TW200536643A - Electrolytic processing apparatus - Google Patents

Abstract

An electrolytic processing apparatus (50) has feed electrodes (74) to feed an electric current to a substrate (W), an ion exchanger (76) brought into contact with the substrate (W), and process electrodes (72) to perform an electrolytic process on the substrate (W). The electrolytic processing apparatus (50) has an electrolytic processing liquid source to supply an electrolytic processing liquid between the substrate (W) and the ion exchanger (76), and a regeneration liquid supply source to supply a regeneration liquid to a regeneration liquid chambers (90a, 90b). The electrolytic processing apparatus (50) includes regeneration electrodes (84) spaced from the process electrodes (72) and a power supply (58, 96) to apply a voltage between the electrodes (74, 72, 84). The electrolytic processing apparatus (50) includes a controller (82) to control the voltage applied between the electrodes (74, 72, 84) so that the feed electrode (74) has a potential higher than the process electrode (72) and the same polarity as the process electrode (72), and that the process electrode (72) has a potential higher than the regeneration electrode (84).

Description

200536643 IX. Description of the invention: [Technical field to which the invention belongs] 'The present invention relates to an electrolytic processing device, and more particularly to a conductive material for treating a conductive material formed on a surface of a substrate (such as a semiconductor wafer) or for removing Electrolytic processing device for impurities on a substrate surface. [Prior art]

Km ~ Kawata agrees with low resistance and high electromigration resistance copper (cu) instead of using Shao or Shao alloys to form interconnections on substrates such as semiconductor wafers The material of the circuit has been gradually growing. Copper interconnects (wercc, nneetl, C, n) itf are formed by filling copper in the micro-holes formed on the surface of the substrate. Various techniques are known to form / '· interconnects, including chemical vapor deposition (⑽), ㈣, and ballasts = any method described in: " forming copper on the entire surface of the substrate Chemical mechanical milling (HP) is then used to remove unwanted copper. Figures 1A to 1C show :: substances forming copper interconnections in the base. As shown in Fig. 1A, an insulating film 2 (such as silicon dioxide (CD2) / special month or low-k material amine); 彳 #, 士 # + # \ The conductive layer 1ajl on the substrate. The contact hole 3 and the interconnect trench are formed in the insulating film 2 by the lithography technique. After that,

A barrier layer 5 formed of r = ls (TaN) or similar material is formed on the object 2, and a seed layer 7 is formed on the barrier layer 5 by plating, CVD =: = Among them, the seed layer is used as a feed layer for the electric ore. 3I6929 200536643 Next, as shown in Fig. 1β, the substrate 纟 is covered with copper to fill the surface of 以 with steel plating, 4 contact holes 3, and the mutual insulation film 2 plating. In this view, a copper thin film 6 is provided.徭, ρ, 磨 (CMP) to remove the copper film contact hole 3 and the mutual distance, cover ^ ^ on the copper film on the Maicuo by mechanical and mechanical research, ', Ba Yuantao 2 The copper film in 4 is the main π — ^ "绝缘 of the insulating film 2, the surface of the special boat 6 is substantially higher than the m ^ c surface. If you hunt this, you can in the insulation layer 2 copper fe 6 The composition of Xiwan and Zhiru (豕 冷 z〒) forms the interconnected part of attack, as shown in Figure 1C. The components in various types of equipment are close to thin, and the cloud | 1 Supply has been delivered to Enlai. Has been adopted, U Tianwan, Ren d card manufacturing technology has been widely used

At this point, the characteristics of the material are deeply processed under certain conditions. In this and by the surface: the desired part of the piece is physically destroyed. The conventional mechanical processing method of mechanical force 2L removal will be worse because of how the machine promotes a person's mouth. So the question. D0% does not deteriorate the material characteristics, but it is very important: as shown in the $ 1C copper interconnect, for example, it has been replaced with ^ skin for the oxygen cut of I㈣ film, A material (low-k material) having a dielectric constant lower than that found by oxidation has been used to prevent signal delay due to increased capacitance between the interconnects. However, due to the low density and low mechanical strength of such low-k materials, traditional processing methods such as samarium using mechanical action may cause separation or mechanical damage to the samarium material. Some processing methods have been developed to solve the above problems, such as chemical processing of chemical juices (electrochemicai mac), and electrolytic 316929 6 200536643 grinding. In contrast to the traditional physical dissolution reaction, the second method is carried out: these methods are based on the chemical ,,,,, and "force-finding." Therefore, these methods will not suffer, such as the water produced by plastic deformation. = Defect 'enables these processing methods to be carried out without damaging the properties of the material. 1Reverse machines have recently been developed—a kind of electrolytic processing and processing equipment. As shown in Figure 2, the dry buckle is replaced. The reactor 17, which is connected to the working device, has a processing electrode for supplying power to the tritium source supplier 17, and the connection electrode 21 is provided. "17 of the feeding electrode 16. The processed electrode 14 has an ion exchanger, and 1% is attached to its surface. The _γH horn 12b is attached to its surface. # 子 子 ^^ η ΊΚ 戍 The liquid 18 of the ultrapure water is self-flowing, and the early and early 19 are supplied to the electrodes. Then, make the worker's voice jealous'c 0, the voice of the workpiece 10. . Zhao 1 or Touch was attached to these electrodes 14 and 16 Κϋ 庑 L and then changed to 1 2β and 1 rib. The surface of the workpiece 10 is divided by the hair Li, the processing electrode 14 and the lightning feeder by the power supply Π. And feed one between 16. Then, move

According to this electrolytic processing method, water molecules in the liquid 18 are dissociated into the surface of the chloride oxygen ion J? 4 by the ionizer. As a result, the bifurcation of hydroxide ions in the vicinity of the workpiece increases. The hydroxide ions 22 will react with each other in the workpiece 10 to perform the removal of the workpiece. “A 11000 surface layer is removed. Therefore, the reaction product 26 that is 1 Dissolved in liquid 18 and removed from the workpiece 10 by the liquid 丨 8 flowing along the surface of the workpiece 10. 316929 7 200536643 For example, when the cations are ionized by copper electrolysis processing, Shi's father changed The state is used for capture. Therefore, the positive ion ^% 'copper will be consumed by the cation exchange group and the industrial product ^ group will be consumed by copper. If copper consumes this ^, the processed product will be deposited into the The electrolytic processing is continuously performed on the / electrode 14 between the workpiece 10 and the processing electrode 14. If there are two = therefore, it is impossible to connect "the ion used for copper electrolytic processing." . On the surface of the anion exchanger (anion exchanger), μ is in the _ daughter exchange particle. Therefore, it will cause processing: The fine particles of copper oxide may contaminate the next substrate to be processed = surface. Furthermore, the fine particles are crusted, and the number of workpieces processed by electrolytic processing using an ion exchanger is very small, making it Must = When the worker catches the son-in-law father in the ion-exchange cry, he will be arrested and replaced by Qiao Li as early as in the "ion exchanger" example, and in the case of the anion exchanger Was replaced with chlorine; the method for regenerating the iodine-in-child converter includes ion exchange in a liquid, or applying the opposite of electrolytic treatment:; =: learn the converter. Child / Earth voltage to ion cross Change the male and father to > The child is immersed in chemical liquid in order to use 2 rows. When the ion exchanger includes a cation exchanger, a wide range of chemical liquids are available. When the ion exchanger contains an anion-exchange cryo, age, sex chemical liquids are used. The ion exchange solution 髀 φ y,. L, again in this chemistry " > ° 'has been captured with a selectivity coefficient close to the hydrogen ion 316929 200536643 se 16〇1; 1 \ / 忖 乂 0〇6 {; In the example of a cation exchanger of ^ (: 16] 11 :) ions (such as sulfur ions), the ion exchanger can be regenerated in a short period of time by immersing the ion exchanger in an acidic liquid. When an ion exchanger that has captured ions with a large selectivity coefficient is regenerated by an acid or an alkali, the regeneration rate of the ion exchanger becomes small. Furthermore, the [chemical liquid system that is regenerated in the ion exchanger remains in the feedstock converter at a high concentration. Therefore, the ion exchanger should be cleaned. Furthermore, there is a need to treat chemical liquids for regeneration. In addition, since it is necessary to provide a separate regeneration storage tank for storing and regenerating the installation of the-^ processing device = to generate the ion exchanger, so the electrolysis will be reduced. The counter-ion parent converter comes to regenerate the ion-exchange cry to perform. After the p Μ of the plant is in accordance with the following steps ^ ^ 7 is reasonable, then a regenerative pole is inserted to face the voltage opposite to the processing pressure, and the electrical power of the electrical angle machining program is used to ... A substance trapped in an ion exchanger. In this method, the processing program must be interrupted to reduce the production of regenerated shellfish in the electrolytic processing apparatus. / U. [Summary of the Invention] In view of the above-mentioned disadvantages, the present invention is exhibited in the light of the eighth, Ming-purpose, '' '. Therefore, the purpose of the present invention is to provide an electrolytic processing device that continuously removes the plutonium trapped on a workpiece such as a workpiece, and can continuously perform an electrical angle f of one thousandth on the workpiece. Processing while preventing 316929 9 200536643 from accumulating or depositing in the electrode and the contact member. In: ΓΓ-appearance, the system provides-a kind of electrolytic processing equipment,-Zhuangcheng is an ancient conductive material to perform electrolytic processing. "Hai Di Jiao" /, The clothes set has a feeding electrode, which is configured to feed electricity. To :: or close to the workpiece; and processing: / = pole, which is configured to contact the material to perform electrolytic processing. Two corners: force can be operated :: the electric conductor source formed on the workpiece, which is composed to supply the electrolytic processing solution and the processing solution liquid; and the regenerating solution is transferred to the user, the user, and the processing electrode is immersed in Regenerating the regenerating, 雕 雕 — 奴 /, 源源, the system is configured to supply regenerating liquid to the processing C. The electrolytic processing device includes a regenerating electrode, the "electrode, the processing electrode and: i, f which can be operated into The feed processing device also includes rhenium. . \ Supply electricity between electrodes. The electrolysis and the electrode 丄 == are made to be controlled on the feeding electrode, have a potential higher than the processing electrode, and obtain the feeding electrode, and the processing electrode has a higher power than the regeneration electrode :. The polarity of the head η, therefore, Japan is making the ion exchanger contact or connect the workpiece. The electrolytic processing fluid _ ^^ electrode was used to supply f + 4 to the processing unit and the processing unit, and the processing electrode was supplied to the processing electrode at the same time by the processing electrode. The regeneration of the ion exchanger of the bud-Qianyan Θ ⑨ pole can be added between the feed electrode and the regenerative electrode, and the second voltage can be supplied to the processing electrode and the second electrode. -Electricity is supplied to the feed: between the electrodes. Or And supply the second voltage to the library. 1 ° between the electrode and the regenerative electrode. Kouhai electric processing equipment may include insulation between the member (ion exchanger) and the processing electrode: it is arranged in contact with the liquid permeability. With this configuration, the insulating member has an ion processing product in the sub-exchanger. The two are trapped in the ion / period during the period, and the impurities can be pulled i Φ, seven (eectrQphQresl s), and the insulating member The solar γ pole moves and dissolves in the regenerating liquid. The electric processing of impurities in the moon direction processing #resident 士 $ 丄 ° 玄 # sub-reaction product or ion ^ "is discharged by the flow of the regenerating liquid to the system ^ power supply and by electrophoresis It is directed toward the regeneration electrode 5 1. Therefore, even during processing = ㈣, and the deposited product will not reach the ion exchanger. Because J = raw: product ', there will not be a short circuit between the sink. … The guard electrode and the work piece, the 4 1 solution plus 1 liquid preferably contains pure water, ultrapure water, a liquid or electrolyte solution with a conductivity of 500 gs / cm or less. For example, ultra pure water has 0 · 1μδ / α ^ has less conductivity. In this example, the conductivity is expressed as a conversion value at 25 ° C, lamt. This is also applicable in the following examples. For example, pure water has 1 OpS / cin Or less. Therefore, cleanliness can be achieved by pure water, and preferably ultrapure water. Electrolytic reaction without impurities remaining on the surface of the workpiece. Therefore, cleaning of the surface of the workpiece and subsequent processing of waste liquid can be simplified. For example, 6 'additives such as surfactants can be added to Pure water or ultrapure water 'to adjust the conductivity to 5000 // S / Cm or less, and more preferably η 316929 200536643 is 50 # S / Cm or less, and more preferably ο. 1 // s / cm or less. Therefore, when an additive to prevent local concentration of ions is added, the local concentration of ions can be prevented. For example, the central electrolyte solution may include, for example, NaCl 2 Na 2 S 4 Alkaline salt solution, such as an acidic solution of HmSO4, or a secret solution such as ammonia.

Sex to use selectively. T The electrolytic processing device may further include a separator (dlaphr) which is placed between the contact member and the insulating member and is separated from the elbow by electrolyzing the liquid. The separator may include a three-dimensional ion exchange membrane. With this configuration, it is possible to use a liquid of [...] electrolytic processing liquid. Therefore, the liquid accumulated by the regeneration liquid f serves as a cation exchanger when the contact member contains anion. Zhe Xi Lao sister ^ Take a good package order 柘 44, when the cow contains an anion exchanger, should I

The plate is taken well and also contains anionic crossover. ^ ^ U m μ ^ rb, mouth mouth In the daylight guard, in the cation exchange crying contact member, the positive department through the panel of the n n regeneration. This material is expected to be "%" in the same way as in the contact member of the anion exchanger. The anion exchanger of the separator reaches the regenerated secondary liquid and is removed. The M negative ions can then operate the controller to control the potential of the regenerative electrode of the feeding electrode, or control the current of the second electrode and the regenerative electrode. The current flowing through the feed electrode:;, ::: The working electrode has a great influence on the physical ratio of the electrode, and the current flowing through the processing electrode ::: The current at the electrode at the processing place will easily cause the deposition of processing products or impurities. Or cumulative tendency. Therefore, by controlling the current flowing through the feed electrode and the current flowing through the processing electrode, it is possible to control the processing treatment rate or the tendency that reaction products or impurities are not easily deposited or accumulated. For example, a tendency that does not easily cause the deposition or accumulation of reaction products or impurities will be explained as follows. When copper is processed and the feed electrode is used as the anode and the processed electrode is used as the cathode, the deposits accumulate on the I processing electrode within a few minutes. Therefore, a short circuit occurs between the processing electrode and the feeding electrode. Therefore, the electrolytic reaction cannot be continued. However, when the processing electrode is used as an anode (which has the same polarity as the feeding electrode), the electrolytic reaction can continue for at least several hours without any short circuit between the processing electrode and the feeding electrode . The anode is defined as an electrode that causes a positive charge to flow to the electrolytic processing liquid. The cathode is defined as an electrode that causes a positive charge to flow out of the electrolytic processing liquid. Therefore, it is important that during the processing process, a current continuously flows in a fixed direction φ through the processing electrode. In detail, it is important to maintain the polarity of the processing electrode (so that it has the same polarity as the feeding electrode). Therefore, it is better to control the current or voltage to a fixed value to maintain the polarity of the processing electrode. In this example, it is preferable to control the current flowing through the processing electrode so that it is equal to 1 to 30% of the current flowing through the feeding electrode or the regeneration electrode. When a larger current flows through the processing electrode, the deposition of impurities can be prevented more efficiently. Generally, it is sufficient that the current flowing through the processing electrode is 1 to 30% of the current flowing through the feeding electrode or the regeneration electrode. When considering the consumed energy and processing cost, the current flowing through the processing electrode is more preferably 316929 200536643 flowing from the feeding electrode or regeneration electrode to 1% and preferably 1%. θ According to the present invention, during the electrolytic reaction, the processing reaction products 加工 and P can be removed from the contact members such as the ion parent converter. This can prevent the processing material from being lost— "," or $ "or"> "accumulated in the electrode and the contact member. The second or lesser is that the electrolytic reaction is interrupted to regenerate the contact structure: day. So, The efficiency of the electrolytic processing device can be improved. The above and other purposes, features, and advantages of Ge Ming will be 2 = explanation and cooperate with the attached drawings to obtain a deeper understanding. This is an exemplary illustration of this The preferred embodiment of the invention. [Bei Shi mode] According to the month, one of the present invention, you will bring to Figure 5C the following illustration. At the moment: the afternoon test device, the tea test Figure 3, is called rhyme And will not repeat the description. In the following description, # the substrate is used as the processing process by the electrolytic processing device, and the month can also be applied to any workpiece other than the substrate. Figure 3 is a vertical sectional view, Its display = electrolysis: industrial device 5. The electrolytic processing device two = flat direction; f part 52, mountain piece 54 attached to the arm part 52, and-罟 is a free standing substrate holding thousand 1 4 ; And sighed below the substrate holder 54%. The arm portion 52 can The substrate holder 54 is moved and moved in the vertical direction. The substrate holder 54 is used for holding and holding substrates such as: '爻. The substrate W faces (in a face-down manner). 5 makes the electrolytic processing device 50 also have a coupling Connected to the 5 guard shaft 62. The arm portion 52 is attached to: the upper end of the force center. Because of 316929 200536643 Therefore, when the swing motor 60 is driven, the arm portion 52 vibrates in the horizontal direction to surround the The swing shaft 62 is pivoted. The swing shaft M is connected to a ball screw 64 extending in the vertical direction. The ball screw M is connected to 66. Therefore, when the vertical movement is driven, the ㈣ shaft 62 It will be moved vertically with the arm part 52. = The anti-holding part is connected to the spin SI / rotary motor 68 installed on the arm part M as the first drive mechanism to the right; The holding substrate 54 held by the substrate W and the electrode platform 56 is rotated. Furthermore, the motor 68 swings the arm portion 52 by one rotation of the substrate, so the plate moves vertically and horizontally-moves in the vertical direction and Can be connected with the ⑽ electrode = force; TV: Including a hollow motor, the substrate Λ air motor 7G As the second driving mechanism, the “η, HAI electrode platform 56 moves the hollow motor 7 phase. When the substrate ... two, so 'when the roll drive movement or (SCroll _ ° thousand ° 56 will be full of the electrode ... include: = 2turns. On the processing electrode 72 and the feed two "< Beidian electrode 74 and surrounding the processing electrodes 72: seven edge body (not shown). For example, the processing electrode 72 and the feed may have a fan shape Shape. The zhanzhier electrode 74 may be alternately made to make the processing electrodes 72 and the feeding angle again on the hair pole platform 56: the electrode platform 56 is exposed. Such processing; 4 :: :( 上The top surface is covered with an ion exchanger 76 and 2 electrodes 74 in a positive makeup style. When the processing electric 316929 15 200536643 I :::, :: electrode 74 is arranged on the electrode plane along the circumferential direction γ of the electrode platform 56 pi, the ground :: With this force, processing can be performed. Fixed part of bay membrane. This includes the entire surface of the processed electrodes 7 2 π. In this embodiment, it is slightly larger than the base two buckets; the base plate W held by the amulet 54 is the ancient one t. The electrode platform 56 performs a thirsty roll motion, straight! . Due to • Electrolytic processing. / The front surface of the soil plate W is subject to the "ion's" ion exchange on the electrode platform 56 which has an anion exchange function. 76 may be composed of a non-woven fabric with an ion exchange function. , Sulfuric acid group) Or, ^ ^ acidic cation exchange group (for example, flying man ^ ㈢ 离子 离子 ion exchange cry 亦 IV + + ion exchange group (for example, carboxylic acid group). Better: · Weakly acidic cations Has a strong basic anion exchange _ ion exchanger most of the anion group (such as' tetraylamine group. Or, a low amine group), may have weakly anionic exchange group (triyl or less St ::, non-woven fabrics with strong anion exchange groups can be prepared by .. ^ / clothing. By radiation-induced graft polymerization (including eight-gamma pseudo-ray irradiation and graft polymerization), the graft Λ The porosity is negotiable polyfluorinated non-woven fabric. Then, the joining chain of ¥ is aminated to introduce the tetrakisamine group into the denier, = to form a non-woven fabric with a strong anion exchange function. The processing power (opacity) of the group is changed by the introduction The graft polymerization system can be set by using the value of the grafting chain, such as acrylic acid, styrene 3 6 316929 200536643, amino acetic acid ethyl acrylate, sodium sulfide styrene, or chloroamidine. It is carried out by styrene monomer. The amount of the graft chain can be controlled by adjusting the one-touch = ethyl acetate, the reaction temperature, and the reaction time. Therefore, connect ::, '―, 卩 non-woven fabrics are being grafted. The ratio of the weight after polymerization to the weight of the non-woven fabric before the graft polymerization can be increased up to 500%. Therefore, the processing capacity of the ion exchange group introduced by the graft polymerization can be protected up to 5 meq / g. $ For example, non-woven fabrics with strong acidic cation exchange function can be prepared by the following method. Graft polymerization treatment induced by Korean shot == stable irradiation and graft polymerization), graft bond Introduce polyolefin non-woven fabrics with fiber, 讧 20-50 microns, and porosity of 90%. If the introduced graft is linked, it will be treated with hot sulfuric acid to introduce sulfur wood into it. Strong acidic ionization Exchange work shovel 2: Γ can have a grafting rate of up to 5_. By: branch = huaqian led the exchange capacity of the ion exchange group can be increased up to 5ineci / g 0: subcross: device 76 can It is formed from polyhydrocarbons, such as polyethylene or polypropylene, butadiene, any other organic polymer. In addition, the ion-exchange 6 can be thin or polypropylene such as woven cloth, paper, porous materials, short fibers, and nets. In the case of dilute graft polymerization, the prophet can first radiate radiation (gamma rays or electron beams) on the material J to generate free radicals with this, so that the free radicals react with the monomers. In this example In the middle of the day, "there are fewer links in the chain. Alternatively, a single-may be implanted in the material, and then a radioactive ray (gamma pseudo-ray electron beam 316929 200536643, :) 'is simultaneously irradiated to perform radical polymerization. In this method, the dryness can be:-low ', but it can be applied to almost all; = the uniform mouth of this' when the ion exchanger 76 is formed by a non-woven fabric with ▲ planting and exchange function, then = Functions or functions such as pure water or ultra-pure water or electrolysis and production without any hindrance. Therefore, in the liquid :: = non-woven fabric shifter 76 _ 之 离 孑 ^ from, the shout and the ion exchange > should. Ion exchange can be easily carried out between them. If the ion exchanger 76 is provided by only the ion exchange function _ 所 _0 #, the material reading function or the male type will be limited. In addition, it is produced by the electrolytically processed materials. The cation exchangers capable of anion exchange with anion exchange function are arranged concentrically. Or the anion exchanger with ^ 1 son-to-parent work shift function and cation exchange :: = change can be stacked on top of each other. In addition, the anion-exchange catalysts can also be formed in a fan-shaped configuration. In addition, the ion exchange alternates in the direction of the two-circumferential direction = :: = :::: The ion exchanger may include an amphoteric ion-exchange group having the "appropriate-: Γ: Γ ion-exchange group" and the cation 12 has a layered The part of the _child exchange ion exchange group :::::::::: converter '' and the part containing the mosaic ion ion exchange group in the thickness direction are parallel-type material converters. Can be processed according to the material

JS 3] 6929 200536643 and selective use of the right and right, ^, ion exchange cry with deionization exchange function θ ion exchange cry with cation exchange function. The sons and daughters are of different ancestry or with drawings. 2 =, the electrolysis processing device shown in Fig. 3 is partially enlarged and viewed as follows: No: § The electrode platform 56 has a central portion defined in its center, and is used to supply electrolytic processing liquid such as # 刀 刀 为 超Pure water) to the through hole 56a electrolysis plus two :: water 'and preferably: force ;: the tube 78 extends through the "empty :: =; electrical points. The through hole 56a through the life extension jealousy ~ τ mouth p_H, the wide contact electric angle dry processing liquid supply pipe 78 is connected to the electrolytic processing liquid supply source 80. It is connected to the hole center and is supplied to the electrode. Flat = processing liquid passes through the ion-exchange characteristic of the water absorption characteristic. The surface of 76% of the surface is then passed on. The surface is supplied to the entire surface of the substrate W. For example, pure water has ... or pure water has 0.1 // S / Cm or less. ^ Rate, and has a conductivity of 50b s / cm or less. It is also possible to use liquid instead of pure water. The processing caused by the dissolution of the person or gas is not: will = have a high reproducibility The uniformity of processing. Ding Yi shows that Dakota has a conductivity of 5 ^ For example, add electrolyte to pure water or ultrapure water Obtain ^ 或 pure water or ultrapure water. Use this electrolysis " ㈣ = solution) to get power consumption. The electrolyte solution can include social resistance and salt-reduced alkaline lake or coffee neutral alkaline solution. These solutions You can also selectively use 316929 19 200536643 according to the characteristics of… such as lice and water. When using an electrolyte solution, it is best to set a slightly smaller distance between the substrate w and the ion exchanger so that The substrate ⑻ will not be in contact with the ion exchanger π. In addition, a liquid obtained by adding a surfactant to pure water or ultrapure water may be used instead of the pure water or ultrapure water. The electrical conductivity is 500 / zS / Cm or less, and more preferably 50 // s / cm or more, and more preferably 0.1 / zs / cni or less (10MΩ.㈣ or less resistivity ). By adding a surfactant to pure water or ultrapure water, a homogeneous layer will be formed at the interface between the substrate w and the ion exchanger 76 to prevent i from w moderately. Ion exchange (metal dissociation) to increase the flatness of the surface of t. The surfactant concentration is preferably over 100 ppm. When the liquid has an excessively high conductivity, the current efficiency treatment rate will decrease. Use 5 s / cm or less, and more than G.Wcm or less, and more preferably G.1 / Zs / em $ Provides the required processing rate. The heart can be used to extract the square θ In the known example, 'the plurality of fan-shaped electrodes 72 and 74 are buried on the upper surface of the electrode platform 56 along the direction of the circular steam. For example: The equal electrodes 72 and 74 are respectively connected to the power source i, the cathode of the anode and the cathode of the anode through the control box θ Jinbu 'to the Lei Tiao Temple. 82. These electrodes are used as Processing electrode = The electrode of the anode of E-supply 58 is used as the feeding electrode. In the case of copper, the electrolytic reaction is based on the cathode. It depends on the material being processed, and is connected to the cathode ::. Depending on the electrode to be processed, the electrodes connected to the anode can be used as the feeding power as the processing electrode. Gas 316929 20 200536643 II: The processing material is "w II: to be carried out. Therefore, connected to the power source: II: electrolytic reaction" Temple electrode system is used to process Emperor 4 ..., 5δ cathode system It is used as the feeding electrode. When the electrodes connected to the anode are tested, the electrolytic reaction is in the anode? The materials of the mouth geography are knots or Shi Xi and other electrode systems are used for ΪΓΓΙ rows. Therefore, it is connected to the anode. It should be used as a feeding electrode. The electrodes that are connected to the cathode are generally, the processing electrodes are less active, and the metal is carbon. Materials instead of :: guang ::: electric ceramic materials or metal compounds. For example, you can sinter a plated metal clock or object at high temperature with titanium metal or silver, and so on You can get stable and reinforced materials to make ceramics. 1: It has products that can be made from ceramic oxides with a variety of different raw material characteristics, including metal and non-metallic quilts and Nitrides. Some ceramic materials are conductive. Electricity: The resistance value of the electrode usually increases, which results in supply. However, the surface of the electrode can be avoided by using a non-oxidizing material such as ㈣ such as oxygen == oxide to avoid the electrode, the electrode's Oxidation results in an increase in resistance. ^ The ion exchanger 76 has a cation exchange group to perform copper electrolysis. After the electrolytic reaction, copper will occupy most of the ion exchange group in the ion exchanger (positive ion converter) 76. . Therefore, when processing the next M 6929 2] 200536643 substrates, the processing efficiency of the processing electrode will be reduced. Or, the processing product will be short-circuited. Because of: two difficulties / the ion exchange Γ76Λ The electrolytic reaction was continuously performed. Furthermore, at that time, the fine particles of copper oxide were combined with the surface of the copper electrolysis reaction (anion exchanger) 76. The generation and attachment to the ion exchanger may contaminate the next piece. Α: Λ This 'copper oxide' fine particle exchanger is used as an ion exchanger 76. In this example, y is used to separate the anode from the substrate; WV is between the processing electrode γ 2 and the substrate W. The position is to regenerate the ion exchanger 76 in the manner of ^ U-as described in Section 4B. ^^ The guide pen 72 is a recess 5 in the electrode platform 56 which is produced by a famous newspaper. In Xuan Fengxuan: Department y * # A, the mother-feeding electrode 74 :: placed in the notch 56b of the concave electrode 72 formed on the electrode platform 56 ', Cai Ling # 丄 谷Depth of 56c. The regeneration electrode 8 4 I 6 used to regenerate the concave M < Bad Fighter, σσ 'b is placed at the bottom of the notch 56 b. The notch 56 b has a cover 86 Is the insulating member 88 provided on the processing electrode? 2 Furthermore, the edge member 88 and the guard electrode 72 are liquid-permeable. In this case, the processing electrode 72 is made of 4 :: with a large number of meshes, and the meshes are used as perforations. As shown in Fig. 4, the: ㈣ insulating member 88 is separated to form a regeneration liquid chamber 90a during the processing + h 7 ^ 仏 and the 隹 忑 processing electrode 72 and the separator. The regenerative electrode 84 is spaced from the process' to the liquid chamber 90b between the process electrode 72 and the regenerative electrode 84. The regeneration regeneration 316929 22 200536643 The regeneration liquid chambers 90a and 90b are connected to the regeneration liquid supply 56d and extend through the electrode platform 56. The regeneration liquid supply 56d is connected to the regeneration liquid supply 94 via a regeneration liquid supply pipe ⑽, wherein the regeneration liquid supply pipe system extends through the hollow w. : Hollow part. The peripheral parts of these regeneration liquid chambers are also connected to the regeneration liquid discharge port $ 56e. The regeneration liquid discharge channel extends in the j-plane direction and is opened at the periphery of the electrode platform 56. -The regeneration liquid system configured by the dagger is supplied to the regeneration liquid chambers 90a and g0b of Yan Xuan and the like through the regeneration liquid supply channel =. Therefore, Ϊ, etc. == the body cavity Ϊ 9GaA _ will be filled with the regeneration fluid = to immerse the heart electrode 72 and the insulating member 88 in the regeneration fluid. The regeneration fluid is in the regeneration fluid chambers 90a & 9Gb. Flow in one direction. Iron% #, nn, ..., ^ regeneration liquid moon beans are discharged to the outside of the electrode platform 56 via the regeneration liquid discharge passage 56e. The mesh &# 1 4 加工 私 # 72 is composed of a pole having an amount of A for perforation. So from that ionizer? The processed product of the ion type (material impurity) generated in 6 will enter the regeneration liquid chamber 9Qb through the mesh (perforation) in the processing electrode 72. Good, to be supplied to these regenerating liquid chambers 9 = the system contains a highly conductive (for example, X-reverse "a liquid-generating system that produces an insoluble compound is used to dissolve the self-removing. Flat ... to facilitate the process ^ 72 ^ and the male child passing through the partition 72 is discharged to the 316929 2 by liquid flow. 〇536643 Outside the platform 56. Therefore, when the regenerating liquid contains a liquid having a high conductivity (dielectric hanging number) and less likely to generate insoluble compounds due to reaction with the ion x that has been removed from the ion exchanger 76 The resistance can be reduced, so that the power of the Guru version in these 0: 90b is reduced to yua and 7β. Furthermore, it can be avoided due to the The ionic phase reacts to produce difficult-to-remove or insoluble compounds: byproducts (by-products) and can be avoided from being attached to the separator. C is used selectively. For example, I have been used in copper electrolysis and Mi Xilian.隹 When the regenerator is regenerating, it can be rough Sulfuric acid with a concentration of at least 1% by weight. Configured in the ion exchange crying 7 β Xia ancient + ^ ^ to want to be white ^ ^ ° The partition 86 is best not to hinder / remove the ionic impurities The partition 86 is preferably able to prevent the flow of the 90a; ^, the regeneration liquid (including the M therein), and the partition 86 to enter into the miscellaneous j 丄 μ σ., Dental material m The transformer 76 ° meets these conditions. Including ion-exchangers, such as production. This type of ion-exchanger is allowed to be separated by the ionizer. Furthermore, because of the ion exchanger Ground penetration 76. Regeneration liquid chamber_flowed into the ion exchanger from the Haihai In this embodiment, the partition 86 contains an ion exchange having the same as the = :: cation exchanger) ::: plate (料The parent converter) S6 only allows the ions that are considered as (% ion exchange *) to pass through the separator δ6. The regeneration liquid flowing through the regeneration liquid chamber 316929 24 200536643 90a In the middle of the eighth ion breakage to prevent entering the ion cross, anion cross through the separator (ion exchange state) 86 Change group ^ ion 176. ^ Son father ㈣ 76 contains cries as the parent converter, it is best to use an anion exchange port as a partition (ion exchanger) 86. 纟 g 纟 矣 4 with liquid permeability Prostitute ^. ,,,,,, and 彖 members 88 should be insoluble in regenerating liquid moon beans. In this embodiment, p 丁 土 / 1 meaning that its thickness is large and tender, and the processed product will be deposited in the processing :::;, ', Is the opening of 2_, in the device 76. On the driver, the ,,,,,, and> are accumulated in the ion exchange to the substrate w'; in: the diplex product will pass through the ion exchanger 1 and reach The plate W has a liquid circuit on the processing electrode 72 and the substrate on the insulating member 88. A sinking occurs between the two and the ion exchanger 76 on the processing electrode 72. In a, the processing electrode 72 is on the processing electrode 72 ... to the handle parent converter 76. Therefore, a short circuit does not occur between the driver & board W. In the known example, the anode of the feed electrode 58 and the processing electrode 72 are connected to the power supply. Dangerous 2 ^ Connected to the power supply shore. The power supply 58 is used for the processing of machining + endurance 58 and the processing electrode 72 n. " Connected to the feeding electrode 74 box (not shown) separately, and the second and regenerative electrode 84 are connected to the ", anode and cathode of the supplier 96 through the control electrode factory ...", Ying 96 The regenerative voltage is supplied between the regenerative electrode 84. 〆Processing electrode 72 and connected to the power supply 5 8 to the electric retroactive supply 庥 wee or 々phase 4 (Cang Kaodi 3 pictures) and connection

The control box (not shown) of "6" is to adjust the processing L to regenerate the electric dust, so that the feeding electrode 74 ^ is processed-and the foot is located at the potential of the processing electrode 72 316929 200536643, and the processing electrode 72 The potential is higher than the potential of the regeneration electrode 84. The control boxes also adjust the processing voltage and regeneration voltage so that the feed electrode 74 has the same polarity as the processing electrode 72. In this embodiment, the polarity of the feeding electrode 74 and the processing electrode 72 is an anode. Specifically, a positive charge flows out from the feed electrode 74 and the processing electrode 72, and flows into the electrolytic processing liquid. Therefore, the processed products (ions) accumulated on the ion exchanger 76 are continuously discharged. In this way, the electrolytic reaction can be continuously performed for a long time. In this embodiment, the feeding electrode 74, the processing electrode 72, and the regeneration electrode 84 are electrically connected in series. The control boxes independently control the current flowing through the feeding electrode 74, the current flowing through the processing electrode 72, the current flowing through the regeneration electrode 84, the potential of the feeding electrode 74, and the potential of the processing electrode 72. And the potential of the regeneration electrode 84. Therefore, ionic impurities can be discharged from the ion exchanger 76 during the electrolytic reaction. In this way, the electrolytic reaction can be performed continuously. In detail, it is preferable to control the current flowing through the processing electrode 72 so that it is 1% to 30% of the current flowing through the feed electrode 74 or the regeneration electrode 84. In this embodiment, as shown in FIG. 5A, the feeding electrode 74, the processing electrode 72, and the regeneration electrode 96 are electrically connected in series to the power supply 58 and the power supply 96. However, the connection of these electrodes and power supply is not limited to the illustrated examples. For example, as shown in FIG. 5B, the feeding electrode 74 may be connected to the anode of the first power supply 97a, and the regeneration electrode 84 may be connected to the cathode of the first power supply 97a. The processing electrode / 2 can be connected to the anode 5 of the second power supply 9 7 b and the regeneration electrode 8 4 26 316929 200536643 can be connected to the second power supply 97b

As shown in the figure, the feeding electrode 74 can be connected to the 5th pole of the second electric pole, and the μA regenerative rabbit / original supply state 98a of the positive μ regeneration pole 84 can be connected to the first band pole. The feed-in k-throw source is supplied to 98a of the female shell pole 74, which can be connected to the second power source # 藤 σσ, and the processing pillow. The anode of the supply state 98b for children, children. 72 can be connected to this second power supply for the cathode of μ98b according to Fig. 5B and the present invention. Kesa is like the connection shown in the figure. The potential of the processing electrode 72 is controlled by the exact power supply of the second power source, and 9 is accurately set and controlled. 1 _ 之 -Dianbao and was…: Erdang The force: When the working electrode 72 is arranged close to the ion exchanger, Si:: 2 has a negative potential of the same as that of the ion exchanger. It is used to reduce the number of w from the sediment or bubbles. The electrolytic reaction and regeneration reaction are performed. The substrate human electrode 72 and the Lu Hai regeneration electrode 84 are preferably arranged in a & + > configuration. The thickness of the substrate will be described below using the electrolytic processing (electrolytic processing and recycling processing) device / 50 substrate processing processing holder 54 which holds and holds the substrate of the electrolytic processing device 50. This arm w #holds the substrate W. The arm portion 52 swings to perform electrolytic processing on the substrate holder 5 holding the substrate W at a position of 5 squares. The above 6 f is owed and: ,,,,, and then drives the vertical movement motor door 拄 and lowers the substrate holder 54 Therefore, the substrate W held by the substrate holding member 54 is The contactor soil θ contacts or faces the surface of the ion exchanger 76 attached to the electrode platform. D. μ is shown in the following table: When the rotary motor 6S is driven to drive the hollow motor 70 to ground, \ 仔. The helium pole platform 5 6 performs scroll movement. 316929 27 200536643 will be electrolyzed liquid such as pure water or ultrapure water. The through hole 56a of the plate is widely used from the electrode 72 and feed electrode 4 of the slave electrode platform 56. ：: = The upper surface of the electrode platform 56. Therefore, the space between the processing of ultrapure water and plate? Will be filled with pure water, and the capacity will be liquid or electrolyte at a rate of 吣 / ㈣ or less. The Pa source supplier 58 supplies the processing voltage to the 1L of the feed electrode 74, the μ processing electrode 72, or the gas ion: "produced by the ion exchanger 1: A θ conductive thin film is formed on the surface of the substrate W on a copper electrode 6) that is processed at the electrode (cathode). "Device 50 NM Shidu Youyi can electrolyze 电解 ion Λ pure water or ultra-pure water, the electrolytic processing liquid can be 76 ', so an effective electrolytic reaction can be achieved. On this day τ' will be used for ion exchange crying. 56 Ψ ^ M d ^ jm. The regeneration / night body passes through the regeneration liquid supply channel in the electrode flat μ and the chambers 90a and 90b. Therefore, the regenerative liquid cavity of the five bucket heart 5 xuanxing is full of regeneration liquid, and the material / Chambers 903 and 9 are then filled with the regeneration liquid, "Hai Zai Γ, = electrode 72 and insulating member 88 are immersed in the liquid flowing radially outward through the regeneration liquid chambers 90a and 90b, and Eight, two "Hai Temple regenerated and placed on the electrode flat surface noodles _ discharge the material core quilt: Erzuo by the use of the ion exchanger 76 as a solid electrolyte ion 72 ion of the ion exchanger 76 Move toward the processing electrode 72 ". The ions in the ion exchanger 1 pass through the partition into the regenerating liquid chamber 90a. The ions in the moved 9Oa are moved by, hu τ < Xi $, Wang From t month to month, it is discharged to the electrical connection r :::: regeneration fluid of the body cavity coffee and ten. Outside. In this way, regenerate the ion exchanger 3J6929 200536643 Γί: Γ When using a cation exchanger as the ion exchange "6 22 The cations in the ion exchanger 76 will pass through the partition as # ± 赖 腔 室 9Qa 中 ° # When an anion exchange cryopreservator is used as the ion parent converter 76, the external exchange port M ^ is locked, and the anion in the phosphorus exchanger 76 is captured and passes through the partition plate 86.叩 is privately entered into the regenerating liquid chamber 90a. In addition, during the processing process, A is supplied by the Emperor. The next day, the power supply 96 applies the regeneration voltage L to the processing electrode 72 and the regeneration electrode. π $ 'in order to force the electric current to flow between the private electrode 72 and the regenerative electrode 84 and the ion exchanger 76 in the morning. Therefore, the accumulated work products (ionic impurities) at m σ can be moved and charged ... into the regeneration liquid chamber_. The ions of the moved “regenerating liquid plutonium chamber 90b are combined to obtain QOh, a ^^,” which is discharged from the raw liquid supplied to the regenerating liquid chamber to the electrode a on the regenerating electrode 84. Therefore, α 56 ’s The outside may be regenerated by deposition. The ion exchanger 76 may be further provided. The W plate 86 includes an ion exchanger having an exchange group with the ion exchanger 76, so that the partition (ion exchange = 61 is prevented) Ion exchangers " ion impurities move through the partition t :: parent converter) 86. Therefore, power consumption can be reduced. Furthermore, the regeneration liquid (including one of them) via the processing electrode 72 Ions) enter the ion exchanger M through the separator 86. This prevents the ion exchanger 76 from being contaminated again during regeneration. Furthermore, the regeneration liquid between the -mu plate 86 and the force π 'electrode 72 has South conductivity, and less likely to cause insoluble power consumption due to the reaction with the ion 316929 29 200536643 removed from the ion exchanger 76 because the regeneration ρ σ ′ is therefore outside the regeneration part, Reduced electrical impedance The insoluble, insoluble compounds (by-products) produced by the reaction of the two cores with ionic impurities are attached to the electrode 7? Plate 86, which is at about 54 〇ρ ^ 玍. Therefore, it can be avoided in the processing 42 and 6 Mysterious feed thunder—the change in resistance between φ ^,. This can confirm the control difficulty. M ″ After the completion of the electrolytic reaction, between the middle electrode π and the feed electrode 74: The shoulder holder 54 should move between '58, processing 79 ', and between the power supply 96, the processing electrode 72, and the regeneration electrode 84 to stop the substrate holder 54'. Then, it is expected that the substrate 4 and the electrode platform 56 will be transferred to the subsequent processing process after the substrate W that has been electrolytically processed and the arm M is moved.

Water, for example, water supply, and is preferably ultra-pure i, C side; β-electrode platform 56 and some trick w A water (which does not contain electrolyte) to perform electricity, working hours S, two ：: =: = Attention or Remaining in the Silk ^ Table Iα The dissociated Nazi can cry by the ion exchange "% ^ ☆ η # λ is also used for the capture of Han 4-way m I / Ρ. Therefore Can prevent the dissociated copper ions from accumulating on other parts of the substrate w, and become contaminated, and its cylinder W will be oxidized and turned into fine particles on the surface of the substrate 5 Ultra-pure water has a larger specific fEa (speelf heart current does not easily pass through ultra-pure water. And the workpiece ~ αΑ Λ ~ low pen resistance, the electrode and the workpiece, and in a close position, or will leave The electrode fisherman # 夕 斗 f ”is also provided by the pedigree 5 and placed between the eHAI 〃 # 1. The above electrolyte solution can be used to further reduce the resistance of 316929 30 200536643, and therefore reduce the power consumption. In the use of the electrolyte solution In processing, the workpiece is processed with an area slightly larger than the processing electrode. However, the ultra-pure water and ion exchanger Because the current is difficult to pass through the ultrapure water, the workpiece will be processed only in the area facing the processing electrode and the ion exchanger. If the processing voltage and current density are increased to increase the processing rate, the electrode will be processed at the electrode. In the case of a large resistance between the substrate and the workpiece, electric charges may be generated. These charges will cause variations in the surface of the workpiece (P i tch i ng), making it difficult to maintain the surface of the workpiece Uniformity or flatness. However, when the ion exchanger 76 is brought into contact with the substrate W, the resistance is small enough to prevent the generation of the charge. In this embodiment, the feeding electrodes are used Copper is processed as an anode. However, when the feed electrodes are configured as a cathode, aluminum or silicon removal processing can be performed. In this example, the feed electrodes and processed electrode groups are processed. The structure has the same polarity. In detail, when the processing electrode group is constituted as a cathode, and the positive charge flowing from the electrolytic processing liquid flows to the cathode, it accumulates in the ion exchange The ion-processed products on 76 can be continuously discharged. Therefore, the electrolytic reaction can be continuously performed for a long time. Furthermore, in the above embodiment, the electrode platform 56 is scrolled while the substrate W is rotated. The electrode platform 56 and the substrate W can also form any movement as long as they move relative to each other. For example, one of the electrode platform 56 and the substrate W can be rotated, or both. In the above embodiment, the substrate holding member 54 sucks and holds 316929 200536643. The substrate w makes the surface of the substrate w report ^ ^ to the 4th eve of the next day (in a face type) .;, ',' Alternatively, 基板% JM of the substrate w W may be treated so that the substrate and the support face upward (in a manner of face-up). Although the present invention is particularly light, the lack of 疋 疋 1 乂 仏 yoke example has been illustrated and explained in detail, but it should be understood that, without violating the application, π material L, +, τ The situation in the mouth of Limaowei is constantly changed and modified. AAXiLSJl… t: =: applied to an electrolytic processing device, which is used to: > form a conductive material on the surface of a substrate (such as a semiconductor wafer), or remove impurities attached to the surface of the substrate . Raw materials [Schematic description] 〇Figure 1A to 苐 lc are diagrams showing an example of a process for forming a copper interconnect in a substrate; FIG. 2 is a schematic view showing an electrolytic process using an ion exchanger 〇Principle FIG. 3 is a vertical cross-sectional view showing electrolytic addition according to the embodiment of the present invention; ^ FIG. 4 is a partially enlarged view of the electrolytic processing device shown in FIG. 3; FIG. 5A is shown in FIG. Circuit diagrams of the electrical connections of the electrolytic processing apparatus shown in Figs. 3 and 4; and ^ Figs. 5B and 5C are circuit diagrams showing variations of the types of electrical connections shown in Fig. 5A. [Symbol description of main components] Conductive layer] Semiconductor substrate] a Conductive layer 316929 32 200536643 2 4 6 Insulating film interconnect channel copper film 10 12a 14 17 20 24 52 «56 56b 56d 58 62 φ 66 72 Workpiece ion exchanger Processing electrode power supply Water molecule hydrogen ion arm electrode platform 1 〇a 12b 16 18 22 50 54 56a Regenerative liquid supply channel 56 76 80 82 86 90a 92 Power supply 6 () Swing shaft 64 Vertical movement motor 70 Electrode 74 Ion exchanger Electrolyte processing liquid supply controller 84 Separator

Regenerative liquid chamber 90b Regenerative liquid supply tube 94 Power supply 97a Contact hole barrier layer seed layer atomic ion exchanger Feeder electrode Liquid hydroxide ion electrolytic processing device Substrate holder Through hole notch Regenerative liquid discharge channel Swing motor ball Screw hollow motor feed electrode electrolytic processing liquid supply tube regeneration electrode insulation member regeneration liquid chamber regeneration liquid supply source first power supply λ 1 ^ 090 33 96 200536643 97b second power supply 98b second power supply

98a W First Power Supply Board

34 316929

Claims (1)

200536643 200536643 Patent scope: A type of electrolytic processing device, which includes: 雀, Belleville electrodes, the group constitutes a conductive material that can feed # ,, six >; and, electric claws to contact members formed on the workpiece The system knows that Ύ + s is in contact with or close to the worker I ·… in a way that can be used to form an electrolytic reaction on / on the workpiece; the conductive material of the conductive material on the cow's electrolytic processing liquid source can be + And the contact member; a processing liquid is in the regenerating liquid chamber, and the system constitutes the raw liquid; όα 电极 工 电极 子 is immersed in the regenerating liquid supply source, and operates in a liquid chamber manner ; / Heart 4 regenerates the liquid to the regeneration: the electrode is separated from the processing electrode; the power supply is to be supplied, and between the regeneration electrode:; type :: electric electrode, the electrode, the controller To control the power supplied to the feed. And the electric electrode has a higher operation than the adding method, so that the potential of the feed knife and the electrode: the same polarity ’and the processing electrode has a higher value than the regeneration? Electrode position. χ Dansheng Electrode 2 :: Electrolytic Machining of the Patent Application No. 丨, "Ba margin member", which is installed in the step, and the insulating member is ΐ! The contact member and the processing electrode bear偁 忏 is liquid permeable. • If the patent application scope item 2 of the electric meridian processing device, further includes 3] 6929 200536643 separator 'It is set between the connection between the electrolytic processing liquid and the pieces and the insulating member, with 4 · 如Patent application No. 3 / raw liquid separation. The plate contains an ion exchange membrane. 1. One set of electrolytic processing, wherein the partition 5. The electrolytic processing device of any one of the contact members as described in the scope of application for patent application No. 丨 to 6 '. The scope of application for patent includes the ion exchanger. Among them, the processing equipment is any one of the 4 items of electrolytic processing equipment. To two have liquid permeability. The controller is controlled by a controllable item ζ; ^ Xiang Qian's electrolytic processing of Pei Ji and the regenerative electrode of φ, 贝, the electrode, the processing moxibustion, the processing electrode, and the: electrode or :: system Flow through the power feed ^ 8. Operate in the manner of electricity / claws in the scope of patent application D. The controller is a controllable electrolytic processing device, wherein it is equal to flowing through the feeding electrode; 30%. 4 the current of the regeneration electrode,