TW200701830A - Method of producing a display device - Google Patents

Method of producing a display device

Info

Publication number
TW200701830A
TW200701830A TW095114121A TW95114121A TW200701830A TW 200701830 A TW200701830 A TW 200701830A TW 095114121 A TW095114121 A TW 095114121A TW 95114121 A TW95114121 A TW 95114121A TW 200701830 A TW200701830 A TW 200701830A
Authority
TW
Taiwan
Prior art keywords
electrodes
organic electroluminescent
producing
substrate
applying
Prior art date
Application number
TW095114121A
Other languages
Chinese (zh)
Other versions
TWI391024B (en
Inventor
Tamami Koyama
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Publication of TW200701830A publication Critical patent/TW200701830A/en
Application granted granted Critical
Publication of TWI391024B publication Critical patent/TWI391024B/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/26—Dry etching; Plasma etching; Reactive-ion etching of conductive or resistive materials
    • H10P50/264—Dry etching; Plasma etching; Reactive-ion etching of conductive or resistive materials by chemical means
    • H10P50/266—Dry etching; Plasma etching; Reactive-ion etching of conductive or resistive materials by chemical means by vapour etching only
    • H10P50/267—Dry etching; Plasma etching; Reactive-ion etching of conductive or resistive materials by chemical means by vapour etching only using plasmas
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/236—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers using printing techniques, e.g. applying the etch liquid using an ink jet printer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6329—Deposition from the gas or vapour phase using physical ablation of a target, e.g. physical vapour deposition or pulsed laser deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/69215—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material being a silicon oxide, e.g. SiO2
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0441—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2101/00—Properties of the organic materials covered by group H10K85/00
    • H10K2101/27—Combination of fluorescent and phosphorescent emission

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The invention provides a method of producing an organic electroluminescent device comprising applying a composition containing an organic electroluminescent compound onto multiple electrodes to form an organic electroluminescent layer on each of the electrodes, wherein the substrate on which the composition is applied is a substrate with the portions between electrodes and/or the surface of the electrodes having been subjected to water-repellent treatment. By using this method, deterioration of a device and reduction in performance due to existence of an insulating layer which is indispensable for segregation of each polymer light-emitting compound in conventional process of applying polymer light-emitting compounds can be avoided.
TW095114121A 2005-04-25 2006-04-20 Display method of display device TWI391024B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005126883 2005-04-25

Publications (2)

Publication Number Publication Date
TW200701830A true TW200701830A (en) 2007-01-01
TWI391024B TWI391024B (en) 2013-03-21

Family

ID=39138925

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095114121A TWI391024B (en) 2005-04-25 2006-04-20 Display method of display device

Country Status (3)

Country Link
KR (1) KR20070121829A (en)
CN (1) CN101164178B (en)
TW (1) TWI391024B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI607481B (en) * 2015-09-10 2017-12-01 雙葉電子工業股份有限公司 Producing method of fluorescent display tube and fluorescent display tube

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10381425B2 (en) * 2016-12-08 2019-08-13 Lg Display Co., Ltd. Organic light emitting display device
KR102944824B1 (en) 2020-10-22 2026-03-27 삼성디스플레이 주식회사 Display device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3698138B2 (en) * 2001-12-26 2005-09-21 セイコーエプソン株式会社 Water repellent treatment method, thin film forming method, organic EL device manufacturing method using the method, organic EL device, and electronic apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI607481B (en) * 2015-09-10 2017-12-01 雙葉電子工業股份有限公司 Producing method of fluorescent display tube and fluorescent display tube

Also Published As

Publication number Publication date
CN101164178B (en) 2012-01-11
TWI391024B (en) 2013-03-21
KR20070121829A (en) 2007-12-27
CN101164178A (en) 2008-04-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees