TW200501833A - Plasma-assisted joining - Google Patents

Plasma-assisted joining

Info

Publication number
TW200501833A
TW200501833A TW092134066A TW92134066A TW200501833A TW 200501833 A TW200501833 A TW 200501833A TW 092134066 A TW092134066 A TW 092134066A TW 92134066 A TW92134066 A TW 92134066A TW 200501833 A TW200501833 A TW 200501833A
Authority
TW
Taiwan
Prior art keywords
plasma
joining
methods
cavity
sustaining
Prior art date
Application number
TW092134066A
Other languages
Chinese (zh)
Inventor
Devendra Kumar
Satyendra Kumar
Original Assignee
Dana Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2003/014053 external-priority patent/WO2003096773A1/en
Application filed by Dana Corp filed Critical Dana Corp
Publication of TW200501833A publication Critical patent/TW200501833A/en

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Catalysts (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Exhaust Gas After Treatment (AREA)
  • Hydrogen, Water And Hydrids (AREA)
  • Plasma Technology (AREA)

Abstract

Methods and apparatus for plasma-assisted joining of one or more parts together are provided. The joining process may include, for example, placing at least first and second joining areas in proximity to one another in a cavity, forming a plasma in the cavity by subjecting a gas to electromagnetic radiation in the presence of a plasma catalyst, and sustaining the plasma at least until the first and second joining areas are joined. Plasma catalysts, and methods and apparatus for igniting, modulating, and sustaining a joining plasma, are provided. Additional cavity shapes, and methods and apparatus for selective plasma-joining, are also provided.
TW092134066A 2002-12-04 2003-12-03 Plasma-assisted joining TW200501833A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US43067702P 2002-12-04 2002-12-04
US43527802P 2002-12-23 2002-12-23
PCT/US2003/014053 WO2003096773A1 (en) 2002-05-08 2003-05-07 Plasma-assisted joining
US10/430,414 US6870124B2 (en) 2002-05-08 2003-05-07 Plasma-assisted joining

Publications (1)

Publication Number Publication Date
TW200501833A true TW200501833A (en) 2005-01-01

Family

ID=36603175

Family Applications (5)

Application Number Title Priority Date Filing Date
TW092134046A TW200419065A (en) 2002-12-04 2003-12-03 Plasma-assisted engine exhaust treatment
TW092134050A TW200424327A (en) 2002-12-04 2003-12-03 Plasma-assisted coating
TW092134052A TW200427627A (en) 2002-12-04 2003-12-03 Plasma-assisted carburizing
TW092134043A TW200421487A (en) 2002-12-04 2003-12-03 Plasma-assisted sintering
TW092134066A TW200501833A (en) 2002-12-04 2003-12-03 Plasma-assisted joining

Family Applications Before (4)

Application Number Title Priority Date Filing Date
TW092134046A TW200419065A (en) 2002-12-04 2003-12-03 Plasma-assisted engine exhaust treatment
TW092134050A TW200424327A (en) 2002-12-04 2003-12-03 Plasma-assisted coating
TW092134052A TW200427627A (en) 2002-12-04 2003-12-03 Plasma-assisted carburizing
TW092134043A TW200421487A (en) 2002-12-04 2003-12-03 Plasma-assisted sintering

Country Status (2)

Country Link
AR (4) AR042432A1 (en)
TW (5) TW200419065A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI651748B (en) * 2017-07-10 2019-02-21 法商歐洲雷射系統與方案解決公司 Low pressure wire ion plasma discharge source, and application to electron source with secondary emission

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007037527B4 (en) * 2006-11-10 2013-05-08 Schott Ag Process for coating objects with alternating layers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI651748B (en) * 2017-07-10 2019-02-21 法商歐洲雷射系統與方案解決公司 Low pressure wire ion plasma discharge source, and application to electron source with secondary emission

Also Published As

Publication number Publication date
AR042432A1 (en) 2005-06-22
TW200424327A (en) 2004-11-16
TW200427627A (en) 2004-12-16
AR042280A1 (en) 2005-06-15
AR042281A1 (en) 2005-06-15
TW200421487A (en) 2004-10-16
TW200419065A (en) 2004-10-01
AR047196A1 (en) 2006-01-11

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