TW200427978A - Detection method and apparatus - Google Patents
Detection method and apparatus Download PDFInfo
- Publication number
- TW200427978A TW200427978A TW92119557A TW92119557A TW200427978A TW 200427978 A TW200427978 A TW 200427978A TW 92119557 A TW92119557 A TW 92119557A TW 92119557 A TW92119557 A TW 92119557A TW 200427978 A TW200427978 A TW 200427978A
- Authority
- TW
- Taiwan
- Prior art keywords
- photoluminescence
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- patent application
- item
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Links
- 238000001514 detection method Methods 0.000 title claims description 7
- 238000005424 photoluminescence Methods 0.000 claims abstract description 102
- 230000007547 defect Effects 0.000 claims abstract description 82
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- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims abstract description 18
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- 229910052732 germanium Inorganic materials 0.000 claims description 7
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 7
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
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- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6489—Photoluminescence of semiconductors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0216815A GB0216815D0 (en) | 2002-07-19 | 2002-07-19 | Detection method and apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200427978A true TW200427978A (en) | 2004-12-16 |
Family
ID=9940777
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW92119557A TW200427978A (en) | 2002-07-19 | 2003-07-17 | Detection method and apparatus |
Country Status (4)
| Country | Link |
|---|---|
| AU (1) | AU2003281574A1 (fr) |
| GB (1) | GB0216815D0 (fr) |
| TW (1) | TW200427978A (fr) |
| WO (1) | WO2004010121A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240230553A1 (en) * | 2021-05-21 | 2024-07-11 | Sumco Corporation | Method of evaluating silicon single-crystal ingot, method of evaluating silicon epitaxial wafer, method of manufacturing silicon epitaxial wafer, and method of evaluating silicon mirror polished wafer |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9618897D0 (en) | 1996-09-10 | 1996-10-23 | Bio Rad Micromeasurements Ltd | Micro defects in silicon wafers |
| GB0308182D0 (en) | 2003-04-09 | 2003-05-14 | Aoti Operating Co Inc | Detection method and apparatus |
| TWI391645B (zh) | 2005-07-06 | 2013-04-01 | Nanometrics Inc | 晶圓或其他工作表面下污染物及缺陷非接觸測量之差分波長光致發光 |
| TWI439684B (zh) | 2005-07-06 | 2014-06-01 | Nanometrics Inc | 具自晶圓或其他工件特定材料層所發射光致發光信號優先偵測之光致發光成像 |
| RU2374607C2 (ru) * | 2007-10-11 | 2009-11-27 | Валерий Андреевич Базыленко | Способ контроля шероховатости поверхности на основе эффекта фотолюминесценции частиц наноразмерного уровня |
| US9633865B2 (en) | 2008-02-22 | 2017-04-25 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Low-stain polishing composition |
| EP2319073A1 (fr) * | 2008-07-09 | 2011-05-11 | BT Imaging Pty Ltd | Procédé et appareil d'imagerie de couche mince |
| KR20110055631A (ko) * | 2008-08-19 | 2011-05-25 | 비티 이미징 피티와이 리미티드 | 결함 감지를 위한 방법 및 장치 |
| US8441639B2 (en) * | 2009-09-03 | 2013-05-14 | Kla-Tencor Corp. | Metrology systems and methods |
| TW201140039A (en) * | 2010-01-04 | 2011-11-16 | Bt Imaging Pty Ltd | Improved illumination systems and methods for photoluminescence imaging of photovoltaic cells and wafers |
| US8629411B2 (en) | 2010-07-13 | 2014-01-14 | First Solar, Inc. | Photoluminescence spectroscopy |
| US9354177B2 (en) * | 2013-06-26 | 2016-05-31 | Kla-Tencor Corporation | System and method for defect detection and photoluminescence measurement of a sample |
| CN110854032A (zh) * | 2019-11-13 | 2020-02-28 | 上海华力集成电路制造有限公司 | 锗硅工艺中颗粒缺陷的检测方法 |
| CN111337458A (zh) * | 2020-03-30 | 2020-06-26 | 创能动力科技有限公司 | 用于半导体层的缺陷检测方法及系统 |
| CN114486926B (zh) * | 2021-12-30 | 2024-03-26 | 深圳瑞波光电子有限公司 | 半导体激光芯片失效分析方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4571685A (en) * | 1982-06-23 | 1986-02-18 | Nec Corporation | Production system for manufacturing semiconductor devices |
| GB9618897D0 (en) * | 1996-09-10 | 1996-10-23 | Bio Rad Micromeasurements Ltd | Micro defects in silicon wafers |
| GB9803842D0 (en) * | 1998-02-25 | 1998-04-22 | Shin Etsu Handotai Europ Ltd | Semiconductor wafer inspection apparatus |
-
2002
- 2002-07-19 GB GB0216815A patent/GB0216815D0/en not_active Ceased
-
2003
- 2003-07-14 AU AU2003281574A patent/AU2003281574A1/en not_active Abandoned
- 2003-07-14 WO PCT/GB2003/003022 patent/WO2004010121A1/fr not_active Ceased
- 2003-07-17 TW TW92119557A patent/TW200427978A/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240230553A1 (en) * | 2021-05-21 | 2024-07-11 | Sumco Corporation | Method of evaluating silicon single-crystal ingot, method of evaluating silicon epitaxial wafer, method of manufacturing silicon epitaxial wafer, and method of evaluating silicon mirror polished wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| AU2003281574A1 (en) | 2004-02-09 |
| GB0216815D0 (en) | 2002-08-28 |
| WO2004010121A1 (fr) | 2004-01-29 |
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