TW200745770A - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
TW200745770A
TW200745770A TW096104922A TW96104922A TW200745770A TW 200745770 A TW200745770 A TW 200745770A TW 096104922 A TW096104922 A TW 096104922A TW 96104922 A TW96104922 A TW 96104922A TW 200745770 A TW200745770 A TW 200745770A
Authority
TW
Taiwan
Prior art keywords
lithographic apparatus
sensor head
coplanar
support
moveable object
Prior art date
Application number
TW096104922A
Other languages
English (en)
Inventor
Der Pasch Engelbertus Antonius Fransiscus Van
Emiel Jozef Melanie Eussen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200745770A publication Critical patent/TW200745770A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0606—Position monitoring, e.g. misposition detection or presence detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
TW096104922A 2006-02-22 2007-02-09 Lithographic apparatus and device manufacturing method TW200745770A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/358,725 US7602489B2 (en) 2006-02-22 2006-02-22 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
TW200745770A true TW200745770A (en) 2007-12-16

Family

ID=38138251

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096104922A TW200745770A (en) 2006-02-22 2007-02-09 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US7602489B2 (zh)
EP (1) EP1826615A3 (zh)
JP (1) JP4486976B2 (zh)
KR (1) KR100855075B1 (zh)
CN (1) CN101055425B (zh)
SG (1) SG135129A1 (zh)
TW (1) TW200745770A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
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TWI550359B (zh) * 2012-04-26 2016-09-21 Ａｓｍｌ荷蘭公司 微影裝置及元件製造方法

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KR101323565B1 (ko) 2006-01-19 2013-10-29 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법및 패턴 형성 장치, 노광 방법 및 노광 장치, 그리고디바이스 제조 방법
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US7602489B2 (en) 2006-02-22 2009-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI596444B (zh) 2006-08-31 2017-08-21 尼康股份有限公司 Exposure method and device, and device manufacturing method
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US8269945B2 (en) * 2007-12-28 2012-09-18 Nikon Corporation Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
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US8792079B2 (en) * 2007-12-28 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method having encoders to measure displacement between optical member and measurement mount and between measurement mount and movable body
NL1036618A1 (nl) * 2008-03-24 2009-09-25 Asml Netherlands Bv Encoder-type measurement system, lithograpic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system.
NL1036662A1 (nl) * 2008-04-08 2009-10-09 Asml Netherlands Bv Stage system and lithographic apparatus comprising such stage system.
NL1036742A1 (nl) 2008-04-18 2009-10-20 Asml Netherlands Bv Stage system calibration method, stage system and lithographic apparatus comprising such stage system.
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US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8817236B2 (en) * 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8760629B2 (en) * 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
JP2010205867A (ja) * 2009-03-03 2010-09-16 Canon Inc 位置検出装置及び露光装置
NL2005013A (en) * 2009-07-31 2011-02-02 Asml Netherlands Bv Positioning system, lithographic apparatus and method.
US8514395B2 (en) * 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
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US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
JP2011054694A (ja) * 2009-08-31 2011-03-17 Canon Inc 計測装置、露光装置およびデバイス製造方法
US20110096318A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110102761A1 (en) * 2009-09-28 2011-05-05 Nikon Corporation Stage apparatus, exposure apparatus, and device fabricating method
US20110096312A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096306A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110123913A1 (en) * 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US20110128523A1 (en) * 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US8488106B2 (en) * 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
JP5482347B2 (ja) * 2010-03-18 2014-05-07 凸版印刷株式会社 フォトマスク及び露光装置
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CN103246172B (zh) 2012-02-10 2016-12-28 约翰内斯﹒海德汉博士有限公司 具有位置测量装置的多个扫描单元的装置
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TWI627379B (zh) 2013-10-07 2018-06-21 德商強那斯海登翰博士有限公司 光學位置測量裝置
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CN105783847B (zh) * 2014-12-23 2018-10-23 丹东华通测控有限公司 一种角位移传感器校准装置
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KR102552792B1 (ko) * 2015-02-23 2023-07-06 가부시키가이샤 니콘 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고 디바이스 제조 방법
CN111948912A (zh) 2015-02-23 2020-11-17 株式会社尼康 基板处理系统及基板处理方法、以及组件制造方法
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI550359B (zh) * 2012-04-26 2016-09-21 Ａｓｍｌ荷蘭公司 微影裝置及元件製造方法

Also Published As

Publication number Publication date
JP4486976B2 (ja) 2010-06-23
US7602489B2 (en) 2009-10-13
KR20070085158A (ko) 2007-08-27
EP1826615A2 (en) 2007-08-29
EP1826615A3 (en) 2007-09-12
JP2007266581A (ja) 2007-10-11
CN101055425A (zh) 2007-10-17
US20070195296A1 (en) 2007-08-23
KR100855075B1 (ko) 2008-08-29
CN101055425B (zh) 2012-11-28
SG135129A1 (en) 2007-09-28

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