TW200715445A - Substrate processing apparatus - Google Patents

Substrate processing apparatus

Info

Publication number
TW200715445A
TW200715445A TW095123001A TW95123001A TW200715445A TW 200715445 A TW200715445 A TW 200715445A TW 095123001 A TW095123001 A TW 095123001A TW 95123001 A TW95123001 A TW 95123001A TW 200715445 A TW200715445 A TW 200715445A
Authority
TW
Taiwan
Prior art keywords
substrate
liquid
developer
rinse
state
Prior art date
Application number
TW095123001A
Other languages
Chinese (zh)
Other versions
TWI307932B (en
Inventor
Hiroshi Komiya
Norihiko Nishimura
Shunichi Yahiro
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200715445A publication Critical patent/TW200715445A/en
Application granted granted Critical
Publication of TWI307932B publication Critical patent/TWI307932B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The liquid layer of the developer R on the substrate G rises and flows to the substrate G rear due to gravity in the ramp M2. The liquid layer of the developer R at the speed which almost is equal to conveying speed from the front end of the substrate G facing toward the rear end from state of liquid quantity changes in state of the thin liquid layer R'. The substrate G, when it moves to the declivity road M3, the rinse liquid S of the belt shape is supplied to on the substrate from the rinse nozzle 138 from the upper part. Near the line to which the rinse liquid contacts on the substrate G, the developer R' of thin liquid layer state on the substrate G being substituted by the rinse liquid S, development is stopped completely.
TW095123001A 2005-06-27 2006-06-26 Substrate processing apparatus TWI307932B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005186521A JP4523498B2 (en) 2005-06-27 2005-06-27 Development processing apparatus and development processing method

Publications (2)

Publication Number Publication Date
TW200715445A true TW200715445A (en) 2007-04-16
TWI307932B TWI307932B (en) 2009-03-21

Family

ID=37597410

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095123001A TWI307932B (en) 2005-06-27 2006-06-26 Substrate processing apparatus

Country Status (4)

Country Link
JP (1) JP4523498B2 (en)
KR (1) KR101194975B1 (en)
CN (1) CN1892423B (en)
TW (1) TWI307932B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100717373B1 (en) 2006-06-12 2007-05-11 세메스 주식회사 Flat Panel Cleaning Device and Roll Brush Used in It
KR100799107B1 (en) * 2007-03-15 2008-03-17 (주)포인텍 Surface treatment device
JP4824723B2 (en) * 2008-06-17 2011-11-30 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method
JP4812847B2 (en) 2009-02-23 2011-11-09 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method
JP2013080808A (en) * 2011-10-04 2013-05-02 Tokyo Electron Ltd Substrate processing apparatus and substrate processing method
CN103207539A (en) * 2012-01-13 2013-07-17 昆山允升吉光电科技有限公司 Non-contact conveying device
JP5990821B2 (en) 2012-02-09 2016-09-14 日東電工株式会社 Method for producing water-resistant organic thin film
JP6347572B2 (en) * 2012-07-12 2018-06-27 東邦化成株式会社 Lift-off device and lift-off method
US20140047735A1 (en) * 2012-08-14 2014-02-20 Shenzhen China Star Optoelectronics Technology Co. Ltd. Cleaning Apparatus for Glass Substrate
CN104347352B (en) * 2013-07-31 2018-05-29 细美事有限公司 A kind of substrate board treatment and substrate processing method using same
JP6289922B2 (en) * 2014-01-30 2018-03-07 芝浦メカトロニクス株式会社 Substrate processing apparatus and substrate processing method
KR101563128B1 (en) * 2015-01-09 2015-10-27 엠에스티코리아(주) apparatus for transferring substrates
CN106125518A (en) * 2016-08-31 2016-11-16 武汉华星光电技术有限公司 Developing apparatus
JP7258196B2 (en) * 2018-06-12 2023-04-14 東京エレクトロン株式会社 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
JP7018826B2 (en) * 2018-06-12 2022-02-14 東京エレクトロン株式会社 Board processing equipment and board processing method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3631668A1 (en) * 1986-09-18 1988-03-24 Hoechst Ag DEVICE FOR PROCESSING PHOTO SENSITIVE MATERIALS
JP2506919B2 (en) * 1988-03-31 1996-06-12 株式会社芝浦製作所 Development device
JP3040055B2 (en) * 1994-08-01 2000-05-08 キヤノン株式会社 Method of developing photosensitive resin
JP3175908B2 (en) * 1995-05-25 2001-06-11 シャープ株式会社 Substrate transfer device for liquid processing equipment
JP4022288B2 (en) * 1997-09-02 2007-12-12 大日本スクリーン製造株式会社 Substrate processing equipment
JP2002252200A (en) * 2001-02-22 2002-09-06 Hitachi Electronics Eng Co Ltd Substrate processing apparatus and processing method
JP3916891B2 (en) * 2001-06-19 2007-05-23 東京エレクトロン株式会社 Substrate processing apparatus and development processing apparatus
TWI226077B (en) * 2001-07-05 2005-01-01 Tokyo Electron Ltd Liquid processing apparatus and liquid processing method
JP2003107733A (en) * 2001-09-27 2003-04-09 Fuji Photo Film Co Ltd Photosensitive material processor
JP2003306226A (en) * 2002-04-12 2003-10-28 Shibaura Mechatronics Corp Substrate processing apparatus and processing method
JP3788789B2 (en) * 2003-01-22 2006-06-21 東京応化工業株式会社 Substrate development method and development apparatus
JP4309782B2 (en) * 2004-02-27 2009-08-05 シャープ株式会社 Liquid processing apparatus and liquid processing method
JP2006193267A (en) * 2005-01-12 2006-07-27 Sharp Corp Substrate transport method and substrate transport apparatus
JP4563191B2 (en) * 2005-01-17 2010-10-13 大日本スクリーン製造株式会社 Substrate processing equipment

Also Published As

Publication number Publication date
JP4523498B2 (en) 2010-08-11
TWI307932B (en) 2009-03-21
JP2007005695A (en) 2007-01-11
KR101194975B1 (en) 2012-10-25
CN1892423B (en) 2010-05-12
KR20070000366A (en) 2007-01-02
CN1892423A (en) 2007-01-10

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees