TW200844652A - Process for forming solder resist film and photosensitive composition - Google Patents

Process for forming solder resist film and photosensitive composition Download PDF

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Publication number
TW200844652A
TW200844652A TW096143195A TW96143195A TW200844652A TW 200844652 A TW200844652 A TW 200844652A TW 096143195 A TW096143195 A TW 096143195A TW 96143195 A TW96143195 A TW 96143195A TW 200844652 A TW200844652 A TW 200844652A
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Taiwan
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group
carbon atoms
photosensitive composition
wavelength
laser light
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TW096143195A
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Chinese (zh)
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TWI360022B (en
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Yoko Shibasaki
Kenji Kato
Masao Arima
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Taiyo Ink Mfg Co Ltd
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Publication of TWI360022B publication Critical patent/TWI360022B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

To provide a method for forming a solder resist film by which a coating formed of a photosensitive composition can be thoroughly cured from the surface to the depth by compensating the defects of shorter-wavelength laser light and longer-wavelength laser light while making good use of respective advantages, and to provide a high-sensitivity photosensitive composition suitable for use in the method. The method for forming a solder resist film comprises: applying a photosensitive composition onto a substrate; drying it; irradiating a formed dry coating with first laser light and second laser light different from the first laser light in wavelength to form a patterned latent image irradiated with both of the first laser light and the second laser light; and developing the latent image with an alkaline aqueous solution. The photosensitive composition is used in the method, wherein a dry coating thereof before light exposure shows an absorbance of 0.6-1.2 in a wavelength range of 355-380 nm and an absorbance of 0.3-0.6 at a wavelength of 405 nm, per 25 μm film thickness of the dry coating.

Description

200844652 九、發明說明 【發明所屬之技術領域】 本發明係關於一種將感光性組成物塗佈於基材，使其 v 乾燥後，對該乾燥塗膜照射雷射光後，藉由鹼性水溶液顯 像而形成阻焊膜的形成方法以及用於本方法的感光性組成 爹 物及塗佈該組成物於載膜上後乾燥所得之乾膜。 •p 【先前技術】 於印刷電路板的最外層，設置稱爲阻焊膜的永久保護 膜。爲了形成該阻焊膜，廣泛地採用可正確地形成細微圖 型之光阻法。其中，考慮環境面等，以鹼顯像型的光阻法 爲主流。 作爲光阻法之一手法，使用來自發出紫外線的燈的光 之一倂曝光法已廣爲知悉，例如於特開平0 1 - 1 4 1 904號所 揭露。該一倂曝光法，係將感光性組成物塗佈於基材，使 • 其乾燥後，使來自發出紫外線的燈的光，介由光罩，對該 乾燥塗膜進行全面曝光。所以，以非常短的時間可形成圖 • 型潛像。但是，該一倂曝光法，必須使光罩對基材進行對 . 位，該對位需花費時間。再者基材會因其電路形成時的熱 經歷而有尺寸變化，容易與設計値產生偏差。相對地，因 光罩不會產生如上述的尺寸變化，對應該基材的偏差之位 置的修正無法進行。越是細微的圖型，偏差的影響越大， 而難以形成正確的圖型潛像。爲了形成正確的圖型潛像， 分別測定各基材的電路形成後的尺寸，必須對每一基材製 -5- 200844652 作對應其之光罩而非常繁雜。 相對地，使用雷射光的直接繪圖法，根據電腦的數據 ，使用來自雷射光源的單一波長的光’於乾燥阻焊塗膜上 ，直接描繪圖型潛像（國際公開W002/0 96969號）。該 直接繪圖法，對於如上述與基材的尺寸的設計値之偏差， 測定電路形成後基材的尺寸’與設計値之偏差’以電腦修 正，可形成所期望的正確的圖型潛像。所以，直接繪圖法 ，與一倂曝光法比較，可更正確地且容易地形成細微的圖 型潛像。 但是，直接繪圖法係於基材上掃描雷射光而描繪圖型 潛像。所以，藉由直接繪圖法，於1片基材上形成圖型潛 像用的時間，比一倂曝光法長，有生產性變差的傾向。所 以，爲了提高生產性，要求可用於高速直接繪圖法之高感 度的感光性組成物。感光性組成物的感度低時，以高速地 直接繪圖，亦即以短時間的雷射光照射，無法充分地形成 圖型潛像。一般的紫外線硬化型感光性組成物，具有 200mJ〜600mJ的感度。對於以直接繪圖法對厚膜的乾燥 阻焊塗膜曝光而使其充分地硬化而言，該感度範圍爲低。 而且，於雷射直接繪圖法，係使用單一波長。一般使 用更短波長的雷射光時，因光線的能量高，具有可迅速地 使其硬化的優點，但相反地因光有難以透過深部的傾向， 而有阻焊膜的硬化深度下降的傾向。使用更長波長時，光 達到感光性組成物的乾燥塗膜的深部爲止，具有所謂硬化 深度提高的優點，但相反地因光線的能量低，效率差，硬 -6- 200844652 化時間長。再者，這中間，塗膜表面因容易受到氧氣的硬 化阻礙，有所謂無法得到充分的表面硬化的傾向。 【發明內容】 本發明的目的，係在於提供一邊產生更短波長的雷射 光及更長波長的雷射光的各優點，一邊補足個別的缺點， 可使由感光性組成物所形成的塗膜從表面至深部爲止充分 地硬化之阻焊膜的形成方法，以及適用該方法的高感度感 光性組成物。 爲了解決上述目的，根據本發明的第1方面，係提供 一種阻焊膜之形成方法，其特徵爲：塗佈感光性組成物於 基材上，使其乾燥後，於該乾燥塗膜上照射2個以上的波 長互爲相異之雷射光，被該2個以上的雷射光分別照射過 之圖型潛像形成後，以鹼水溶液顯像。 根據本發明的其他方面，係提供一種阻焊膜之形成方 法，其特徵爲：塗佈感光性組成物於基材上，使其乾燥後 ，於該乾燥塗膜，照射第1雷射光及與該第1雷射光的波 長相異之第2雷射光，被前述第1雷射光及第2雷射光兩 者照射過之圖型潛像形成後，以鹼水溶液顯像。 而且，根據本發明的其他方面，提供一種感光性組成 物，係用於第1方面的阻焊膜之形成方法之感光性組成物 ，其特徵爲：其曝光前的乾燥塗膜係厚度每25 μιη，於355 〜3 80nm的波長範圍下顯示〇.6〜1.2的吸光度，且於 4 0 5 nm的波長下顯示〇 · 3〜0.6的吸光度。 200844652 再者’根據本發明的其他方面，係提供一種乾膜，其 係將上述的感光性組成物塗佈於載膜上後乾燥而得。 【實施方式】 以下’更詳細說明本發明。 本發明的阻焊膜之形成方法，係將感光性組成物塗佈 於基材上，使其乾燥後，於該乾燥塗膜上照射2個以上的 波長互爲相異之雷射光，被該2個以上的雷射光分別照射 過之圖型潛像形成後，以鹼水溶液顯像。 特別是本發明的阻焊膜之形成方法，其係將感光性組 成物塗佈於基材上，使其乾燥後，於該乾燥塗膜，照射第 1雷射光及與該第1雷射光的波長相異之第2雷射光，被 前述第1雷射光及第2雷射光兩者照射過之圖型潛像形成 後，以鹼水溶液顯像。 藉由於感光性組成物的乾燥塗膜，照射2個以上的波 長互爲相異之雷射光，例如照射第1雷射光及與該第1雷 射光的波長相異之第2雷射光，被二雷射光照射的乾燥塗 膜部分充分地硬化，可正確地形成圖型潛像（被二雷射光 照射的部分）。2個以上的波長互爲相異之雷射光中，可 先照射任一雷射光，不論順序。而且，也可同時照射2個 以上的波長互爲相異之雷射光。 以下，說明使用第1雷射光及第2雷射光之2個雷射 光的態樣。 用於本發明的阻焊膜之形成方法之第1雷射光與第2 200844652 雷射光，可使用半導體雷射光及固體雷射光。特別是第1 雷射光或第2雷射光之一爲藍紫色雷射光（例如405nm) 較理想。另一雷射光，通常爲紫外線雷射光。該第1雷射 光與第2雷射光的光源，可設置於1台的雷射照射裝置內 〇 於上述本發明的阻焊膜之形成方法，適合使用曝光前 的乾燥塗膜係厚度每25μιη，於3 5 5〜3 80nm的波長範圍下 顯示0.6〜1.2的吸光度，且於405 nm的波長下顯示0.3〜 〇·6的吸光度之本發明的感光性組成物。更詳細地，藉由 曝光前的乾燥塗膜於短波長側之3 55〜3 80nm的波長範圍 下顯示0.6〜1.2的吸光度，入射光在乾燥塗膜的表層部之 吸收大，使表面硬化的同時，藉由於長波長側之405nm的 波長下顯示0.3〜0.6的吸光度，使光透過直到乾燥塗膜的 底部爲止，藉由得到充分的硬化深度而實現高感度。 此處，本發明所謂「曝光前的乾燥塗膜係厚度每 2 5μπι，於3 5 5〜3 80nm的波長範圍下顯示0.6〜1·2的吸光 度，且於405nm的波長下顯示0.3〜0.6的吸光度」，雖 於後述的實施例中詳述，其係指對塗佈•.乾燥感光性組成 物糊料而得的乾燥塗膜，將4個不同厚度與各乾燥塗膜的 厚度之波長355〜380nm下吸光度作圖，由其近似式算出 膜厚25 μπι的乾燥塗膜的吸光度，所得的吸光度爲0.6〜 1.2的範圍，而且對塗佈•乾燥感光性組成物糊料而得的 乾燥塗膜，將4個不同厚度與各乾燥塗膜的厚度之波長 40 5 nm下吸光度作圖，由其近似式算出膜厚2 5 μιη的乾燥 -9- 200844652 塗膜的吸光度，所得的吸光度爲0.3〜0.6的範圍。 而且’本發明所謂「曝光前的乾燥塗膜的厚度每 2 5μιη，於3 5 5〜3 8 0nm的波長範圍下之最大吸光度及 405 nm的波長下之吸光度的差爲〇.3以上未達〇.6」，雖 於後述的實施例中詳述，其係指對塗佈•乾燥感光性組成 物糊料而得的乾燥塗膜，將4個不同厚度與各乾燥塗膜的 厚度之波長3 5 5〜3 80nm下吸光度作圖，其近似式算出膜 厚25 μηι的乾燥塗膜的吸光度而得的最大吸光度與對塗佈 •乾燥感光性組成物糊料而得的乾燥塗膜，將4個不同厚 度與各乾燥塗膜的厚度之波長405nm下吸光度作圖，由其 近似式算出膜厚25μιη的乾燥塗膜的吸光度而得的吸光度 的差爲0.3以上未達0.6。 而且，本發明所謂「曝光前的乾燥塗膜的厚度每 2 5 μηι，於 3 5 5 nm的波長下之顯示0 · 6〜1 · 0的吸光度及 405 nm的波長下顯示0·3〜0.5的吸光度，且355 nm的波 長下之吸光度與405 nm的波長下之吸光度的差爲0.3以上 未達0.5」，雖於後述的實施例中詳述，其係指對塗佈· 乾燥感光性組成物糊料而得的乾燥塗膜，將4個不同厚度 與各乾燥塗膜的厚度之波長3 5 5nm下吸光度作圖，其近似 式算出膜厚25 μηι的乾燥塗膜的吸光度而得的吸光度爲 0.6〜1 · 0的範圍，以及對塗佈•乾燥感光性組成物糊料而 得的乾燥塗膜，將4個不同厚度與各乾燥塗膜的厚度之波 長405nm下吸光度作圖，由其近似式算出膜厚25μηχ的乾 燥塗膜的吸光度而得的吸光度爲〇.3〜〇·5的範圍，且如上 -10- 200844652 述同樣地算出所得的波長3 5 5nm與405nm之膜厚25μπι的 乾燥塗膜的吸光度而得的吸光度的差爲0.3以上未達0.5 〇 於本發明的感光性組成物之曝光前的乾燥塗膜，在 355〜3 8 0nm的波長範圍下顯示未達0.6的吸光度的情況時 ，在表層部光的吸收不足，有表面硬化不充分的傾向。顯 示超過1.2的吸光度的情況時，表面硬化過份進行，因有 阻礙光朝底部透過的傾向，所以不理想。而且，於曝光前 其乾燥塗膜在405 nm的波長下顯示未達0.3的吸光度的情 況，沒有被乾燥塗膜吸收的光，例如碰到基板上的銅箔而 反射，因有改變阻焊膜形狀的傾向，所以不理想。於顯示 超過0.6的吸光度的情況，有直到乾燥塗膜的底部爲止無 法使光充分地透過的傾向，所以不理想。 而且，本發明的感光性組成物，其曝光前的乾燥塗膜 的厚度每25μηι，於3 5 5〜3 80nm的波長範圍下之最大吸光 度及405 nm的波長下之吸光度的差爲0.3以上未達0.6較 理想。藉由吸光度的差爲該範圍，可有效地得到上述表面 硬化及硬化深度，可使本發明的感光性組成物變成更高感 度。該吸光度的差未達0.3時，爲了得到充分的表面硬化 及硬化深度，有需要更長的曝光時間的傾向。而且，超過 0.6時，有難以同時得到充分的表面硬化及硬化深度之傾 向，所以不理想。 再者，本發明的感光性組成物，於曝光前其乾燥塗膜 的厚度每25 μπι，於355 nm的波長下顯示0.6〜1.0的吸光 200844652 度及於 405nm的波長下顯示 0.3〜0.5的吸光度，且 3 5 5nm的波長下之吸光度與405nm的波長下之吸光度的差 爲0.3以上未達0.5較理想。 作爲本發明的感光性組成物，可使用含有（A )含有 羧酸的樹脂、（B )光聚合引發劑及（C )顏料者。 作爲含有羧酸的樹脂（A)，可使用分子中含有羧基 的習知慣用的樹脂化合物。再者，分子中含有乙烯性不飽 和雙鍵之含有羧酸的感光性樹脂，從光硬化性、耐顯像性 的觀點更理想。 具體地，例如下述的樹脂。 (1 )(甲基）丙烯酸等的不飽和羧酸與這些以外的 具有不飽和雙鍵的化合物的1種以上藉由共聚合而得之含 有羧酸的樹脂； (2) 於（甲基）丙烯酸等的不飽和羧酸與這些以外 的含有不飽和雙鍵的化合物的1種以上的共聚合物，藉由 使（甲基）丙烯酸縮水甘油酯、（甲基）丙烯酸3,4·環氧 基環己基甲酯等具有環氧基與不飽和雙鍵的化合物、（甲 基）丙烯酸氯化物反應，使乙烯性不飽和基加成作爲懸垂 物而得之含有羧酸的感光性樹脂； (3) 於（甲基）丙烯酸縮水甘油酯、（甲基）丙烯 酸3,4-乙環氧基環己基甲酯等的含有環氧基及不飽和雙鍵 的化合物與這些以外的具有不飽和雙鍵的化合物之共聚合 物，使（甲基）丙烯酸等的不飽和羧酸反應，於所生成的 2級羥基，使多元酸酐反應而得的含有羧酸的感光性樹脂 -12- 200844652 (4 )於順丁嫌二酸酐等的具有不飽和雙鍵之酸酐與 這些以外的具有不飽和雙鍵的化合物之共聚合物，使（甲 基）丙烯酸2-羥基乙酯等具有羥基及不飽和雙鍵的化合物 反應而得的含有羧酸的感光性樹脂； (5)使多官能基環氧化合物與（甲基）丙烯酸等的 不飽和單羧酸反應，於所生成的羥基，使飽和或不飽和的 多元酸酐反應而得的含有羧酸的感光性樹脂； (6 )於聚乙烯醇衍生物等的含有羥基的聚合物，使 飽和或不飽和的多元酸酐反應後，使所生成的羧酸與1分 子中具有環氧基及不飽和雙鍵的化合物反應而得的含有羧 酸的感光性樹脂； (7) 於多官能基環氧化合物、（甲基）丙烯酸等的 不飽和單羧酸以及1分子中至少有1個醇性羥基及可與環 氧基反應之醇性羥基以外的1個反應性基之化合物（例如 二羥甲基丙酸等）的反應生成物，使飽和或不飽和的多元 酸酐反應而得的含有羧酸的感光性樹脂； (8) 於1分子中至少有2個環氧丙烷環之多官能基 環氧丙烷化合物，使（甲基）丙烯酸等的不飽和單羧酸反 應，對所得的改性環氧丙烷樹脂中的1級羥基，使飽和或 不飽和的多元酸酐反應而得的含有羧酸的感光性樹脂；以 及 (9 )於多官能基環氧樹脂（例如甲酚酚醛樹脂型環 氧樹脂等），使不飽和單羧酸反應（例如（甲基）丙烯酸 -13- 200844652 等）後，使多元酸酐（例如四氫酞酸酐等）反應所得的含 有羧基的感光性樹脂中，再使分子中具有1個環氧乙烷環 及1個以上乙烯性不飽和基的化合物（例如（甲基）丙烯 . 酸縮水甘油酯等）反應所得的含有羧酸的感光性樹脂等， 但不限於這些。 這些之樹脂中較理想爲上述（2 ) 、 ( 5 ) 、 ( 7 )、 (9 )的含有羧酸的感光性樹脂，特別是上述（9 )的含有 φ 羧酸的感光性樹脂，從光硬化性、硬化塗膜特性的觀點較 理想。 而且，於本說明書，所謂（甲基）丙烯酸酯，係丙烯 酸酯及甲基丙烯酸酯之總稱，其他類似的表現也相同。這 些丙烯酸酯化合物及甲基丙烯酸酯化合物，可單獨使用， 也可混合2種以上使用。 如上述含有羧酸的樹脂（A )，因於主幹聚合物的側 鏈具有羧基，可藉由鹼水溶液顯像。 Φ 而且，上述含有羧酸的樹脂（A )的酸價，較理想爲 40〜200mgKOH/g的範圍，更理想爲45〜120mgKOH/g的 • 範圍。含有羧酸的樹脂的酸價未達40mgKOH/g時，鹼顯 - 像變得困難，所以不理想。另一方面，超過200mgKOH/g 時，因顯像液造成曝光部的繼續溶解，線比需要的還痩， 依情況而異，曝光部與未曝光部沒有區別而被顯像液溶解 剝離，使正常的阻焊圖型的描繪變得困難，所以不理想。 而且，上述含有羧酸的樹脂（A)的重量平均分子量 ，雖因樹脂骨架而異，一般爲 2,000〜150,000，再者 14- 200844652 5,000〜100,000的範圍較理想。重量平均分子量未達 2,000時，不黏著性能變差，而且曝光後塗膜的耐濕性變 差，顯像時產生膜的減少，解像度變得非常差。另一方面 ，重量平均分子量超過1 50,000時，顯像性顯著變差，且 貯存安定性變差。200844652 IX. OBJECTS OF THE INVENTION [Technical Field] The present invention relates to a method in which a photosensitive composition is applied to a substrate and dried, and then the dried coating film is irradiated with laser light, and then exposed to an alkaline aqueous solution. A method of forming a solder resist film, a photosensitive composition for use in the method, and a dry film obtained by coating the composition on a carrier film and then drying the film. • p [Prior Art] On the outermost layer of the printed circuit board, a permanent protective film called a solder mask is placed. In order to form the solder resist film, a photoresist method which can accurately form a fine pattern is widely used. Among them, considering the environmental surface, etc., the alkali development type photoresist method is the mainstream. As one of the methods of the light-resistance method, the use of light from a lamp that emits ultraviolet light is widely known, for example, as disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. In the one-shot exposure method, a photosensitive composition is applied to a substrate, and after drying, the light from the ultraviolet-emitting lamp is exposed to the entire surface of the dried coating film through a photomask. Therefore, a latent image of the type can be formed in a very short time. However, in the one-shot exposure method, the photomask must be aligned with the substrate, and the alignment takes time. Further, the substrate may have a dimensional change due to the thermal history of the formation of the circuit, which may easily deviate from the design flaw. On the other hand, since the mask does not have the dimensional change as described above, the correction of the position of the deviation of the substrate cannot be performed. The more subtle the pattern, the greater the influence of the deviation, and it is difficult to form the correct pattern latent image. In order to form a correct pattern latent image, it is very complicated to measure the size of each substrate after the circuit is formed, and it is necessary to make a photomask corresponding to each substrate to -5 - 200844652. In contrast, using the direct mapping method of laser light, according to the data of the computer, a single wavelength of light from the laser source is used to dry the solder resist film to directly depict the latent image (International Publication No. W002/0 96969) . In the direct drawing method, the deviation from the design of the size of the substrate as described above, and the measurement of the difference between the size of the substrate and the design ’ after the circuit is formed are corrected by a computer to form a desired pattern latent image. Therefore, the direct drawing method can form a fine pattern latent image more accurately and easily than a one-shot exposure method. However, the direct mapping method scans the laser light on the substrate to depict a latent image. Therefore, the time for forming a pattern latent image on one substrate by the direct drawing method is longer than the one-shot exposure method, and the productivity tends to be deteriorated. Therefore, in order to improve productivity, a photosensitive composition which can be used for high-sensitivity direct drawing method with high sensitivity is required. When the sensitivity of the photosensitive composition is low, the image is directly drawn at a high speed, i.e., irradiated with laser light for a short period of time, and the pattern latent image cannot be sufficiently formed. A general ultraviolet curable photosensitive composition having a sensitivity of 200 mJ to 600 mJ. The sensitivity range is low for exposing the thick film of the dry solder resist film to direct hardening by direct drawing. Moreover, in laser direct mapping, a single wavelength is used. When laser light of a shorter wavelength is generally used, since the energy of light is high, there is an advantage that it can be hardened quickly. On the contrary, the light tends to be hard to pass through the deep portion, and the hardening depth of the solder resist film tends to decrease. When a longer wavelength is used, the light has an advantage of increasing the depth of hardening until it reaches the deep portion of the dried coating film of the photosensitive composition. Conversely, the light energy is low and the efficiency is poor, and the hardening time is long. Further, in the middle, the surface of the coating film is likely to be inhibited by the hardening of oxygen, and there is a tendency that sufficient surface hardening cannot be obtained. SUMMARY OF THE INVENTION An object of the present invention is to provide advantages of producing laser light of a shorter wavelength and laser light of a longer wavelength while complementing individual disadvantages, and the coating film formed of the photosensitive composition can be obtained from A method of forming a solder resist film that is sufficiently hardened from the surface to the deep portion, and a high-sensitivity photosensitive composition to which the method is applied. In order to achieve the above object, according to a first aspect of the present invention, a method for forming a solder resist film is provided, characterized in that a photosensitive composition is applied onto a substrate, dried, and then irradiated onto the dried coating film. Two or more laser beams having mutually different wavelengths are formed, and the latent image of the pattern irradiated by the two or more laser beams is formed, and then developed as an aqueous alkali solution. According to another aspect of the present invention, a method for forming a solder resist film is provided, wherein a photosensitive composition is applied onto a substrate, dried, and then irradiated with the first laser light and the dried coating film. The second laser light having the same wavelength of the first laser light is formed by the latent image of the first laser beam and the second laser beam, and then developed as an aqueous alkali solution. Further, according to another aspect of the present invention, there is provided a photosensitive composition which is used in a photosensitive composition for forming a solder resist film according to the first aspect, characterized in that the thickness of the dried coating film before exposure is 25 per Μιη, which exhibits an absorbance of 〇.6 to 1.2 in a wavelength range of 355 to 3 80 nm, and an absorbance of 〇·3 to 0.6 at a wavelength of 405 nm. Further, according to another aspect of the present invention, a dry film obtained by applying the above-mentioned photosensitive composition onto a carrier film and drying it is provided. [Embodiment] Hereinafter, the present invention will be described in more detail. In the method for forming a solder resist film of the present invention, a photosensitive composition is applied onto a substrate and dried, and then two or more laser beams having mutually different wavelengths are irradiated onto the dried coating film. After the formation of the latent image of the pattern irradiated by the two or more laser beams, the image is developed with an aqueous alkali solution. In particular, in the method for forming a solder resist film of the present invention, the photosensitive composition is applied onto a substrate and dried, and then the first laser light and the first laser light are irradiated onto the dried coating film. The second laser light having a different wavelength is formed by the pattern latent image irradiated by both the first laser light and the second laser light, and then developed as an aqueous alkali solution. By irradiating two or more kinds of laser beams having mutually different wavelengths by the dry coating film of the photosensitive composition, for example, irradiating the first laser light and the second laser light having a wavelength different from the wavelength of the first laser light, The portion of the dried coating film irradiated with the laser light is sufficiently hardened to correctly form a pattern latent image (a portion irradiated with two laser beams). In two or more laser beams of mutually different wavelengths, any laser light may be irradiated first, regardless of the order. Further, it is also possible to simultaneously irradiate two or more laser beams having mutually different wavelengths. Hereinafter, an aspect in which two laser beams of the first laser beam and the second laser beam are used will be described. As the first laser light and the second 200844652 laser light used in the method for forming a solder resist film of the present invention, semiconductor laser light and solid laser light can be used. In particular, one of the first laser light or the second laser light is preferably blue-violet laser light (for example, 405 nm). Another laser light, usually ultraviolet laser light. The light source of the first laser light and the second laser light can be installed in one laser irradiation device, and the method for forming the solder resist film of the present invention is suitable for use, and the thickness of the dried coating film before exposure is preferably 25 μm. The photosensitive composition of the present invention exhibits an absorbance of 0.6 to 1.2 in a wavelength range of 3 5 5 to 3 80 nm and an absorbance of 0.3 to 〇 6 at a wavelength of 405 nm. In more detail, the dry coating film before exposure exhibits an absorbance of 0.6 to 1.2 in a wavelength range of 3 55 to 380 nm on the short-wavelength side, and the absorption of incident light in the surface portion of the dried coating film is large, and the surface is hardened. At the same time, by exhibiting an absorbance of 0.3 to 0.6 at a wavelength of 405 nm on the long wavelength side, light is transmitted until the bottom of the coating film is dried, and a high degree of hardening depth is obtained to achieve high sensitivity. Here, the "dry coating film thickness before exposure" of the present invention shows an absorbance of 0.6 to 1.2 in a wavelength range of 3 5 5 to 380 nm per 2 5 μm, and a density of 0.3 to 0.6 at a wavelength of 405 nm. The "absorbance" is a dry coating film obtained by coating and drying the photosensitive composition paste, and the wavelength of the thickness of each of the four different thicknesses and the thickness of each dried coating film is 355. The absorbance at ~380 nm was plotted, and the absorbance of the dried coating film having a film thickness of 25 μm was calculated from the approximate expression, and the obtained absorbance was in the range of 0.6 to 1.2, and the dried coating was applied to apply and dry the photosensitive composition paste. The film was plotted for absorbance at a wavelength of 40 5 nm at a thickness of 4 different thicknesses of each dried coating film, and the absorbance of the dried -9-200844652 film having a film thickness of 25 μm was calculated from the approximate formula, and the obtained absorbance was 0.3. ~0.6 range. Further, 'the thickness of the dried coating film before exposure of the present invention is 2 to 5 μm, the difference between the maximum absorbance at a wavelength range of 3 5 5 to 380 nm and the absorbance at a wavelength of 405 nm is not more than 〇3. 〇.6", which is a detailed description of the examples described later, refers to a dry coating film obtained by applying and drying a photosensitive composition paste, and having four different thicknesses and wavelengths of thicknesses of the respective dried coating films. 3 5 5 to 3 absorbance at 80 nm, the approximate absorbance of the dry film of the film thickness of 25 μm is calculated by the approximate formula, and the dried film obtained by applying and drying the photosensitive composition paste will be The absorbance at a wavelength of 405 nm of the thickness of each of the four different thicknesses and the thickness of each of the dried coating films was plotted, and the difference in absorbance obtained by calculating the absorbance of the dried coating film having a thickness of 25 μm from the approximate expression was 0.3 or more and less than 0.6. Further, in the present invention, the thickness of the dried coating film before exposure is every 2 5 μηι, and the absorbance at 0 5 5 nm at a wavelength of 0.25 nm and the wavelength at 405 nm are 0·3 to 0.5. The absorbance, and the difference between the absorbance at a wavelength of 355 nm and the absorbance at a wavelength of 405 nm is 0.3 or more and less than 0.5". Although it is described in detail in Examples to be described later, it means a photosensitive composition for coating and drying. The dry coating film obtained by the paste was prepared by plotting the absorbance at a wavelength of 3 5 5 nm of the thickness of each of the dried coating films at a thickness of 4 different thicknesses, and calculating the absorbance of the dried coating film having a film thickness of 25 μm. a dry coating film obtained by coating and drying the photosensitive composition paste, and a thickness of each of the four different thicknesses and the thickness of each dried coating film at a wavelength of 405 nm, from the range of 0.6 to 1.0 mm. The absorbance obtained by calculating the absorbance of the dried coating film having a film thickness of 25 μηχ is in the range of 〇.3 to 〇·5, and the obtained film having a wavelength of 35 5 nm and a film thickness of 405 nm of 25 μm is calculated in the same manner as described above in -10-200844652. The difference in absorbance obtained by drying the absorbance of the film When the dry coating film before exposure of 0.3 or more to 0.5% of the photosensitive composition of the present invention exhibits an absorbance of less than 0.6 in a wavelength range of 355 to 380 nm, light absorption in the surface layer is insufficient. There is a tendency for surface hardening to be insufficient. When the absorbance exceeds 1.2, the surface hardening is excessively performed, which tends to hinder the transmission of light toward the bottom, which is not preferable. Further, before the exposure, the dried coating film exhibits an absorbance of less than 0.3 at a wavelength of 405 nm, and light that is not absorbed by the dried coating film, for example, is reflected by the copper foil on the substrate, and the solder resist film is changed. The tendency of shape is not ideal. In the case where the absorbance exceeding 0.6 is exhibited, there is a tendency that the light is not sufficiently transmitted until the bottom of the coating film is dried, which is not preferable. Further, in the photosensitive composition of the present invention, the thickness of the dried coating film before the exposure is 25 or less, and the difference between the maximum absorbance in the wavelength range of 35 to 380 nm and the absorbance at the wavelength of 405 nm is 0.3 or more. Up to 0.6 is ideal. When the difference in absorbance is within this range, the above-mentioned surface hardening and hardening depth can be effectively obtained, and the photosensitive composition of the present invention can be made higher in sensitivity. When the difference in absorbance is less than 0.3, a longer exposure time is required in order to obtain sufficient surface hardening and hardening depth. Further, when it exceeds 0.6, it is difficult to obtain sufficient surface hardening and the depth of hardening at the same time, which is not preferable. Further, the photosensitive composition of the present invention exhibits a light absorption of 0.6 to 1.00 at a wavelength of 355 nm and an absorbance of 0.3 to 0.5 at a wavelength of 405 nm per 25 μm of the dried coating film before exposure. The difference between the absorbance at a wavelength of 355 nm and the absorbance at a wavelength of 405 nm is preferably 0.3 or more and less than 0.5. As the photosensitive composition of the present invention, those containing (A) a carboxylic acid-containing resin, (B) a photopolymerization initiator, and (C) a pigment can be used. As the carboxylic acid-containing resin (A), a conventionally used resin compound having a carboxyl group in its molecule can be used. Further, a photosensitive resin containing a carboxylic acid containing an ethylenic unsaturated double bond in the molecule is more preferable from the viewpoints of photocurability and development resistance. Specifically, for example, the following resins. (1) a resin containing a carboxylic acid obtained by copolymerization of one or more unsaturated carboxylic acids such as (meth)acrylic acid and a compound having an unsaturated double bond; (2) (methyl) One or more kinds of copolymers of an unsaturated carboxylic acid such as acrylic acid and a compound containing an unsaturated double bond other than these, by using glycidyl (meth)acrylate or (meth)acrylic acid 3,4·epoxy a compound containing an epoxy group and an unsaturated double bond, or a (meth)acrylic acid chloride, such as a cyclohexylmethyl ester, and an ethylenically unsaturated group to be added as a suspension to obtain a photosensitive resin containing a carboxylic acid; 3) a compound containing an epoxy group and an unsaturated double bond such as glycidyl (meth)acrylate or 3,4-ethylenecyclocyclohexylmethyl (meth)acrylate, and an unsaturated double other than these A carboxylic acid-containing photosensitive resin -12-200844652 (4) of a copolymer of a compound of a bond, an unsaturated carboxylic acid such as (meth)acrylic acid, and a polybasic acid anhydride formed by reacting a polybasic acid anhydride ) Shun Ding succinic anhydride, etc. Photosensitive property of a carboxylic acid obtained by reacting a bond of an acid anhydride of a bond with a compound having a compound having an unsaturated double bond, and a compound having a hydroxyl group and an unsaturated double bond such as 2-hydroxyethyl (meth)acrylate (5) A carboxylic acid-containing sensitization obtained by reacting a polyfunctional epoxy compound with an unsaturated monocarboxylic acid such as (meth)acrylic acid to react a saturated or unsaturated polybasic acid anhydride with a generated hydroxyl group. (6) a hydroxyl group-containing polymer such as a polyvinyl alcohol derivative, which reacts a saturated or unsaturated polybasic acid anhydride to have an epoxy group and an unsaturated double bond in one molecule. a carboxylic acid-containing photosensitive resin obtained by reacting a compound; (7) an unsaturated monocarboxylic acid such as a polyfunctional epoxy compound or (meth)acrylic acid; and at least one alcoholic hydroxyl group in one molecule; A carboxylic acid-containing photosensitive product obtained by reacting a saturated or unsaturated polybasic acid anhydride with a reaction product of a compound having one reactive group other than an alcoholic hydroxyl group (for example, dimethylolpropionic acid) Resin; ( 8) A polyfunctional propylene oxide compound having at least two propylene oxide rings in one molecule, and an unsaturated monocarboxylic acid such as (meth)acrylic acid is reacted, and 1 of the obtained modified propylene oxide resin is obtained. a hydroxy group-containing photosensitive resin containing a carboxylic acid obtained by reacting a saturated or unsaturated polybasic acid anhydride; and (9) a polyfunctional epoxy resin (for example, a cresol novolac type epoxy resin) to be unsaturated After the monocarboxylic acid reaction (for example, (meth)acrylic acid-13-200844652, etc.), the carboxyl group-containing photosensitive resin obtained by reacting a polybasic acid anhydride (for example, tetrahydrophthalic anhydride or the like) has one epoxy in the molecule. A carboxylic acid-containing photosensitive resin obtained by reacting an ethane ring and a compound having one or more ethylenically unsaturated groups (for example, (meth) propylene, acid glycidyl ester, etc.), but is not limited thereto. Among these resins, a carboxylic acid-containing photosensitive resin of the above (2), (5), (7), and (9) is preferable, and in particular, the φ carboxylic acid-containing photosensitive resin of the above (9) is used. The viewpoint of the properties of hardenability and hard coating film is preferable. Further, in the present specification, the term "(meth)acrylate" is a generic term for acrylate and methacrylate, and other similar expressions are also the same. These acrylate compounds and methacrylate compounds may be used singly or in combination of two or more. The above carboxylic acid-containing resin (A) can be imaged by an aqueous alkali solution because the side chain of the main polymer has a carboxyl group. Φ Further, the acid value of the carboxylic acid-containing resin (A) is preferably in the range of 40 to 200 mgKOH/g, more preferably in the range of 45 to 120 mgKOH/g. When the acid value of the carboxylic acid-containing resin is less than 40 mgKOH/g, the alkali image becomes difficult, which is not preferable. On the other hand, when it exceeds 200 mgKOH/g, the exposure portion is continuously dissolved by the developing liquid, and the line is more than necessary, depending on the case, and the exposed portion is not separated from the unexposed portion, and is dissolved and peeled off by the developing solution. The depiction of a normal solder mask pattern becomes difficult, so it is not ideal. Further, the weight average molecular weight of the carboxylic acid-containing resin (A) varies depending on the resin skeleton, and is generally from 2,000 to 150,000, and further preferably from 14 to 200844652 to 5,000 to 100,000. When the weight average molecular weight is less than 2,000, the non-adhesive property is deteriorated, and the moisture resistance of the coating film after exposure is deteriorated, and the film is reduced at the time of development, and the resolution is extremely poor. On the other hand, when the weight average molecular weight exceeds 150,000, the developability is remarkably deteriorated, and the storage stability is deteriorated.

如此的含有羧酸的樹脂（A )的調配量，基於本發明 的感光性組成物的全部質量，可選擇20〜60質量％，較理 想爲30〜50質量％。未達20質量％時，因塗膜強度有降 低的傾向，所以不理想。另一方面，超過6 〇質量％時，黏 性變高，因塗佈性等降低，所以不理想。 作爲光聚合引發劑（B)，使用選自具有下述一般式 (I)所表示的基之肟酯系光聚合引發劑、具有下述一般 式（11 )所表示的基之α -胺基乙醯苯系光聚合引發劑、以 及具有下述一般式（III)所表示的基之醯基氧化膦系光聚 合引發劑所成群的1種以上的光聚合引發劑較理想。The blending amount of the carboxylic acid-containing resin (A) can be 20 to 60% by mass, preferably 30 to 50% by mass, based on the total mass of the photosensitive composition of the present invention. When the amount is less than 20% by mass, the coating film strength tends to decrease, which is not preferable. On the other hand, when the amount is more than 6% by mass, the viscosity is high and the coating property is lowered, which is not preferable. As the photopolymerization initiator (B), an oxime ester-based photopolymerization initiator having a group represented by the following general formula (I) and an α-amino group having a group represented by the following general formula (11) are used. One or more kinds of photopolymerization initiators in which a phthalic acid-based photopolymerization initiator and a sulfhydryl phosphine-based photopolymerization initiator having a group represented by the following general formula (III) are present are preferred.

(III) (式中， -15- 200844652 R1表示氫原子、苯基（也可以碳數1〜6的烷基、苯 基或鹵原子所取代）、碳數1〜20的烷基（也可以1個以 上的羥基所取代，於烷基鏈的中間也可具有i個以上的氧 原子）、碳數5〜8的環烷基、碳數2〜20的烷醯基或苯 甲醯基（也可以碳數1〜6的烷基或苯基所取代）， R2表示苯基（也可以碳數1〜6的烷基、苯基或鹵原 子所取代）、碳數1〜2 0的烷基（也可以1個以上的羥基 所取代，於烷基鏈的中間也可具有1個以上的氧原子）、 碳數5〜8的環烷基、碳數2〜20的烷醯基或苯甲醯基（ 也可以碳數1〜6的烷基或苯基所取代）， R3及R4表示各自獨立之碳數1〜12的烷基或芳基烷 基， R5及R6表示各自獨立之氫原子、碳數1〜6的烷基或 2者鍵結之環狀烷醚基， R7及R8表示各自獨立之碳數1〜10的直鏈狀或分歧 狀的烷基、環己基、環戊基、芳基或以鹵原子、烷基或烷 氧基所取代之芳基，但R7及R8中之一也可表示R — C( =〇 ) —基（此處R爲碳數1〜20的烴基））。 作爲前述具有下述一般式（I)所表示的基之肟酯系 光聚合引發劑，較理想爲下述式（IV )所表示的2-(乙醯 氧基亞胺基甲基）硫蒽-9-酮、(III) (In the formula, -15- 200844652 R1 represents a hydrogen atom, a phenyl group (may also be substituted with an alkyl group having 1 to 6 carbon atoms, a phenyl group or a halogen atom), and an alkyl group having 1 to 20 carbon atoms (may also be used) One or more hydroxyl groups may be substituted, and may have one or more oxygen atoms in the middle of the alkyl chain), a cycloalkyl group having 5 to 8 carbon atoms, an alkanoyl group having 2 to 20 carbon atoms or a benzhydryl group ( It may also be substituted with an alkyl group having 1 to 6 carbon atoms or a phenyl group), and R2 represents a phenyl group (may also be substituted with an alkyl group having 1 to 6 carbon atoms, a phenyl group or a halogen atom), and an alkyl group having 1 to 20 carbon atoms. a group (may be substituted by one or more hydroxyl groups, and may have one or more oxygen atoms in the middle of the alkyl chain), a cycloalkyl group having 5 to 8 carbon atoms, an alkyl alkene group having 2 to 20 carbon atoms, or benzene. A mercapto group (which may also be substituted with an alkyl group having 1 to 6 carbon atoms or a phenyl group), R3 and R4 represent an alkyl group or an arylalkyl group having 1 to 12 carbon atoms, and R5 and R6 represent independently hydrogen atoms. An atom, an alkyl group having 1 to 6 carbon atoms or a cyclic alkyl ether group bonded to 2, and R 7 and R 8 each independently represent a linear or divalent alkyl group having 1 to 10 carbon atoms, a cyclohexyl group, and a cyclopentane group. Base, aryl or halogen atom The alkyl group substituted with an aryl group or an alkoxy group, but also one of R7 and R8 may represent R - C (= square) - group (wherein R is a hydrocarbon group having a carbon number of 1~20)). The oxime ester photopolymerization initiator having the group represented by the following general formula (I) is preferably 2-(ethyloxyiminomethyl)sulfonium represented by the following formula (IV). -9-ketone,

200844652 下述式（v )所表示的化合物200844652 A compound represented by the following formula (v)

(式中， R9表示氫原子、鹵原子、碳數1〜12的燒基、環戊基 、環己基、苯基、苯甲基、苯甲醯基、碳數2〜i 2的烷醯 基、fe數2〜12的|兀氧基鑛基（構成垸氧基之院基的碳數 爲2以上時，丨兀基可以1個以上的經基所取代，於院基鏈 的中間也可具有1個以上的氧原子）或苯氧基鑛基， R1G、R12表示各自獨立之苯基（也可以碳數1〜6的 院基、苯基或鹵原子所取代）、碳數1〜20的院基（也可 以1個以上的羥基所取代，於烷基鏈的中間也可具有1個 以上的氧原子）、碳數5〜8的環烷基、碳數2〜20的烷 醯基或苯甲醯基（也可以碳數1〜6的烷基或苯基所取代 )， R11表示氫原子、苯基（也可以碳數1〜6的烷基、苯 基或鹵原子所取代）、碳數1〜20的烷基（也可以1個以 -17- 200844652 上的經基所取代，於烷基鏈的中間也可具有1個以上的氧 原子）、碳數5〜8的環烷基、碳數2〜20的烷醯基或苯 甲醯基（也可以碳數6的烷基或苯基所取代））以及 下述式（VI)所表示的化合物 R16 R15(wherein R9 represents a hydrogen atom, a halogen atom, a alkyl group having 1 to 12 carbon atoms, a cyclopentyl group, a cyclohexyl group, a phenyl group, a benzyl group, a benzamyl group, and an alkylene group having 2 to 2 carbon atoms;兀 矿 2 2 2 fe fe fe fe fe fe 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀Having one or more oxygen atoms) or a phenoxy mineral group, and R1G and R12 each independently represent a phenyl group (may also be substituted with a phenyl group or a halogen atom having 1 to 6 carbon atoms), and have a carbon number of 1 to 20 The base (which may be substituted by one or more hydroxyl groups, may have one or more oxygen atoms in the middle of the alkyl chain), a cycloalkyl group having 5 to 8 carbon atoms, or an alkylene group having 2 to 20 carbon atoms. Or a benzamidine group (which may be substituted by an alkyl group having 1 to 6 carbon atoms or a phenyl group), and R11 represents a hydrogen atom or a phenyl group (may also be substituted with an alkyl group having 1 to 6 carbon atoms, a phenyl group or a halogen atom) An alkyl group having 1 to 20 carbon atoms (one may be substituted with a radical on -17-200844652, and may have one or more oxygen atoms in the middle of the alkyl chain), and a ring having 5 to 8 carbon atoms. Alkyl group, carbon number 2~20 An alkanoyl group or a benzhydryl group (which may also be substituted with an alkyl group having 6 carbon atoms or a phenyl group) and a compound represented by the following formula (VI): R16 R15

(式中， R13及R14表示各自獨立之碳數1〜12的烷基， R15、R16、R17、RU及R19表示各自獨立之氫原子或 碳數1〜6的烷基， Μ表示〇、S或NH，以及 m及η表示〇〜5的整數）。 其中，以上述式（IV)所表示的2-(乙醯氧基亞胺基 甲基）硫蒽-9 -酮以及式（V )所表示的化合物更理想。作 爲市售品，例如千葉特殊化學公司製（CHIBA )的CGI-325、IRAGURE OXEO1、IRAGURE OXE02 等。這些肟酯 系光聚合引發劑，可單獨或組合2種以上使用。 作爲具有前述一般式（II )所表示的基之α-胺基乙醯 苯系光聚合引發劑，例如2-甲基-1-[4-(甲硫基）苯基]-2-嗎啉基丙酮d、2-苯甲基-2-二甲基胺基-1- ( 4-嗎啉基苯 -18- 200844652 基）-丁 ·1酮、2-(二甲基胺基）-2-[(4-甲基苯 卜卜[4- ( 4-嗎啉基）苯基μ：!· 丁酮、Ν，Ν·二甲基 苯等。作爲市售品，例如千葉特殊化學公司製（ 的 IRAGURE907、IRAGURE369、IRAGURE379 等 作爲具有前述一般式（111)所表示的基之醯 系光聚合引發劑，例如2,4,6-三甲基苯甲醯基二 膦、雙（2，4,6-三甲基苯甲醯基）苯基氧化膦、雙 甲氧基苯甲醯基）-2,4,4-三甲基-戊基氧化膦等 售品，例如BASF公司製LUCIRIN ΤΡΟ、千葉特 司製（CHIBA)的 IRAGURE819 等。 如此的光聚合引發劑（B )的調配量，對前 酸的樹脂（A ) 100質量份而言，可選擇爲〇.〇 p 份，較理想爲0.5〜1 5質量份的範圍。未達〇 . 〇1 因在銅上的光硬化性不足，塗膜會剝離，耐藥品 特性差，所以不理想。另一方面，超過3 〇質量 聚合引發劑（B)在阻焊塗膜表面的光吸收變強 部硬化性低的傾向，所以不理想。 而且，於前述具有下述一般式（I)所表示 酯系光聚合引發劑的情況，其調配量對前述含有 脂（A) 100質量份而言，可選擇爲001〜2〇質 理想爲0 · 0 1〜5質量份的範圍。如此的肟酯系光 劑（Ϊ )，因在與銅箔界面，與銅原子反應，作 引發劑的功能有失去活性的情形，倂用α -胺基乙 聚合引發劑（II)等較理想。 基）甲基 胺基乙醯 CHIBA ) 〇 基氧化膦 苯基氧化 ! ( 2,6-二 0 作爲市 殊化學公 述含有羧 〜30質量 質量份， 性等塗膜 份時，光 ，因有深 的基之肟 羧酸的樹 量份，較 聚合引發 爲光聚合 醯苯系光 -19- 200844652 作爲本發明的感光性組成物所含的顏料（C )，含有 献青藍（phthalocyanine blue )系顏料較理想。本發明人 等發現對405 nm的單一波長的光（雷射光）添加酞青藍系 顏料之感光性組成物，可以更低曝光量得到表面硬化性。 該酞青藍系顏料的增感效果的理由雖不清楚，例如於膜厚 每25 μιη的吸光度未達0.3的感光性組成物，添加酞青藍 ，只在吸光度0.3以上，可以低曝光量同時得到充分的表 面硬化性及硬化深度。而且，該增感效果，具有表面反應 性（改善光澤）的效果，相反地硬化深度變差。亦即，進 行反射曝光的光之作用。該作用也對阻焊劑的形狀的安定 化有效。作爲酞青藍系顏料，例如oc型銅酞青藍、α型單氯 銅酞青藍、β型銅酞青藍、ε型銅酞青藍、鈷酞青藍、無金 屬酞青藍等。 如此的顏料（C )的適合添加量，只要感光性組成物 的乾燥塗膜的405nm波長下的吸光度每25μιη爲0.3〜0.6 的範圍，可任意添加，例如對含有羧酸的樹脂（A ) 1 〇〇 質量份而言，爲0.0 1〜5質量份的範圍。 其他作爲可適用於本發明的感光性組成物之光聚合引 發劑、光引發助劑及增感劑，例如安息香化合物、乙醯苯 化合物、蒽醌化合物、硫蒽酮化合物、縮酮化合物、二苯 基酮化合物、氧蒽酮化合物及3級胺化合物等。 列舉安息香化合物的具體例時，例如安息香、安息香 甲醚、安息香乙醚、安息香丙醚。 列舉乙醯苯化合物的具體例時，例如乙醯苯、2,2-二 •20- 200844652 甲氧基-2-苯基乙醯苯、2,2-二乙氧基-2·苯基乙醯苯、i，;u 二氯乙醯苯。 列舉蒽醌化合物的具體例時，例如2-甲基蒽醌、2-乙 基蒽醌、2-第3 丁基蒽醌、1-氯蒽醌。 列舉硫蒽酮化合物的具體例時，例如2,4-二甲基硫蒽 酮、2,4-二乙基硫蒽酮、2-氯硫蒽酮、2,4-二異丙基硫蒽 酮。 列舉縮酮化合物的具體例時，例如乙醯苯二甲基縮酮 、苯甲基二甲基縮酮。 列舉二苯基醒化合物的具體例時，例如二苯基酬、4_ 苯甲醯基二苯基硫醚、苯甲基_4’_甲基二苯基硫醚、4-苯甲基- 4’-乙基二苯基硫醚、4-苯甲基- 4’-丙基二苯基硫醚 〇 列舉3級胺化合物的具體例時，例如乙醇胺化合物、 具有胺基苯構造的化合物，例如4，4 ’ -二甲基胺基二苯基 酮（日本曹達公司製NISSOCURE-MABP ) 、4,4’-二乙基 胺基二苯基酮（保土之穀化學公司製EAB )等二烷基胺基 二苯基酮、7-(二乙基胺基）·4_甲基-2H-1-苯並吡喃-2·酮 、（7-(二乙基胺基）-4-甲基香豆素）等含有二烷基胺基 的香豆素（coumarin)化合物、4-二甲基胺基安息香酸乙 酯（日本化藥公司製KAYACURE-EPA ) 、2-二甲基胺基 安息香酸乙酯（國際生化合成（international Biosynthesis) 公司製 Quantacure DMB) 、 4-二 甲基胺基安息 香酸（正丁氧基）乙酯（國際生化合成（international 21 - 200844652(wherein R13 and R14 represent independently an alkyl group having 1 to 12 carbon atoms, and R15, R16, R17, RU and R19 each represent an independently hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and Μ represents 〇, S Or NH, and m and η represent integers of 〇~5). Among them, 2-(ethoxylated imidomethyl)thioindole-9-one represented by the above formula (IV) and a compound represented by the formula (V) are more preferable. As a commercial item, for example, CGI-325, IRAGURE OXEO1, IRAGURE OXE02, etc. manufactured by Chiba Specialty Chemical Co., Ltd. (CHIBA). These oxime ester-based photopolymerization initiators may be used alone or in combination of two or more. As the α-aminoethyl benzene-based photopolymerization initiator having the group represented by the above general formula (II), for example, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholine Base acetone d, 2-benzyl-2-dimethylamino-1-(4-morpholinylbenzene-18-200844652)-butyl-1-one, 2-(dimethylamino)-2 -[(4-Methylbenzeneb [4-(4-morpholinyl)phenyl]: butanone, hydrazine, hydrazine, dimethyl benzene, etc. As a commercial product, for example, Chiba Special Chemical Co., Ltd. (IRAGURE 907, IRAGURE 369, IRAGURE 379, etc. as an oxime-based photopolymerization initiator having the group represented by the above general formula (111), for example, 2,4,6-trimethylbenzimidyl diphosphine, bis (2, 4) , 6-trimethylbenzimidyl)phenylphosphine oxide, bismethoxybenzhydryl)-2,4,4-trimethyl-pentylphosphine oxide, and the like, such as LUCIRIN® manufactured by BASF Corporation , ILAGA 819 of Chiba Special Co., Ltd. (CHIBA), etc. The amount of the photopolymerization initiator (B) is preferably 〇.〇p, for 100 parts by mass of the pre-acid resin (A). It is in the range of 0.5 to 15 parts by mass. It does not reach 〇. 〇1 due to light hardening on copper Insufficient, the coating film is peeled off, and the chemical resistance is poor. Therefore, more than 3 〇 mass polymerization initiator (B) tends to have low hardenability in the light absorption and strengthening portion on the surface of the solder resist film. In the case of the above-mentioned ester-based photopolymerization initiator represented by the following general formula (I), the blending amount is preferably 001 to 2 in terms of 100 parts by mass of the above-mentioned fat (A). It is in the range of 0·0 1 to 5 parts by mass. Such an oxime ester-based photoreceptor (Ϊ) is inactivated by the reaction with a copper atom at the interface with the copper foil, and the function of the initiator is inactivated. Aminoethyl polymerization initiator (II), etc. is preferred. Base) methylaminoethyl hydrazine CHIBA) fluorenylphosphine oxide phenyl oxidation! (2,6-2 0 as a special chemical containing carboxy to 30 mass parts by mass When the film is coated, the light is contained in the photosensitive composition of the present invention as a result of the photopolymerization of the phthalic acid-based photo--19-200844652. (C), ideal for containing phthalocyanine blue pigments The present inventors have found that a photosensitive composition of an indigo blue pigment is added to light of a single wavelength of 405 nm (laser light), and surface hardenability can be obtained at a lower exposure amount. The sensitizing effect of the indigo blue pigment Although the reason is not clear, for example, in the photosensitive composition having a film thickness of not more than 0.3 per 25 μm, indigo blue is added, and only the absorbance is 0.3 or more, and sufficient surface hardenability and hardening depth can be simultaneously obtained with a low exposure amount. Further, this sensitizing effect has an effect of surface reactivity (improving gloss), and conversely, the hardening depth is deteriorated. That is, the effect of the light of the reflected exposure. This action is also effective for the stabilization of the shape of the solder resist. As the indigo blue pigment, for example, oc type copper beryllium blue, ? type monochloro copper indigo blue, ? type copper beryllium blue, ? type copper beryllium blue, cobalt indigo blue, and no metal indigo blue. The amount of the pigment (C) to be added is suitably added as long as the absorbance at a wavelength of 405 nm of the dried coating film of the photosensitive composition is in the range of 0.3 to 0.6 per 25 μm, for example, for the resin (A) containing a carboxylic acid. In the case of 〇〇 by mass, it is in the range of 0.01 to 5 parts by mass. Other photopolymerization initiators, photoinitiation aids, and sensitizers which are applicable to the photosensitive composition of the present invention, for example, a benzoin compound, an acetophenone compound, an anthraquinone compound, a thioxanthone compound, a ketal compound, and A phenylketone compound, a oxone compound, a tertiary amine compound, and the like. Specific examples of the benzoin compound are exemplified by benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin propyl ether. Specific examples of the acetophenone compound include, for example, acetophenone, 2,2-di•20-200844652 methoxy-2-phenylethenzene, 2,2-diethoxy-2-phenylene Toluene, i,; u dichloroacetamidine. Specific examples of the hydrazine compound include 2-methyl hydrazine, 2-ethyl hydrazine, 2-butyl butyl hydrazine, and 1-chloro hydrazine. Specific examples of the thioxanthone compound include, for example, 2,4-dimethylthioxanthone, 2,4-diethylthiononanone, 2-chlorothioxanthone, and 2,4-diisopropylthione. ketone. Specific examples of the ketal compound include, for example, acetophenone ketal and benzyl dimethyl ketal. Specific examples of the diphenyl waking compound are exemplified by, for example, diphenyl phthalate, 4 benzylidene diphenyl sulfide, benzyl 4'-methyl diphenyl sulfide, 4-benzyl- 4 '-Ethyl diphenyl sulfide and 4-benzyl- 4'-propyl diphenyl sulfide are exemplified as specific examples of the tertiary amine compound, for example, an ethanolamine compound or a compound having an aminobenzene structure, for example 4,4 '-dimethylaminodiphenyl ketone (NISSOCURE-MABP manufactured by Nippon Soda Co., Ltd.), 4,4'-diethylaminodiphenyl ketone (EAB manufactured by Hodogaya Chemical Co., Ltd.), etc. Alkylaminodiphenyl ketone, 7-(diethylamino).4_methyl-2H-1-benzopyran-2·one, (7-(diethylamino)-4- a coumarin compound containing a dialkylamine group such as methyl coumarin, 4-ethylamino benzoic acid ethyl ester (KAYACURE-EPA manufactured by Nippon Kayaku Co., Ltd.), 2-dimethylamine Ethyl benzoate (International Biosynthesis Quantacure DMB), 4-dimethylamino benzoic acid (n-butoxy) ethyl ester (international biosynthesis (international 21 - 200844652

Bio-synthesis)公司製 Quantacure BEA)、對-二甲基胺 基安息香酸異戊基乙酯（日本化藥公司製 KAYACURE-DMBI) 、4-二甲基胺基安息香酸2-乙基己酯（Van Dyk公 * 司製Esolol507) 、4,4’·二乙基胺基二苯基酮（保土之榖 _ 化學公司製EAB )。 上述之中，以硫蒽酮化合物及3級胺化合物較理想。 於本發明的組成物，含有硫蒽酮化合物從深部硬化性的面 Φ 而言較理想。其中以2,4-二甲基硫蒽酮、2,4-二乙基硫蒽 酮、2-氯硫蒽酮、2,4-二異丙基硫蒽酮等硫蒽酮化合物較 理想。 如此的硫蒽酮化合物的調配量，對上述含有羧酸的樹 月旨（A ) 1 00質量份而言，較理想爲20質量份以下，更理 想爲1 〇質量份以下的比例。硫蒽酮化合物的調配量過多 時，厚膜硬化性低，因與產品的成本提高有關，所以不理 想。 • 作爲3級胺化合物，以具有二烷基胺基苯構造的化合 物較理想，其中二烷基胺基二苯基酮化合物，最大吸收波 ‘ 長爲3 5 0〜410nm之含有二烷基胺基的香豆素（coumarin • )化合物較理想。作爲二烷基胺基二苯基酮化合物，以 4,4’-二乙基胺基二苯基酮，毒性也低，較理想。最大吸收 波長爲3 50〜410nm之含有二烷基胺基的香豆素化合物， 因最大吸收波長在紫外線區域，著色少，無色透明的阻焊 感光性組成物，當然可提供使用著色顏料，反映著色顏料 本身的顏色之著色阻焊感光性組成物。特別是7 ·(二乙基 -22- 200844652 胺基）-4 -甲基-2 Η-1-苯並吡喃-2-酮，因對波長 400〜 4 1 Onm的雷射光顯示優異的增感效果而較理想。 如此的3級胺化合物的調配量，對上述含有羧酸的樹 脂（A) 100質量份而言，較理想爲0.1〜20質量份，更理 想爲0.1〜1 0質量份的比例。3級胺化合物的調配量爲〇· 1 質量份以下時，有無法得到充分的增感效果的傾向。超過 20質量份時，因3級胺化合物在乾燥的阻焊塗膜的表面之 光吸收變強，有深部硬化性低的傾向。 這些光聚合引發劑、光引發助劑及增感劑，可單獨或 2種以上的混合物使用。 如此的光聚合引發劑、光引發助劑及增感劑的總量， 對上述含有羧酸的樹脂（A) 100質量份而言爲35質量份 以下的範圍較理想。超過3 5質量份時，由於這些的光吸 收而有深部硬化性低的傾向。 於本發明的感光性組成物，爲了賦予耐熱性，可調配 分子中有2個以上的環狀醚基及/或環狀硫醚基（以下簡 稱爲環狀（硫）醚基）之熱硬化性成分（D )。 如此的分子中有2個以上的環狀（硫）醚基之熱硬化 性成分（D)，係分子中有2個以上的3、4或5員環的環 狀醚基或環狀硫醚基中之一或2種的基之化合物。例如分 子內有至少2個以上的環氧基的化合物，亦即多官能基環 氧化合物（D-1)、分子內有至少2個以上的環氧丙烷基 的化合物、亦即多官能基環氧丙院化合物（D - 2 )、分子 內有至少2個以上的硫醚基的化合物、亦即環硫樹脂 •23- 200844652 3 )等。 作爲前述多官能基環氧化合物（D-1 )，例如日本環 氧樹脂公司製 EPIKOTE828、EPIKOTE834、EPIKOTE1001 、EPIKOTE1004、大日本油墨（INK )化學工業公司製 EPICLON840 、 EPICLON850 、 EPICLON1050 、 EPICLON2055、東都化成公司製 EPOTOHTO YD-01 1、 YD-013、YD-127、YD-128、道康寧公司製 D.E.R.317、 D.E.R.331、D.E.R.661、D.E.R.664、千葉（CHIBA)特殊 化學公司的 ARALDITE607 1 、 ARALDITE6084 、Bio-synthesis) Quantacure BEA), p-dimethylamino benzoic acid isoamyl ethyl ester (KAYACURE-DMBI, manufactured by Nippon Kayaku Co., Ltd.), 2-dimethylamino benzoic acid 2-ethylhexyl ester (Van Dyk Co., Ltd. Esolol 507), 4,4'·Diethylaminodiphenyl ketone (After the soil 榖 _ EAB, Chemical Co., Ltd.). Among the above, a thioxanthone compound and a tertiary amine compound are preferred. In the composition of the present invention, the thioxanthone-containing compound is preferably from the deep-hardenable surface Φ. Among them, a thioxanthone compound such as 2,4-dimethylthiofluorenone, 2,4-diethylthio fluorenone, 2-chlorothioxanthone or 2,4-diisopropylthioxanthone is preferred. The amount of the thioxanthone compound is preferably 20 parts by mass or less, more preferably 1 part by mass or less, per 100 parts by mass of the carboxylic acid-containing tree. When the amount of the thioxanthone compound is too large, the thick film hardenability is low, which is unfavorable because of the increase in the cost of the product. • As a tertiary amine compound, a compound having a dialkylaminophenic benzene structure, a dialkylamine diphenyl ketone compound, and a dialkylamine having a maximum absorption wave length of 3 to 50 to 410 nm The base coumarin ( ) compound is preferred. As the dialkylaminodiphenyl ketone compound, 4,4'-diethylaminodiphenyl ketone is preferred, and the toxicity is also low. A coumarin compound having a maximum absorption wavelength of 3 50 to 410 nm containing a dialkylamine group, which has a small absorption wavelength in the ultraviolet region, has less coloration, and is a colorless and transparent solder resist photosensitive composition, and of course, can provide a coloring pigment, reflecting A color resistive photosensitive composition of the color of the coloring pigment itself. In particular, 7 · (diethyl-22- 200844652 amino)-4 -methyl-2 fluoren-1-benzopyran-2-one exhibits an excellent increase in laser light with a wavelength of 400 to 4 1 Onm. It is more ideal than the effect. The amount of the carboxylic acid-containing resin (A) is preferably 0.1 to 20 parts by mass, more preferably 0.1 to 10 parts by mass, per 100 parts by mass of the carboxylic acid-containing resin (A). When the compounding amount of the tertiary amine compound is 〇·1 parts by mass or less, a sufficient sensitizing effect may not be obtained. When the amount is more than 20 parts by mass, the light absorption of the third-stage amine compound on the surface of the dried solder resist film becomes strong, and the deep hardenability tends to be low. These photopolymerization initiators, photoinitiation aids, and sensitizers may be used singly or in combination of two or more kinds. The total amount of the photopolymerization initiator, the photoinitiator, and the sensitizer is preferably 35 parts by mass or less based on 100 parts by mass of the carboxylic acid-containing resin (A). When the amount is more than 35 parts by mass, the deep curing property tends to be low due to the light absorption. In the photosensitive composition of the present invention, in order to impart heat resistance, thermosetting of two or more cyclic ether groups and/or cyclic thioether groups (hereinafter simply referred to as cyclic (thio)ether groups) in an adjustable molecule is performed. Sexual component (D). The thermosetting component (D) having two or more cyclic (thio)ether groups in the molecule, wherein the molecule has two or more cyclic ether groups or cyclic sulfides of a 3, 4 or 5 member ring. A compound of one or two of the groups. For example, a compound having at least two or more epoxy groups in the molecule, that is, a polyfunctional epoxy compound (D-1) or a compound having at least two or more propylene oxide groups in the molecule, that is, a polyfunctional ring An oxypropyl compound (D-2), a compound having at least two or more thioether groups in the molecule, that is, an episulfide resin (23-200844652 3). As the polyfunctional epoxy compound (D-1), for example, EPIKOTE 828, EPIKOTE 834, EPIKOTE 1001, EPIKOTE 1004 manufactured by Nippon Epoxy Co., Ltd., EPICLON 840, EPICLON 850, EPICLON 1050, EPICLON 2055, and Dongdu Chemical Co., Ltd., manufactured by Dainippon Ink (INK) Chemical Industry Co., Ltd. EPOTOHTO YD-01 1, YD-013, YD-127, YD-128, DER317, DER331, DER661, DER664, and CHIBA special chemical company ARALDITE607 1 , ARALDITE6084

ARALDITE GY25 0、ARALDITEGY260、住友化學工業公 司製的 SUMIEPOXY ESA-011、ESA-014、ELA-115、ELA-128、旭化成工業公司製 A.E.R.3 3 0、A.E.R.331、 A.E.R.661、A.E.R.664等（皆爲商品名）的雙酚A型環氧 樹脂；日本環氧樹脂公司製EPIKOTE YL903、大日本油墨 (INK)化學工業公司製 EPICLON 152、EPICLON 165、 東都化成公司製EPOTOHTO YDB-400、YDB-500、道康寧 公司製 D.E.R.542、千葉（CHIBA )特殊化學公司的 ARALDITE8011、住友化學工業公司製的 SUMIEPOXY ESB-400、ESB-700、旭化成工業公司製 A.E.R.711、 A.E.R.7 14等（皆爲商品名）的溴化環氧樹脂；日本環氧 樹脂公司製EPIKOTE 152、EPIKOTE 154、道康寧公司製 D.E.N. 431、D.E.N· 438、大日本油墨（INK)化學工業公 司製 EPICLON N-730、EPICLON N-770、EPICLON N-865 、東都化成公司製 EPOTOHTO YDCN-701、YDCN-704、 -24- 200844652 千葉（CHIBA )特殊化學公司的 ARALDITE ECN1 23 5、ARALDITE GY25 0, ARALDITEGY260, SUMIEPOXY ESA-011, ESA-014, ELA-115, ELA-128, manufactured by Sumitomo Chemical Industries, AER3 3 0, AER331, AER661, AER664, etc. Commodity name) bisphenol A type epoxy resin; EPIKOTE YL903 manufactured by Japan Epoxy Resin Co., Ltd., EPICLON 152, EPICLON 165 manufactured by Dainippon Ink (INK) Chemical Industry Co., Ltd., EPOTOHTO YDB-400, YDB-500 manufactured by Dongdu Chemical Co., Ltd. DAR542 from Dow Corning Corporation, ARALDITE 8011 from Chiba Chemical Co., Ltd., SUMIEPOXY ESB-400 from Sumitomo Chemical Industries, ESB-700, AER711 from Asahi Kasei Kogyo Co., Ltd., AER7 14 (both trade names) Epoxy resin; EPIKOTE 152, EPIKOTE 154 manufactured by Japan Epoxy Co., Ltd., DEN 431, DEN·438 manufactured by Dow Corning Corporation, EPICLON N-730, EPICLON N-770, EPICLON N-made by Dainippon Ink (INK) Chemical Industry Co., Ltd. 865, EPOTOHTO YDCN-701, YDCN-704, -24- 200844652 by Dongdu Chemical Co., Ltd. ARALDITE ECN1 from Chiba Special Chemical Company 23

ARALDITE ECN1 273、ARALDITE ECN1 299、ARALDITEARALDITE ECN1 273, ARALDITE ECN1 299, ARALDITE

XPY3 07、日本化藥公司製的 EPPN-201、EOCN- 1 025、 EOCN- 1 020、EOCN-104S、RE-3 06、住友化學工業公司製 的 SUMIEPOXY ESCN-195X、ESCN-220、旭化成工業公司 製A.E.R· ECN-23 5、ECN-299等（皆爲商品名）的酚醛樹 脂型環氧樹脂；大日本油墨（INK )化學工業公司製 EPICLON 83 0、日本環氧樹脂公司製 EPIKOTE807、東都 化成公司製 EPOTOHTO YDF-170、YDF-175、YDF-2004、 千葉（CHIBA)特殊化學公司的ARALDITE XPY3 06等（ 皆爲商品名）的雙酚F型環氧樹脂；東都化成公司製 EPOTOHTO ST-2004、ST-2007、ST-3 000 (商品名）等氫 化雙酚A型環氧樹脂；曰本環氧樹脂公司製EPIKOTE604 、東都化成公司製EPOTOHTO YH-434、千葉（CHIB A ) 特殊化學公司的ARALDITE MY720、住友化學工業公司製 的SUMIEPOXY ELM-120等（皆爲商品名）的縮水甘油胺 型環氧樹脂；千葉（CHIBA)特殊化學公司的ARALDITE CY-350 (商品名）等乙內醯脲（hydrantoin)型環氧樹脂 :大協（DAICEL)化學工業公司製的CELLOXIDE 202 1 、千葉（CHIBA)特殊化學公司的ARALDITE CY175、 C Y 1 79等（皆爲商品名）的脂環式環氧樹脂；日本環氧樹 脂公司製YL-93 3、道康寧公司製的t.e.n.、EPPN-501、 EPPN-502等（皆爲商品名）三羥基苯基甲烷型環氧樹脂 ;日本環氧樹脂公司製YL-6056、YX-4000、YL-6121 (皆 -25- 200844652 爲商品名）等雙二甲酚（bixylenol)型或雙酚型環氧樹脂 或這些的混合物；日本化藥公司製EBP S-200、旭電化工 業公司製EPX-30、大日本油墨（INK )化學工業公司製 EXA-15 14 (商品名）等雙酚S型環氧樹脂；日本環氧樹 脂公司製EPIKOTE157S (商品名）等雙酚A酚醛樹脂型 環氧樹脂；日本環氧樹脂公司製EPIKOTE YL-931、千葉 (CHIBA)特殊化學公司的ARALDITE163等（皆爲商品 名）的四酚基乙烷型環氧樹脂；千葉（CHIB A )特殊化學 公司的ARALDITE PT810、日產化學公司製的TEPIC等（ 皆爲商品名）的雜環式環氧樹脂；日本油脂公司製 BLEMMER DGT等鄰苯二甲酸縮水甘油酯樹脂；東都化成 公司製ZX- 1 063等四縮水甘油基二甲酚基乙烷樹脂；新日 鐵化學公司製ESN-190、ESN-360、大日本油墨（INK)化 學工業公司製 HP-4032、EXA-4750、EXA-4700等含萘基 環氧樹脂；大日本油墨（INK )化學工業公司製HP-72 00 、HP-72 0 0 Η等具有二環戊二烯骨架之環氧樹脂；日本油 脂公司製CP-50S、CP-50M等甲基丙烯酸縮水甘油酯共聚 合系環氧樹脂；又如環己基馬來醯亞胺與甲基丙烯酸縮水 甘油酯共聚合環氧樹脂；環氧基改性聚丁二烯橡膠衍生物 (例如DAICEL化學工業製ρβ-3 600等）、CTBN改性環 氧樹脂（例如東都化成公司製YR-102、YR-45 0等）等， 但不限於這些。這些環氧樹脂，可單獨或組合2種以上使 用。這些之中，特別以酚醛樹脂型環氧樹脂、雜環式環氧 樹脂、雙酚Α型環氧樹脂或這些的混合物較理想。 -26 - 200844652 作爲前述多官能基環氧丙烷化合物（D - 2 )，例如雙[ (3 -甲基-3-環氧丙烷基甲氧基）甲基]醚、雙[(3_乙基-3_ 環氧丙烷基甲氧基）甲基]醚、；1，4_雙[(3一甲基-3-環氧丙 乂 烷基甲氧基）甲基]苯、1，4-雙[(3-乙基-3-環氧丙烷基甲 氧基）甲基]苯、丙烯酸（3_甲基-3-環氧丙烷基）甲酯、 丙烯酸（3 -乙基-3-環氧丙烷基）甲酯、甲基丙烯酸（3_甲 基-3-環氧丙院基）甲酯、甲基丙烯酸（3_乙基-3_環氧丙 φ 垸基）甲酯、這些的寡聚物或共聚合物等的多官能基環氧 丙院類外’例如環氧丙醇與酚醛樹脂、聚（對羥基苯乙烯 )、軸型雙酣類、杯芳烴類、杯芳烴烷基化類、或倍半矽 氧烷（silsesqui〇xane )等與具有羥基之樹脂的醚化物等。 其他’例如具有環氧丙烷環之不飽和單體與（甲基）丙烯 酸烷酯的共聚合物。 作爲前述分子內有至少2個以上的硫醚基的化合物（ D-3 ) ’例如日本環氧樹脂公司製雙酚A型環硫樹脂 # YL7000等。而且，使用相同的合成方法，也可使用酚醛 樹脂型環氧樹脂的環氧基的氧原子被硫原子取代之環硫樹 ^ 脂。 - 前述分子中有2個以上的環狀（硫）醚基之熱硬化性 成分（D)的調配量，對前述含有羧酸的樹脂的羧基1當 量而言’較理想爲0 · 6〜2.0當量，更理想爲〇 . 8〜丨.5當 量所成的範圍。前述分子中有2個以上的環狀（硫）醚基 之熱硬化性成分（D )的調配量未達〇. 6時，因於阻焊膜 殘留羧基，耐熱性、耐鹼性、電絕緣性等差，所以不理想 -27- 200844652 。另一方面，超過2.0當量時，低分子纛的環狀（硫）醚 基殘留於乾燥塗膜，因塗膜的強度低，所以不理想° 使用上述分子中有2個以上的環狀（硫）醚基之熱硬 化性成分（D )的情況下，含有熱硬化觸媒較理想。作爲 如此的熱硬化觸媒，例如咪唑、2-甲基咪唑、2-乙基咪唑 、2 -乙基-4-甲基咪唑、2_苯基咪唑、4 -苯基咪唑、1-氰乙 基-2 -苯基咪唑、1-(2 -氰乙基）-2 -乙基-4-甲基咪唑等咪 唑衍生物；二氰基二醯胺、苯甲基二甲基胺、4-(二甲基 胺基）-N，N-二甲基苯甲基胺、4-甲氧基-N，N-二甲基苯甲 基胺、4-甲基-N，N-二甲基苯甲基胺等胺化合物、己二酸 二醯肼（adipic acid dihydrazide)、癸二酸二醯朋1 等二醯 肼（dihydrazide)化合物；三苯膦等磷化合物等，而且作 爲市售的熱硬化觸媒，例如四國化成工業公司製2 MZ-A、 2MZ-OK、2PHZ、2P4BHZ、2P4MHZ (皆爲咪唑系化合物 的商品名）、SAN-APRO 公司製 U-CAT3 5 03N、U-CAT3 5 02T (皆爲二甲基胺的嵌段異氰酸酯化合物的商品 名）、DBU、DBN、U-CATSA102、U-CAT5002 (皆爲二環 式脒（am idine)化合物及其鹽）等。特別是不限於這些 ，只要是環氧樹脂、環氧丙烷化合物的熱硬化觸媒或可促 進環氧基及/或環氧丙烷基與羧基反應者，可單獨或混合2 種以上使用。而且’可使用胍胺、乙醯基胍胺、苯胍胺、 三聚氰胺、2,4-二胺基-6-甲基丙烯醯氧基乙基-S-三嗪、2-乙烯基-2,4-二胺基-S-三嗪、2-乙烯基-4,6-二胺基-S-三 嗪•異氰脲酸（isocyanuric acid)加成物、2,4-二胺基-6- -28- 200844652 甲基丙烯醯氧基乙基-S-三嗪·異氰脲酸加成物等的S-三 嗪（triazine )衍生物，較理想爲這些也可作爲密合性賦 予劑功能的化合物與前述熱硬化性觸媒倂用。 這些熱硬化性觸媒的調配量，以一般的量之比例便足 夠，例如對含有羧酸的樹脂（A)或分子中有2個以上的 環狀（硫）醚基之熱硬化性成分（D ) 100質量份而言， 較理想爲0.1〜20質量份，更理想爲0.5〜15.0質量份。 本發明的感光性組成物，爲了提高其塗膜的物理強度 等，依據需要可調配塡充劑。作爲如此的塡充劑，可使用 習知慣用的無機或有機塡充劑，特別是使用硫酸鋇、球狀 氧化矽及滑石較理想。再者，可使用將奈米氧化矽分散於 具有1個以上的乙烯性不飽和基之化合物、前述多官能基 環氧樹脂（D-1)之 Hanse-Chemie 公司製 NANOCRYL( 商品名）XP 0396 、 XP 0596 、 XP 0733 > XP 0746 、 XP 0765、XP 0768、XP 0953、XP 0954、XP 1045 (皆爲製品 的等級名稱）、Hanse-Chemie公司製NANOPOX (商品名 )XP 05 16、XP 05 25、XP 03 14 (皆爲製品的等級名稱） 。可調配這些的單獨或2種以上。 這些塡充劑的調配量，對前述含有羧酸的樹脂（A) 1〇〇質量份而言，較理想爲3 00質量份以下，更理想爲 0.1〜3 00質量份，特別理想爲0.1〜150質量份。前述塡 充劑的調配量超過3 00質量份時，因感光性組成物的黏度 變高，印刷性降低，硬化物變脆，所以不理想。 再者，本發明的感光性組成物，爲了前述含有羧酸的 -29- 200844652 樹脂（A )的合成、組成物的調整，或爲了塗佈於基板、 載膜之黏度調整，可使用有機溶劑。 作爲如此的有機溶劑，例如酮類、芳香族烴類、二醇 . 醚類、二醇醚乙酸酯類、酯類、醇類、脂肪族烴類、石油 系溶劑等。更具體地，例如甲基乙基酮、環己酮等酮類； 甲苯、二甲苯、四甲基苯等芳香族烴類；賽璐蘇（ cellosolve )、甲基賽聪蘇、丁基賽璐蘇、卡必醇（ carbitol)、甲基卡必醇、丁基卡必醇、丙二醇單甲醚、 二丙二醇單甲醚、二丙二醇二乙基醚、三乙二醇單乙醚等 二醇醚類；乙酸乙酯、乙酸丁酯、二丙二醇甲醚乙酸酯、 丙二醇甲醚乙酸酯、丙二醇乙醚乙酸酯、丙二醇丁醚乙酸 酯等酯類；乙醇、丙醇、乙二醇、丙二醇等醇類；辛烷、 癸烷等脂肪族烴類；石油醚、石油腦、氫化石油腦、溶劑 石油腦等石油系溶劑等。如此的有機溶劑，可以單獨或2 種以上的混合物使用。 Φ 本發明的感光性組成物，進而依據需要，可調配氫醌 、氫醌單甲醚、第3 丁基鄰苯二酚、焦性沒食子酸、硫代 * 二苯胺（phenothiazine )等習知慣用的熱聚合禁止劑、微 • 粉氧化砍、有機皂土 （ bentonite )、微晶高嶺土 （ montmorillonite )等習知慣用的增黏劑、砂氧系、氟系、 高分子系等的消泡劑及/或調平劑、咪唑系、噻唑系、三 唑系等矽烷偶合劑、抗氧化劑、防鏽劑等習知慣用的添加 劑類。 將本發明的感光性組成物，以例如有機溶劑，調整爲 -30-XPY3 07, EPPN-201, EOCN- 1 025, EOCN- 1 020, EOCN-104S, RE-3 06 manufactured by Nippon Kayaku Co., Ltd., SUMIEPOXY ESCN-195X, ESCN-220, Asahi Kasei Industrial Co., Ltd., manufactured by Sumitomo Chemical Industries, Ltd. AER· ECN-23 5, ECN-299, etc. (all are trade names) phenolic resin epoxy resin; Dainippon Ink (INK) Chemical Industry Co., Ltd. EPICLON 83 0, Japan Epoxy Resin Co., Ltd. EPIKOTE 807, Dongdu Chemical Company's EPOTOHTO YDF-170, YDF-175, YDF-2004, Chiba (CHIBA) special chemical company's ARALDITE XPY3 06 (all are trade names) bisphenol F-type epoxy resin; Dongdu Chemical Co., Ltd. EPOTOHTO ST-2004 Hydrogenated bisphenol A type epoxy resin such as ST-2007, ST-3 000 (trade name); EPIKOTE604 manufactured by Epoxy Epoxy Co., Ltd., EPOTOTO YH-434 manufactured by Dongdu Chemical Co., Ltd., Chiba (CHIB A) special chemical company ARALDITE MY720, a glycidylamine type epoxy resin such as SUMIEPOXY ELM-120 manufactured by Sumitomo Chemical Industries Co., Ltd. (both trade names); and a urethane urea such as ARALDITE CY-350 (trade name) from Chiba Special Chemical Company (hydrantoin) type epoxy tree Grease: CELLOXIDE 202 1 manufactured by DAICEL Chemical Industry Co., Ltd., alicyclic epoxy resin of ARALDITE CY175, CY 1 79, etc. (all are trade names) of Chiba Special Chemical Company; Japan Epoxy Resin Co., Ltd. YL-93 3. Tencent, EPPN-501, EPPN-502, etc. (all are trade names) trihydroxyphenylmethane epoxy resin manufactured by Dow Corning Corporation; YL-6056, YX-4000 manufactured by Japan Epoxy Resin Co., Ltd. Bixylenol type or bisphenol type epoxy resin such as YL-6121 (both -25-200844652), or a mixture of these; EBP S-200 manufactured by Nippon Kayaku Co., Ltd., EPX manufactured by Asahi Kasei Kogyo Co., Ltd. -30, bisphenol S-type epoxy resin such as EXA-15 14 (trade name) manufactured by Dainippon Ink (INK) Chemical Industry Co., Ltd.; bisphenol A phenolic epoxy resin such as EPIKOTE157S (trade name) manufactured by Nippon Epoxy Co., Ltd. Resin; EPIKOTE YL-931 manufactured by Nippon Epoxy Co., Ltd., ARALDITE 163 of Chiba (CHIBA) special chemical company (all are trade names), tetraphenol ethane type epoxy resin; Chiba (CHIB A) special chemical company ARALDITE PT810, TEPIC made by Nissan Chemical Co., Ltd. a heterocyclic epoxy resin of the trade name; a glycidyl phthalate resin such as BLEMMER DGT manufactured by Nippon Oil Co., Ltd.; and a tetraglycidyl xylenyl ethane resin such as ZX-1 063 manufactured by Tosho Kasei Co., Ltd.; Nippon Chemical Co., Ltd. ESN-190, ESN-360, Nippon Ink (INK) Chemical Industry Co., Ltd. HP-4032, EXA-4750, EXA-4700, etc. Naphthalene-based epoxy resin; Dainippon Ink (INK) Chemical Industry Epoxy resin with dicyclopentadiene skeleton such as HP-72 00 and HP-72 0 0 ;, and glycidyl methacrylate copolymerized epoxy resin such as CP-50S and CP-50M manufactured by Nippon Oil Co., Ltd. Another example is cyclohexylmaleimide and glycidyl methacrylate copolymerized epoxy resin; epoxy modified polybutadiene rubber derivative (such as DAICEL Chemical Industry ρβ-3 600, etc.), CTBN modified An epoxy resin (for example, YR-102, YR-45 0, etc. manufactured by Tosho Kasei Co., Ltd.), etc., but is not limited thereto. These epoxy resins may be used alone or in combination of two or more. Among these, a phenol resin type epoxy resin, a heterocyclic epoxy resin, a bisphenol fluorene type epoxy resin or a mixture of these is preferable. -26 - 200844652 As the aforementioned polyfunctional propylene oxide compound (D - 2 ), for example, bis[(3-methyl-3-epoxypropenylmethoxy)methyl]ether, bis[(3_ethyl) -3_ propylene oxide methoxy)methyl]ether; 1,4_bis[(3-methyl-3-epoxypropyl decyl methoxy)methyl]benzene, 1,4-double [(3-Ethyl-3-epoxypropenylmethoxy)methyl]benzene, (3-methyl-3-epoxypropenyl)methyl acrylate, acrylic acid (3-ethyl-3-epoxy) Propane-based methyl ester, methyl methacrylate (3-methyl-3-epoxypropyl) methyl ester, methacrylic acid (3_ethyl-3_epoxypropyl fluorenyl) methyl ester, these oligos Polyfunctional epoxy or propylene-based polymers such as propylene glycol and phenolic resins, poly(p-hydroxystyrene), axial biguanides, calixarenes, calixarene alkylation An ether or the like of a resin having a hydroxyl group, or the like, or a silsesqui〇xane. Other 'for example, a copolymer having an unsaturated monomer of a propylene oxide ring and an alkyl (meth) acrylate. The compound (D-3) having at least two or more thioether groups in the molecule is, for example, a bisphenol A-type episulfide resin #YL7000 manufactured by Nippon Epoxy Co., Ltd., or the like. Further, by using the same synthesis method, an sulfosulfate in which an oxygen atom of an epoxy group of a phenol resin-type epoxy resin is substituted with a sulfur atom can also be used. - the amount of the thermosetting component (D) having two or more cyclic (thio)ether groups in the above molecule is preferably from 0 to 6 to 2.0 based on 1 equivalent of the carboxyl group of the carboxylic acid-containing resin. The equivalent, more preferably 〇. 8~丨.5 equivalent range. The amount of the thermosetting component (D) having two or more cyclic (thio)ether groups in the above molecule is less than 〇. 6. When the carboxyl group remains in the solder mask, heat resistance, alkali resistance, and electrical insulation are caused. Sexually equal, so not ideal -27- 200844652. On the other hand, when the amount is more than 2.0 equivalents, the cyclic (thio)ether group of the low molecular weight ruthenium remains on the dried coating film, and the strength of the coating film is low, so that it is not preferable. In the case of the thermosetting component (D) of the ether group, it is preferred to contain a thermosetting catalyst. As such a thermosetting catalyst, for example, imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 4-phenylimidazole, 1-cyanoacetate Imidazole derivatives such as 2-phenylimidazole, 1-(2-cyanoethyl)-2-ethyl-4-imidazole; dicyanodiamine, benzyldimethylamine, 4- (Dimethylamino)-N,N-dimethylbenzylamine, 4-methoxy-N,N-dimethylbenzylamine, 4-methyl-N,N-dimethyl An amine compound such as benzylamine, a dipicazide compound such as adipic acid dihydrazide or adipic acid, and a phosphorus compound such as triphenylphosphine, etc., and a commercially available heat Hardening catalyst, for example, 2 MZ-A, 2MZ-OK, 2PHZ, 2P4BHZ, 2P4MHZ (all trade names of imidazole compounds) manufactured by Shikoku Chemicals Co., Ltd., U-CAT3 5 03N, U-CAT3 manufactured by SAN-APRO Co., Ltd. 5 02T (trade names of block isocyanate compounds which are all dimethylamine), DBU, DBN, U-CATSA102, U-CAT5002 (all of which are bicyclic amidine compounds and salts thereof). In particular, it is not limited to these, and it may be used alone or in combination of two or more kinds as long as it is a thermosetting catalyst of an epoxy resin or a propylene oxide compound or a reaction capable of promoting an epoxy group and/or an oxypropylene group and a carboxyl group. Moreover, 'p-amine, acetamylamine, benzoguanamine, melamine, 2,4-diamino-6-methylpropenyloxyethyl-S-triazine, 2-vinyl-2 can be used, 4-Diamino-S-triazine, 2-vinyl-4,6-diamino-S-triazine • Isocyanuric acid adduct, 2,4-diamino-6 - -28- 200844652 S-triazine derivative such as methacryloxyethyloxy-S-triazine-isocyanuric acid adduct, etc., preferably these can also be used as an adhesion-imparting agent The functional compound is used in combination with the aforementioned thermosetting catalyst. The amount of these thermosetting catalysts is sufficient in a general amount, for example, a resin containing a carboxylic acid (A) or a thermosetting component having two or more cyclic (thio)ether groups in the molecule ( D) 100 parts by mass, more preferably 0.1 to 20 parts by mass, still more preferably 0.5 to 15.0 parts by mass. In order to increase the physical strength of the coating film, etc., the photosensitive composition of the present invention may be formulated with a sizing agent as needed. As such a chelating agent, a conventional inorganic or organic chelating agent can be used, and in particular, barium sulfate, spherical cerium oxide and talc are preferably used. Further, NANOCRYL (trade name) XP 0396 manufactured by Hanse-Chemie Co., Ltd. which disperses nano cerium oxide in a compound having one or more ethylenically unsaturated groups and the above polyfunctional epoxy resin (D-1) can be used. , XP 0596 , XP 0733 > XP 0746 , XP 0765 , XP 0768 , XP 0953 , XP 0954 , XP 1045 (all grade names of products ) , NANOPOX (trade name ) XP 05 16 , XP 05 by Hanse-Chemie 25, XP 03 14 (all are the grade name of the product). These may be used alone or in combination of two or more. The amount of the hydrazine-containing resin (A) is preferably 300 parts by mass or less, more preferably 0.1 to 30,000 parts by mass, particularly preferably 0.1 to 1 part by mass of the carboxylic acid-containing resin (A). 150 parts by mass. When the amount of the above-mentioned hydrazine is more than 30,000 parts by mass, the viscosity of the photosensitive composition is increased, the printability is lowered, and the cured product is brittle, which is not preferable. Further, in the photosensitive composition of the present invention, an organic solvent may be used for the synthesis of the carboxylic acid-containing -29-200844652 resin (A), the adjustment of the composition, or the viscosity adjustment applied to the substrate and the carrier film. . Examples of such an organic solvent include ketones, aromatic hydrocarbons, diols, ethers, glycol ether acetates, esters, alcohols, aliphatic hydrocarbons, and petroleum solvents. More specifically, for example, ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as toluene, xylene, and tetramethylbenzene; cellosolve, methyl cersubsin, and butyl oxime Sodium, carbitol, methyl carbitol, butyl carbitol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol diethyl ether, triethylene glycol monoethyl ether and other glycol ethers Ethyl acetate, butyl acetate, dipropylene glycol methyl ether acetate, propylene glycol methyl ether acetate, propylene glycol diethyl ether acetate, propylene glycol butyl ether acetate, etc.; ethanol, propanol, ethylene glycol, propylene glycol Alcohols; aliphatic hydrocarbons such as octane and decane; petroleum-based solvents such as petroleum ether, petroleum brain, hydrogenated petroleum brain, solvent petroleum brain, and the like. Such an organic solvent may be used singly or in combination of two or more. Φ The photosensitive composition of the present invention may further be formulated with hydroquinone, hydroquinone monomethyl ether, butyl catechol, pyrogallic acid, thiophene phenothiazine, etc., as needed. Defoaming agents such as thermal polymerization inhibitors, micro-molecules, bentonite, and montmorillonite, which are conventionally used, such as tackifiers, sand oxides, fluorines, and polymers. A conventionally used additive such as a emulsifier, an imidazole-based, a thiazole-based or a triazole-based decane coupling agent, an antioxidant, and a rust preventive agent. The photosensitive composition of the present invention is adjusted to -30-, for example, an organic solvent.

200844652 適合塗佈方法的黏度，於形成有電路的基 法、流塗法、滾輪塗佈法、棒塗法、網版 佈法等的方法塗佈，在約6 〇〜i 〇 〇 °C的溫 物中的有機溶劑揮發乾燥（預乾燥）’可 。該本發明的感光性組成物的乾燥塗膜， 的厚度較理想。而且，將本發明的感光性 膜上’藉由使其乾燥，可得乾膜。將捲取 形成有電路的基板貼合，藉由剝離載膜， 的基板上，形成阻焊膜。然後，以直接繪 接成像裝置）描繪圖型的潛像後，將未曝 液（例如0.3〜3 %碳酸鈉水溶液）顯像， 。再者’於含有熱硬化性成分的情況，藉 140〜180 °C的溫度，使其熱硬化，使前述 (A)的殘基與分子中有2個以上的環狀 硬化性成分（D )的環狀（硫）醚基反應 、耐藥性、耐吸濕性、密合性、電的特性 硬化塗膜。 作爲上述基板所使用的基材，例如使 樹脂、玻璃布環氧樹脂、玻璃聚醯亞胺 環氧樹脂、玻璃布/紙環氧樹脂、合成纖 •聚乙烯· PPO ·氰酸酯等的高頻電路 copper clad laminate )等的材質之全部等 覆銅層合板、其他例如聚醯亞胺、PET ^ 陶瓷基板、晶圓板等。 板上，藉由浸塗 印刷法、淋幕塗 度，使含於組成 形成不黏的塗膜 具有 1 5〜1 ΟΟμπι 組成物塗佈於載 成薄膜狀者，與 可於形成有電路 圖裝置（雷射直 光部藉由驗水溶 而形成阻焊圖型 由例如加熱至約 含有羧酸的樹脂 (硫）醚基之熱 ’可形成耐熱性 等各種特性佳之 用紙酚、紙環氧 、玻璃布/不織布 維環氧樹脂、氟 用覆銅層合板（ 級（FR-4等）的 ^膜、玻璃基板、 -31 _ 200844652 塗佈本發明的感光性組成物後進行揮發乾燥，係將使 用熱風循環式乾燥爐、IR紅外線爐、熱板、對流烘箱等（ 具備藉由蒸氣之空氣加熱方式的熱源者）的乾燥機內的熱 風，逆流接觸的方法以及藉由噴嘴吹支持體的方法而進行 〇 作爲本發明的感光性組成物之曝光手段所使用的光源 ，可使用半導體雷射、固體雷射。而且，其曝光量隨本發 明的感光性組成物的乾燥膜厚等而異，一般爲 5〜 100mJ/cm2，較理想爲 5〜6 0 m J/cm2，更理想爲 5〜30 mJ/cm2的範圍內。作爲直接繪圖裝置，可使用例如 PENTAX賓得士公司製、日立 Via Mechanics公司製、 BALL半導體公司製等。 作爲前述顯像方法，例如浸泡法、淋浴法、噴灑法、 刷塗法等。作爲顯像液，可使用氫氧化鉀、氫氧化鈉、碳 酸鈉、碳酸鉀、磷酸鈉、矽酸鈉、氨、氫氧化四甲基銨等 鹼水溶液。 [實施例] 以下，藉由實施例說明本發明，但本發明不限於這些 〈含有羧酸的樹脂的合成〉 於具備攪拌機、溫度計、回流冷卻管、滴入漏斗及氮 氣導入管之2公升分離式燒瓶，放入甲酚酚醛樹脂型環氧 -32- 200844652 樹脂（日本化藥（股）製、E O CN _ 1 0 4 S、軟化點9 2 °C、環 氧當量=220g/當量）660g、作爲溶劑之卡必醇乙酸酯 421.3g及溶劑石油腦180.6g，於90艺下進行加熱•攪拌 ，使其溶解。然後，一旦冷卻至60它，加入丙烯酸21 6g 、作爲反應觸媒之三苯膦4 · 0 g、聚合禁止劑的甲基氫醌 1 · 3 g，於 10 0 °C下使其反應 12 小時，得到酸價 0.2mgKOH/g的反應生成物。於其中放入四氫酞酸酐 24 1.7g，加熱至90°C，使其反應6小時。藉此，得到不揮 發成分=65質量％、固體成分酸價=77mgKOH/g、雙鍵當 量（每1莫耳不飽和基的樹脂的g重量）=4 00 g/當量、 重量平均分子量=7,0 0 0的含有羧酸的樹脂的溶液。以下 該含有羧酸的樹脂的溶液，稱爲A-1清漆。 〈感光性組成物1〜7的調製〉 表1所示的成分以相同的表中所示的量（質量份）進 行調配•攪拌，以3個滾輪使其分散，得到各感光性組成 物。 -33- 200844652 表 感光性組成物 1 2 3 4 5 6 7 A-1清漆 154 154 154 154 154 154 154 光聚合引發劑(B-1/1 1 1 1 1 0.8 0.9 2 光聚合引發劑(B-2/2 0.45 0.45 0.45 0.45 0.2 0.2 光聚合引發劑(Β-3Γ 6 6 6 6 6 6 光聚合引發劑(B-4)m 5 5 5 5 1 1 5 增感劑(〇1广 1 0.5 增感劑(C-2)*6 0.1 0.2 增感劑(C-3)*7 0.5 0.5 化合物(D-2)*8 20 20 20 20 20 20 20 塡充劑(E-1)*9 130 130 130 130 130 130 120 熱硬化性成分(F小1)， 15 15 15 15 15 15 15 熱硬化性成分(F-1-2)”1 30 30 30 30 30 30 30 酞青藍 0.40 0.40 0.40 0.40 0.34 0.8 黃色顏料*12 0.75 0.75 0.75 0.75 0.75 0.75 0.3 微粉三聚氰胺 3 3 3 3 3 3 3 矽氧系消泡劑 3 3 3 3 3 3 3 DPM*13 5 5 5 5 5 5 5 #150*14 5 5 5 5 5 5 5 註 *1: 2-(乙醯氧基亞胺基甲基)硫蒽-9-酮 (肟酯系光聚合引發劑(I)) *2:乙酮-l-[9-乙基-6·(2-甲基苯甲醯基)-9H-嘮唑-3-基]乙醯基肟） (千葉特殊化學公司製IRGACURE OXE02) (肟酯系光聚合引發劑(I)) *3·· 2-甲基小[4-(甲硫基)苯基]-2-嗎啉基丙酮-1 (胺基苯乙酮系光聚合引發劑(II)) *4: 2,4,6·三甲基苯甲醯基二苯基氧化膦 (醯基氧化膦系光聚合引發劑(III)) *5·· 2,4-二乙基硫蒽酮 *6·· 4,4，-雙二乙基胺基二苯基酮 *7·· 7-(二乙基胺基)斗甲基-2H-1-苯並吡喃-2-酮 *8:二季戊四醇六丙烯酸酯 *9··硫酸鋇(堺化學工業公司製B-30) 酚酚醛樹脂型環氧樹脂(日本化藥公司製EPPN-201) 雙二甲酚型環氧樹脂(日本環氧樹脂公司製YX-4000) 蒽醌系黃色顏料 二丙二醇甲醚以酸指 *10 *11 *12 *13 *14:出光石油化學公司製芳香族系有機溶劑、商品名IPSOU150 -34- 200844652 使用感光性組成物1〜7，檢查所形成的阻焊膜的吸光 度。亦即，將各感光性組成物以塗佈器塗佈於玻璃板後， 使用熱風循環式乾燥爐，於8 0 °C下進行乾燥3 0分鐘，於 玻璃板上製作其乾燥塗膜。對該玻璃板上的各感光性組成 物的乾燥塗膜，使用紫外線可見光分光光度計（日本分光 公司製Ubest-V-5 70DS )以及積分球裝置（日本分光公司 製ISN-4 70 )，測定吸光度。而且，對與塗佈有各感光性 組成物的玻璃板之相同的玻璃板，測定3 0 0〜5 0 Onm的波 長範圍之吸光度的基準線。從所製作的附有乾燥塗膜的玻 璃板的吸光度，藉由減去基準線而算出乾燥塗膜的吸光度 。該作業藉由塗佈器，以4階段改變塗佈厚度而進行，將 乾燥塗膜的厚度與吸光度作圖，從該圖求得乾燥阻焊膜的 每25 μιη膜厚之吸光度。結果表示於表2。 表2 感光性組成物 1 2 3 4 5 6 7 吸光度 (25 μιη) 355-375nm的最大吸收度A 0.81 0.86 0.94 0.86 0.60 0.56 1.21 405mn的最大吸收度B 0.32 0.35 0.43 0.41 0.42 0.26 0.42 A與B的差 0.49 0.51 0.51 0.45 0.18 0.2 0.79 然後，對感光性組成物1，藉由表3所示的實施例1 及2、以及比較例1〜4的曝光方法，使其乾燥塗膜曝光。 -35- 200844652 表3 曝光方法 實施例1 以具有發出355nm波長的紫外線雷射光的光源之直接繪圖機曝光，形 成圖型潛像後，於該圖型潛像上，以具有發出405nm波長的藍紫色雷 射光的光源之直接繪圖機曝光 實施例2 以具有發出405nm波長的藍紫色雷射光的光源之直接繪圖機曝光，形 成圖型潛像後，於該圖型潛像上，以具有發出355nm波長的紫外線雷 射光的光源之直接繪圖機曝光 比較例1 以具有發出355nm波長的紫外線雷射光的光源之直接繪圖機曝光，形~ 成圖型潛像 比較例2 以具有發出355nm波長的紫外線雷射光的光源之直接繪圖機曝光，形 成圖型潛像後，於該圖型潛像上，以具有相同光源的直接繪圖機曝光 比較例3 以具有發出405nm波長的藍紫色雷射光的光源之直接繪圖機曝光，形 成圖型潛像 比較例4 以具有發出405mn波長的藍紫色雷射光的光源之直接繪圖機曝光，形 成圖型潛像後，於該圖型潛像上，以具有相同光源的直接繪圖機曝光 此處’爲了檢查所形成的阻焊膜之各性質，進行以下 的測試後，進行評價。 (1 )表面硬化性 銅厚35μπι的覆銅基板進行擦光（buff)滾輪硏磨後 ，進行水洗，使其乾燥。然後，將感光性組成物1藉由網 版印刷法塗佈於該基板上，以8 0 °C的熱風循環式乾燥爐， 使其乾燥60分鐘。乾燥後，藉由實施例丨及2、以及比較 例1〜4的曝光方法，使該乾燥阻焊塗膜曝光。曝光圖型 係使用全面曝光的圖型。曝光後，使用作爲顯像液的1質 量％的碳酸鈉水溶液，於30°C下，以0.2MPa，進行60秒 的顯像，然後於1 5 0 °C下進行6 0分鐘的熱硬化。 -36-200844652 The viscosity suitable for the coating method is applied in a method of forming a circuit, a flow coating method, a roller coating method, a bar coating method, a screen printing method, etc., at about 6 〇 to 〇〇 ° C. The organic solvent in the warmth is volatilized and dried (pre-dried). The dried coating film of the photosensitive composition of the present invention has a desired thickness. Further, by drying the photosensitive film of the present invention, a dry film can be obtained. A substrate on which a circuit is formed is wound and bonded, and a solder resist film is formed on the substrate by which the carrier film is peeled off. Then, after the latent image of the pattern is drawn by directly drawing the image forming apparatus, the unexposed liquid (for example, 0.3 to 3% aqueous sodium carbonate solution) is developed. In addition, when the thermosetting component is contained, it is thermally cured by a temperature of 140 to 180 ° C, and the residue of the above (A) and the molecule have two or more cyclic hardening components (D). The cyclic (thio)ether group reaction, chemical resistance, moisture absorption resistance, adhesion, and electrical properties of the cured coating film. The substrate used for the substrate is, for example, high in resin, glass cloth epoxy resin, glass polyimide resin epoxy resin, glass cloth/paper epoxy resin, synthetic fiber, polyethylene, PPO, cyanate or the like. All of the materials such as the copper clad laminate) are copper-clad laminates, and other polyimides, PET ceramic substrates, wafer boards, and the like. On the plate, by using a dip coating method or a curtain coating degree, a composition having a composition of non-sticky coating having a composition of 15 to 1 ΟΟμπι is applied to a film-formed film, and a circuit pattern device can be formed ( The laser direct light portion is formed by a water-repellent solution to form a solder resist pattern. For example, heat to a resin (sulfur) ether group containing a carboxylic acid can form various properties such as heat resistance, paper phenol, paper epoxy, and glass cloth. /Non-woven fabric epoxy resin, fluorine-clad copper-clad laminate (film of grade (FR-4, etc.), glass substrate, -31 _ 200844652) The photosensitive composition of this invention is apply|coated and it is volatilized and dried, and hot air is used. Hot air in a dryer such as a circulating drying furnace, an IR infrared oven, a hot plate, a convection oven (a heat source having a vapor heating method by steam), a method of countercurrent contact, and a method of blowing a support by a nozzle半导体 As a light source used for the exposure means of the photosensitive composition of the present invention, a semiconductor laser or a solid laser can be used, and the exposure amount thereof varies depending on the dry film thickness of the photosensitive composition of the present invention. It is usually 5 to 100 mJ/cm 2 , more preferably 5 to 60 m J/cm 2 , and more preferably 5 to 30 mJ/cm 2 . As a direct drawing device, for example, PENTAX Pentax, Hitachi Via Mechanics can be used. As a developing method, for example, a soaking method, a shower method, a spraying method, a brushing method, etc. As the developing liquid, potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate can be used. An aqueous alkali solution such as sodium phosphate, sodium citrate, ammonia or tetramethylammonium hydroxide. [Examples] Hereinafter, the present invention will be described by way of examples, but the present invention is not limited to these <synthesis of carboxylic acid-containing resins> A 2 liter separation flask equipped with a stirrer, a thermometer, a reflux cooling tube, a dropping funnel, and a nitrogen introduction tube, and a cresol novolac type epoxy-32-200844652 resin (manufactured by Nippon Kayaku Co., Ltd., EO CN _ 1) 0 4 S, softening point 9 2 ° C, epoxy equivalent = 220 g / equivalent) 660 g, as a solvent, carbitol acetate 421.3 g and solvent petroleum brain 180.6 g, heated and stirred under 90 art to make Dissolved. Then, once cooled to 60 It was added with 21 6 g of acrylic acid, 4,0 g of triphenylphosphine as a reaction catalyst, and 1.0 g of methylhydroquinone as a polymerization inhibiting agent, and reacted at 10 0 ° C for 12 hours to obtain an acid value of 0.2 mgKOH. / g of the reaction product, in which 1.7 g of tetrahydrophthalic anhydride was placed, and heated to 90 ° C to carry out a reaction for 6 hours, thereby obtaining a nonvolatile content = 65 mass%, and a solid content acid value = 77 mgKOH / g, double bond equivalent (g weight per 1 mole of unsaturated resin) = 4 00 g / equivalent, weight average molecular weight = 7,0 0 0 carboxylic acid containing resin solution. The solution of the carboxylic acid-containing resin is hereinafter referred to as A-1 varnish. <Preparation of photosensitive compositions 1 to 7> The components shown in Table 1 were blended and stirred in the amounts (parts by mass) shown in the same table, and dispersed by three rolls to obtain respective photosensitive compositions. -33- 200844652 Table photosensitive composition 1 2 3 4 5 6 7 A-1 varnish 154 154 154 154 154 154 154 Photopolymerization initiator (B-1/1 1 1 1 1 0.8 0.9 2 Photopolymerization initiator (B -2/2 0.45 0.45 0.45 0.45 0.2 0.2 Photopolymerization initiator (Β-3Γ 6 6 6 6 6 6 Photopolymerization initiator (B-4) m 5 5 5 5 1 1 5 Sensitizer (〇1广1 0.5 Sensitizer (C-2)*6 0.1 0.2 Sensitizer (C-3)*7 0.5 0.5 Compound (D-2)*8 20 20 20 20 20 20 20 Titanium (E-1)*9 130 130 130 130 130 130 120 Thermosetting component (F small 1), 15 15 15 15 15 15 15 Thermosetting component (F-1-2)” 1 30 30 30 30 30 30 30 Indigo blue 0.40 0.40 0.40 0.40 0.34 0.8 yellow pigment*12 0.75 0.75 0.75 0.75 0.75 0.75 0.3 micronized melamine 3 3 3 3 3 3 3 antimony defoamer 3 3 3 3 3 3 3 DPM*13 5 5 5 5 5 5 5 #150*14 5 5 5 5 5 5 5 Note *1: 2-(ethoxylated imidomethyl)thioindole-9-one (oxime ester photopolymerization initiator (I)) *2: ethyl ketone-l-[ 9-ethyl-6·(2-methylbenzhydryl)-9H-indazol-3-yl]ethenylhydrazine) (IRGACURE OXE02, manufactured by Chiba Specialty Chemicals Co., Ltd.) (an oxime-based photopolymerization initiator ( I)) *3·· 2-Methyl small [4-(methylthio)phenyl]-2-morpholinylacetone-1 (amino acetophenone photopolymerization initiator (II)) *4: 2,4 ,6·trimethylbenzimidyldiphenylphosphine oxide (fluorenylphosphine oxide-based photopolymerization initiator (III)) *5·· 2,4-diethylthioxanthone*6·· 4,4 ,-Di-diethylaminodiphenyl ketone*7·· 7-(diethylamino)dometho-2H-1-benzopyran-2-one*8: dipentaerythritol hexaacrylate* 9··Barium sulfate (B-30 manufactured by Nippon Chemical Industry Co., Ltd.) Phenolic phenolic resin epoxy resin (EPPN-201 manufactured by Nippon Kayaku Co., Ltd.) Bis-xylenol epoxy resin (YX-4000, manufactured by Nippon Epoxy Co., Ltd.)蒽醌-based yellow pigment dipropylene glycol methyl ether with acid refers to *10 *11 *12 *13 *14: Aromatic organic solvent manufactured by Idemitsu Petrochemical Co., Ltd., trade name IPSOU150 -34- 200844652 Using photosensitive composition 1~7 Check the absorbance of the formed solder mask. Namely, each of the photosensitive compositions was applied to a glass plate by an applicator, and then dried in a hot air circulating drying oven at 80 ° C for 30 minutes to prepare a dried coating film on a glass plate. The dried coating film of each photosensitive composition on the glass plate was measured using an ultraviolet-visible spectrophotometer (Ubest-V-5 70DS manufactured by JASCO Corporation) and an integrating sphere device (ISN-4 70 manufactured by JASCO Corporation). Absorbance. Further, a reference line for measuring the absorbance in the wavelength range of 300 to 50 Onm was measured for the same glass plate as the glass plate to which each photosensitive composition was applied. The absorbance of the dried coating film was calculated from the absorbance of the produced glass plate with the dried coating film by subtracting the reference line. This operation was carried out by changing the coating thickness in four stages by an applicator, and the thickness of the dried coating film and the absorbance were plotted, and the absorbance per 25 μm of the film thickness of the dried solder resist film was determined from the figure. The results are shown in Table 2. Table 2 Photosensitive composition 1 2 3 4 5 6 7 Absorbance (25 μιη) Maximum absorbance at 355-375 nm A 0.81 0.86 0.94 0.86 0.60 0.56 1.21 Maximum absorbance of 405 mn B 0.32 0.35 0.43 0.41 0.42 0.26 0.42 A and B The difference was 0.49 0.51 0.51 0.45 0.18 0.2 0.79 Then, the photosensitive composition 1 was exposed to the dried coating film by the exposure methods of Examples 1 and 2 and Comparative Examples 1 to 4 shown in Table 3. -35- 200844652 Table 3 Exposure Method Example 1 After exposure to a direct plotter with a source of ultraviolet laser light emitting a wavelength of 355 nm to form a latent image, the latent image on the pattern has a blue wavelength of 405 nm. Direct plotter exposure of a source of purple laser light. Example 2 is exposed by a direct plotter having a source of blue-violet laser light emitting a wavelength of 405 nm to form a latent image of the pattern, and on the latent image of the pattern, to emit 355 nm. Direct plotter exposure of a source of ultraviolet laser light of wavelengths. Comparative Example 1 Exposure to a direct plotter with a source of ultraviolet laser light emitting a wavelength of 355 nm, shape-formation latent image comparison example 2 to have an ultraviolet ray emitting a wavelength of 355 nm After the direct drawing machine of the light source is exposed to form a latent image, the direct drawing machine with the same light source is used to expose Comparative Example 3 to directly have a light source emitting blue-violet laser light having a wavelength of 405 nm. Plotter exposure, forming a latent image of Comparative Example 4 Exposure to a direct plotter with a source of blue-violet laser light emitting a wavelength of 405 nm After the plotter directly after forming a latent image pattern, the pattern on the latent image, to have the same exposure light source here 'for each of the properties of the solder resist film formed was examined, the following test was evaluated. (1) Surface-hardening copper-clad substrate having a copper thickness of 35 μm was subjected to buff roller honing, washed with water, and dried. Then, the photosensitive composition 1 was applied onto the substrate by a screen printing method, and dried in a hot air circulating drying oven at 80 ° C for 60 minutes. After drying, the dried solder resist coating film was exposed by the exposure methods of Examples 2 and 2 and Comparative Examples 1 to 4. The exposure pattern uses a fully exposed pattern. After the exposure, a 1% by mass aqueous sodium carbonate solution as a developing solution was used, and development was carried out at 30 ° C for 20 seconds at 0.2 MPa, and then thermally cured at 150 ° C for 60 minutes. -36-

200844652 如此所得的硬化塗膜之表面硬化性，使用光澤 MICROTRICROSS ( BYK-Gardener 公司製），對入 60°時的光澤度進行評價。評價基準爲光澤度50，該 以上爲良好，未達該數値爲不良。該評價結果表示 (2 )硬化深度及剖面形狀 以線/間隔爲3 00μιη/300μΓη的寬度，銅厚70μπι 路圖型基板，分別進行擦光（buff )滾輪硏磨後，· 洗，使其乾燥。於該電路圖型基板上，藉由網版印甩 佈感光性組成物1，以80°C的熱風循環式乾燥爐，仴 燥3 〇分鐘。乾燥後，藉由實施例1及2、以及比較ί 4的曝光方法，使該乾燥塗膜曝光。曝光圖型係使用 依序描繪 30/40/50/60/70/80/90/1 00μιη寬度的線於 隔部之圖型。曝光後，藉由使用作爲顯像液的1.0 的碳酸鈉水溶液進行顯像，得到阻焊圖型。然後， 水銀燈，以曝光量lOOOmJ/cm2照射紫外線後，使 化6 0分鐘。此時，殘存之最小的線寬作爲硬化深 價。 而且，剖面形狀的評價，係藉由觀察硬化塗膜序 的設計値爲1 ΟΟμπι之線部的剖面進行。此處，銅厚 時的阻焊膜的厚度爲65 μπι。將剖面形狀，根據圖1 型圖，以Α〜Ε的5階段進行評價。圖中，1 a表示| 設計値，1 b表示曝光•顯像後阻焊膜的形狀，1 e ^ 度計 射角 數値 表4 之電 行水 法塗 其乾 I 1〜 分別 述間 『量％ 高壓 熱硬 的評 線寬 7 0 μπι 的模 寬的 示基 -37- 200844652 板。各評價的狀態係如下’亦即 A評價：如設計寬度的理想狀態； B評價：因耐顯像性不足而發生表面層腐蝕； C評價：基蝕（undercut)狀態； D評價：因暈光（halation)等而產生線太粗； E評價：表面層的線太粗且產生基蝕。 此處，所謂基鈾及暈光，都表示與設計値之偏差的用 φ 語。所謂基蝕，特別是表示下部比設計値細的情形，暈光 係指上部•下部中之一或兩者比設計値粗的情形。 特別是A評價中，與設計値之偏差，線的上部•下部 皆爲5 μπι以內。 不僅限於Α評價，C評價、D評價也爲可使用作爲阻 焊膜的程度。相對地，B評價、E評價者，線、基飩部分 容易剝離，係爲難以使用作爲阻焊膜的程度，特別是E評 價爲不可能使用的程度。 # 評價結果，合倂表示於表4。 表4 曝光方法 實施例 比較例 1 2 1 2 3 4 曝光量(mJ/cm2)(第1台/第2台） 20/20 20/20 70/- 30/30 60/- 30/30 曝光時間(秒)(第1台/第2台） 20/20 20/20 70Λ 30/30 60/- 30/30 剖面形狀 A A C C B B 硬化深度最小線寬 60 50 90 90 50 60 表面硬化1生60°光澤 良好 良好 良好 良好 不良 不良 由表4得知，於使用本發明的曝光方法之實施例1及 -38- 200844652 2的曝光方法的情況，在低曝光量及短曝光時間下，可得 優異的淨j面形狀、硬化深度及表面硬化性。另一方面，於 使用比較例1〜4的曝光方法的情況，爲了使組成物硬化 ’需要更高的曝光量及長曝光時間，再者所得的阻焊膜的 咅！J面形狀 '硬化深度及表面硬化性也不充分。 再者’對感光性組成物2〜7，使其乾燥塗膜曝光，形 成阻焊膜。爲了檢查所形成的阻焊膜的各性質，使用實施 例1 1及2的曝光方法作爲曝光方法，與上述同樣地進行測 試後’進行評價。對這些的評價結果與表4之調配例1的 評價結果，合倂表示於表5。 表5 1------ --一_ 實施/ 例1 感光性組成物 1 2 3 4 5 6 7 曝光量(mJ/cm2) (第1台/第2台） 20/20 20/20 20/20 20/20 15/15 20/20 20/20 曝光時間(秒） (第1台/第2台） 20/20 20/20 20/20 20/20 15/15 20/20 20/20 剖面形狀 A A A A A或D C E 硬化涂度最小線寬 60 60 60 60 60 70 1〇〇 表面硬化性60°光g 良好 良好 良好 良好 良好 良好 良好 --^--- 實旆」 刚2 感光性組成物 1 2 3 4 5 6 7 曝光量(mJ/cm2) (第1台/第2台） 20/20 20/20 20/20 20/20 15/15 20/20 20/20 曝光時間(秒） (第1台/第2台） 20/20 20/20 20/20 20/20 15/15 20/20 20/20 剖面形狀 A A A A A或D C E 硬化深度最小線寬 50 50 50 50 50 70 90 表面硬化性60。光澤 良好 良好 良好 良好 良好 良好 良好 〜 — -39- 200844652 由表5的結果，得知於本發明的阻焊膜的形成方法， 使用曝光前的乾燥塗膜之厚度每25μπι，於3 5 5〜3 80nm的 波長範圍下顯示0.6〜1.2的吸光度，且於40 5 nm的波長 下顯示0.3〜0·6的吸光度之感光性組成物（1〜5 )更理想 實施例3 將表1所示的感光性組成物1以甲基乙基酮稀釋，塗 佈於載膜上，以80 °C的熱風乾燥機加熱乾燥30分鐘，形 成厚度25 μπχ的光硬化性•熱硬化性樹脂組成物層，於其 上貼合覆蓋薄膜，得到乾膜。然後，剝去覆蓋薄膜，於形 成有圖型之銅箔基板，將所得的乾膜進行熱層合。然後， 以表3所示的實施例1及2的條件進行曝光，除去載膜後 ，以1重量％的碳酸鈉水溶液顯像60秒，得到圖像。再以 1 5 0°C的熱風乾燥機進行60分鐘的加熱硬化，製作測試基 板。對所得的具有硬化包覆膜之測試基板，以前述測試方 法及評價方法，進行各特性的評價測試。結果與表5的感 光性組成物1的結果相同。 【圖式簡單說明】 圖1表示感光性組成物的乾燥塗膜進行曝光，將其顯 像後而得之阻焊膜的剖面形狀的模型圖。 -40- 200844652200844652 The surface hardenability of the hardened coating film thus obtained was evaluated by using a gloss MICROTRICROSS (manufactured by BYK-Gardener Co., Ltd.) to obtain a gloss at 60°. The evaluation standard is glossiness 50, which is good, and the number is not good. The evaluation results show that (2) the depth of hardening and the cross-sectional shape are 300 ft/300 μΓη in line/space, and the copper-thick 70 μπι pattern substrate is subjected to buff roller honing, and washed to dry. . On the circuit pattern substrate, the photosensitive composition 1 of the screen printing cloth was dried in a hot air circulating drying oven at 80 ° C for 3 minutes. After drying, the dried coating film was exposed by the exposure methods of Examples 1 and 2 and Comparative ί 4 . The exposure pattern uses a pattern of 30/40/50/60/70/80/90/1 00μιη width lines in the septum. After the exposure, development was carried out by using a sodium carbonate aqueous solution of 1.0 as a developing liquid to obtain a solder resist pattern. Then, the mercury lamp was irradiated with ultraviolet rays at an exposure amount of 1000 mJ/cm2, and then allowed to react for 60 minutes. At this time, the remaining line width is the hardening depth. Further, the evaluation of the cross-sectional shape was carried out by observing the cross section of the line portion of the hardened coating film sequence of 1 ΟΟμπι. Here, the thickness of the solder resist film at the time of copper thickness is 65 μm. The cross-sectional shape was evaluated in five stages of Α~Ε according to the figure of Fig. 1. In the figure, 1 a indicates | design 値, 1 b indicates the shape of the solder mask after exposure and development, and the number of angles of 1 e ^ 计 値 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 Amount % High pressure hot hard line width 7 0 μπι The width of the mold base -37- 200844652 board. The state of each evaluation is as follows: that is, A evaluation: ideal state such as design width; B evaluation: surface layer corrosion due to insufficient development resistance; C evaluation: undercut state; D evaluation: due to halation (halation) or the like produces a line that is too thick; E evaluation: the line of the surface layer is too thick and causes a base corrosion. Here, the so-called base uranium and the halo light all indicate the deviation from the design 的 in the φ language. The so-called base erosion, especially when the lower part is thinner than the design, the halo means that one or both of the upper part and the lower part are thicker than the design. In particular, in the A evaluation, the deviation from the design ,, the upper and lower parts of the line are all within 5 μπι. The C evaluation and the D evaluation are not limited to the extent that they can be used as a solder resist. In contrast, in the B evaluation and the E-evaluator, the wire and the base portion are easily peeled off, and it is difficult to use the solder resist film, and in particular, the E evaluation is impossible. # Evaluation results, combined in Table 4. Table 4 Exposure Method Example Comparative Example 1 2 1 2 3 4 Exposure (mJ/cm2) (1st / 2nd) 20/20 20/20 70/- 30/30 60/- 30/30 Exposure time (seconds) (1st / 2nd) 20/20 20/20 70Λ 30/30 60/- 30/30 Profile shape AACCBB Hardening depth Minimum line width 60 50 90 90 50 60 Surface hardening 1 60° gloss good Good and good, good and bad, as shown in Table 4, in the case of the exposure method of Example 1 and -38-200844652 2 using the exposure method of the present invention, an excellent net can be obtained at a low exposure amount and a short exposure time. Surface shape, hardening depth and surface hardenability. On the other hand, in the case of using the exposure methods of Comparative Examples 1 to 4, in order to harden the composition, a higher exposure amount and a longer exposure time were required, and the obtained solder resist film was further obtained! J-face shape 'The depth of hardening and surface hardenability are also insufficient. Further, the photosensitive compositions 2 to 7 were exposed to a dry coating film to form a solder resist film. In order to examine the properties of the formed solder resist film, the exposure methods of Examples 11 and 2 were used as the exposure method, and the evaluation was carried out in the same manner as described above. The evaluation results of these and the evaluation results of the formulation example 1 of Table 4 are shown in Table 5. Table 5 1-------一_ Implementation / Example 1 Photosensitive composition 1 2 3 4 5 6 7 Exposure amount (mJ/cm2) (1st / 2nd) 20/20 20/20 20/20 20/20 15/15 20/20 20/20 Exposure time (seconds) (1st / 2nd) 20/20 20/20 20/20 20/20 15/15 20/20 20/20 Profile shape AAAAA or DCE Hardening degree Minimum line width 60 60 60 60 60 70 1〇〇Surability 60° light g Good good Good Good Good Good good--^--- Really 2 Photosensitive composition 1 2 3 4 5 6 7 Exposure (mJ/cm2) (1st / 2nd) 20/20 20/20 20/20 20/20 15/15 20/20 20/20 Exposure time (seconds) (page 1/2nd) 20/20 20/20 20/20 20/20 15/15 20/20 20/20 Profile shape AAAAA or DCE Hardening depth Minimum line width 50 50 50 50 50 70 90 Surface hardenability 60. Good gloss good good good good good good good ~ -39- 200844652 From the results of Table 5, it is known that the method of forming the solder resist film of the present invention uses the thickness of the dried coating film before exposure every 25 μm, at 3 5 5~ The photosensitive composition (1 to 5) exhibiting an absorbance of 0.6 to 1.2 at a wavelength of 80 nm and exhibiting an absorbance of 0.3 to 0.6 at a wavelength of 40 5 nm is more preferable. The photosensitive composition 1 was diluted with methyl ethyl ketone, applied onto a carrier film, and dried by heating in a hot air dryer at 80 ° C for 30 minutes to form a photocurable thermosetting resin composition layer having a thickness of 25 μπχ. A cover film was attached thereto to obtain a dry film. Then, the cover film was peeled off to form a patterned copper foil substrate, and the obtained dry film was thermally laminated. Then, exposure was carried out under the conditions of Examples 1 and 2 shown in Table 3, and after the carrier film was removed, the film was developed with a 1% by weight aqueous sodium carbonate solution for 60 seconds to obtain an image. Further, heat-hardening was performed for 60 minutes in a hot air dryer at 150 ° C to prepare a test substrate. The test substrate having the cured coating film obtained was subjected to an evaluation test of each characteristic by the aforementioned test method and evaluation method. The results were the same as those of the photosensitive composition 1 of Table 5. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a model diagram showing a cross-sectional shape of a solder resist film obtained by exposing a dried coating film of a photosensitive composition to a developed image. -40- 200844652

【主要元件符號說明】 1 a :線寬的設計値 1 b :曝光·顯像後阻焊膜的形狀 1 c :基板 -41 -[Description of main component symbols] 1 a : Design of line width 値 1 b : Shape of solder mask after exposure and development 1 c : Substrate -41 -

Claims (1)

200844652 十、申請專利範園 1. 一種阻焊膜之形成方法，其特徵爲：塗佈感 組成物於基材上，使其乾燥後，於該乾燥塗膜上照射 , 以上的波長互爲相異之雷射光，被該2個以上的雷射 別照射過之圖型潛像形成後，以鹼水溶液顯像。 ▲ 2 · —'種阻焊膜之形成方法’其特徵爲：塗佈感 組成物於基材上，使其乾燥後，於該乾燥塗膜，照射 φ 雷射光及與該第1雷射光的波長相異之第2雷射光， 述第1雷射光及第2雷射光兩者照射過之圖型潛像形 ，以鹼水溶液顯像。 3. 如申請專利範圍第2項之阻焊膜之形成方法 中該第1雷射光及第2雷射光中之一爲藍紫色雷射光 4. 一種感光性組成物，其係用於如申請專利範圍 .項之阻焊膜之形成方法的感光性組成物，其特徵爲： 光前的乾燥塗膜係厚度每25μιη，於3 5 5〜3 80nm的波 φ 圍下顯示0.6〜1.2的吸光度’且於405 nm的波長下 0.3〜0.6的吸光度。 ♦ 5.如申請專利範圍第4項之感光性組成物，其 ^ 曝光前的乾燥塗膜的厚度每2 5 μπι，於3 5 5〜3 8 Onm的 範圍下之最大吸光度及405nm的波長下之吸光度的 0.3以上未達〇.6。 6.如申請專利範圍第4項之感光性組成物，其 曝光前的乾燥.塗膜係厚度每25^m，於3 5 5nm的波長 示0.6〜1.0的吸光度及於405nm的波長下顯示〇·3 光性 2個 光分 光性 第1 被前 成後 ，其 〇 丨第2 其曝 長範 顯示 中其 波長 差爲 中其 下顯 〜0.5 -42- 200844652 的吸光度，且3 5 5nm的波長下之吸光度與 下之吸光度的差爲0.3以上未達0.5。 7.如申請專利範圍第4項之感光性組 感光性組成物含有（A )含有羧酸的樹脂、 發劑及（C )顏料。 8 .如申請專利範圍第7項之感光性組 光聚合引發劑（B)係選自具有式（I)所表 系光聚合引發劑、具有式（II )所表示的基 酮系光聚合引發劑及具有式（III )所表示的 膦系光聚合引發劑所成群中1種以上的光聚 40 5 nm的波長 成物，其中該 (B )光聚合引 成物，其中該 示的基之脂酯 之α-胺基苯乙 基之氧化醯基 合引發劑，200844652 X. Patent application garden 1. A method for forming a solder resist film, characterized in that a coating composition is coated on a substrate, dried, and then irradiated on the dried coating film, the above wavelengths are mutually phased The different laser light is formed by the alkali aqueous solution after the latent image of the pattern irradiated by the two or more lasers is formed. ▲ 2 - "Method for forming a solder mask" is characterized in that a coating composition is applied onto a substrate and dried, and then the dried coating film is irradiated with φ laser light and the first laser light. The second laser light having a different wavelength is a pattern latent image in which both the first laser light and the second laser light are irradiated, and is imaged by an aqueous alkali solution. 3. In the method for forming a solder mask according to the second aspect of the patent application, one of the first laser light and the second laser light is blue-violet laser light. 4. A photosensitive composition, which is used as a patent application. The photosensitive composition of the method for forming a solder mask of the above aspect is characterized in that: the thickness of the dried coating film before the light shows an absorbance of 0.6 to 1.2 at a wavelength φ of 3 5 5 to 3 80 nm every 25 μm. And absorbance of 0.3 to 0.6 at a wavelength of 405 nm. ♦ 5. As in the photosensitive composition of claim 4, the thickness of the dried coating film before exposure is 2 5 μm, the maximum absorbance in the range of 3 5 5 to 3 8 Onm and the wavelength of 405 nm. The absorbance of 0.3 or more does not reach 〇.6. 6. The photosensitive composition according to item 4 of the patent application, which is dried before exposure. The thickness of the coating film is 25 μm, the absorbance of 0.6 to 1.0 at a wavelength of 35 nm, and the wavelength at a wavelength of 405 nm. ·3 Photometricity 2 After the first light is formed, the wavelength difference between the second and the second light is shown as the absorbance of the lower wavelength of ~0.5 -42-200844652, and the wavelength of 355 nm The difference between the absorbance and the absorbance below is 0.3 or more and less than 0.5. 7. The photosensitive composition of claim 4, wherein the photosensitive composition contains (A) a carboxylic acid-containing resin, a hair agent, and (C) a pigment. 8. The photosensitive group photopolymerization initiator (B) according to claim 7 is selected from the group consisting of photopolymerization initiators of the formula (I) and having a ketone-based photopolymerization initiator represented by the formula (II) And a wavelength product of one or more kinds of photopolymerization of 40 5 nm in a group of the phosphine-based photopolymerization initiator represented by the formula (III), wherein the (B) photopolymerization derivative, wherein the group is shown a bismuth oxide-based initiator of α-aminophenethylethyl ester, (式中， Rl表示氫原子、苯基（也可以碳數1〜 基或鹵原子所取代）、碳數1〜2 0的烷基（ 上的羥基所取代，於烷基鏈的中間也可具有 原子）、碳數5〜8的環烷基、碳數2〜20 6的烷基、苯 也可以1個以 1個以上的氧 的烷醯基或苯 -43- 200844652 甲_基（也可以碳數1〜6的烷基或苯基所取代）， R1 2表示苯基（也可以碳數1〜6的烷基、苯基或鹵原 子所取代）、碳數1〜20的烷基（也可以1個以上的羥基 所取代，於烷基鏈的中間也可具有1個以上的氧原子）、 碳數5〜8的環烷基、碳數2〜20的烷醯基或苯甲醯基（ 也可以碳數1〜6的烷基或苯基所取代）， R3及R4表示各自獨立之碳數1〜12的烷基或芳基烷 基， R5及R6表示各自獨立之氫原子、碳數1〜6的烷基或 2者鍵結之環狀烷醚基， R7及R8表示各自獨立之碳數1〜10的直鏈狀或分歧 狀的院基、環己基、環戊基、芳基或以鹵原子、院基或院 氧基所取代之芳基，但R7及R8中之一也可表示R 一 C( =〇 ) —基（此處R爲碳數1〜20的烴基））。 9 ·如申請專利範圍第8項之感光性組成物，其中該 具有式（Ο所表示的基之肟酯系光聚合引發劑含有式（ IV)的化合物，(wherein R1 represents a hydrogen atom, a phenyl group (may also be substituted with a carbon number of 1 to a group or a halogen atom), an alkyl group having a carbon number of 1 to 20 (substituted by a hydroxyl group, and may be in the middle of the alkyl chain) a cycloalkyl group having an atomic number, a carbon number of 5 to 8, an alkyl group having 2 to 20 carbon atoms, or a benzene group may have one or more alkyl anthracene groups or benzene-43-200844652 A-based group (also It may be substituted by an alkyl group having 1 to 6 carbon atoms or a phenyl group), and R1 2 represents a phenyl group (may also be substituted with an alkyl group having 1 to 6 carbon atoms, a phenyl group or a halogen atom), and an alkyl group having 1 to 20 carbon atoms. (Alternatively, one or more hydroxyl groups may be substituted, and one or more oxygen atoms may be present in the middle of the alkyl chain), a cycloalkyl group having 5 to 8 carbon atoms, an alkanoyl group having 2 to 20 carbon atoms, or a benzyl group. Mercapto group (may also be substituted with an alkyl group having 1 to 6 carbon atoms or a phenyl group), R3 and R4 represent an alkyl group or an arylalkyl group having 1 to 12 carbon atoms, and R5 and R6 represent independent hydrogen atoms. An alkyl group having 1 to 6 carbon atoms or a cyclic alkyl ether group bonded to 2, and R7 and R8 each independently represent a linear or branched group having a carbon number of 1 to 10, a cyclohexyl group or a cyclopentyl group. , aryl or halogen An aryl group substituted by an atom, a hospital or an alkoxy group, but one of R7 and R8 may also represent R a C( =〇)- group (wherein R is a hydrocarbon group having 1 to 20 carbon atoms)). 9. The photosensitive composition of claim 8, wherein the oxime-based photopolymerization initiator having the formula (?) contains a compound of the formula (IV), S—0一 S—CH3 (IV) -44- 1 0 ·如申請專利範圍第8項之感光性組成物，其中該 2 具有式（I )所表示的基之肟酯系光聚合引發劑含有式（V 3 )的化合物， 200844652S-O-S-CH3 (IV) -44- 1 0. The photosensitive composition of claim 8, wherein the oxime-based photopolymerization initiator having the group represented by formula (I) contains Compound of formula (V 3 ), 200844652 馨 (式中， R9表示氫原子、鹵原子、碳數1〜12的烷基、環戊基 、環己基、苯基、苯甲基、苯甲醯基、碳數2〜12的院醯 基、碳數2〜12的烷氧基羰基（構成烷氧基之烷基的碳數 爲2以上時，烷基可以1個以上的羥基所取代，於烷基鏈 的中間也可具有1個以上的氧原子）或苯氧基羰基， R1G、R12表示各自獨立之苯基（也可以碳數1〜6的 φ 烷基、苯基或鹵原子所取代）、碳數1〜20的烷基（也可 以1個以上的羥基所取代，於烷基鏈的中間也可具有1個 , 以上的氧原子）、碳數5〜8的環烷基、碳數2〜20的烷 . 醯基或苯甲醯基（也可以碳數1〜6的烷基或苯基所取代 )， rM表示氫原子、苯基（也可以碳數1〜6的烷基、苯 基或鹵原子所取代）、碳數1〜20的烷基（也可以1個以 上的經基所取代，於烷基鏈的中間也可具有1個以上的氧 原子）、碳數5〜8的環烷基、碳數2〜20的烷醯基或苯 -45- 200844652 甲醯基（也可以碳數1〜6的烷基或苯基所取代））。 1 1.如申請專利範圍第7項之感光性組成物，其中該 顏料（C)含有酞青藍系顏料。 12.如申請專利範圍第7項之感光性組成物，其中更 包含分子中具有2個以上的環狀醚基及/或環狀硫醚基之 熱硬化性成分（D )。 1 3 ·如申請專利範圍第4項之感光性組成物，其係適 用爲厚度15〜100 μπι的乾燥塗膜。 14. 一種乾膜，其特徵爲：將如申請專利範圍第4項 之感光性組成物塗佈於載膜上後乾燥而得。In the formula, R9 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 12 carbon atoms, a cyclopentyl group, a cyclohexyl group, a phenyl group, a benzyl group, a benzamidine group, and a carbon number of 2 to 12 The alkoxycarbonyl group having 2 to 12 carbon atoms (when the carbon number of the alkyl group constituting the alkoxy group is 2 or more, the alkyl group may be substituted with one or more hydroxyl groups, and may have one or more groups in the middle of the alkyl chain. Oxygen atom) or phenoxycarbonyl group, R1G, R12 represent a respective phenyl group (may also be substituted by a φ alkyl group having 1 to 6 carbon atoms, a phenyl group or a halogen atom), and an alkyl group having 1 to 20 carbon atoms ( It may be substituted by one or more hydroxyl groups, and may have one or more oxygen atoms in the middle of the alkyl chain, a cycloalkyl group having 5 to 8 carbon atoms, or an alkane having 2 to 20 carbon atoms. Mercapto (which may also be substituted by an alkyl group having 1 to 6 carbon atoms or a phenyl group), rM represents a hydrogen atom, a phenyl group (may also be substituted with an alkyl group having 1 to 6 carbon atoms, a phenyl group or a halogen atom), and carbon. a number of 1 to 20 alkyl groups (may be substituted by one or more trans groups, and may have one or more oxygen atoms in the middle of the alkyl chain), a cycloalkyl group having 5 to 8 carbon atoms, and a carbon number of 2 to 20 alkane Mercapto or benzene -45- 200844652 Mercapto (which may also be substituted by an alkyl or phenyl group having 1 to 6 carbon atoms)). 1. The photosensitive composition of claim 7, wherein the pigment (C) contains an indigo blue pigment. 12. The photosensitive composition of claim 7, which further comprises a thermosetting component (D) having two or more cyclic ether groups and/or cyclic thioether groups in the molecule. 1 3 . The photosensitive composition of claim 4, which is a dry coating film having a thickness of 15 to 100 μm. A dry film obtained by applying a photosensitive composition according to item 4 of the patent application to a carrier film and drying it. -46 --46 -
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