TW200534236A - Method of manufacturing large-size substrate - Google Patents

Method of manufacturing large-size substrate Download PDF

Info

Publication number: TW200534236A
Authority: TW; Taiwan
Prior art keywords: substrate; processing; flatness; manufacturing; processing tool
Prior art date: 2004-02-18

Application number

TW094104705A

Other languages

English (en)

Chinese (zh)

Other versions

TWI369671B (2

Inventor

Yukio Shibano

Daisuke Kusabiraki

Shuhei Ueda

Atsushi Watabe

Original Assignee

Shinetsu Chemical Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2004-02-18

Filing date

2005-02-17

Publication date

2005-10-16

2005-02-17 Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co

2005-10-16 Publication of TW200534236A publication Critical patent/TW200534236A/zh

2012-08-01 Application granted granted Critical

2012-08-01 Publication of TWI369671B publication Critical patent/TWI369671B/zh

Links

239000000758 substrate Substances 0.000 title claims abstract description 136
238000004519 manufacturing process Methods 0.000 title claims abstract description 29
238000012545 processing Methods 0.000 claims abstract description 116
238000000034 method Methods 0.000 claims abstract description 38
239000002002 slurry Substances 0.000 claims abstract description 18
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
239000002245 particle Substances 0.000 claims description 26
239000010419 fine particle Substances 0.000 claims description 21
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
238000005259 measurement Methods 0.000 claims description 12
239000004973 liquid crystal related substance Substances 0.000 claims description 6
229910052814 silicon oxide Inorganic materials 0.000 claims description 4
229910000420 cerium oxide Inorganic materials 0.000 claims description 3
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 3
238000003672 processing method Methods 0.000 abstract description 5
238000005498 polishing Methods 0.000 abstract description 3
238000003754 machining Methods 0.000 description 8
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
239000011521 glass Substances 0.000 description 6
230000003287 optical effect Effects 0.000 description 5
230000000052 comparative effect Effects 0.000 description 4
239000000463 material Substances 0.000 description 4
230000002093 peripheral effect Effects 0.000 description 3
238000005488 sandblasting Methods 0.000 description 3
238000012937 correction Methods 0.000 description 2
230000005489 elastic deformation Effects 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
239000004744 fabric Substances 0.000 description 2
239000011859 microparticle Substances 0.000 description 2
239000010453 quartz Substances 0.000 description 2
239000002994 raw material Substances 0.000 description 2
239000004576 sand Substances 0.000 description 2
239000007921 spray Substances 0.000 description 2
238000007514 turning Methods 0.000 description 2
101100489581 Caenorhabditis elegans par-5 gene Proteins 0.000 description 1
238000004458 analytical method Methods 0.000 description 1
238000007664 blowing Methods 0.000 description 1
239000002131 composite material Substances 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
230000007547 defect Effects 0.000 description 1
230000001066 destructive effect Effects 0.000 description 1
238000010586 diagram Methods 0.000 description 1
239000002270 dispersing agent Substances 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
238000001035 drying Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
229910000449 hafnium oxide Inorganic materials 0.000 description 1
WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
JYTUFVYWTIKZGR-UHFFFAOYSA-N holmium oxide Inorganic materials [O][Ho]O[Ho][O] JYTUFVYWTIKZGR-UHFFFAOYSA-N 0.000 description 1
OWCYYNSBGXMRQN-UHFFFAOYSA-N holmium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ho+3].[Ho+3] OWCYYNSBGXMRQN-UHFFFAOYSA-N 0.000 description 1
238000002347 injection Methods 0.000 description 1
239000007924 injection Substances 0.000 description 1
238000001459 lithography Methods 0.000 description 1
238000000691 measurement method Methods 0.000 description 1
238000010422 painting Methods 0.000 description 1
230000035515 penetration Effects 0.000 description 1
238000007517 polishing process Methods 0.000 description 1
229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
229920005591 polysilicon Polymers 0.000 description 1
238000011160 research Methods 0.000 description 1
238000012552 review Methods 0.000 description 1
238000000926 separation method Methods 0.000 description 1
238000005507 spraying Methods 0.000 description 1
239000004094 surface-active agent Substances 0.000 description 1
ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 description 1
229910003452 thorium oxide Inorganic materials 0.000 description 1

Classifications

- A—HUMAN NECESSITIES
- A63—SPORTS; GAMES; AMUSEMENTS
- A63F—CARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
- A63F7/00—Indoor games using small moving playing bodies, e.g. balls, discs or blocks
- A63F7/02—Indoor games using small moving playing bodies, e.g. balls, discs or blocks using falling playing bodies or playing bodies running on an inclined surface, e.g. pinball games
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C11/00—Selection of abrasive materials or additives for abrasive blasts
- B24C11/005—Selection of abrasive materials or additives for abrasive blasts of additives, e.g. anti-corrosive or disinfecting agents in solid, liquid or gaseous form
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C7/00—Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts
- B24C7/0007—Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a liquid carrier
- B24C7/0038—Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a liquid carrier the blasting medium being a gaseous stream
- G—PHYSICS
- G07—CHECKING-DEVICES
- G07F—COIN-FREED OR LIKE APPARATUS
- G07F17/00—Coin-freed apparatus for hiring articles; Coin-freed facilities or services
- G07F17/32—Coin-freed apparatus for hiring articles; Coin-freed facilities or services for games, toys, sports, or amusements
- A—HUMAN NECESSITIES
- A63—SPORTS; GAMES; AMUSEMENTS
- A63F—CARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
- A63F2250/00—Miscellaneous game characteristics
- A63F2250/14—Coin operated
- A63F2250/142—Coin operated with pay-out or rewarding with a prize

Landscapes

Engineering & Computer Science (AREA)
Mechanical Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Multimedia (AREA)
Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Liquid Crystal (AREA)
Surface Treatment Of Glass (AREA)

TW094104705A 2004-02-18 2005-02-17 Method of manufacturing large-size substrate TW200534236A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2004041396		2004-02-18

Publications (2)

Publication Number	Publication Date
TW200534236A true TW200534236A (en)	2005-10-16
TWI369671B TWI369671B (2)	2012-08-01

Family

ID=34709095

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW094104705A TW200534236A (en)	2004-02-18	2005-02-17	Method of manufacturing large-size substrate

Country Status (5)

Country	Link
US (1)	US7183210B2 (2)
EP (1)	EP1566241B1 (2)
KR (1)	KR100837041B1 (2)
DE (1)	DE602005001710T2 (2)
TW (1)	TW200534236A (2)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI250133B (en) *	2002-01-31	2006-03-01	Shinetsu Chemical Co	Large-sized substrate and method of producing the same
CA2764294C (en)	2004-12-17	2013-12-24	Ventana Medical Systems, Inc.	Methods and compositions for a microemulsion-based tissue treatment
US7549141B2 (en) *	2005-09-12	2009-06-16	Asahi Glass Company, Ltd.	Photomask, photomask manufacturing method, and photomask processing device
JP5526895B2 (ja) *	2009-04-01	2014-06-18	信越化学工業株式会社	大型合成石英ガラス基板の製造方法
US8562145B2 (en)	2011-06-22	2013-10-22	3M Innovative Properties Company	Display system and method for projection onto non-planar surfaces
DE102015224933A1 (de) *	2015-12-11	2017-06-14	Siltronic Ag	Monokristalline Halbleiterscheibe und Verfahren zur Herstellung einer Halbleiterscheibe
JP6819451B2 (ja) *	2017-05-08	2021-01-27	信越化学工業株式会社	大型合成石英ガラス基板並びにその評価方法及び製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5123206A (en) *	1987-12-04	1992-06-23	Whitemetal, Inc.	Wet abrasive blasting method
US5230185A (en) *	1990-04-06	1993-07-27	Church & Dwight Co., Inc.	Blasting apparatus and method
US5484325A (en) *	1993-10-07	1996-01-16	Church & Dwight Co., Inc.	Blast nozzle containing water atomizer for dust control
WO1995022432A1 (en) *	1994-02-21	1995-08-24	Waterkracht B.V.	Blasting device with adjustable blast strength
US5975996A (en) *	1996-07-18	1999-11-02	The Penn State Research Foundation	Abrasive blast cleaning nozzle
KR20010014577A (ko) *	1999-03-18	2001-02-26	시부야 히로토시	클린싱 및 스크레이핑 방법과 그 장치 그리고 클린싱 및스크레이핑 매질유체 형성방법과 그 장치
TWI250133B (en) *	2002-01-31	2006-03-01	Shinetsu Chemical Co	Large-sized substrate and method of producing the same
JP4267333B2 (ja) *	2002-01-31	2009-05-27	信越化学工業株式会社	大型合成石英ガラス基板の製造方法

2005
- 2005-02-17 EP EP05250912A patent/EP1566241B1/en not_active Expired - Lifetime
- 2005-02-17 TW TW094104705A patent/TW200534236A/zh not_active IP Right Cessation
- 2005-02-17 DE DE602005001710T patent/DE602005001710T2/de not_active Expired - Lifetime
- 2005-02-17 KR KR1020050013074A patent/KR100837041B1/ko not_active Expired - Lifetime
- 2005-02-17 US US11/059,530 patent/US7183210B2/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
DE602005001710D1 (de)	2007-09-06
EP1566241A1 (en)	2005-08-24
EP1566241B1 (en)	2007-07-25
TWI369671B (2)	2012-08-01
KR100837041B1 (ko)	2008-06-11
US20050181611A1 (en)	2005-08-18
DE602005001710T2 (de)	2008-04-30
US7183210B2 (en)	2007-02-27
KR20060042037A (ko)	2006-05-12

Legal Events

Date	Code	Title	Description
2025-04-01	MK4A	Expiration of patent term of an invention patent

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CN110967924A (zh)	2020-04-07	光掩模基板、其修正方法、制造方法和处理方法、光掩模的制造方法以及基板处理装置
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JP4340893B2 (ja)	2009-10-07	大型基板の製造方法
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