TW200802423A - Crystalline transparent conductive thin film, method of producing the same, transparent conductive film, and touch panel - Google Patents

Crystalline transparent conductive thin film, method of producing the same, transparent conductive film, and touch panel

Info

Publication number
TW200802423A
TW200802423A TW096100026A TW96100026A TW200802423A TW 200802423 A TW200802423 A TW 200802423A TW 096100026 A TW096100026 A TW 096100026A TW 96100026 A TW96100026 A TW 96100026A TW 200802423 A TW200802423 A TW 200802423A
Authority
TW
Taiwan
Prior art keywords
transparent conductive
thin film
conductive thin
producing
touch panel
Prior art date
Application number
TW096100026A
Other languages
English (en)
Other versions
TWI387977B (zh
Inventor
Tomotake Nashiki
Tomonori Noguchi
Hideo Sugawara
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of TW200802423A publication Critical patent/TW200802423A/zh
Application granted granted Critical
Publication of TWI387977B publication Critical patent/TWI387977B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/033—Pointing devices displaced or positioned by the user, e.g. mice, trackballs, pens or joysticks; Accessories therefor
    • G06F3/0354—Pointing devices displaced or positioned by the user, e.g. mice, trackballs, pens or joysticks; Accessories therefor with detection of two-dimensional [2D] relative movements between the device, or an operating part thereof, and a plane or surface, e.g. 2D mice, trackballs, pens or pucks
    • G06F3/03547—Touch pads, in which fingers can move on a surface
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Laminated Bodies (AREA)
TW096100026A 2006-01-30 2007-01-02 A crystalline transparent conductive film, a method for producing the same, a transparent conductive film, and a touch panel TWI387977B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006021048A JP5166700B2 (ja) 2006-01-30 2006-01-30 結晶性透明導電性薄膜、その製造方法、透明導電性フィルムおよびタッチパネル

Publications (2)

Publication Number Publication Date
TW200802423A true TW200802423A (en) 2008-01-01
TWI387977B TWI387977B (zh) 2013-03-01

Family

ID=38309031

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096100026A TWI387977B (zh) 2006-01-30 2007-01-02 A crystalline transparent conductive film, a method for producing the same, a transparent conductive film, and a touch panel

Country Status (6)

Country Link
US (1) US9260777B2 (zh)
JP (1) JP5166700B2 (zh)
KR (2) KR101007170B1 (zh)
CN (1) CN101133463B (zh)
TW (1) TWI387977B (zh)
WO (1) WO2007086230A1 (zh)

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JP5382841B2 (ja) * 2005-10-31 2014-01-08 日東電工株式会社 導電性積層フィルム、タッチパネル用電極板、タッチパネルおよび導電性積層フィルム用粘着剤
US9606078B2 (en) * 2007-11-11 2017-03-28 University Of North Florida Board Of Trustees Nanocrystalline indum tin oxide sensors and arrays
JP2009226932A (ja) * 2008-02-27 2009-10-08 Jsr Corp 導電性積層フィルム、偏光板およびタッチパネル
JP2009226774A (ja) * 2008-03-24 2009-10-08 Mitsubishi Plastics Inc 透明導電性フィルム用積層ポリエステルフィルム
KR101671543B1 (ko) * 2008-11-20 2016-11-01 이데미쓰 고산 가부시키가이샤 ＺｎＯ-ＳｎＯ₂-Ｉｎ₂Ｏ₃계 산화물 소결체 및 비정질 투명 도전막
JP5556436B2 (ja) * 2009-10-13 2014-07-23 東洋紡株式会社 透明導電性積層フィルム及び透明導電性積層シート並びにタッチパネル
WO2011048996A1 (ja) * 2009-10-19 2011-04-28 東洋紡績株式会社 透明導電性フィルム
JP5281554B2 (ja) 2009-11-30 2013-09-04 三菱樹脂株式会社 離型フィルム
CN102191462A (zh) * 2010-03-15 2011-09-21 三菱综合材料株式会社 薄膜形成用气相沉积材、具备该薄膜的薄膜片材和层压片材
US9053937B2 (en) * 2010-04-15 2015-06-09 Electronics And Telecommunications Research Institute Semiconductor device and method of manufacturing the same
JP5468499B2 (ja) * 2010-09-02 2014-04-09 日東電工株式会社 透明導電性薄膜の製造方法
KR101045026B1 (ko) * 2010-11-12 2011-06-30 (주)비엠씨 투명 도전성 적층 필름, 이의 제조방법 및 이를 포함하는 터치패널
JP2012223904A (ja) * 2011-04-15 2012-11-15 Nitto Denko Corp 粘着剤層付き透明樹脂フィルム、積層フィルムおよびタッチパネル
KR101686393B1 (ko) 2011-10-22 2016-12-14 미쓰비시 쥬시 가부시끼가이샤 도포 필름
EP2792701A4 (en) 2012-03-26 2015-09-02 Mitsubishi Plastics Inc COATED FOIL
JPWO2013172354A1 (ja) * 2012-05-15 2016-01-12 旭硝子株式会社 導電膜用素材、導電膜積層体、電子機器、ならびに導電膜用素材および導電膜積層体の製造方法
CN103999166B (zh) * 2012-06-07 2018-01-09 日东电工株式会社 透明导电性膜
JP6080399B2 (ja) * 2012-06-26 2017-02-15 ジオマテック株式会社 透明導電膜
WO2014162761A1 (ja) 2013-04-06 2014-10-09 三菱樹脂株式会社 塗布フィルム
JP2015021014A (ja) 2013-07-16 2015-02-02 三菱樹脂株式会社 積層ポリエステルフィルム
JP2015098549A (ja) * 2013-11-20 2015-05-28 三菱樹脂株式会社 ポリエステルフィルム
JP5957133B2 (ja) * 2014-11-20 2016-07-27 日東電工株式会社 保護フィルム付き透明導電性フィルム
WO2016103852A1 (ja) 2014-12-27 2016-06-30 三菱樹脂株式会社 塗布フィルム
CN108025541B (zh) 2016-03-19 2021-01-15 三菱化学株式会社 涂布膜
KR20180080742A (ko) * 2017-01-04 2018-07-13 (주)에프티씨 접지형 정전용량방식 및 감압방식 동작기능을 갖는 삽입형 휴대폰 케이스
JP2018116273A (ja) * 2017-01-13 2018-07-26 日東電工株式会社 光学積層体
CN106864111B (zh) * 2017-02-14 2018-08-03 江苏秀强玻璃工艺股份有限公司 一种玻璃写字板及其制作方法
JP7375499B2 (ja) * 2019-11-26 2023-11-08 三菱ケミカル株式会社 積層ポリエステルフィルム及びその製造方法
US20230391969A1 (en) * 2021-08-06 2023-12-07 Nitto Denko Corporation Laminate

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JP2525475B2 (ja) * 1989-01-25 1996-08-21 帝人株式会社 透明導電性積層体
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JPH04308612A (ja) * 1991-04-04 1992-10-30 Nitto Denko Corp 透明導電膜およびその製造法と透明導電フイルムとアナログ式タツチパネル
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WO2002091483A2 (en) * 2001-05-08 2002-11-14 Bp Corporation North America Inc. Improved photovoltaic device
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JP4086132B2 (ja) 2001-11-16 2008-05-14 株式会社ブリヂストン 透明導電性フィルムおよびタッチパネル
JP3627864B2 (ja) 2001-12-27 2005-03-09 東洋紡績株式会社 透明導電性フィルム、透明導電性シートおよびタッチパネル
KR20030064604A (ko) * 2002-01-16 2003-08-02 미쓰이 가가쿠 가부시키가이샤 투명 도전성 필름과 그 제조방법 및 그것을 사용한일렉트로루미네센스 발광소자
JP2004053784A (ja) * 2002-07-18 2004-02-19 Sharp Corp 液晶表示装置およびその製造方法
KR20070033443A (ko) * 2004-10-06 2007-03-26 닛토덴코 가부시키가이샤 투명 도전성 필름 및 터치 패널

Also Published As

Publication number Publication date
KR20070092326A (ko) 2007-09-12
WO2007086230A1 (ja) 2007-08-02
TWI387977B (zh) 2013-03-01
US9260777B2 (en) 2016-02-16
JP2007200823A (ja) 2007-08-09
CN101133463B (zh) 2011-09-07
JP5166700B2 (ja) 2013-03-21
KR101007170B1 (ko) 2011-01-12
CN101133463A (zh) 2008-02-27
US20090117405A1 (en) 2009-05-07
KR101007169B1 (ko) 2011-01-12
KR20100032454A (ko) 2010-03-25

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees