TW200744968A - Processing method of glass substrate, and highly flat and highly smooth glass substrate - Google Patents

Processing method of glass substrate, and highly flat and highly smooth glass substrate

Info

Publication number
TW200744968A
TW200744968A TW096112721A TW96112721A TW200744968A TW 200744968 A TW200744968 A TW 200744968A TW 096112721 A TW096112721 A TW 096112721A TW 96112721 A TW96112721 A TW 96112721A TW 200744968 A TW200744968 A TW 200744968A
Authority
TW
Taiwan
Prior art keywords
glass substrate
processing
highly
substrate
processing method
Prior art date
Application number
TW096112721A
Other languages
English (en)
Other versions
TWI406832B (zh
Inventor
Koji Otsuka
Hiroshi Kojima
Masabumi Ito
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of TW200744968A publication Critical patent/TW200744968A/zh
Application granted granted Critical
Publication of TWI406832B publication Critical patent/TWI406832B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/005—Other surface treatment of glass not in the form of fibres or filaments by irradiation by atoms
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/006—Other surface treatment of glass not in the form of fibres or filaments by irradiation by plasma or corona discharge
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties
    • C03C2204/08—Glass having a rough surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Surface Treatment Of Glass (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096112721A 2006-04-12 2007-04-11 玻璃基板的處理方法、和高平坦且高光滑的玻璃基板 TWI406832B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006109937A JP4997815B2 (ja) 2006-04-12 2006-04-12 高平坦かつ高平滑なガラス基板の作製方法

Publications (2)

Publication Number Publication Date
TW200744968A true TW200744968A (en) 2007-12-16
TWI406832B TWI406832B (zh) 2013-09-01

Family

ID=38280315

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096112721A TWI406832B (zh) 2006-04-12 2007-04-11 玻璃基板的處理方法、和高平坦且高光滑的玻璃基板

Country Status (6)

Country Link
US (1) US8137574B2 (zh)
EP (1) EP2007691B1 (zh)
JP (1) JP4997815B2 (zh)
KR (1) KR101366422B1 (zh)
TW (1) TWI406832B (zh)
WO (1) WO2007119860A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12154768B2 (en) 2020-12-26 2024-11-26 Industrial Technology Research Institute Surface processing equipment and surface processing method

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080125014A1 (en) * 2006-11-29 2008-05-29 William Rogers Rosch Sub-aperture deterministric finishing of high aspect ratio glass products
JP2009013046A (ja) * 2007-06-05 2009-01-22 Asahi Glass Co Ltd ガラス基板表面を加工する方法
KR20100032865A (ko) * 2007-06-29 2010-03-26 아사히 가라스 가부시키가이샤 유리 기판 표면으로부터 이물질을 제거하는 방법 및 유리 기판 표면을 가공하는 방법
JP5470703B2 (ja) * 2007-12-27 2014-04-16 旭硝子株式会社 Ｅｕｖｌ用光学部材およびその表面処理方法
WO2010061828A1 (ja) * 2008-11-26 2010-06-03 Hoya株式会社 マスクブランク用基板
JP5526895B2 (ja) * 2009-04-01 2014-06-18 信越化学工業株式会社 大型合成石英ガラス基板の製造方法
JP5099111B2 (ja) * 2009-12-24 2012-12-12 信越半導体株式会社 両面研磨装置
JP5637062B2 (ja) * 2010-05-24 2014-12-10 信越化学工業株式会社 合成石英ガラス基板及びその製造方法
JP2012031052A (ja) * 2010-06-28 2012-02-16 Asahi Glass Co Ltd ガラス体を製造する方法及びｅｕｖリソグラフィ用の光学部材を製造する方法
CN102101755A (zh) * 2011-01-07 2011-06-22 福州华映视讯有限公司 玻璃基板的薄化方法
JP5858623B2 (ja) * 2011-02-10 2016-02-10 信越化学工業株式会社 金型用基板
JP2013159531A (ja) * 2012-02-07 2013-08-19 Panasonic Liquid Crystal Display Co Ltd 液晶表示素子の製造方法
JP6518038B2 (ja) * 2014-04-30 2019-05-22 日本放送協会 光電変換素子の製造方法
JP6308039B2 (ja) * 2014-06-13 2018-04-11 旭硝子株式会社 マスクブランク用ガラス基板の製造方法
US20160266482A1 (en) * 2015-03-10 2016-09-15 Asahi Glass Company, Limited Glass substrate for mask blank
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
US10948814B2 (en) * 2016-03-23 2021-03-16 AGC Inc. Substrate for use as mask blank, and mask blank
JP6819451B2 (ja) * 2017-05-08 2021-01-27 信越化学工業株式会社 大型合成石英ガラス基板並びにその評価方法及び製造方法
US20200009701A1 (en) * 2018-07-09 2020-01-09 Arizona Board Of Regents On Behalf Of The University Of Arizona Polishing protocol for zirconium diboride based ceramics to be implemented into optical systems
JP7711579B2 (ja) * 2021-12-08 2025-07-23 Ａｇｃ株式会社 Ｅｕｖリソグラフィ用基板の識別方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5449314A (en) * 1994-04-25 1995-09-12 Micron Technology, Inc. Method of chimical mechanical polishing for dielectric layers
JP3731917B2 (ja) 1994-09-06 2006-01-05 三洋電機株式会社 ガスクラスターイオンビームによる固体表面の平坦化方法
US6396988B1 (en) * 1999-08-13 2002-05-28 Nec Corporation Optical waveguide device and method of forming the same
JP3487584B2 (ja) 2000-05-02 2004-01-19 キヤノン株式会社 インクジェット記録装置、および該装置における記録ヘッドの吐出状態を回復させる方法
JP3627805B2 (ja) * 2001-04-20 2005-03-09 信越化学工業株式会社 フォトマスク用ガラス基板及びその製造方法
JP3975321B2 (ja) 2001-04-20 2007-09-12 信越化学工業株式会社 フォトマスク用シリカガラス系基板及びフォトマスク用シリカガラス系基板の平坦化方法
JP3932836B2 (ja) * 2001-07-27 2007-06-20 株式会社日立製作所 薄膜の膜厚計測方法及びその装置並びにそれを用いたデバイスの製造方法
DE10314212B4 (de) * 2002-03-29 2010-06-02 Hoya Corp. Verfahren zur Herstellung eines Maskenrohlings, Verfahren zur Herstellung einer Transfermaske
DE102004014954A1 (de) * 2003-03-27 2005-03-10 Hoya Corp Verfahren zur Herstellung eines Glassubstrats für einen Maskenrohling und Verfahren zur Herstellung eines Maskenrohlings
JP4219718B2 (ja) * 2003-03-28 2009-02-04 Ｈｏｙａ株式会社 Ｅｕｖマスクブランクス用ガラス基板の製造方法及びｅｕｖマスクブランクスの製造方法
JP5367204B2 (ja) * 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
US7250114B2 (en) * 2003-05-30 2007-07-31 Lam Research Corporation Methods of finishing quartz glass surfaces and components made by the methods
JP4665443B2 (ja) * 2004-06-22 2011-04-06 旭硝子株式会社 ガラス基板の研磨方法
EP1758962B1 (en) * 2004-06-22 2013-10-30 Asahi Glass Company, Limited Polishing method for glass substrate, and glass substrate
WO2006082751A2 (en) * 2005-02-02 2006-08-10 Asahi Glass Company, Limited Process for polishing glass substrate
EP1890978A1 (en) * 2005-06-14 2008-02-27 Asahi Glass Company, Limited Method of finishing pre-polished glass substrate surface
US7432205B2 (en) * 2005-12-15 2008-10-07 United Microelectronics Corp. Method for controlling polishing process
JP5169163B2 (ja) * 2006-12-01 2013-03-27 旭硝子株式会社 予備研磨されたガラス基板表面を仕上げ加工する方法
JP5402391B2 (ja) * 2009-01-27 2014-01-29 信越化学工業株式会社 半導体用合成石英ガラス基板の加工方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12154768B2 (en) 2020-12-26 2024-11-26 Industrial Technology Research Institute Surface processing equipment and surface processing method

Also Published As

Publication number Publication date
JP4997815B2 (ja) 2012-08-08
EP2007691A1 (en) 2008-12-31
TWI406832B (zh) 2013-09-01
US8137574B2 (en) 2012-03-20
JP2007287737A (ja) 2007-11-01
EP2007691B1 (en) 2014-05-07
US20090017257A1 (en) 2009-01-15
WO2007119860A1 (en) 2007-10-25
KR101366422B1 (ko) 2014-02-24
KR20080111468A (ko) 2008-12-23

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