TW200722937A - Exposure apparatus - Google Patents

Abstract

To provide an exposure apparatus that appropriately controls a blowing state of air to a mask film and a substrate, and appropriately sets the fluid environment of air blown to a mask film and a substrate in an exposure chamber. The exposure apparatus 1 is equipped with: a supply port 3 on one sidewall in an exposure chamber R2 for supplying air at a preliminarily set temperature and humidity along a face of a support frame 31 in an irradiation side; a sidewall discharge port 5 disposed below the supply port for discharging air from between the support frame and a mount table 30 and from the exposure chamber; a blow direction changing means 4 disposed on the other sidewall of the exposure chamber for changing the blowing direction of the air supplied from the supply port to pass through between the support frame and the mount table and to direct toward the sidewall discharge port; and a temperature and humidity controlling means 2 receiving the air discharged from the sidewall discharge port through a filter, controlling the air to the preliminarily set temperature and humidity and sending the air to the supply port.