TW200615713A - Container capable of preventing the crystallization of photomasks - Google Patents

Container capable of preventing the crystallization of photomasks

Info

Publication number
TW200615713A
TW200615713A TW093134016A TW93134016A TW200615713A TW 200615713 A TW200615713 A TW 200615713A TW 093134016 A TW093134016 A TW 093134016A TW 93134016 A TW93134016 A TW 93134016A TW 200615713 A TW200615713 A TW 200615713A
Authority
TW
Taiwan
Prior art keywords
photomasks
crystallization
preventing
container capable
containing space
Prior art date
Application number
TW093134016A
Other languages
Chinese (zh)
Inventor
Ming-Chien Chiu
Original Assignee
Gudeng Prec Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gudeng Prec Ind Co Ltd filed Critical Gudeng Prec Ind Co Ltd
Priority to TW093134016A priority Critical patent/TW200615713A/en
Priority to US10/905,089 priority patent/US20060120840A1/en
Publication of TW200615713A publication Critical patent/TW200615713A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1902—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers specially adapted for a single substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1911—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by materials, roughness, coatings or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Packages (AREA)

Abstract

The present invention relates to a container capable of preventing the crystallization of photomasks. The container comprises a base and a cover enclosed with the base to form a sealed containing space. A plastic material containing silver that can absorb and eliminate sulfide from the plastic material. Alternatively, silver can be disposed in the containing space to absorb the sulfide in the containing space. Thus, the photomasks and the wafers can be conserved in a harmless environment to prevent any possible substances crystallized on the photomasks and to enhance the yield in the manufacturing process.
TW093134016A 2004-11-08 2004-11-08 Container capable of preventing the crystallization of photomasks TW200615713A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW093134016A TW200615713A (en) 2004-11-08 2004-11-08 Container capable of preventing the crystallization of photomasks
US10/905,089 US20060120840A1 (en) 2004-11-08 2004-12-15 [semiconductor container that prevents crystalization on storage wafers/masks]

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW093134016A TW200615713A (en) 2004-11-08 2004-11-08 Container capable of preventing the crystallization of photomasks

Publications (1)

Publication Number Publication Date
TW200615713A true TW200615713A (en) 2006-05-16

Family

ID=36574402

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093134016A TW200615713A (en) 2004-11-08 2004-11-08 Container capable of preventing the crystallization of photomasks

Country Status (2)

Country Link
US (1) US20060120840A1 (en)
TW (1) TW200615713A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11029595B2 (en) 2015-02-03 2021-06-08 Asml Netherlands B.V. Mask assembly and associated methods

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108107672B (en) * 2016-11-25 2021-03-02 上海微电子装备（集团）股份有限公司 A reticle box
US12578636B2 (en) 2019-12-31 2026-03-17 Entegris, Inc. Reticle pod having retention through reticle compartment wall
US12087605B2 (en) * 2020-09-30 2024-09-10 Gudeng Precision Industrial Co., Ltd. Reticle pod with antistatic capability

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4154344A (en) * 1976-11-09 1979-05-15 Minnesota Mining And Manufacturing Company Material for forming envelopes used to protect electronic components
US5651171A (en) * 1995-02-22 1997-07-29 Carbon & Polymer Research, Inc. Method of making a shielded magnetic storage system
TWI262164B (en) * 2004-12-15 2006-09-21 Gudeng Prec Ind Co Ltd Airtight semiconductor transferring container
US20080060974A1 (en) * 2006-02-21 2008-03-13 Taiwan Semiconductor Manufacturing Company, Ltd. Mask carrier treatment to prevent haze and ESD damage

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11029595B2 (en) 2015-02-03 2021-06-08 Asml Netherlands B.V. Mask assembly and associated methods
US11086213B2 (en) 2015-02-03 2021-08-10 Asml Netherlands B.V. Mask assembly and associated methods
TWI741498B (en) * 2015-02-03 2021-10-01 荷蘭商Ａｓｍｌ荷蘭公司 Mask assembly container, pellicle assembly container, pellicle assembly, and method for making said pellicle assembly
TWI793736B (en) * 2015-02-03 2023-02-21 荷蘭商Ａｓｍｌ荷蘭公司 Pellicle inspection tool for an euv transparent pellicle, lithographic apparatus, and method for monitoring a pellicle of a mask assembly
US11635681B2 (en) 2015-02-03 2023-04-25 Asml Netherlands B.V. Mask assembly and associated methods
TWI842365B (en) * 2015-02-03 2024-05-11 荷蘭商Ａｓｍｌ荷蘭公司 Pellicle inspection tool for an euv transparent pellicle and mask assembly

Also Published As

Publication number Publication date
US20060120840A1 (en) 2006-06-08

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