TW200420690A - Photocurable composition, color filter, and crystaldisplay device - Google Patents

Photocurable composition, color filter, and crystaldisplay device

Info

Publication number
TW200420690A
TW200420690A TW092136794A TW92136794A TW200420690A TW 200420690 A TW200420690 A TW 200420690A TW 092136794 A TW092136794 A TW 092136794A TW 92136794 A TW92136794 A TW 92136794A TW 200420690 A TW200420690 A TW 200420690A
Authority
TW
Taiwan
Prior art keywords
color filter
photocurable composition
species
display device
crystal display
Prior art date
Application number
TW092136794A
Other languages
Chinese (zh)
Other versions
TWI245164B (en
Inventor
Norikuni Suzuki
Youichi Nemoto
Original Assignee
Fujifilm Arch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Arch Co Ltd filed Critical Fujifilm Arch Co Ltd
Publication of TW200420690A publication Critical patent/TW200420690A/en
Application granted granted Critical
Publication of TWI245164B publication Critical patent/TWI245164B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)

Abstract

The present invention is to provide a photocurable composition used for color filter which there is no pinhole-cissing produced on coating surface of the overcoat layer and whose developing margin and developing latitude are excellent. And there are provided the color filter as well as the crystal display device which are made by using the composition mentioned above. In the photocurable composition containing (a) coloring agent, (b) alkali dissolvable resin, (c) photosensitive polymerizable component, (d) photo initiator of plymerization, and (e) solvent, for the (b) alkali dissolvable resin, the photocurable composition is used, which contains the acrylic copolymer A made of (I) acidic component monomer, (ii) alkyl polyoxyethylene'polyoxypropylene(metha)acrylate, and (iii) at least one compound with carbon-carbon unsaturated bond chosen from specific acrylate species, styrenic species, and vinylester species, and the color filter as well as crystal display device which are made by using the composition mentioned above.
TW092136794A 2002-12-27 2003-12-25 Photocurable composition, color filter, and crystal display device TWI245164B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002382567A JP4025191B2 (en) 2002-12-27 2002-12-27 Photocurable composition, color filter, and liquid crystal display device

Publications (2)

Publication Number Publication Date
TW200420690A true TW200420690A (en) 2004-10-16
TWI245164B TWI245164B (en) 2005-12-11

Family

ID=32818090

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092136794A TWI245164B (en) 2002-12-27 2003-12-25 Photocurable composition, color filter, and crystal display device

Country Status (3)

Country Link
JP (1) JP4025191B2 (en)
KR (1) KR101002674B1 (en)
TW (1) TWI245164B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101122744B (en) * 2006-08-11 2012-05-30 富士胶片株式会社 Light solidifying coloring composition and color filter using the same
TWI405275B (en) * 2008-01-11 2013-08-11 朝灯精密制版股份有限公司 Conductive cover for conductive sphere and manufacturing method thereof

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4902271B2 (en) * 2005-06-03 2012-03-21 富士フイルム株式会社 Color filter manufacturing method, color filter and image recording material
KR101304263B1 (en) * 2005-06-03 2013-09-05 후지필름 가부시키가이샤 Pigment-containing thermal-curable composition, color filter, image-recording material, and method of producing color filter
JP4959252B2 (en) 2006-08-11 2012-06-20 富士フイルム株式会社 Color filter laminate and color filter
KR101395629B1 (en) * 2006-08-11 2014-05-16 후지필름 가부시키가이샤 Photo-curable colored composition and color filter using the same
JP4902292B2 (en) * 2006-08-11 2012-03-21 富士フイルム株式会社 Photocurable coloring composition and color filter using the same
KR100920603B1 (en) * 2006-12-28 2009-10-08 제일모직주식회사 Photosensitive resin composition and color filter manufactured therefrom
JP5115205B2 (en) * 2008-01-15 2013-01-09 Ｊｎｃ株式会社 Positive photosensitive polymer composition
KR102136697B1 (en) * 2017-12-27 2020-07-23 에스케이머티리얼즈퍼포먼스 주식회사 Colored resin compositions which have high mositure-proof performance

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3686494B2 (en) 1997-03-04 2005-08-24 三菱化学株式会社 Photopolymerizable composition for color filter
JP2000098606A (en) 1998-09-22 2000-04-07 Sumitomo Chem Co Ltd Colored photosensitive resin composition
JP2000194132A (en) 1998-12-25 2000-07-14 Sumitomo Chem Co Ltd Color photosensitive resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101122744B (en) * 2006-08-11 2012-05-30 富士胶片株式会社 Light solidifying coloring composition and color filter using the same
TWI405275B (en) * 2008-01-11 2013-08-11 朝灯精密制版股份有限公司 Conductive cover for conductive sphere and manufacturing method thereof

Also Published As

Publication number Publication date
TWI245164B (en) 2005-12-11
JP4025191B2 (en) 2007-12-19
KR101002674B1 (en) 2010-12-20
JP2004212677A (en) 2004-07-29
KR20040060714A (en) 2004-07-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees