TW200736857A - Chemical rinse composition for removing resist stripper - Google Patents

Chemical rinse composition for removing resist stripper

Info

Publication number
TW200736857A
TW200736857A TW096110228A TW96110228A TW200736857A TW 200736857 A TW200736857 A TW 200736857A TW 096110228 A TW096110228 A TW 096110228A TW 96110228 A TW96110228 A TW 96110228A TW 200736857 A TW200736857 A TW 200736857A
Authority
TW
Taiwan
Prior art keywords
ether
corrosion inhibitor
diethylene glycol
rinse composition
chemical rinse
Prior art date
Application number
TW096110228A
Other languages
Chinese (zh)
Other versions
TWI421650B (en
Inventor
Seong-Bae Kim
Hee-Jin Park
Suk-Il Yoon
Byung-Uk Kim
Sung-Gun Shin
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW200736857A publication Critical patent/TW200736857A/en
Application granted granted Critical
Publication of TWI421650B publication Critical patent/TWI421650B/en

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04H—BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES; SWIMMING OR SPLASH BATHS OR POOLS; MASTS; FENCING; TENTS OR CANOPIES, IN GENERAL
    • E04H15/00—Tents or canopies, in general
    • E04H15/30—Tents or canopies, in general convertible, e.g. from one type tent to another type tent, from tent to canopy or from tent cover into diverse articles
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04H—BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES; SWIMMING OR SPLASH BATHS OR POOLS; MASTS; FENCING; TENTS OR CANOPIES, IN GENERAL
    • E04H15/00—Tents or canopies, in general
    • E04H15/32—Parts, components, construction details, accessories, interior equipment, specially adapted for tents, e.g. guy-line equipment, skirts, thresholds
    • E04H15/34—Supporting means, e.g. frames
    • E04H15/44—Supporting means, e.g. frames collapsible, e.g. breakdown type
    • E04H15/48—Supporting means, e.g. frames collapsible, e.g. breakdown type foldable, i.e. having pivoted or hinged means
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04H—BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES; SWIMMING OR SPLASH BATHS OR POOLS; MASTS; FENCING; TENTS OR CANOPIES, IN GENERAL
    • E04H15/00—Tents or canopies, in general
    • E04H15/32—Parts, components, construction details, accessories, interior equipment, specially adapted for tents, e.g. guy-line equipment, skirts, thresholds
    • E04H15/58—Closures; Awnings; Sunshades
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04H—BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES; SWIMMING OR SPLASH BATHS OR POOLS; MASTS; FENCING; TENTS OR CANOPIES, IN GENERAL
    • E04H15/00—Tents or canopies, in general
    • E04H15/32—Parts, components, construction details, accessories, interior equipment, specially adapted for tents, e.g. guy-line equipment, skirts, thresholds
    • E04H15/64—Tent or canopy cover fastenings
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04H—BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES; SWIMMING OR SPLASH BATHS OR POOLS; MASTS; FENCING; TENTS OR CANOPIES, IN GENERAL
    • E04H15/00—Tents or canopies, in general
    • E04H15/32—Parts, components, construction details, accessories, interior equipment, specially adapted for tents, e.g. guy-line equipment, skirts, thresholds
    • E04H2015/326—Frame members connected by elastic cord

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A chemical rinse composition for cleaning a resist stripper is provided to improve cleaning power, to prevent the corrosion of a metal film and to remove the organic and inorganic impurities from a substrate. A chemical rinse composition comprises 0.05-10 wt% of an organic amine compound; 0.05-30 wt% of an organic solvent; 0.005-5 wt% of a triazole-based corrosion inhibitor; 0.005-5 wt% of a corrosion inhibitor selected from the group consisting of a hydroxyphenol corrosion inhibitor, an alkyl gallate corrosion inhibitor and a reducing agent; and the balance of water. Preferably the organic solvent is at least one glycol ether compound selected from ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol butyl ether, and diethylene glycol propyl ether.
TW096110228A 2006-03-23 2007-03-23 Chemical rinse composition for removing resist stripper TWI421650B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060026545A KR101251594B1 (en) 2006-03-23 2006-03-23 Chemical rinse composition for removing resist stripper

Publications (2)

Publication Number Publication Date
TW200736857A true TW200736857A (en) 2007-10-01
TWI421650B TWI421650B (en) 2014-01-01

Family

ID=38631197

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096110228A TWI421650B (en) 2006-03-23 2007-03-23 Chemical rinse composition for removing resist stripper

Country Status (4)

Country Link
JP (1) JP2007256955A (en)
KR (1) KR101251594B1 (en)
CN (1) CN101042543B (en)
TW (1) TWI421650B (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102216854A (en) * 2008-08-04 2011-10-12 高级技术材料公司 Environmentally friendly polymer stripping compositions
KR101082011B1 (en) 2009-02-05 2011-11-10 램테크놀러지 주식회사 Composition for removing photoresist and method of forming a pattern using the composition
KR101831452B1 (en) * 2009-02-25 2018-02-22 아반토 퍼포먼스 머티리얼즈, 엘엘씨 Multipurpose acidic, organic solvent based microelectronic cleaning composition
WO2011014027A2 (en) * 2009-07-29 2011-02-03 동우 화인켐 주식회사 Cleaning fluid composition and a cleaning method for a panel using the same
JP5279921B2 (en) * 2009-11-26 2013-09-04 エルジー・ケム・リミテッド Photoresist stripper composition and photoresist stripping method using the same
CN102540776B (en) * 2010-12-30 2013-07-03 苏州瑞红电子化学品有限公司 Stripping liquid for removing residual photoresist in semiconductor technology
EP2666550A4 (en) * 2011-01-18 2014-10-29 Denki Kagaku Kogyo Kk APPARATUS AND METHOD FOR ULTRASONIC CLEANING
KR102032321B1 (en) * 2012-11-13 2019-10-15 동우 화인켐 주식회사 A resist stripper composition for preventing unevenness
JP6075556B2 (en) 2013-07-10 2017-02-08 株式会社オートネットワーク技術研究所 Electric wire with terminal
CN103425001A (en) * 2013-07-19 2013-12-04 杨桂望 Resist membrane cleaning composition
KR101710171B1 (en) * 2014-09-17 2017-02-24 주식회사 엘지화학 Stripper composition for removing photoresist and stripping method of photoresist using the same
CN104330959B (en) * 2014-10-25 2018-04-10 江阴市化学试剂厂有限公司 Photoresist lift off liquid and preparation method thereof
TWI690780B (en) * 2014-12-30 2020-04-11 美商富士軟片電子材料美國股份有限公司 Stripping compositions for removing photoresists from semiconductor substrates
CN106591870B (en) * 2017-01-04 2018-06-29 河北医科大学 A kind of silver electrode surface cleaning protective agent and preparation method thereof
CN107908084A (en) * 2017-11-21 2018-04-13 东莞市广华化工有限公司 A kind of new-type inorganic environmental protection moves back film liquid
CN111381458B (en) * 2018-12-27 2024-04-30 安集微电子科技（上海）股份有限公司 Photoresist cleaning liquid
WO2020194420A1 (en) * 2019-03-25 2020-10-01 パナソニックＩｐマネジメント株式会社 Resist stripping solution
CN110331048B (en) * 2019-07-02 2021-07-20 深圳市大正瑞地科技有限公司 Environment-friendly membrane stripping liquid and preparation method thereof
CN113009793B (en) * 2019-12-19 2025-03-04 安集微电子科技（上海）股份有限公司 A cleaning solution for removing photoresist residues
CN113176718B (en) * 2021-05-06 2021-12-14 肇庆微纳芯材料科技有限公司 Polyimide stripping liquid, preparation method thereof and cleaning method of polyimide film
TW202437031A (en) 2023-03-13 2024-09-16 台灣芯電應用科技股份有限公司 Stripper composition and cleaning method
CN116627005B (en) * 2023-05-10 2026-04-21 浙江凯圣氟化学有限公司 A high-efficiency hydroxylamine-free stripping and cleaning combination solution
KR20260019511A (en) * 2023-06-05 2026-02-10 다우 글로벌 테크놀로지스 엘엘씨 N-substituted piperazine-containing compositions for electronic manufacturing applications

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5419779A (en) * 1993-12-02 1995-05-30 Ashland Inc. Stripping with aqueous composition containing hydroxylamine and an alkanolamine
US5597420A (en) * 1995-01-17 1997-01-28 Ashland Inc. Stripping composition having monoethanolamine
US5997658A (en) * 1998-01-09 1999-12-07 Ashland Inc. Aqueous stripping and cleaning compositions
KR100286860B1 (en) * 1998-12-31 2001-07-12 주식회사 동진쎄미켐 Photoresist Remover Composition
JP2001022095A (en) * 1999-07-02 2001-01-26 Nippon Zeon Co Ltd Stripper for positive resist
KR100842072B1 (en) * 2001-05-31 2008-06-30 에스케이케미칼주식회사 Photoresist removal liquid composition and photoresist removal method using the same
JP2007536566A (en) * 2004-05-07 2007-12-13 ドウジン セミケム カンパニー リミテッド (Photo) Composition for resist removal
KR101152139B1 (en) * 2005-12-06 2012-06-15 삼성전자주식회사 Cleaning material for display device and method for manufacturing thin film transistor array panel using the same

Also Published As

Publication number Publication date
KR101251594B1 (en) 2013-04-08
CN101042543B (en) 2011-12-28
JP2007256955A (en) 2007-10-04
CN101042543A (en) 2007-09-26
KR20070096330A (en) 2007-10-02
TWI421650B (en) 2014-01-01

Similar Documents

Publication Publication Date Title
TW200736857A (en) Chemical rinse composition for removing resist stripper
TW200602817A (en) Composition for stripping and cleaning and use thereof
AU2003272688A8 (en) Compositions substrate for removing etching residue and use thereof
TW200604762A (en) Composition for removing photoresist and/or etching residue from a substrate and use thereof
SG168509A1 (en) Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same
TW200508300A (en) Composition and method for removing copper-compatible resist
EP1610185A3 (en) Composition and method using same for removing residue from a substrate
TW200745327A (en) Cleaner composition for removal of lead-free soldering flux, rinsing agent for removal of lead-free soldering flux, and method for removal of lead-free soldering flux
MY127401A (en) Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature
ZA200700653B (en) Cleaning compositions for microelectronics substrates
WO2009005014A1 (en) Resist stripping composition
MY157701A (en) Novel alkyl perfluoroalkene ethers and uses thereof
MY161562A (en) Rinse liquid for lithography and pattern formation method using the same
KR101999641B1 (en) Microelectronic substrate cleaning compositions having copper/azole polymer inhibition
TW200613543A (en) Aqueous resist stripper composition
TW200732864A (en) Composition for removing residue of a wiring substrate, and washing method thereof
TW200715074A (en) Aqueous cleaning composition and method for using same
KR20090106992A (en) Photoresist stripper composition and photoresist stripping method using the same
TW200508820A (en) Photoresist removing liquid compositions for the substrate containing ag and/ or ag alloy, process for making patterns made from these, and display units containing them
JP2008537182A5 (en)
SG161273A1 (en) Non-aqueous photoresist stripper that inhibits galvanic corrosion
WO2007122792A3 (en) Biofilm formation inhibitor composition
TW200715073A (en) Photoresist stripper composition and method for manufacturing a semiconductor device using the same
CN102566332B (en) A kind of thick film photolithography glue cleaning fluid
KR101679030B1 (en) Stripper composition of photoresist