TW200416487A - Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method thereof - Google Patents

Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method thereof Download PDF

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Publication number
TW200416487A
TW200416487A TW092121521A TW92121521A TW200416487A TW 200416487 A TW200416487 A TW 200416487A TW 092121521 A TW092121521 A TW 092121521A TW 92121521 A TW92121521 A TW 92121521A TW 200416487 A TW200416487 A TW 200416487A
Authority
TW
Taiwan
Prior art keywords
photoresist layer
photosensitive composition
group
image forming
compound
Prior art date
Application number
TW092121521A
Other languages
English (en)
Chinese (zh)
Other versions
TWI326006B (fr
Inventor
Yasuhiro Kameyama
Rieko Fujita
Toshiyuki Urano
Takashi Miyazawa
Eriko Toshimitsu
Original Assignee
Mitsubishi Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chem Corp filed Critical Mitsubishi Chem Corp
Publication of TW200416487A publication Critical patent/TW200416487A/zh
Application granted granted Critical
Publication of TWI326006B publication Critical patent/TWI326006B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW092121521A 2002-08-07 2003-08-06 Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method thereof TW200416487A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2002229416 2002-08-07
JP2002365470 2002-12-17
JP2003017559 2003-01-27
JP2003034161 2003-02-12
JP2003044649 2003-02-21

Publications (2)

Publication Number Publication Date
TW200416487A true TW200416487A (en) 2004-09-01
TWI326006B TWI326006B (fr) 2010-06-11

Family

ID=31721816

Family Applications (2)

Application Number Title Priority Date Filing Date
TW092121521A TW200416487A (en) 2002-08-07 2003-08-06 Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method thereof
TW096137263A TW200839443A (en) 2002-08-07 2003-08-06 Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method therefor

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW096137263A TW200839443A (en) 2002-08-07 2003-08-06 Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method therefor

Country Status (5)

Country Link
KR (2) KR20050047088A (fr)
CN (2) CN101135850B (fr)
AU (1) AU2003254812A1 (fr)
TW (2) TW200416487A (fr)
WO (1) WO2004015497A1 (fr)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005031463A1 (fr) * 2003-09-25 2005-04-07 Mitsubishi Chemical Corporation Composition photosensible au laser bleu-violet negatif, materiau de formation d'image, dispositif de formation d'image et procede de formation d'image
WO2005109098A1 (fr) * 2004-05-12 2005-11-17 Fuji Photo Film Co., Ltd. Matériau de formation de motif, appareil de formation de motif, et procédé de formation de motif
JP2006154740A (ja) * 2004-07-14 2006-06-15 Fuji Photo Film Co Ltd 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
US20080268374A1 (en) 2004-07-14 2008-10-30 Fujifilm Corporation Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process
TW200622491A (en) * 2004-09-28 2006-07-01 Fuji Photo Film Co Ltd Pattern-forming material, pattern-forming device and pattern-forming method
TWI358613B (en) * 2006-03-10 2012-02-21 Rohm & Haas Elect Mat Compositions and processes for photolithography
KR101313538B1 (ko) * 2006-04-06 2013-10-01 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물
JP4975579B2 (ja) * 2007-10-01 2012-07-11 太陽ホールディングス株式会社 組成物、ドライフィルム、硬化物及びプリント配線板
TWI491982B (zh) * 2009-10-28 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP5296828B2 (ja) * 2011-04-15 2013-09-25 旭化成イーマテリアルズ株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP5973431B2 (ja) * 2011-05-31 2016-08-23 デンカ株式会社 エネルギー線硬化性樹脂組成物
EP2682440A1 (fr) * 2012-07-06 2014-01-08 Basf Se Composition de polissage mécanique et chimique (cmp) comprenant un tensioactif non ionique et un sel de carbonate
CN103298265B (zh) * 2013-04-09 2016-04-06 王俊生 一种电路板外层线路成型方法
KR102145934B1 (ko) * 2014-05-20 2020-08-19 동우 화인켐 주식회사 광경화 패턴의 형성 방법
CN105418674A (zh) * 2015-11-10 2016-03-23 中国乐凯集团有限公司 一种高折射率树脂及其应用
US11681223B2 (en) 2016-08-08 2023-06-20 Nissan Chemical Corporation Photocurable composition and method for producing semiconductor device
US10520813B2 (en) 2016-12-15 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd Extreme ultraviolet photoresist with high-efficiency electron transfer
US12124166B2 (en) * 2017-04-25 2024-10-22 Merck Patent Gmbh Negative resist formulation for producing undercut pattern profiles
KR102769114B1 (ko) * 2020-07-01 2025-02-18 도쿄 오카 고교 가부시키가이샤 화학 증폭형 감광성 조성물, 감광성 드라이 필름, 도금용 주형 부착 기판의 제조 방법, 및 도금 조형물의 제조 방법
US20220067489A1 (en) 2020-08-28 2022-03-03 Illumina, Inc. Detecting and Filtering Clusters Based on Artificial Intelligence-Predicted Base Calls
AU2022248999A1 (en) 2021-03-31 2023-02-02 Illumina, Inc. Artificial intelligence-based base caller with contextual awareness
CN117631439B (zh) * 2022-08-31 2025-10-31 长春人造树脂厂股份有限公司 光阻膜及其应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09281698A (ja) 1996-04-11 1997-10-31 Mitsubishi Chem Corp カラーフィルター用光重合性組成物
US6468711B1 (en) * 1998-09-09 2002-10-22 Fuji Photo Film Co., Ltd. Photosensitive composition and method for manufacturing lithographic printing plate
US6335144B1 (en) 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
DE06121351T1 (de) * 2000-04-19 2009-01-29 Agfa Graphics N.V. Lichtempfindliche lithografische Druckplatte und Verfahren zur Herstellung einer Druckplatte
JP2002072460A (ja) * 2000-09-05 2002-03-12 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途
JP2002148801A (ja) * 2000-11-14 2002-05-22 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途
JP2002169275A (ja) * 2000-12-04 2002-06-14 Mitsui Chemicals Inc 光酸発生剤及びそれを用いた可視光感光性樹脂組成物
JP2002202598A (ja) * 2000-12-28 2002-07-19 Fuji Photo Film Co Ltd 感光性組成物およびそれを用いた光重合方法
JP4152597B2 (ja) * 2001-02-16 2008-09-17 三菱製紙株式会社 感光性組成物
JP2003167329A (ja) * 2001-09-20 2003-06-13 Mitsubishi Chemicals Corp 平版印刷版の作製方法
JP2003195526A (ja) * 2001-12-27 2003-07-09 Mitsubishi Chemicals Corp 感光性平版印刷版の刷版方法

Also Published As

Publication number Publication date
AU2003254812A1 (en) 2004-02-25
TW200839443A (en) 2008-10-01
WO2004015497A1 (fr) 2004-02-19
TWI326006B (fr) 2010-06-11
CN101135850B (zh) 2011-02-16
KR101003323B1 (ko) 2010-12-22
CN101135850A (zh) 2008-03-05
KR20050047088A (ko) 2005-05-19
CN100573321C (zh) 2009-12-23
KR20080011351A (ko) 2008-02-01
CN1675588A (zh) 2005-09-28

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