TW200420690A - Photocurable composition, color filter, and crystaldisplay device - Google Patents

Photocurable composition, color filter, and crystaldisplay device

Info

Publication number
TW200420690A
TW200420690A TW092136794A TW92136794A TW200420690A TW 200420690 A TW200420690 A TW 200420690A TW 092136794 A TW092136794 A TW 092136794A TW 92136794 A TW92136794 A TW 92136794A TW 200420690 A TW200420690 A TW 200420690A
Authority
TW
Taiwan
Prior art keywords
color filter
photocurable composition
species
display device
crystal display
Prior art date
Application number
TW092136794A
Other languages
English (en)
Other versions
TWI245164B (en
Inventor
Norikuni Suzuki
Youichi Nemoto
Original Assignee
Fujifilm Arch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Arch Co Ltd filed Critical Fujifilm Arch Co Ltd
Publication of TW200420690A publication Critical patent/TW200420690A/zh
Application granted granted Critical
Publication of TWI245164B publication Critical patent/TWI245164B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
TW092136794A 2002-12-27 2003-12-25 Photocurable composition, color filter, and crystal display device TWI245164B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002382567A JP4025191B2 (ja) 2002-12-27 2002-12-27 光硬化性組成物およびカラーフィルター並びに液晶表示装置

Publications (2)

Publication Number Publication Date
TW200420690A true TW200420690A (en) 2004-10-16
TWI245164B TWI245164B (en) 2005-12-11

Family

ID=32818090

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092136794A TWI245164B (en) 2002-12-27 2003-12-25 Photocurable composition, color filter, and crystal display device

Country Status (3)

Country Link
JP (1) JP4025191B2 (zh)
KR (1) KR101002674B1 (zh)
TW (1) TWI245164B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101122744B (zh) * 2006-08-11 2012-05-30 富士胶片株式会社 光固化性着色组合物以及使用其的滤色器
TWI405275B (zh) * 2008-01-11 2013-08-11 朝灯精密制版股份有限公司 Conductive cover for conductive sphere and manufacturing method thereof

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4902271B2 (ja) * 2005-06-03 2012-03-21 富士フイルム株式会社 カラーフィルタの製造方法、カラーフィルタおよび画像記録材料
KR101304263B1 (ko) * 2005-06-03 2013-09-05 후지필름 가부시키가이샤 안료함유 열경화성 조성물, 및, 컬러필터, 화상기록재료,및, 컬러필터의 제조방법
JP4959252B2 (ja) 2006-08-11 2012-06-20 富士フイルム株式会社 カラーフィルタ用積層体及びカラーフィルタ
KR101395629B1 (ko) * 2006-08-11 2014-05-16 후지필름 가부시키가이샤 광경화성 착색 조성물 및 이것을 사용한 컬러필터
JP4902292B2 (ja) * 2006-08-11 2012-03-21 富士フイルム株式会社 光硬化性着色組成物及びそれを用いたカラーフィルタ
KR100920603B1 (ko) * 2006-12-28 2009-10-08 제일모직주식회사 감광성 수지 조성물 및 그로부터 제조되는 컬러필터
JP5115205B2 (ja) * 2008-01-15 2013-01-09 Ｊｎｃ株式会社 ポジ型感光性重合体組成物
KR102136697B1 (ko) * 2017-12-27 2020-07-23 에스케이머티리얼즈퍼포먼스 주식회사 우수한 방투습 성능을 갖는 유색 수지 조성물

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3686494B2 (ja) 1997-03-04 2005-08-24 三菱化学株式会社 カラーフィルター用光重合性組成物
JP2000098606A (ja) 1998-09-22 2000-04-07 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
JP2000194132A (ja) 1998-12-25 2000-07-14 Sumitomo Chem Co Ltd 着色感光性樹脂組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101122744B (zh) * 2006-08-11 2012-05-30 富士胶片株式会社 光固化性着色组合物以及使用其的滤色器
TWI405275B (zh) * 2008-01-11 2013-08-11 朝灯精密制版股份有限公司 Conductive cover for conductive sphere and manufacturing method thereof

Also Published As

Publication number Publication date
TWI245164B (en) 2005-12-11
JP4025191B2 (ja) 2007-12-19
KR101002674B1 (ko) 2010-12-20
JP2004212677A (ja) 2004-07-29
KR20040060714A (ko) 2004-07-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees