooling drum, (3) setting the coating layer on the unstretched film, and continuing After the film forming direction (Md direction) is extended, or the unstretched film is extended in the MD direction, a coating layer is provided to obtain a step of laminating a uniaxially stretched film. (4) The continuous film forming direction is directed to the vertical direction ( TD direction) performing the steps of stretching and laminating a uniaxially stretched film to obtain a biaxially stretched film, and (5) a step of thermally fixing the obtained biaxially stretched film, and a transesterification reaction that can be manufactured is directed to polyethylene naphthalene dicarboxylate In the case of acid esters and weight fractions, 2 to 80 ppm, more preferably 4 to 60 ppm, and particularly 8 to 40 ppm of the element in the presence of the element is the most desirable. In the step of producing polyethylene naphthalene dicarboxylate, after the transesterification reaction, the melt viscosity reaction is performed until the intrinsic viscosity is 0.40 to 0.60 dl / g, and after the crushing, the solid viscosity is reduced to 0.46 to 0.75 dl / g. Phase polymerization is preferred. The adjustment of the intrinsic viscosity is performed after the small pieces obtained by the melt polymerization are vacuum-dried, and can be heated at a temperature of 200 to 250 ° C to the intended, inherent viscosity under vacuum or in the presence of an inert gas. After the small pieces are melt-formed into a thin film, the inherent viscosity is slightly reduced. The ideal film extension temperature is made by the glass transition temperature of the polymer
-17- (14) (14)200401707-17- (14) (14) 200401707
Tg(°c)以 Tg -20°C 〜Tg +60°C 爲宜、Tg -i〇°c 〜Tg +50°c 爲較佳 ,更佳者爲Tg〜Tg +40°C,特別以Tg +5°C〜Tg +30°C爲最佳 〇 理想之延伸倍率係連續製膜之薄膜中往連續製膜方向( MD方向)及往垂直方向(TD方向)分別爲 2.0〜5.0倍, 且,分別之延伸倍率差爲不足1. 〇倍者。較理想之延伸倍 率爲2.5〜4.5倍,更佳者爲2.8〜4.3倍,特別以3.0〜 4.0倍爲最佳。 理想之熱固定溫度係使聚合物融點做爲Tm( °C )時,爲 Tm-100 °C〜Tm-5 °C者宜。較理想之熱固定溫度爲丁m_8〇 〜Tm-10°C ,更佳者爲丁m-60°C 〜Tm-lOt:,特別以 Τχη·4〇Τ: 〜丁 m-10°C爲最佳。 本發明層合薄膜可進行熱固定後,更藉由熱處理後製 造之,此時,使加熱處理於薄膜之(X-80)〜X°c之溫度下進 行後’連續製膜之薄膜中於連續製膜方向或其垂直方向亦可 弛緩。其中X代表熱固定溫度。 做爲連續製膜薄膜之連續製膜方向中弛緩處理之方法者 如:熱固定後卷取圓筒爲止之間,於熱固定區域途中切開薄 膜兩端部後,針對薄膜之供給速度使拉出速度進行減速之方 法’不同兩速度之運送滾輥間以IR電熱器進行加熱之方法, 於加熱搬運滾輥上使薄膜搬運加熱運送滾輥後之運送滾輥之 速度進行減速之方法,熱固淀後,使熱風於噴塗噴嘴上運送 薄膜之同時,由供給之速度使拉出速度進行減速之方法,或 以製膜機進行卷取後,於加熱運送滾輥上使運送薄膜之運送 -18- (15) (15)200401707 滾輥速度進行減速之方法,或藉由加熱烤箱內、IR電熱器運 送加熱區域之同時,使加熱區域後之滾輕速度由加熱領域前 之滾輥速度進行減速之方法,均爲理想使用之方法,針對供 給側之速度使拉出側速度之減速率做成〇. 1〜1 〇 %,進行弛鬆 處理者宜。 . 又,針對連續製膜方向垂直方向之驰緩處理進行該連續 製fe方向之驰緩處理時’未使力於其垂直方向之結果可達成 ,且,獨立,於熱固定薄膜時,熱固定出口拉幅器寬度針對 熱固定入口之寬度爲0.01〜10%之範圍者,藉由縮小後可達成 之。 塗佈層係將水性塗液塗佈於未延伸薄膜或單軸延伸薄膜 後,往雙方向或單方向進行延伸熱固定後強固設定於薄膜者 。做爲塗工方法者可單獨或合倂使用滾輥塗層法,影寫版塗 層法、滾輥沖洗法、噴霧法、氣刮式塗層法、浸透法、簾塗 法等。 (硬塗佈層) 本發明層合薄膜之至少單面上,以設定做爲機能層之 硬塗佈層者宜。硬塗佈層以設置於塗佈層側爲宜。藉由此, 可提昇防止薄膜刮傷性者。因此,做爲硬塗佈層者只要爲耐 藥性、耐損性均強之硬化性樹脂者即可,未特別限定。此硬 化性樹脂例如:電離放射線硬化型樹脂、熱硬化型樹脂、熱 可塑性樹脂等,又以電離放射線硬化型樹脂對於透明基材薄 膜其膜形成作業容易,且較易提昇鉛筆硬度所期待値爲較理 -19- (16) (16)200401707 想者。 做爲硬塗佈層形成所使用之電離放射線硬化型樹脂例者 以具有丙烯酸酯系官能基者爲宜,特別以聚酯丙烯酸酯或胺 基甲酸乙酯丙烯酸酯爲最佳。 聚酯丙烯酸酯係由聚酯系聚醇之低聚物之丙烯酸酯及/ 或甲基丙烯酸酯(以下稱含有丙烯酸酯與甲基丙烯酸酯之(甲 基)丙烯酸酯者)所構成者。 又,該胺基甲酸乙酯丙烯酸酯係使聚醇化合物與二異氰 酸酯化合物所成之低聚物進行丙烯酸酯化者所構成者。 另外,做爲構成丙烯酸酯之單量體者例如:甲基(甲基) 丙烯酸酯、乙基(甲基)丙烯酸酯、丁基(甲基)丙烯酸酯、2乙 基己基(甲基)丙烯酸酯、甲氧基乙基(甲基)丙烯酸酯、丁氧 基乙基(甲基)丙烯酸酯、苯基(甲基)丙烯酸酯等例。 更欲提高該硬塗佈層硬度時,可倂用多官能單體者。具 體之多官能單體例如:三羥甲基丙烷三(甲基)丙烯酸酯、己 二醇(甲基)丙烯酸酯、三丙二醇二(甲基)丙烯酸酯、二乙二 醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊 四醇六(甲基)丙烯酸酯、1,6己二醇二(甲基)丙烯酸酯、新 戊二醇二(甲基)丙烯酸酯等例。 做爲用於硬塗佈層形成之聚酯系低聚物者如:己二酸與 二醇(乙二醇、聚乙二醇、丙二醇、丁二醇、聚丁二醇等)、 三醇(甘油、三聚甲基丙烷等)、癸二酸與二醇 '與三醇相互 縮合生成物之聚己二酸酯三醇、聚癸二酸酯聚醇等例。又, 亦可以其他有機酸取代該脂肪族二羧酸之一部份或全部。此 -20- (17) (17)200401707 時,做爲其他有機酸例者如:異酞酸、對苯二甲酸、或献酸 酐等可於硬塗佈層中出現高度硬度,爲理想者。 用於硬塗佈層形成之聚胺基甲酸乙酯系低聚物可由聚異 氰酸酯與聚醇相互縮合生成物取得。其體例之聚異気酸醋如 :亞甲基、雙(對-苯二異氰酸酯)、六亞甲基二異氰酸醋_己三 醇之附加物、六亞甲基二異氰酸酯、甲苯基二異氰酸醋、甲 苯基二異氰酸酯三羥基丙烷之加合體、丨,5-萘二異氰酸酯 、硫代丙基二異氰酸酯、乙基苯-2,4-二異氰酸酯、2,4_ 甲苯基二異氰酸醋二量體、氫化二甲苯基二異氰酸醋、三 (4-苯基異氰酸酯)硫代磷酸酯等例,又,具體之聚醇例者如: 聚氧基四亞甲基二醇等之聚醚系聚醇、聚己二酸酯聚醇、聚 碳酸酯聚醇等聚酯系聚醇、丙烯酸酯類與羥乙基甲基丙烧酸 酯之共聚物等例。 更做爲該電離放射線硬化型樹脂例者爲使用紫外線硬化 型樹脂時,於此等樹脂中以苯乙酮類、二苯甲酮類、米蚩苯 甲醯基苯甲酸酯、α-戊肟酯、或噻噸酮類等做爲光聚合啓 發劑,且,以正-丁胺、三乙胺、三正-丁膦等做爲光增感劑 進行混合後使用者宜。 又,胺基甲酸乙酯丙烯酸酯具良好彈性、彎曲性、良好 加工性(反折性),惟,表面硬度卻不足,不易取得2Η以上之 鉛筆硬度。反之,聚酯丙烯酸酯,藉由選擇聚酯之構成成份 後,可形成極高硬度之硬塗佈層。因此,易成立兼具高硬度 與彎曲性者,因此,針對60〜90重量份之胺基甲酸乙酯丙烯 酸酯配合40〜10重量份之聚酯丙烯酸酯之硬塗層爲最理想者 -21 -Tg (° c) is preferably Tg -20 ° C ~ Tg + 60 ° C, Tg -i0 ° c ~ Tg + 50 ° c is more preferred, more preferably Tg ~ Tg + 40 ° C, especially Tg + 5 ° C ~ Tg + 30 ° C is the best. The ideal stretch ratio is 2.0 to 5.0 times in the continuous film formation direction (MD direction) and vertical direction (TD direction) in the continuous film formation. And, the difference in extension magnification is less than 1.0 time. The ideal stretch ratio is 2.5 to 4.5 times, the more preferred is 2.8 to 4.3 times, and the most preferred is 3.0 to 4.0 times. The ideal heat-fixing temperature is that when the melting point of the polymer is Tm (° C), it is preferably Tm-100 ° C ~ Tm-5 ° C. The ideal heat-fixing temperature is dm_80 ~ Tm-10 ° C, more preferably dm-60 ° C ~ Tm-lOt :, especially τχ · 4〇Τ: dm-10 ° C is the most good. After the laminated film of the present invention can be heat-fixed, it can be manufactured after heat treatment. At this time, the heat treatment is performed at a temperature of (X-80) ~ X ° c of the film. The continuous film formation direction or its vertical direction may also relax. Where X stands for heat-fixing temperature. As a method of relaxing the film in the continuous film-forming direction of the continuous film-forming film, for example, after the heat-fixing is performed, the cylinder is wound up, and both ends of the film are cut in the middle of the heat-fixing area, and then the film is pulled out according to the film supply speed Method of speed deceleration 'Method of heating between different speed rollers by an IR heater, a method of decelerating the speed of the rollers after heating and transporting the film on the heating and transportation rollers, thermosetting After deposition, while the hot air is conveying the film on the spray nozzle, the method of decelerating the pull-out speed from the supply speed, or after being wound by a film making machine, the film is conveyed on a heating conveying roller. -18 -(15) (15) 200401707 The method of decelerating the roller speed, or by heating the heating area in the oven and IR heater, and decelerating the light speed after the heating area by the speed of the roller before the heating area. The methods are all ideal methods. For the speed on the supply side, the deceleration rate of the speed on the pull-out side is made 0.1 to 10%, and it is appropriate to perform a relaxation treatment. In addition, when the relaxation process in the vertical direction of the continuous film-forming direction is performed, the result that the force is not applied in the vertical direction can be achieved, and, independently, when heat-fixing the film, the heat-fixation is achieved. Outlet tenter width can be achieved by reducing the width of the heat-fixed inlet from 0.01 to 10%. The coating layer is one that is coated with an aqueous coating solution on an unstretched film or a uniaxially stretched film, and then stretched and fixed in two directions or in one direction, and then set firmly on the film. As a coating method, a roll coating method, a photocopying coating method, a roll washing method, a spray method, an air-scraping coating method, a soaking method, a curtain coating method, etc. may be used alone or in combination. (Hard-coating layer) It is preferable that at least one side of the laminated film of the present invention is a hard-coating layer which is set as a functional layer. The hard coating layer is preferably provided on the coating layer side. Thereby, a person who can prevent the film from being scratched can be promoted. Therefore, the hard coating layer is not particularly limited as long as it is a hardening resin having strong chemical resistance and damage resistance. This hardening resin is, for example, ionizing radiation-hardening resin, thermosetting resin, thermoplastic resin, etc. The ionizing radiation-hardening resin is easy to form a film for a transparent substrate film, and it is easy to improve the hardness of a pencil. Logic -19- (16) (16) 200401707 thinkers. Examples of the ionizing radiation-curable resin used for the formation of the hard coating layer are those having an acrylate-based functional group, and particularly preferably polyester acrylate or urethane acrylate. The polyester acrylate is composed of an acrylate and / or a methacrylate (hereinafter referred to as (meth) acrylate containing acrylate and methacrylate) of an oligomer of a polyester polyol. In addition, the urethane acrylate is constituted by acrylate-forming an oligomer formed of a polyol compound and a diisocyanate compound. In addition, as a single body constituting an acrylate, for example, meth (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2ethylhexyl (meth) acrylate Examples include esters, methoxyethyl (meth) acrylate, butoxyethyl (meth) acrylate, and phenyl (meth) acrylate. When it is desired to increase the hardness of the hard coating layer, a polyfunctional monomer may be used. Specific polyfunctional monomers such as: trimethylolpropane tri (meth) acrylate, hexanediol (meth) acrylate, tripropylene glycol di (meth) acrylate, diethylene glycol di (meth) Examples include acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and the like. As the polyester-based oligomer used for hard coating layer formation, such as adipic acid and glycols (ethylene glycol, polyethylene glycol, propylene glycol, butylene glycol, polybutanediol, etc.), triols (Glycerin, trimethylolpropane, etc.), polyadipate triol, polysebacate polyalcohol, etc., which are the condensation products of sebacic acid, diol 'and triol, etc. In addition, part or all of the aliphatic dicarboxylic acid may be replaced by other organic acids. When this -20- (17) (17) 200401707, as examples of other organic acids, such as: isophthalic acid, terephthalic acid, or acid anhydride, etc., can have high hardness in the hard coating layer, which is ideal. The polyurethane-based oligomer used for the formation of the hard coating layer can be obtained from a polycondensation product of polyisocyanate and polyol. Examples of its polyisocyanate are: methylene, bis (p-phenylenediisocyanate), hexamethylene diisocyanate-hexane triol, hexamethylene diisocyanate, tolyl diisocyanate Adducts of isocyanate, tolyl diisocyanate trihydroxypropane, 1,5-naphthalene diisocyanate, thiopropyl diisocyanate, ethylbenzene-2,4-diisocyanate, 2,4_ tolyl diisocyanate Examples of acid vinegar dimers, hydrogenated xylyl diisocyanate, tris (4-phenylisocyanate) phosphorothioate, etc., and specific examples of polyalcohol are: polyoxytetramethylene glycol Examples include polyester polyols such as polyether polyols, polyadipate polyols, and polycarbonate polyols, and copolymers of acrylates and hydroxyethyl methylpropionate. As examples of the ionizing radiation-curable resin, when an ultraviolet-curable resin is used, acetophenones, benzophenones, mifedibenzyl benzoate, and α-pentyl are used in these resins. Oxime esters or thioxanthones are used as photopolymerization heuristics, and n-butylamine, triethylamine, tri-n-butylphosphine and the like are used as photosensitizers for mixing. In addition, urethane acrylate has good elasticity, bendability, and good workability (reflexibility), but the surface hardness is insufficient, and it is difficult to obtain a pencil hardness of 2Η or more. Conversely, polyester acrylate can form a hard coating layer with extremely high hardness by selecting the constituent components of polyester. Therefore, it is easy to establish a combination of high hardness and flexibility. Therefore, the hard coating of 60 to 90 parts by weight of urethane acrylate and 40 to 10 parts by weight of polyester acrylate is the most ideal -21 -
Uod (18) (18)200401707 形成該硬塗佈層所使用塗工液中,調整光澤之同時,附 與表面潤滑劑之目的下使該二次粒徑爲20μηι以下之不活性 微粒子針對100重量份樹脂成份進行添加0.3〜3重量份者宜。 當不足0.3重量份則將降低提昇潤滑性效果,反之,超出3 重量份則取得硬塗佈層之鉛筆硬度降低。塗工液以外之不活 性微粒子例者如:二氧化矽、碳酸鎂、氫氧化鋁、硫酸鋇等 無機微粒子之外,有聚碳酸酯、丙烯樹脂、聚醯亞胺、聚醯 胺、聚乙烯萘二甲酸酯、蜜胺樹脂等有機聚合物之微粒子例 者。 又,硬塗佈層中可含有紫外線吸收劑。藉由此,可防止 基材層及著色劑(特以染料系)之紫外線劣化,維持長期間視 認性與防爆性。紫外線吸收劑種類並未特,惟,以選擇前述 特定之環狀亞胺酯者爲較佳。添加量針對形成硬塗佈層樹脂 以0.1〜10重量%者宜。當不足0.1重量%時,則防紫外線劣化 之效果降低,反之超出10重量%則降低耐磨損性、耐擦傷性 。添加方法以分散於溶劑後進行使用爲宜。 爲形成硬塗佈層之塗工方法以適當選自滾輥塗層,影寫 版塗層、棒塗層、擠壓塗層等,因應塗液特性、塗工量,選 取適當先行自體公知之方法即可。硬塗佈層之厚度以 1〜15μιη之範圍者宜。塗液之固形份濃度爲30〜70重量%者貞 ,更佳者爲40〜60重量%。 硬塗佈層以設於層合薄膜之單面或雙面者宜。又,亦 可於硬塗佈層之反面或硬塗佈層上設置氣體隔離層、導電層 -22 - 0868 (19) (19)200401707 等機能層。 (氣體隔離層) 以本發明層合薄膜做爲有機EL之支撑體薄膜使用時, 以至少於單面設置做爲機能層之氣體隔離層爲宜,氣體隔離 層亦可任意設置於基材層上、塗佈層上、硬塗佈層上。做爲 氣體隔離層者如:有機材料系及無機材料系例者。 做爲有機材料系之氣體隔離層者可使用聚乙燃醇、乙燒 醇-乙燒共聚物、等之乙烯醇共聚物、聚丙烯腈、丙條腈-丙 烯酸甲酯共聚物、丙烯腈-苯乙烯共聚物等之丙烯腈共聚物 ,或聚氯化亞乙烯等有機高分子材料所成之層者。此等材料 於本發明聚酯上利用影寫版塗層、逆塗佈藉由濕式塗佈法可 做成氣體隔離層。使用聚乙烯系之隔離層時,藉由吸濕後易 急驟降低氧隔離特性,以另外形成水蒸氣隔離者宜。 做爲無機材料系之氣體隔離層例者可以1種或2種以上選 自矽、鋁、鎂、鋅所成群之金屬做爲主成份之金屬氧化物、 金屬氮化物例者。此等做爲理想氣體隔離性材料爲公知者。 此等氧化物之層可由濺射法、真空蒸鍍法、離子噴鍍法、電 漿CVD法等氣相中使材料堆積後藉由膜形成之氣相堆積法製 作之。Uod (18) (18) 200401707 In the coating liquid used to form the hard coating layer, while adjusting the gloss, the inactive fine particles with a secondary particle diameter of 20 μηι or less are adjusted for the purpose of attaching a surface lubricant to 100 weight It is preferable to add 0.3 to 3 parts by weight of the resin component. When it is less than 0.3 parts by weight, the effect of improving lubricity will be reduced. On the other hand, when it exceeds 3 parts by weight, the pencil hardness of the hard coating layer is reduced. Examples of inactive fine particles other than the coating fluid include inorganic fine particles such as silicon dioxide, magnesium carbonate, aluminum hydroxide, and barium sulfate, and polycarbonate, acrylic resin, polyimide, polyimide, and polyethylene. Examples of fine particles of organic polymers such as naphthalate and melamine resin. The hard coat layer may contain an ultraviolet absorber. As a result, it is possible to prevent UV degradation of the base material layer and the coloring agent (especially dyes), and to maintain visibility and explosion-proof properties for a long period of time. The type of the ultraviolet absorber is not specific, but it is preferable to select the specific cyclic imide as described above. The addition amount is preferably 0.1 to 10% by weight based on the resin forming the hard coating layer. When it is less than 0.1% by weight, the effect of preventing UV deterioration is reduced, while when it exceeds 10% by weight, the abrasion resistance and scratch resistance are reduced. The method of addition is preferably used after being dispersed in a solvent. The coating method for forming the hard coating layer is appropriately selected from roller coating, photocopying coating, rod coating, extrusion coating, etc., and according to the characteristics of the coating liquid and the amount of coating, an appropriate prior self-knowledge is selected. Method. The thickness of the hard coating layer is preferably in the range of 1 to 15 μm. The solid content concentration of the coating liquid is 30 to 70% by weight, and more preferably 40 to 60% by weight. The hard coating layer is preferably provided on one side or both sides of the laminated film. In addition, a functional layer such as a gas barrier layer and a conductive layer may be provided on the opposite side of the hard coating layer or on the hard coating layer. -22-0868 (19) (19) 200401707. (Gas Isolation Layer) When the laminated film of the present invention is used as a support film of an organic EL, it is advisable to provide a gas isolation layer as a functional layer at least on one side, and the gas isolation layer can also be arbitrarily disposed on the substrate layer. On, on the coating layer, on the hard coating layer. As the gas barrier layer, such as those of organic materials and inorganic materials. As the gas barrier layer of organic materials, polyvinyl alcohol, ethyl alcohol-ethyl alcohol copolymer, vinyl alcohol copolymer, polyacrylonitrile, propionitrile-methyl acrylate copolymer, acrylonitrile- A layer made of an acrylonitrile copolymer such as a styrene copolymer or an organic polymer material such as polyvinyl chloride. These materials can be used to form a gas barrier layer by a wet coating method using a photolithographic coating and reverse coating on the polyester of the present invention. When using a polyethylene-based insulation layer, it is advisable to reduce the oxygen insulation properties suddenly after absorbing moisture to form another water vapor insulation. As an example of the gas barrier layer of the inorganic material system, one or two or more kinds of metals selected from the group consisting of silicon, aluminum, magnesium, and zinc as the metal oxide and metal nitride as the main component can be used. These are known as ideal gas barrier materials. These oxide layers can be formed by a vapor deposition method in which a material is deposited in a gas phase such as a sputtering method, a vacuum evaporation method, an ion plating method, and a plasma CVD method, and then a film is formed.
其中又以針對矽原子數之氧原子數比例爲1.5〜2.0之矽 氧化物做爲主成份之金屬氧化物其氣體隔離性、透明性、袠 面平滑性、彎曲性、膜應力、成本等面爲較理想者。對於矽 氧化物之矽原子數其氧原子數比例依X線光電子分光法、X (20) (20)200401707 線微分光法、奧格電子分光法、盧瑟福後方散射法等進行分 析後決定其氧原子數比例。該比例小於1.5則降低彎曲性、 透明性,因此,以1.5〜2.0爲宜。 由金屬氧化物所成之無機氣體隔離層之厚度以5〜200nm 者宜。若小於5nm則不易形成均勻之膜,產生未形成膜部份 ,由此部份滲入氣體、氣體隔離性變差。又,超出200nm則 不僅透明性差,彎曲性亦不良,產生裂化後損及氣體隔離性 。另外,依金屬氧化物之製膜方法其特性不同,通常金屬氧 化物之膜厚變厚其金屬氧化物層之殘留應力亦變大,因此, 本發明透明導電性高分子基板其金屬氧化物層形成後之凹地 變大而不理想。 更針對高度透明性之要求,該矽氧化物以含有氟化鎂爲 總重量之5〜30重量%者宜。此時,由氣體隔離性之觀點視之 ,膜厚以60〜200nm者宜。 此等氣體隔離層可做成單獨層使用,亦可合倂複數層使 用之。特別是倂用有機系氣體隔離層與無機系氣體隔離層時 ,對於氣體隔離層之裂化之有機系氣體隔離層之良好耐性與 特別對於水蒸氣之無機氣體隔離層之良好耐性呈相乘效果者 ,因此爲理想組合者。 (固定層) 更以強化層合薄膜與氣體隔離層相互之密合性爲目的 下,亦可於此等層間形成各種固定層,做爲該固定層者務必 爲具有耐藥性、透明性、良好層間密合性者,如:含矽樹脂Among them, the metal oxide is mainly composed of silicon oxide whose silicon atom has an oxygen atomic ratio of 1.5 to 2.0. Its gas barrier properties, transparency, smoothness of the surface, flexibility, film stress, cost, etc. For the ideal. The proportion of silicon atoms in silicon oxide and the number of oxygen atoms is determined after analysis by X-ray photoelectron spectroscopy, X (20) (20) 200401707 line differential spectroscopy, Auger electron spectroscopy, and Rutherford backscattering. Its oxygen atomic ratio. When the ratio is less than 1.5, flexibility and transparency are reduced, and therefore, 1.5 to 2.0 is preferable. The thickness of the inorganic gas barrier layer made of metal oxide is preferably 5 to 200 nm. If it is less than 5nm, it is difficult to form a uniform film, and a part where no film is formed is generated. As a result, the part penetrates into the gas, and the gas barrier property is deteriorated. In addition, beyond 200 nm, not only the transparency is poor, but the bendability is also poor, and the gas barrier properties are damaged after cracking. In addition, according to the method of forming a metal oxide film, the characteristics are different. Generally, the film thickness of the metal oxide becomes thicker, and the residual stress of the metal oxide layer becomes larger. Therefore, the metal oxide layer of the transparent conductive polymer substrate of the present invention After the formation of the concave becomes larger, it is not ideal. For the requirement of high transparency, the silicon oxide is preferably 5 to 30% by weight based on the total weight of magnesium fluoride. At this time, from the viewpoint of gas barrier properties, a thickness of 60 to 200 nm is preferable. These gas barrier layers can be used as a single layer or a combination of multiple layers. Especially when organic and inorganic gas barrier layers are used, the good resistance of the cracked organic gas barrier layer to the gas barrier layer and the good resistance of the inorganic gas barrier layer to water vapor are multiplied. , So it is the ideal combination. (Fixed layer) In order to strengthen the adhesion between the laminated film and the gas barrier layer, various fixed layers can also be formed between these layers. The fixed layer must be resistant, transparent, Good interlayer adhesion, such as: silicone resin
-24- (21) (21)200401707 、環氧樹脂等熱硬化性樹脂、紫外線硬化性丙烯樹脂等放射 線硬化性樹脂、蜜胺樹脂、胺基甲酸乙酯樹脂、醇酸樹脂等 例。 附隔離層之層合薄膜構成並未特別限定,一般於層合 薄膜之單面或雙面進行層合之構成,於附硬塗層之層合薄 膜硬塗層面上進行層合之構成,或於其反面進行層合之構 成等例。又,含有導電層、固定層等機能層之構成體者亦可 (導電層) 做爲EL顯示用基板、電泳紙用基板、太陽電池用基板 之使用時,以任意於基材層上、塗佈層上、硬塗佈層上、氣 體隔離層上進行設置做爲機能層之導電層者宜。做爲導電層 者只要透明性、導電性物良好者,未特別限定。 此導電層例,如:添加錫、碲、鎘、鉬、鎢、氟等做爲 不純物之氧化銦、氧化鎘、氧化錫、添加鋁做爲不純物之氧 化鋅、氧化鈦等金屬氧化膜例者。其中又以含有2〜15重量% 氧化錫之銦錫氧化物(ITO)之薄膜具良好透明性、導電性爲 較理想者。 該導電層之膜厚係依其目的之表面抵抗被設定之。導電 層之表面抵抗値依其目的設定由300 Ω /□〜1 Ω /□,其膜厚 通常由10nm〜400nm被製作之。惟,製作導電層於具有可撓 性之高分子基板時,爲防止對於基板彎曲應力之導電層割 裂以較薄者宜,導電層之厚度爲30〜140nm者,爲特別理想 -25- (22) (22)200401707 。又,爲取得低抵抗値於130〜200 °C之溫度下進行熱處理者 宜。 電極層之構成並未特別限定,一般於基材層之至少單面 進行層合之構成、附硬塗佈之層合薄膜至少單面進行層合 之構成,附氣體隔離層之層合薄膜至少單面上進行層合之構 成等例者。又,含其他機能層之構成體亦可。 本發明層合薄膜,附硬塗層之層合薄膜,附氣體隔離 層之層合薄膜、附導電層之層合薄膜利用其良好色相、透 明性、不易割裂性,可做爲如:液晶顯示器之擴散板用薄膜 、防止反射薄膜、有機EL、電泳紙、碰觸配電盤、PDP用電 磁波保護膜、太陽電池用基板、貼窗用者。 [實施例] 另外,本發明中各種物性値及特性係如下所測定者,且 被定義之。 (1) 薄膜厚度 使用電微計器(Anlitu (股份)製之商品名「K-312A型」 )、針壓30g,進行測定試料薄膜之厚度。 (2) 濁度、總光線透射率 依]IS規格、K-7 1 05- 1 98 1爲基準,進行測定試料總光線 透射率Tt(%)與擴散透射率Td(%)。而,試料薄膜之濁度 Hz(%)由Hz = (Td/Tt)xl00算取之。當ΙΟΟμίΉ厚度之試料薄膜時 ►26- (23) 200401707 之濁度Hzm(%)由試料薄膜之厚度ϋ(μΐΉ)與濁度Hz以Hzm = Hz x(D/100)算取之。 (3)色相-24- (21) (21) 200401707, thermosetting resins such as epoxy resins, radiation curable resins such as ultraviolet curable acrylic resins, melamine resins, urethane resins, alkyd resins, and the like. The structure of the laminated film with an isolation layer is not particularly limited. Generally, the structure of the laminated film is laminated on one or both sides of the laminated film, and the structure of the laminated film is laminated on the hard-coated surface of the laminated film. Or the structure of lamination on the reverse side. In addition, those who include functional layers such as conductive layers and fixed layers (conductive layers) can be used as substrates for EL displays, substrates for electrophoretic paper, and substrates for solar cells. It is suitable to set the conductive layer as the functional layer on the cloth layer, the hard coating layer, and the gas barrier layer. The conductive layer is not particularly limited as long as it has good transparency and conductive materials. Examples of this conductive layer include metal oxide films such as tin, tellurium, cadmium, molybdenum, tungsten, fluorine, etc. as impurities indium oxide, cadmium oxide, tin oxide, zinc oxide, titanium oxide, etc. as impurities . Among them, an indium tin oxide (ITO) film containing 2 to 15% by weight of tin oxide is preferable because it has good transparency and electrical conductivity. The film thickness of the conductive layer is set according to its intended surface resistance. The surface resistance of the conductive layer is set from 300 Ω / □ ~ 1 Ω / □ according to its purpose, and its film thickness is usually made from 10nm to 400nm. However, when making a conductive polymer substrate with a flexible polymer substrate, in order to prevent the conductive layer from being cracked against the substrate bending stress, it is preferable to thin the conductive layer, and the thickness of the conductive layer is 30 ~ 140nm, which is particularly desirable -25- (22 ) (22) 200401707. In order to obtain low resistance, it is advisable to perform heat treatment at a temperature of 130 to 200 ° C. The structure of the electrode layer is not particularly limited. Generally, the structure is laminated on at least one side of the base material layer, the laminated film with hard coating is laminated on at least one side, and the laminated film with gas barrier layer is at least Examples of the structure of lamination on one side. Moreover, a structure including other functional layers may be used. The laminated film of the present invention, a laminated film with a hard coat layer, a laminated film with a gas barrier layer, and a laminated film with a conductive layer use its good hue, transparency, and non-breakability, and can be used as, for example, a liquid crystal display. Film for diffusion plate, anti-reflection film, organic EL, electrophoretic paper, touch switchboard, electromagnetic wave protective film for PDP, substrate for solar cell, and window-sticker. [Examples] In addition, various physical properties and properties in the present invention were measured and defined as follows. (1) Film thickness The thickness of the sample film was measured using an electric micrometer (trade name "K-312A model" manufactured by Anlitu (stock)) and a needle pressure of 30 g. (2) Turbidity and total light transmittance The total light transmittance Tt (%) and diffusion transmittance Td (%) of the sample were measured according to the IS standard and K-7 1 05- 1 98 1 as a reference. The turbidity Hz (%) of the sample film is calculated from Hz = (Td / Tt) x 100. When the sample film with a thickness of 100 μΉ is ► ►26- (23) 200401707 The turbidity Hzm (%) is calculated from the thickness ϋ (μΐΉ) and turbidity Hz of the sample film in Hzm = Hz x (D / 100). (3) Hue
依JIS規格Z 87 29爲基準,將薄膜之L*a*b*顯色系中L* 値、a*値(a*T)、b*値(b*T)分別於透射測定法與反射測定法 求取之。此時’利用色差計(日本電色工業製之商品名「 SZS-Σ 90」)進行測定針對標準光之薄膜之透射及反射光譜 。當ΙΟΟμπι厚度之試料薄膜時之a*値(a*1()())與b*値(b*1G())可 藉由試料薄膜厚度D(pm)a*1Q() = a*TX(D/100) b* i〇〇 = b*T x (D/l 00) 進行算取 之。 (4)薄膜之折射率According to JIS standard Z 87 29, L * 値, a * 値 (a * T), b * 値 (b * T) in the L * a * b * color rendering system of the film are measured by transmission and reflection, respectively. Determine it by the measurement method. At this time, a transmission and reflection spectrum of a film for standard light was measured using a color difference meter (trade name "SZS-Σ 90" manufactured by Nippon Denshoku Industries). When a sample film with a thickness of 100 μm is used, a * 値 (a * 1 () ()) and b * 値 (b * 1G ()) can be determined by the sample film thickness D (pm) a * 1Q () = a * TX (D / 100) b * i〇〇 = b * T x (D / 100). (4) refractive index of thin film
利用稜鏡偶合器(Metricon公司製之商品名「Μ o d e 1 2 0 1 0」),與連續製膜之薄膜製膜方向,薄膜面內之製膜方 向呈垂直之方向’進行測定薄膜厚度方向各折射率(分別爲 nMD、nTD、nZ)。此測定於波長 4 7 3 nm、6 3 3 nm、8 3 Onm 進行之。所取得測定値相當於科希分散式之下式者。其中, 式中λ i代表測定波長、n i代表波長λ i所測定之折射率 ni = a + [b/(A i)2] + [C/(A i)4] -27- (24) (24)200401707 藉由解開連立方程式求出定數a、b、c。利用所取得a,b,c 之値,計算波長5 8 9nm(Na D線之波長)之折射率,求出薄膜 折射率。 (5)面配向數 利用該取得薄膜之折射率,藉由下式算出面配向係數 n S 0The film thickness direction was measured using a 稜鏡 coupling (trade name "M ode 1 2 0 1 0" manufactured by Metricon Corporation) with the film formation direction of the continuous film formation, and the film formation direction within the film plane was perpendicular. Refractive index (nMD, nTD, nZ). This measurement was performed at a wavelength of 4 7 3 nm, 6 3 3 nm, 8 3 Onm. The obtained measurement 値 is equivalent to the following formula of Koch's dispersion. Where λ i represents the measurement wavelength and ni represents the refractive index measured at the wavelength λ i = a + [b / (A i) 2] + [C / (A i) 4] -27- (24) ( 24) 200401707 Find the constants a, b, and c by solving the simultaneous equations. Based on the obtained a, b, and c, the refractive index at a wavelength of 589 nm (the wavelength of the Na D line) was calculated, and the refractive index of the thin film was obtained. (5) Number of plane orientations Using the refractive index of the obtained thin film, the plane orientation coefficient n S 0 is calculated by the following formula.
nS = (nMD + nTD)/2-nZ (6) 低聚物 於200°C烤箱進行薄膜加熱30分鐘後取出,於表面進行 鋁之蒸鍍後,於微分干擾顯微鏡下以640倍,進行觀察 0.24mm2之面積,以下示基準進行判定計算析出低聚物之數 〇 ◎(優良):0〜100個 〇(良):101〜2,000個 x(不良):2,001個以上。 (7) 尺寸安定性nS = (nMD + nTD) / 2-nZ (6) The oligomer was heated in a 200 ° C oven for 30 minutes and then removed. After the aluminum was vapor-deposited on the surface, it was observed under a differential interference microscope at 640 times. The area of 0.24 mm2 was determined by calculating the number of precipitated oligomers based on the following criteria: ○ (excellent): 0 to 100; (good): 101 to 2,000 x (defective): 2,001 or more. (7) Dimensional stability
利用 Seko insturments (股份)製之商品名「TMA/SS 1 2 0 C」,於載重1 4 0 g / m m 2之狀態下,以2 0 °C /分鐘之昇溫速 度由3 0 T:昇溫至2 5 0 °C,進行測定尺寸變化。藉由下式取得 之値做爲200°C下之尺寸變化率。 -28- (25) (25)200401707 尺寸變化率(%) = (20(TC中尺寸-原長)/原長xl 00 (8) 融點及举璃轉移點(Tg) 試料做成20mg之樣品,利用示差掃描熱量測定器(τα Insturments公司製,商品名「DSC 2920」),以20°C/分鐘 之昇溫速度下,測定玻璃轉移度及融點。 (9) 固有粘度 聚合物之固有粘度(「7?」dl/g)係以35°C之鄰-氯苯酚溶 液進行測定之。基材層之配向薄膜固有粘度去除塗佈層後同 法進行測定。 (10) 塗佈層中粒子之平均粒徑 將薄膜小片埋入環氧樹脂(ritaintec (股份)製之商品名 「epomount」)中,利用 Reichert-Jung 公司製之Using the brand name "TMA / SS 1 2 0 C" of Seko insturments (shares), under a load of 140 g / mm 2 at a temperature rising rate of 20 ° C / min from 3 0 T: Measure the dimensional change at 250 ° C. Obtained by the following formula as the dimensional change rate at 200 ° C. -28- (25) (25) 200401707 Dimensional change rate (%) = (20 (size in TC-original length) / original length xl 00 (8) Melting point and glass transfer point (Tg) Samples were measured for glass transition and melting point using a differential scanning calorimeter (manufactured by τα Instruments, trade name "DSC 2920") at a temperature rise rate of 20 ° C / minute. (9) Inherent viscosity polymer Viscosity ("7?" Dl / g) was measured with an o-chlorophenol solution at 35 ° C. The inherent viscosity of the alignment film of the substrate layer was measured in the same way after removing the coating layer. (10) In the coating layer The average particle size of the particles was embedded in a thin film piece in epoxy resin (trade name "epomount" made by retaintec (stock)).
Microtome 2 050,切成每埋入樹脂50nm厚度,於透射型電子 顯微鏡(LEM-2000)以加速電壓ΙΟΟΚν、倍率10萬倍觀察100個 粒子,其平均値做成粒徑。 (11) 耐撞擊性 依JIS規格K721K 1 976爲基準,算出試料薄膜之50%破壞 能量E5〇。此時測定裝置係使用第1圖所示者。第1圖中,1代 表5去碼(質量爲3 0 0 g或5 0 0 g )、2代表U型穿孔(頂端部直徑4 m m -29- (26) (26)200401707 、質量142g)、3代表試料薄膜固定機架、4代表試料薄膜。 又’本發明評定方法中,於JIS規格K7211所示50%破壞能量 E5。之算式中,m値僅使用第1圖中之砝碼1質量%。 <聚乙烯萘二羧酸酯之聚合>Microtome 2 050 was cut to a thickness of 50 nm per embedded resin, and 100 particles were observed in a transmission electron microscope (LEM-2000) at an acceleration voltage of 100 κν and a magnification of 100,000 times. (11) Impact resistance According to JIS standard K721K 1 976, the 50% breaking energy E50 of the sample film was calculated. In this case, the measurement device is the one shown in Fig. 1. In the first figure, 1 represents 5 yards (mass is 3 0 g or 5 0 g), 2 represents U-shaped perforation (diameter of the top part 4 mm -29- (26) (26) 200401707, mass 142g), 3 stands for sample film fixing frame, 4 stands for sample film. Also, in the evaluation method of the present invention, the 50% breaking energy E5 is shown in JIS standard K7211. In the calculation formula, m 値 uses only 1 mass% of the weight in the first figure. < Polymerization of polyethylene naphthalate >
聚合物A 100重量份萘-2,6-二羧酸二甲酯與60重量份乙二醇以 〇·〇1重量份醋酸鈷4鉬、0.02重量份醋酸錳做爲酯交換觸媒使 用後,依常法進行酯交換反應後,添加1.2重量份之三氧化 銻之乙二醇1%溶液,再添加0.029重量份之三甲基磷酸酯後 ,結束酯交換反應。表1代表其中針對聚乙烯萘二羧酸酯之 觸媒添加量。以下,再依常法於高溫高真空下進行縮聚反應 。隨後做成單絲型之小片。此聚合物之固有粘度爲〇.49dl/gPolymer A 100 parts by weight of dimethyl naphthalene-2,6-dicarboxylic acid and 60 parts by weight of ethylene glycol are used as the transesterification catalyst with 0.001 parts by weight of cobalt acetate 4 molybdenum and 0.02 parts by weight of manganese acetate. After carrying out the transesterification reaction according to the usual method, add 1.2 parts by weight of a 1% solution of antimony trioxide in ethylene glycol, and then add 0.029 parts by weight of trimethyl phosphate to terminate the transesterification reaction. Table 1 represents the amount of catalyst added to the polyethylene naphthalate. Hereinafter, the polycondensation reaction is performed under a high temperature and high vacuum according to a conventional method. Monofilament pieces were then made. The inherent viscosity of this polymer is 0.49dl / g
聚合物B、C 將聚合物A進行固相聚合後,取得固有粘度〇.62dl/g之聚 合物B、0.79dl/g之聚合物C。Polymers B and C After polymer A was subjected to solid phase polymerization, polymer B having an intrinsic viscosity of 0.62 dl / g and polymer C of 0.79 dl / g were obtained.
聚合物D、E 將觸媒添加量變換與該A〜C不同之如表1者後,與聚合 物A同法進衍聚合反應,取得固有粘度〇.5〇dl/g之聚合物小片 。將取得小片進行固相聚合後,取得固有粘度爲〇.64dl/g之 聚合物D及0.71dl/g之聚合物E。 ^ -30- (27) (27)200401707Polymers D and E changed the amount of catalyst added to those different from A to C as shown in Table 1, and then polymerized with Polymer A in the same manner to obtain polymer chips with an inherent viscosity of 0.50 dl / g. The obtained pellets were subjected to solid-phase polymerization to obtain a polymer D having an intrinsic viscosity of 0.64 dl / g and a polymer E having 0.71 dl / g. ^ -30- (27) (27) 200401707
聚合物F 未添加鈷化合物,藉由表1之觸媒進行聚合反應,以熔 融聚合取得固有粘度〇.64dl/g之聚合物F。 <塗佈層之調整> 用於實施例1〜4、比較例1與3之塗佈層所使用之塗劑依 如下進行調整之。 組成:由聚酯樹脂與丙烯樹脂及濕潤劑以及塡料所構成 。各成份重量比爲聚酯樹脂:丙烯樹脂:濕潤劑:塡料 = 45:40:5:1 0 ° 聚酯樹脂:係依特開平6-1 16487號公報之實施例1所載方 法爲基準如下述製造之。亦即,於反應器中置入42.2份對苯 二甲酸二甲酯、7.9份異酞酸二甲酯、4份5-磺基異酞酸二甲 酯鈉、36· 8份1,4-丁二醇、27.5份雙酚A之環氧乙烷附加物 ’於此加入0.05份之四丁氧基鈦,於氮氣氛下調節溫度爲 230°C後,進行加熱,餾去所生成之甲醇進行酯交換反應。 再使反應系溫度緩緩上昇至255 °C,系內呈ImmHg之減壓後 進行縮聚反應取得聚酯。 丙烯樹脂:以60莫耳甲基丙烯酸甲酯/30莫耳%乙烯丙烯 酸酯/5莫耳%2-羥乙基甲基丙烯酸酯/5莫耳%N-羥甲基丙烯醯 胺所構成之。 丙烯樹脂係依特開.昭63·37 1 67號公報之製造例1〜3所載 方法爲基準如下述製造之。亦即,於四口燒瓶中置入302份 之離子交換水,於氮氣流中昇溫至60 °C,再加入做爲聚合 -31 - (28) (28)200401707 啓發劑之0.5份過硫酸銨、0.2份亞硝酸氫鈉,再以3個小時 內調整液溫呈60〜70 °C之同時滴入單體之59· 9份甲基丙烯酸 甲酯、30份丙烯酸乙酯、5· 8份之2-羥乙烯甲基丙烯酸酯、 4.3份N-羥甲基丙烯醯胺之混合物。滴畢後仍維持於同溫度2 小時,攪拌中持續反應,再進行冷卻後,取得固形份爲25 % 之丙烯水分散體。 濕潤劑(界面活性劑):聚環氧乙烷(n = 7)月桂醚(三洋化成 股份公司製、商品名「NaloactyN-70」)。 塡料:二氧化矽塡料(平均粒徑60nm)。日產化學股份公 司製之商品名「Snowtex」。 [實施例1] 將聚合物B於170 °C下進行乾燥6小時後,供入料斗擠壓 器,於熔融溫度3 0 5 °C下進行熔融,於平均開孔爲ΙΟμιη之不 銹鋼細線濾器進行過濾,通過3mm之狹縫狀塑模,於表面溫 度6 0 °C之旋轉冷卻滾筒上進行擠壓後,急冷後取得未延伸薄 將此取得未延伸薄膜於120 °C下進行預熱後,更於低速 、高速之滾輥間以IR加熱器上下進行加熱後,做成140 °C之 薄膜溫度,往連續製膜方向(MD方向)延伸3.3倍。 往此MD方向延伸後之薄膜單面上使該塗劑乾燥後之塗 層厚度呈〇.〇3 μπί於滾輥塗佈機進行塗工。 再供入定幅烘乾機後,於1 45 °C下往連續製膜方向與垂 直方向(TD方向)延伸3. 5倍。取得雙軸配向薄膜以24 (TC之溫 -32- (29) (29)200401707 度進行熱固定後,取得100μηι厚之層合薄膜。 表2、表3代表薄膜製造條件與取得薄膜之特性。可取得 良好透明性、色相、加熱時極少產生低聚物,耐撞擊性良好 之薄膜。又,張力 '溫度之施行時其尺寸安定性亦爲良好者 [實施例2〜4] 所使用聚合物、延伸倍率、熱固定溫度如表2所示除外 ,與實施例1同法取得各種不同厚度之層合薄膜。表2、表3 代表薄膜製造條件與取得薄膜之特性。 [比較例1] 除使用聚合物Α之外,與實施例1同法取得厚度1〇〇μιη之 層合薄膜。表2、表3代表薄膜之製造條件與取得薄膜之特 。所取得薄膜之透明性、色相均不良,加熱時易產生低聚物 ,爲耐撞擊性差之薄膜。 [比較例2 ] 利用聚合物C作成厚度200μιη之未延伸薄膜。表2、表3 代表薄膜之製造條件與取得薄膜之特性。色相,透明性均爲 良好者,惟,加熱時易產生低聚物,且耐撞擊性亦差。且, 於附與張力、溫度狀態下被延伸,尺寸安定性無法測定。 [比較例3 ] -33- (30) 200401707 使用聚合物F,將延伸倍率、熱固定溫度做成如表2者’ 取得厚度爲ΙΟΟμίΏ之層合薄膜。表2、表3代表薄膜之製造條 件與取得薄膜之特性。所取得薄膜其透明性、色相均不良、 加熱時易產生低聚物。又,附與張力、溫度之狀態下、薄膜 收縮較大。 [實施例5 ]Polymer F was added without a cobalt compound. Polymerization was performed by the catalyst in Table 1 to obtain polymer F with an intrinsic viscosity of 0.64 dl / g by melt polymerization. < Adjustment of coating layer > The coating agents used for the coating layers of Examples 1 to 4 and Comparative Examples 1 and 3 were adjusted as follows. Composition: It is composed of polyester resin, acrylic resin, wetting agent and concrete. The weight ratio of each component is polyester resin: acrylic resin: humectant: binder = 45: 40: 5: 1 0 ° Polyester resin: It is based on the method described in Example 1 of JP 6-1 16487. Manufactured as follows. That is, 42.2 parts of dimethyl terephthalate, 7.9 parts of dimethyl isophthalate, 4 parts of sodium 5-sulfoisophthalate, and 36.8 parts of 1,4- Butylene glycol, 27.5 parts of ethylene oxide add-on to bisphenol A. Here, 0.05 part of titanium tetrabutoxide was added, and the temperature was adjusted to 230 ° C under a nitrogen atmosphere, followed by heating to distill off the generated methanol. A transesterification reaction is performed. Then, the temperature of the reaction system was gradually raised to 255 ° C, and the pressure in the system was reduced to ImmHg, and then a polycondensation reaction was performed to obtain a polyester. Acrylic resin: 60 mol methyl methacrylate / 30 mol% ethylene acrylate / 5 mol% 2-hydroxyethyl methacrylate / 5 mol% N-hydroxymethyl acrylamide . The acrylic resin is manufactured in the following methods based on the methods described in Production Examples 1 to 3 of JP-A-63-37-67. That is, put 302 parts of ion-exchanged water in a four-necked flask, raise the temperature to 60 ° C in a nitrogen flow, and then add 0.5 parts of ammonium persulfate as a polymerization-31-(28) (28) 200401707 heuristic. , 0.2 parts of sodium hydrogen nitrite, and then adjust the liquid temperature to 60 ~ 70 ° C within 3 hours while dripping 59.9 parts of methyl methacrylate, 30 parts of ethyl acrylate, 5.8 parts A mixture of 2-hydroxyethylene methacrylate and 4.3 parts of N-hydroxymethacrylamide. After dripping, it was maintained at the same temperature for 2 hours. The reaction was continued while stirring. After cooling, a 25% propylene aqueous dispersion was obtained. Wetting agent (surfactant): Polyethylene oxide (n = 7) lauryl ether (manufactured by Sanyo Kasei Co., Ltd., trade name "Naloacty N-70"). Material: Silicon dioxide material (average particle size: 60nm). The trade name "Snowtex" made by Nissan Chemical Co., Ltd. [Example 1] After polymer B was dried at 170 ° C for 6 hours, it was fed into a hopper extruder, melted at a melting temperature of 30 ° C, and performed in a stainless steel thin wire filter with an average opening of 10 μm. Filter, pass through a 3mm slit-shaped mold, squeeze on a rotating cooling roller with a surface temperature of 60 ° C, and obtain an unstretched thin film after rapid cooling. Preheat the unstretched film at 120 ° C. After heating between the low-speed and high-speed rollers with an IR heater, the film temperature is 140 ° C, and it extends 3.3 times in the continuous film-forming direction (MD direction). After the film was extended in the MD direction on one side, the coating thickness after the coating agent was dried was 0.03 μπ, and the coating was performed on a roll coater. After being fed into the fixed-frame dryer, it was extended to a continuous film forming direction and a vertical direction (TD direction) at 1 45 ° C by 3.5 times. Obtain the biaxially oriented film after heat-fixing at 24 (TC-32- (29) (29) 200401707 degrees) to obtain a 100 μm thick laminated film. Tables 2 and 3 represent the film manufacturing conditions and the characteristics of the obtained film. A film with good transparency, hue, and few oligomers when heated, and good impact resistance. Also, the dimensional stability is good when the tension 'temperature is applied. [Examples 2 to 4] Polymers used Except for the stretching ratio and heat-fixing temperature shown in Table 2, laminated films of various thicknesses were obtained in the same manner as in Example 1. Tables 2 and 3 represent the manufacturing conditions of the films and the characteristics of the obtained films. [Comparative Example 1] Except Except for polymer A, a laminate film having a thickness of 100 μm was obtained in the same manner as in Example 1. Table 2 and Table 3 represent the manufacturing conditions of the film and the characteristics of the obtained film. The obtained film had poor transparency and hue. It is easy to produce oligomers when heated, and it is a film with poor impact resistance. [Comparative Example 2] Using polymer C to make an unstretched film with a thickness of 200 μm. Table 2 and Table 3 represent the manufacturing conditions of the film and the characteristics of the obtained film. ,through The properties are all good, but oligomers are easily generated when heated, and the impact resistance is also poor. Moreover, they are stretched under tension and temperature conditions, and the dimensional stability cannot be measured. [Comparative Example 3] -33- (30) 200401707 Using polymer F, the stretching ratio and heat-fixing temperature are made as shown in Table 2 to obtain a laminated film with a thickness of 100 μL. Table 2 and Table 3 represent the manufacturing conditions of the film and the characteristics of the obtained film. The film has poor transparency and hue, and is easy to generate oligomers when heated. In addition, under the conditions of tension and temperature, the film shrinks greatly. [Example 5]
於實施例1取得之層合薄膜塗佈層側中將爲形成硬塗佈 層之硬塗佈劑(大日精化工業(股份)製之商品名「PETD-31」 )與1-羥環苯酮共同加入進行攪拌脫泡後,以滾輥塗層法進 行塗工呈乾厚度爲5μιη,乾燥後,以175Kv及lOMrad之條件 下進行照射電子線後,形成硬塗層塗佈。又,做爲氣體隔離 層者,於硬塗佈層之反面,以真空蒸鍍裝置藉由電子束之加 熱Si與Si〇2混合物所成之蒸鍍材料,被蒸發後,形成厚度 20nm之Si〇>膜。On the side of the laminated film coating layer obtained in Example 1, a hard coating agent (trade name "PETD-31" manufactured by Daiichi SEIKO Kogyo Co., Ltd.) and a 1-hydroxycyclobenzene will be used to form a hard coating layer. After the ketone is added together for stirring and defoaming, the coater is dried to a thickness of 5 μm by a roll coating method. After drying, the electron beam is irradiated under the conditions of 175 Kv and 10 OMrad to form a hard coat coating. In addition, as a gas barrier layer, on the reverse side of the hard coating layer, a vapor deposition material formed by heating a mixture of Si and SiO2 by an electron beam in a vacuum evaporation device is evaporated to form Si having a thickness of 20 nm. 〇 > Film.
再以濺射裝置導入Ar · 〇2混合氣體(〇2濃度! ·4νο1%),調 整壓力呈0.27Pa,利用IT ◦靶(Sn〇2濃度5wt%),以投入電力 密度TW/cm2之條件下進行DC濺射,於氣體隔離層上層合爲 厚度130nm後,150°C下進行熱處理2小時後取得由ITO膜所 成之透明導電薄膜。表示代表取得薄膜之特性,取得具良好 耐撞擊性之薄構成體者。 [實施例6] 使用貝施例2取得之薄膜,與實施例5同法取得由硬塗佈 -34 « (31) 200401707 層、氣體隔離層、IT〇膜所成之透明導電薄膜。表4顯示取 得薄膜之特性。取得具良好耐撞擊性之薄構成體者。 [比較例4] 使用比較例2之薄膜,與實施例5同法取得硬塗佈層、氣 體隔離層、IT〇目吴所成之透明導電薄膜。表4顯示取得薄膜 之特性。所取得薄膜爲耐撞擊性不良者。Then, an Ar · 〇2 mixed gas (〇2 concentration! · 4νο1%) was introduced by a sputtering device, the pressure was adjusted to 0.27Pa, and an IT ◦ target (SnO2 concentration 5wt%) was used to input power density TW / cm2. DC sputtering was performed next, and a thickness of 130 nm was laminated on the gas barrier layer, and then a heat treatment was performed at 150 ° C for 2 hours to obtain a transparent conductive film made of an ITO film. It means those who obtain the characteristics of a thin film and obtain a thin structure with good impact resistance. [Example 6] The thin film obtained in Example 2 was used to obtain a transparent conductive film made of a hard-coated -34 «(31) 200401707 layer, a gas barrier layer, and an IT0 film in the same manner as in Example 5. Table 4 shows the characteristics of the obtained film. Obtain a thin structure with good impact resistance. [Comparative Example 4] Using the film of Comparative Example 2, a transparent conductive film made of a hard coat layer, a gas barrier layer, and ITO was obtained in the same manner as in Example 5. Table 4 shows the characteristics of the obtained film. The obtained film was one with poor impact resistance.
[比較例5] 使用厚度200μπι之聚醚硕薄膜(住友 beclite公司製$ 商品名「FS- 1 3 00」)’與實施例5同法取得硬塗佈層、氣體 隔離層、ITO膜所成之透明導電薄膜。表4顯示所取得薄膜 之特性。所取得薄膜之耐撞擊性爲不良者。 [比較例6 ;][Comparative Example 5] A 200 μm thick polyether film (made by Sumitomo Beclite Co., Ltd. "trade name" FS-1300 ") was used in the same manner as in Example 5 to obtain a hard coating layer, a gas barrier layer, and an ITO film. Transparent conductive film. Table 4 shows the characteristics of the obtained film. The obtained film had poor impact resistance. [Comparative Example 6;]
表4顯示附ITO玻璃(Koning公司製之商品名「Mu? 」)所取得之特性。 -35- (32)200401707 表1 \ 觸媒量(重量p P m) 固有粘度 聚合方法 Co Mn Sb dl/g A 24 45 100 0.49 溶融 B 24 45 100 0.62 溶融+固相 C 24 45 100 0.79 溶融+固相 D 12 68 300 0.64 溶融+固相 E 6 1 68 300 0.7 1 溶融+固相 F 0 68 300 0.64 溶融 表2 \ 聚合物 種類 延伸倍率 熱固定溫度 MD方向 TD方向 °c 實 1 B 3.3 3.5 235 施 2 B 3.1 3.2 245 例 3 D 3.2 3.7 230 4 E 3.2 3.7 230 比 1 A 3.3 3.5 235 較 2 C 1.0 1.0 例 3 F 4.0 3.0 225 -36- r IH ^ rj (33)200401707Table 4 shows characteristics obtained with ITO glass (trade name "Mu?" Manufactured by Koning Corporation). -35- (32) 200401707 Table 1 \ Catalyst amount (weight p P m) Intrinsic viscosity polymerization method Co Mn Sb dl / g A 24 45 100 0.49 Melt B 24 45 100 0.62 Melt + solid phase C 24 45 100 0.79 Melt + Solid phase D 12 68 300 0.64 Melt + Solid phase E 6 1 68 300 0.7 1 Melt + Solid phase F 0 68 300 0.64 Melt Table 2 \ Polymer type elongation rate Heat fixing temperature MD direction TD direction ° c Real 1 B 3.3 3.5 235 Application 2 B 3.1 3.2 245 Example 3 D 3.2 3.7 230 4 E 3.2 3.7 230 than 1 A 3.3 3.5 235 than 2 C 1.0 1.0 Example 3 F 4.0 3.0 225 -36- r IH ^ rj (33) 200401707
(耐撞擊性) 50%破壞能 S CD 6 rH rH CO O in d 00 d rH d CD d (尺寸安定性) 尺寸變化率 ① 6 1 CM 6 rH i —1.2 _1 寸 6 比9大 _3. 5 〇 〇 〇 ◎ X X X (厚度100“ m換算) m 反射測定法 8 cC t-H d rH d LO 6 CSl d CO d ο d -0· 4 〇 1 -0. 1 i 一 0· 1 rH 6 o d o d CSl d LO 6 透射測定法 〇 * cd CO d 1 一0· 3 CO 6 1 寸 d 1 LO d 1 〇 d -0. 6 〇 CO rH 寸 i-Η LO r—i rH rH 寸 03 CO d 03 <N 濁度 Hz100 CO 6 寸 6 CO 6 寸 d ;〇 d r—i d CD 6 面配向 係數 in c 0. 259 0. 251 0. 261 0. 261 0. 256 0. 006 0. 260 折射率 N) C 1. 498 ΙΟ g rH a 寸 τ—1 卜 寸 τΗ 1. 498 CO 寸 CD rH 1. 498 rH CD 卜 rH 1. 755 00 CO rH 00 CO IN rH 00 LO rH I 1. 648 <N rH 卜 rH nMD 1. 753 1 1. 756 00 寸 rH 1. 748 1_ o 10 rH 1. 649 1. 803 固有 粘度 dl/g 0. 55 0. 55 0. 58 0. 65 rH 寸 6 0. 71 0. 58 lit ε a. o o rH ο g LO o o rH o o CN o o tH rH Cv3 CO 寸 rH CO CO -37 - (34) (34)200401707 表4 \ 基材層 厚度 (耐撞擊性) 5 0%破壞能— μΐΏ J 一 實施例5 實施例1之薄膜 100 0.6 一 實施例6 實施例2之薄膜 1.1 _ 比較例4 實施例2之薄膜 200 0.1 一 比較例5 市販之PES薄膜 0.4 一 比較例6 市販之玻璃 720 0.07 _ PES:聚醚硕 (發明效果) 本發明可取得具良好透明性、色相,且,加熱時極少產 生低聚物、呈薄薄膜具良好耐撞擊性之聚乙烯萘二羧酸酯薄 膜所成之層合薄膜。 [產業上可利用性] 另外,本發明取得層合薄膜及以此做爲硬塗層薄膜、 氣體隔離薄膜、透明導電薄膜係藉由該良好特性,特別對於 液晶顯示器、防止反射薄膜、有機EL顯示器、電泳紙、大 陽電池、碰觸配電盤、i_DP用防止電磁波薄膜等之用途極爲 有用。 -38- (35) (35)200401707 【圖式簡單說明】 第1圖代表耐衝擊性試驗裝置圖者。 圖中,1代表砝碼、2代表穿孔、3代表薄膜固定機架 代表試料薄膜。 主要元件對照表 1 砝碼 2 U型穿孔 3 試料薄膜固定機 4 試料薄膜 -39-(Impact resistance) 50% destruction energy S CD 6 rH rH CO O in d 00 d rH d CD d (Dimensional stability) Dimensional change rate ① 6 1 CM 6 rH i —1.2 _1 Inch 6 is greater than 9_3. 5 〇〇〇 ◎ XXX (thickness 100 "m conversion) m reflection measurement method 8 cC tH d rH d LO 6 CSl d CO d ο d -0 · 4 〇1 -0. 1 i-0 · 1 rH 6 odod CSl d LO 6 transmission measurement 〇 * cd CO d 1-0 · 3 CO 6 1 inch d 1 LO d 1 〇d -0. 6 〇CO rH inch i-Η LO r—i rH rH inch 03 CO d 03 < N turbidity Hz100 CO 6 inch 6 CO 6 inch d; 〇dr-id CD 6 plane alignment coefficient in c 0. 259 0. 251 0. 261 0. 261 0. 256 0. 006 0. 260 refractive index N) C 1. 498 ΙΟ g rH a inch τ—1 BU inch τΗ 1. 498 CO inch CD rH 1. 498 rH CD BU rH 1. 755 00 CO rH 00 CO IN rH 00 LO rH I 1. 648 < N rH RH nMD 1. 753 1 1. 756 00 inch rH 1. 748 1_ o 10 rH 1. 649 1. 803 intrinsic viscosity dl / g 0. 55 0. 55 0. 58 0. 65 rH inch 6 0. 71 0 58 lit ε a. Oo rH ο g LO oo rH oo CN oo tH rH Cv3 CO inch rH CO CO -37-(34) (34) 200401707 Table 4 \ Substrate layer thickness (impact resistance 50% failure energy — μΐΏ J-Example 5 Film 100 of Example 1 0.6 0.6 Example 6 Film of Example 2 1.1 _ Comparative Example 4 Film of Example 2 200 0.1-Comparative Example 5 Commercial PES film 0.4- Comparative Example 6 Market glass 720 0.07 _ PES: Polyether (Inventive Effect) The present invention can obtain polyethylene with good transparency and hue, and rarely generates oligomers when heated, and has a thin film with good impact resistance. Laminated film of naphthalene dicarboxylate film. [Industrial Applicability] In addition, the present invention obtains a laminated film and uses it as a hard coat film, a gas barrier film, and a transparent conductive film to take advantage of these good characteristics, particularly for liquid crystal displays, antireflection films, and organic EL It is extremely useful for displays, electrophoretic paper, solar batteries, touch switchboards, and electromagnetic wave prevention films for i_DP. -38- (35) (35) 200401707 [Brief description of the diagram] Figure 1 represents the diagram of the impact resistance test device. In the figure, 1 represents the weight, 2 represents the perforation, and 3 represents the film fixing frame, which represents the sample film. Comparison table of main components 1 Weight 2 U-shaped perforation 3 Sample film fixing machine 4 Sample film -39-
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| Country | Link |
|---|---|
| JP (1) | JPWO2004000920A1 (en) |
| AU (1) | AU2003246180A1 (en) |
| TW (1) | TW200401707A (en) |
| WO (1) | WO2004000920A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108156813A (en) * | 2015-09-30 | 2018-06-12 | 3M创新有限公司 | Multilayer barrier coat |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006306910A (en) * | 2005-04-26 | 2006-11-09 | Teijin Dupont Films Japan Ltd | Polyester film for solar cells |
| JP2006334909A (en) * | 2005-06-01 | 2006-12-14 | Gunze Ltd | Film with gas barrier layer |
| GB0602678D0 (en) * | 2006-02-09 | 2006-03-22 | Dupont Teijin Films Us Ltd | Polyester film and manufacturing process |
| JP4902464B2 (en) * | 2007-08-22 | 2012-03-21 | 帝人デュポンフィルム株式会社 | Solar cell back surface protective film |
| DE102009009791A1 (en) * | 2009-02-20 | 2010-08-26 | Mitsubishi Plastics, Inc. | White, coated polyester film, process for its preparation and its use as back cover in solar modules |
| JP2010232047A (en) * | 2009-03-27 | 2010-10-14 | Teijin Dupont Films Japan Ltd | Biaxially oriented polyester film for solid polymer electrolyte membrane protection and solid polymer electrolyte membrane protection member |
| JP2012000812A (en) | 2010-06-15 | 2012-01-05 | Daicel Corp | Laminated film, method for producing the same and electronic device |
| JP5838578B2 (en) * | 2011-03-29 | 2016-01-06 | 凸版印刷株式会社 | Gas barrier laminate |
| JP6251970B2 (en) * | 2012-03-30 | 2017-12-27 | 三菱ケミカル株式会社 | GAS BARRIER FILM, PROCESS FOR PRODUCING THE SAME, AND GAS BARRIER LAMINATE |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002003624A (en) * | 2000-06-26 | 2002-01-09 | Teijin Ltd | Polyester film |
-
2003
- 2003-06-23 WO PCT/JP2003/007925 patent/WO2004000920A1/en not_active Ceased
- 2003-06-23 JP JP2004515547A patent/JPWO2004000920A1/en active Pending
- 2003-06-23 AU AU2003246180A patent/AU2003246180A1/en not_active Abandoned
- 2003-06-24 TW TW092117155A patent/TW200401707A/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108156813A (en) * | 2015-09-30 | 2018-06-12 | 3M创新有限公司 | Multilayer barrier coat |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2004000920A1 (en) | 2003-12-31 |
| AU2003246180A1 (en) | 2004-01-06 |
| JPWO2004000920A1 (en) | 2005-10-20 |
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