TW200745746A - Black photosensitive composition, light shielding film produced from the same and EL device - Google Patents

Black photosensitive composition, light shielding film produced from the same and EL device

Info

Publication number
TW200745746A
TW200745746A TW096104848A TW96104848A TW200745746A TW 200745746 A TW200745746 A TW 200745746A TW 096104848 A TW096104848 A TW 096104848A TW 96104848 A TW96104848 A TW 96104848A TW 200745746 A TW200745746 A TW 200745746A
Authority
TW
Taiwan
Prior art keywords
light shielding
shielding film
photosensitive composition
black photosensitive
same
Prior art date
Application number
TW096104848A
Other languages
Chinese (zh)
Other versions
TWI377441B (en
Inventor
Hiroyuki Ohnishi
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200745746A publication Critical patent/TW200745746A/en
Application granted granted Critical
Publication of TWI377441B publication Critical patent/TWI377441B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Optical Filters (AREA)

Abstract

To provide a black photosensitive composition for formation of a light shielding film of an EL device, which forms a light shielding film having high shape stability and a low dielectric constant; to provide a light shielding film formed from the black photo- sensitive composition; and to provide an EL device. The black photosensitive composition for an EL device contains a photopoly- merizable compound, a photopolymerization initiator and carbon black, wherein the black photosensitive composition further contains an organic pigment.
TW096104848A 2006-03-17 2007-02-09 Black photosensitive composition, light shielding film produced from the same and EL device TW200745746A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006075272A JP4745092B2 (en) 2006-03-17 2006-03-17 Black photosensitive composition, light-shielding film and EL device manufactured from this black photosensitive composition

Publications (2)

Publication Number Publication Date
TW200745746A true TW200745746A (en) 2007-12-16
TWI377441B TWI377441B (en) 2012-11-21

Family

ID=38593380

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096104848A TW200745746A (en) 2006-03-17 2007-02-09 Black photosensitive composition, light shielding film produced from the same and EL device

Country Status (4)

Country Link
JP (1) JP4745092B2 (en)
KR (1) KR20070094459A (en)
CN (1) CN101038437A (en)
TW (1) TW200745746A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4745093B2 (en) * 2006-03-17 2011-08-10 東京応化工業株式会社 Black photosensitive composition
KR100937201B1 (en) * 2007-11-30 2010-01-19 제일모직주식회사 Black photosensitive resin composition
TWI459051B (en) * 2012-03-01 2014-11-01 Chi Mei Corp Photosensitive resin composition, black matrix, color filter and liquid crystal display element
KR101858766B1 (en) * 2013-07-31 2018-05-16 동우 화인켐 주식회사 Black Photosensitive Resin Composition, Color Filter, and Liquid Crystal Display Device Having the Same
CN106547168B (en) * 2016-10-28 2020-09-01 深圳市华星光电技术有限公司 Black matrix material composition and application
CN115466543B (en) * 2022-10-19 2024-02-27 福斯特(安吉)新材料有限公司 Photocurable black inkjet packaging composition, packaging structure and application thereof
CN116107164B (en) * 2022-12-30 2024-02-20 浙江鑫柔科技有限公司 Photoresist composition, metal conductive pattern, preparation method thereof and touch screen

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07100764B2 (en) * 1990-07-03 1995-11-01 宇部興産株式会社 Black photocurable polymer composition and method for forming black photocurable film
JP3346647B2 (en) * 1993-05-12 2002-11-18 富士写真フイルム株式会社 Light-shielding photosensitive resin composition and light-shielding image forming method
JP4302075B2 (en) * 1997-02-28 2009-07-22 三菱化学株式会社 Black resist composition for forming black matrix
JP4595374B2 (en) * 2003-04-24 2010-12-08 住友化学株式会社 Black photosensitive resin composition

Also Published As

Publication number Publication date
JP2007249045A (en) 2007-09-27
TWI377441B (en) 2012-11-21
KR20070094459A (en) 2007-09-20
CN101038437A (en) 2007-09-19
JP4745092B2 (en) 2011-08-10

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